Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
07/2004
07/22/2004WO2004044075A3 Copper chemical mechanical polishing solutions using sulfonated amphiprotic agents
07/22/2004WO2004041454A3 Substrate processing apparatus and method
07/22/2004WO2004040622A3 Nickel silicide with reduced interface roughness
07/22/2004WO2004040621A3 Method and apparatus for planarizing a semiconductor wafer
07/22/2004WO2004040616A3 Field effect transistor and method for production thereof
07/22/2004WO2004039886A3 Flip-chip system and method of making same
07/22/2004WO2004038766A3 Electrostatic chuck wafer port and top plate with edge shielding and gas scavenging
07/22/2004WO2004037711A3 Processes for hermetically packaging wafer level microscopic structures
07/22/2004WO2004036627A3 Plasma system and method for anistropically etching structures into a substrate
07/22/2004WO2004031072A3 Electrostatically driven lithography
07/22/2004WO2004027873A3 N-p butting connections on soi substrates
07/22/2004WO2004027863A3 Hybrid card
07/22/2004WO2004021420A9 Fabrication method for a monocrystalline semiconductor layer on a substrate
07/22/2004WO2004017383A3 Low termperature deposition of silicon oxides and oxynitrides
07/22/2004WO2004015854A3 Monolithic, software-definable circuit including a power amplifier
07/22/2004WO2004013900A3 System and method for manufacturing embedded conformal electronics
07/22/2004WO2004009861A3 Method to form ultra high quality silicon-containing compound layers
07/22/2004WO2004008493A9 Method and apparatus for supporting semiconductor wafers
07/22/2004WO2004008255A8 Method and apparatus for measuring critical dimensions with a particle beam
07/22/2004WO2004003963A3 Plasma processor with electrode simultaneously responsive to plural frequencies
07/22/2004WO2003107394A3 Organic electroluminescent device
07/22/2004WO2003100835A3 Gate oxide process methods for high performance mos transistors by reducing remote scattering
07/22/2004WO2003098662A3 PLASMA ETCHING OF Cu-CONTAINING LAYERS
07/22/2004WO2003094226A3 Contacting of nanotubes
07/22/2004WO2003090445A3 Wide bandgap digital radiation imaging array
07/22/2004WO2003088314A3 Remote monitoring system for chemical liquid delivery
07/22/2004WO2003065120A3 Microcontact printing
07/22/2004WO2003003421A3 Optical chip packaging via through hole
07/22/2004WO2002082510A9 Single transistor rare earth manganite ferroelectric nonvolatile memory cell
07/22/2004US20040143806 Wiring diagram verifying method, program, and apparatus
07/22/2004US20040143805 Device for determining the mask version utilized for each metal layer of an integrated circuit
07/22/2004US20040143418 Apparatus for predicting life of rotary machine and equipment using the same
07/22/2004US20040143410 Method and apparatus to dynamically recalibrate VLSI chip thermal sensors through software control
07/22/2004US20040143370 programmable logic controller in communication with the system control computer and operatively coupled to electrically controlled valves; refresh time for control of the valves is less than 10 millisecond so repetitive cycling is fast
07/22/2004US20040143357 Method, system, and medium for handling misrepresentative metrology data within an advanced process control system
07/22/2004US20040143356 Multi-electron beam exposure method and apparatus
07/22/2004US20040143353 Method for managing semiconductor manufacturing equipment and system for managing semiconductor manufacturing line
07/22/2004US20040143082 Polysiloxane, process for production thereof and radiation-sensitive resin composition
07/22/2004US20040142836 Resist and etching by-product removing composition and resist removing method using the same
07/22/2004US20040142835 Washing liquid for semiconductor substrate
07/22/2004US20040142641 Polishing pad and method
07/22/2004US20040142640 Polishing processes for shallow trench isolation substrates
07/22/2004US20040142583 Spring interconnect structures
07/22/2004US20040142582 Thin film structure from LILAC annealing
07/22/2004US20040142581 Method for manufacturing a semiconductor device
07/22/2004US20040142580 Silylation treatment unit and method
07/22/2004US20040142579 Semiconductor device and method for fabricating the same
07/22/2004US20040142578 Thin film nanostructures
07/22/2004US20040142577 Method for producing material of electronic device
07/22/2004US20040142576 Semiconductor fabrication method for making small features
07/22/2004US20040142575 Large area printing method for integrating device and circuit components
07/22/2004US20040142574 Semiconductor device and method of manufacturing the same, circuit board, and electronic instrument
