Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
07/2004
07/08/2004US20040133401 Method of displaying measurement result in inspection process and system thereof, and computer program
07/08/2004US20040133361 Method for CVD process control for enhancing device performance
07/08/2004US20040133294 Defect alarm system and method
07/08/2004US20040132900 Heat resistance, chemical resistance, waterproofing; curing, cyclization polyamic acids
07/08/2004US20040132888 Electronic device packaging and curable resin composition
07/08/2004US20040132399 Production system
07/08/2004US20040132386 Apparatus and method for feeding slurry
07/08/2004US20040132384 Method for post-chemical mechanical polishing cleaning
07/08/2004US20040132381 Integrated circuit interconnect fabrication systems and methods
07/08/2004US20040132318 System and method for wet cleaning a semiconductor wafer
07/08/2004US20040132317 Method for oxidation of silicon substrate
07/08/2004US20040132316 Ultra-thin gate dielectrics
07/08/2004US20040132315 Multistage deposition that incorporates nitrogen via an intermediate step
07/08/2004US20040132314 Method of manufacturing an electronic device
07/08/2004US20040132313 Method for production of a metallic or metal-containing layer
07/08/2004US20040132312 Silicon precursors for deep trench silicon etch processes
07/08/2004US20040132311 Method of etching high-K dielectric materials
07/08/2004US20040132310 Method for manufacturing electronic component
07/08/2004US20040132309 Wafer polishing method and wafer polishing apparatus in semiconductor fabrication equipment
07/08/2004US20040132308 Corrosion retarding polishing slurry for the chemical mechanical polishing of copper surfaces
07/08/2004US20040132307 Methods to fabricate semiconductor devices
07/08/2004US20040132306 Method using multi-component colloidal abrasives for CMP processing of semiconductor and optical materials
07/08/2004US20040132305 Aqueous dispersion for chemical mechanical polishing, chemical mechanical polishing process, production process of semiconductor device and material for preparing an aqueous dispersion for chemical mechanical polishing
07/08/2004US20040132304 In situ plasma wafer bonding method
07/08/2004US20040132303 Membrane 3D IC fabrication
07/08/2004US20040132302 a mixture of deionized water, sulfuric acid, hydrogen peroxide and hydrofluoric acid, used for removing photoresist residues during etching
07/08/2004US20040132299 Method for depositing lead-free tin alloy
07/08/2004US20040132298 Apparatus for fabricating a III-V nitride film
07/08/2004US20040132296 Methods to form dual metal gates by incorporating metals and their conductive oxides
07/08/2004US20040132295 Method and device to remove unwanted material from the edge region of a workpiece
07/08/2004US20040132294 Manufacturing method of fine structure, optical element, integrated circuit, and electronic instrument
07/08/2004US20040132293 Method for manufacturing semiconductor device and heat treatment method
07/08/2004US20040132292 Method for manufacturing semiconductor integrated circuit structures
07/08/2004US20040132291 Method of fabricating dual damascene interconnections of microelectronic device using hybrid low k-dielectric and carbon-free inorganic filler
07/08/2004US20040132290 Method for the manufacture of micro structures
07/08/2004US20040132288 Fabrication of semiconductor devices
07/08/2004US20040132287 Dry etch process for copper
07/08/2004US20040132286 Methods of forming refractory metal silicide components and methods of restricting silicon surface migration of a silicon structure
07/08/2004US20040132285 Polymer film metalization
07/08/2004US20040132284 Method and apparatus for forming a barrier metal layer in semiconductor devices
07/08/2004US20040132283 Methods of forming metal wiring of semiconductor devices
07/08/2004US20040132282 Copper transition layer for improving copper interconnection reliability
07/08/2004US20040132281 Treatment of low-k dielectric materials for CMP
07/08/2004US20040132280 Method of forming metal wiring in a semiconductor device
07/08/2004US20040132279 Electronic package with filled blind vias
07/08/2004US20040132278 Method for manufacturing semiconductor device
07/08/2004US20040132277 Production method for semiconductor device
07/08/2004US20040132276 Forming openings within integrated circuits
07/08/2004US20040132275 Bulk synthesis of metal and metal based dielectric nanowires
07/08/2004US20040132274 Method of forming thick metal silicide layer on gate electrode
07/08/2004US20040132273 Formation method of gate electrode in semiconductor
07/08/2004US20040132272 Methods of fabricating a semiconductor device having a metal gate pattern
