Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
09/2004
09/28/2004US6798004 Magnetoresistive random access memory devices and methods for fabricating the same
09/28/2004US6798003 Reliable adhesion layer interface structure for polymer memory electrode and method of making same
09/28/2004US6798002 Dual-purpose anti-reflective coating and spacer for flash memory and other dual gate technologies and method of forming
09/28/2004US6798000 Field effect transistor
09/28/2004US6797996 Compound semiconductor device and method for fabricating the same
09/28/2004US6797995 Heterojunction bipolar transistor with InGaAs contact and etch stop layer for InP sub-collector
09/28/2004US6797994 Double recessed transistor
09/28/2004US6797992 Apparatus and method for fabricating a high reverse voltage semiconductor device
09/28/2004US6797990 Boron phosphide-based semiconductor device and production method thereof
09/28/2004US6797982 Active matrix substrate and display device
09/28/2004US6797968 Ion beam processing method and apparatus therefor
09/28/2004US6797965 Charged particle beam apparatus, pattern measuring method, and pattern drawing method
09/28/2004US6797961 X-ray detector and method of fabricating the same
09/28/2004US6797954 Patterned wafer inspection method and apparatus therefor
09/28/2004US6797926 Apparatus and method for bonding electronic component, circuit board, and electronic component mounting apparatus
09/28/2004US6797910 Production apparatus of planer type semiconductor device and fabrication method of planer type semiconductor device
09/28/2004US6797881 Cross substrate, method of mounting semiconductor element, and semiconductor device
09/28/2004US6797777 Low dielectric constant organic dielectrics based on cage-like structures
09/28/2004US6797682 Resist stripper
09/28/2004US6797652 Copper damascene with low-k capping layer and improved electromigration reliability
09/28/2004US6797651 Method for manufacturing polycrystalline semiconductor layers and thin-film transistors and laser annealing apparatus
09/28/2004US6797650 Flash memory devices with oxynitride dielectric as the charge storage media
09/28/2004US6797648 Cleaning water for cleaning a wafer and method of cleaning a wafer
09/28/2004US6797647 Method for fabricating organic thin film
09/28/2004US6797646 Method of nitrogen doping of fluorinated silicate glass (FSG) while removing the photoresist layer
09/28/2004US6797645 Method of fabricating gate dielectric for use in semiconductor device having nitridation by ion implantation
09/28/2004US6797644 Method to reduce charge interface traps and channel hot carrier degradation
09/28/2004US6797643 Plasma enhanced CVD low k carbon-doped silicon oxide film deposition using VHF-RF power
09/28/2004US6797642 Method to improve barrier layer adhesion
09/28/2004US6797641 Gate oxide stabilization by means of germanium components in gate conductor
09/28/2004US6797640 Method of utilizing hard mask for copper plasma etch
09/28/2004US6797639 Dielectric etch chamber with expanded process window
09/28/2004US6797638 Plasma-etching process for molybdenum silicon nitride layers on half-tone phase masks based on gas mixtures containing monofluoromethane and oxygen
09/28/2004US6797637 Semiconductor device fabrication method
09/28/2004US6797636 Process of fabricating DRAM cells with collar isolation layers
09/28/2004US6797635 Fabrication method for lines of semiconductor device
09/28/2004US6797634 Method of conditioning an etching chamber and method of processing semiconductor substrate using the etching chamber
09/28/2004US6797633 In-situ plasma ash/treatment after via etch of low-k films for poison-free dual damascene trench patterning
09/28/2004US6797632 Bonded wafer producing method and bonded wafer
09/28/2004US6797630 Partial via hard mask open on low-k dual damascene etch with dual hard mask (DHM) approach
09/28/2004US6797629 Method of manufacturing nano transistors
09/28/2004US6797628 Methods of forming integrated circuitry, semiconductor processing methods, and processing method of forming MRAM circuitry
09/28/2004US6797627 Dry-wet-dry solvent-free process after stop layer etch in dual damascene process
09/28/2004US6797626 Method of polishing copper layer of substrate
09/28/2004US6797625 Method of forming a protective step on the edge of a semiconductor wafer
09/28/2004US6797624 Solution for ruthenium chemical mechanical planarization
09/28/2004US6797623 Methods of producing and polishing semiconductor device and polishing apparatus
09/28/2004US6797622 Selective etching of polysilicon
09/28/2004US6797620 Method and apparatus for improved electroplating fill of an aperture