07/22/2004US20040142573 Method for manufacturing MOSFET semiconductor device
07/22/2004US20040142571 Local dry etching method
07/22/2004US20040142570 Post high voltage gate dielectric pattern plasma surface treatment
07/22/2004US20040142569 Methods for fabricating semiconductor devices
07/22/2004US20040142568 Method of manufacturing a CMOS image sensor
07/22/2004US20040142567 Semiconductor device and method of manufacturing the same
07/22/2004US20040142566 Continuous bleed-and-feed process and equipment
07/22/2004US20040142565 Single and multilevel rework
07/22/2004US20040142564 Removal of CMP and post-CMP residue from semiconductors using supercritical carbon dioxide process
07/22/2004US20040142563 Methods and systems for exchanging messages in a controller for a substrate processing system
07/22/2004US20040142562 Method of fabricating a shallow trench isolation structure
07/22/2004US20040142561 Novel method of fabricating barrierless and embedded copper damascene interconnects
07/22/2004US20040142560 Method of selective growth of carbon nano-structures on silicon substrates
07/22/2004US20040142559 Technique for high efficiency metalorganic chemical vapor deposition
07/22/2004US20040142557 Deposition of tungsten nitride
07/22/2004US20040142554 Underlayer protection for the dual damascene etching
07/22/2004US20040142553 Methods of manufacturing semiconductor devices
07/22/2004US20040142552 Conductive bump for semiconductor device and method for making the same
07/22/2004US20040142551 Semiconductor device and a method of manufacturing the same
07/22/2004US20040142550 Method for producing III-IV group compound semiconductor layer, method for producing semiconductor light emitting element, and vapor phase growing apparatus
07/22/2004US20040142549 Method for forming semiconductor device bonding pads
07/22/2004US20040142548 Method for production of contacts on a wafer
07/22/2004US20040142547 Method of fabricating non-volatile memory
07/22/2004US20040142546 Semiconductor device and method for fabricating the same
07/22/2004US20040142544 Semiconductor device including semiconductor thin films having different crystallinity, substrate of the same, and manufacturing method of the same, and liquid crystal display amd manufacturing method of the same
07/22/2004US20040142543 Method of fabricating a semiconductor device utilizing a catalyst material solution
07/22/2004US20040142542 Film or layer made of semi-conductive material and method for producing said film or layer
07/22/2004US20040142541 Strained silicon-on-insulator (ssoi) and method to form the same
07/22/2004US20040142540 Wafer bonding for three-dimensional (3D) integration
07/22/2004US20040142539 Semiconductor device and method of fabrication thereof, optical module and method of fabrication thereof, circuit board, and electronic instrument
07/22/2004US20040142538 Method of manufacturing semiconductor device
07/22/2004US20040142537 Strained-silicon channel CMOS with sacrificial shallow trench isolation oxide liner
07/22/2004US20040142536 Methods of forming materials comprising tungsten and nitrogen, and methods of forming capacitors
07/22/2004US20040142535 Method for forming metal-insulator-metal capacitor of semiconductor device
07/22/2004US20040142534 Semiconductor device having trench isolation structure and method of fabricating the same
07/22/2004US20040142532 Method for forming salicide in semiconductor device
07/22/2004US20040142531 Method of forming a stacked capacitor structure with increased surface area for a DRAM device
07/22/2004US20040142530 Memory cell structures including a gap filling layer and methods of fabricating the same
07/22/2004US20040142529 Methods of manufacturing semiconductor memory devices
07/22/2004US20040142528 Decoupling capacitor for high frequency noise immunity
07/22/2004US20040142527 High voltage tolerant ESD design for analog and RF applications in deep submicron CMOS technologies
07/22/2004US20040142526 Fuse boxes with guard rings for integrated circuits and integrated circuits including the same
07/22/2004US20040142525 Method of manufacturing a semiconductor device
07/22/2004US20040142524 Insulated gate field effect transistor having passivated Schottky barriers to the channel
07/22/2004US20040142523 Method of forming vertical mosfet with ultra-low on-resistance and low gate charge
07/22/2004US20040142522 Semiconductor device
07/22/2004US20040142521 Methods for manufacturing a semiconductor device
07/22/2004US20040142520 Soi device with reduced drain induced barrier lowering