07/08/2004US20040132271 Method to produce dual gates (one metal and one poly or metal silicide) for CMOS devices using sputtered metal deposition, metallic ion implantation, or silicon implantation, and laser annealing
07/08/2004US20040132270 Method of forming a novel gate electrode structure comprised of a silicon-germanium layer located between random grained polysilicon layers
07/08/2004US20040132268 Method of forming cobalt silicide film and method of manufacturing semiconductor device having cobalt silicide film
07/08/2004US20040132267 Patterned strained silicon for high performance circuits
07/08/2004US20040132266 Laser apparatus, laser irradiation method, manufacturing method for semiconductor device, semiconductor device, production system for semiconductor device using the laser apparatus, and electronic equipment
07/08/2004US20040132265 Separating method
07/08/2004US20040132264 Integrated high performance mos tunneling led in ulsi technology
07/08/2004US20040132263 Method for forming shallow well of semiconductor device using low-energy ion implantation
07/08/2004US20040132261 Method for forming gate oxide in semiconductor device
07/08/2004US20040132260 Process for fabricating a short-gate-length MOS transistor and integrated circuit comprising such a transistor
07/08/2004US20040132259 Method of manufacturing a semiconductor device
07/08/2004US20040132258 MOSFET and method of fabricating the same
07/08/2004US20040132257 Semiconductor device fabrication method
07/08/2004US20040132256 MOS transistor having a recessed gate electrode and fabrication method thereof
07/08/2004US20040132255 Semiconductor device and producing method of the same
07/08/2004US20040132254 Deterministically doped field-effect devices and methods of making same
07/08/2004US20040132253 Manufacture method of semiconductor device with gate insulating films of different thickness
07/08/2004US20040132252 Method of forming a field effect transistor having a lateral depletion structure
07/08/2004US20040132251 Non-volatile memory and method for manufacturing non-volatile memory
07/08/2004US20040132250 Preventing dielectric thickening over a gate area of a transistor
07/08/2004US20040132249 Semiconductor device and a method of manufacturing the same
07/08/2004US20040132248 Flash memory cell and method for fabricating the same
07/08/2004US20040132247 Semiconductor device and method of manufacturing the same
07/08/2004US20040132246 Method of forming semiconductor device with capacitor
07/08/2004US20040132245 Method of fabricating a dram cell
07/08/2004US20040132244 Method of manufacturing a semiconductor device
07/08/2004US20040132243 Method of forming cavity between multilayered wirings
07/08/2004US20040132241 Insulated gate field effect transistor and method of fabricating the same
07/08/2004US20040132240 Method of manufacturing CMOS semiconductor device
07/08/2004US20040132239 Methods to form dual metal gates by incorporating metals and their conductive oxides
07/08/2004US20040132238 Semiconductor device and manufacturing method thereof
07/08/2004US20040132237 Method of manufacturing a semiconductor device
07/08/2004US20040132236 Mos transistor
07/08/2004US20040132234 Semiconductor device having silicon on insulator and fabricating method therefor
07/08/2004US20040132233 Semiconductor device
07/08/2004US20040132232 Vertical gain cell and array for a dynamic random access memory and method for forming the same
07/08/2004US20040132231 Lithography device for semiconductor circuit pattern generator
07/08/2004US20040132230 Ball grid array substrate and method for preparing the same
07/08/2004US20040132226 Photoresponsive devices
07/08/2004US20040132225 Method for reducing dimensions between patterns on a photoresist
07/08/2004US20040132223 Method for isolating self-aligned contact pads
07/08/2004US20040131980 Method for forming a pattern and substrate-processing apparatus
07/08/2004US20040131976 Method of forming a thin film transistor liquid crystal display
07/08/2004US20040131964 Thick film containing partially naphthoquinonediazidosulfonyl ester substituted novalak resin and methyl vinyl ether-monoalkyl maleate polymer; high sensitivity and resolution, perpendicular geometry and crack resistance during and after plating
07/08/2004US20040131954 Non absorbing reticle and method of making same
07/08/2004US20040131953 Photomask correction method using composite charged particle beam, and device used in the correction method
07/08/2004US20040131952 Dry multilayer inorganic alloy thermal resist for lithographic processing and image creation
07/08/2004US20040131951 Mask, manufacturing method for mask, and manufacturing method for semiconductor device