09/28/2004US6797619 Method of forming metal wire of semiconductor device
09/28/2004US6797618 Method for forming silicide film of a semiconductor device
09/28/2004US6797617 Reduced cross-contamination between chambers in a semiconductor processing tool
09/28/2004US6797615 Method of manufacturing a semiconductor device
09/28/2004US6797614 Nickel alloy for SMOS process silicidation
09/28/2004US6797613 Process for depositing WSix layers on a high topography with a defined stoichiometry
09/28/2004US6797612 Method of fabricating a small electrode for chalcogenide memory cells
09/28/2004US6797611 Method of fabricating contact holes on a semiconductor chip
09/28/2004US6797610 Sublithographic patterning using microtrenching
09/28/2004US6797609 Semiconductor integrated circuit device and manufacturing method of semiconductor integrated circuit device
09/28/2004US6797608 Method of forming multilayer diffusion barrier for copper interconnections
09/28/2004US6797607 Contact planarization using nanoporous silica materials
09/28/2004US6797606 Semiconductor integrated circuit device and manufacturing method of semiconductor integrated circuit device
09/28/2004US6797605 Method to improve adhesion of dielectric films in damascene interconnects
09/28/2004US6797604 Method for manufacturing device substrate with metal back-gate and structure formed thereby
09/28/2004US6797602 Method of manufacturing a semiconductor device with supersaturated source/drain extensions and metal silicide contacts
09/28/2004US6797601 Methods for forming wordlines, transistor gates, and conductive interconnects
09/28/2004US6797600 Method of forming a local interconnect
09/28/2004US6797599 Gate structure and method
09/28/2004US6797598 Method for forming an epitaxial cobalt silicide layer on MOS devices
09/28/2004US6797597 Process for treating complementary regions of the surface of a substrate and semiconductor product obtained by this process
09/28/2004US6797596 Sacrificial deposition layer as screening material for implants into a wafer during the manufacture of a semiconductor device
09/28/2004US6797595 Method of heat-treating nitride compound semiconductor layer and method of producing semiconductor device
09/28/2004US6797594 Semiconductor device and method of manufacturing the same
09/28/2004US6797593 Methods and apparatus for improved mosfet drain extension activation
09/28/2004US6797592 Method for forming a retrograde implant
09/28/2004US6797591 Method for forming a semiconductor device and a semiconductor device formed by the method
09/28/2004US6797590 DRAM cell structure capable of high integration and fabrication method thereof
09/28/2004US6797589 Insulating micro-structure and method of manufacturing same
09/28/2004US6797588 Method for manufacturing a semiconductor device having a trench and a thick insulation film at the trench opening
09/28/2004US6797587 Active region corner implantation method for fabricating a semiconductor integrated circuit microelectronic fabrication
09/28/2004US6797586 Silicon carbide schottky barrier diode and method of making
09/28/2004US6797585 Nonintrusive wafer marking
09/28/2004US6797584 Semiconductor device and method of fabricating the same
09/28/2004US6797583 Method of manufacturing capacitor in semiconductor devices
09/28/2004US6797582 Vertical thermal nitride mask (anti-collar) and processing thereof
09/28/2004US6797580 Method for fabricating a bipolar transistor in a BiCMOS process and related structure
09/28/2004US6797579 Semiconductor device having trench isolation structure and method of fabricating the same
09/28/2004US6797578 Method for fabrication of emitter of a transistor and related structure
09/28/2004US6797577 One mask PNP (or NPN) transistor allowing high performance
09/28/2004US6797576 Fabrication of p-channel field-effect transistor for reducing junction capacitance
09/28/2004US6797575 Method for forming a polycide structure in a semiconductor device
09/28/2004US6797574 Method of fabricating W/TiN gate for MOSFETS
09/28/2004US6797573 Memory cell and method for forming the same
09/28/2004US6797572 Method for forming a field effect transistor having a high-k gate dielectric and related structure
09/28/2004US6797571 Method of manufacturing semiconductor device
09/28/2004US6797570 NAND-type flash memory devices and methods of fabricating the same
09/28/2004US6797569 Method for low topography semiconductor device formation
09/28/2004US6797568 Flash technology transistors and methods for forming the same
09/28/2004US6797567 High-K tunneling dielectric for read only memory device and fabrication method thereof
09/28/2004US6797566 Semiconductor integrated circuit device and process for producing the same