| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 12/18/2013 | CN103456644A Sleadframe for integrated circuit die packaging in a molded package and a method for preparing such a leadframe |
| 12/18/2013 | CN103456643A Ic carrier plate and manufacturing method thereof |
| 12/18/2013 | CN103456642A Fabrication method of field-effect transistor and device thereof |
| 12/18/2013 | CN103456641A HKMG device with PMOS eSiGe source/drain regions |
| 12/18/2013 | CN103456640A Semiconductor structure composed of field-effect transistor (fet) and method thereof |
| 12/18/2013 | CN103456639A Vertical channel transistor with self-aligned gate electrode and method for fabricating the same |
| 12/18/2013 | CN103456638A Self-alignment GaAs FinFET structure and manufacturing method thereof |
| 12/18/2013 | CN103456637A SiGe source /drain region manufacturing method |
| 12/18/2013 | CN103456636A Method for solving IdVg curve bimodal problem of transistor |
| 12/18/2013 | CN103456635A Manufacturing method for low-voltage LDMOS |
| 12/18/2013 | CN103456634A Manufacturing method for semiconductor device |
| 12/18/2013 | CN103456633A Mos transistor and forming method thereof |
| 12/18/2013 | CN103456632A Mos transistor and forming method thereof |
| 12/18/2013 | CN103456631A Manufacturing method of low-voltage LDMOS (laterally diffused metal oxide semiconductor) devices |
| 12/18/2013 | CN103456630A Mos transistor and forming method thereof |
| 12/18/2013 | CN103456629A Source and drain architecture in an active region of a p-channel transistor by tilted implantation |
| 12/18/2013 | CN103456628A Manufacturing method of germanium-silicon heterojunction bipolar triode device |
| 12/18/2013 | CN103456627A Compound type trench gate schottky device structure and manufacturing method thereof |
| 12/18/2013 | CN103456626A Etching liquid for conductive polymer and method for patterning conductive polymer |
| 12/18/2013 | CN103456625A Method for removing phosphorus serous membrane in dual-corrosion mode |
| 12/18/2013 | CN103456624A Via hole etching method |
| 12/18/2013 | CN103456623A Etching control method for reducing deposition of polymers at edges of wafers |
| 12/18/2013 | CN103456622A Method for controlling oxide etching rate by adopting phosphoric acid process |
| 12/18/2013 | CN103456621A Semiconductor device and method of manufacturing the same |
| 12/18/2013 | CN103456620A Forming method of semiconductor structure |
| 12/18/2013 | CN103456619A Silicon wafer etching method and silicon wafer etching equipment |
| 12/18/2013 | CN103456618A Corrosion method for showing defects of AA (active area) structure of MOS (metal oxide semiconductor) device |
| 12/18/2013 | CN103456617A Production method of illuminating element |
| 12/18/2013 | CN103456616A Technology for manufacturing gate-oxide layer |
| 12/18/2013 | CN103456615A Method for overcoming defects of metal silicide mask layer |
| 12/18/2013 | CN103456614A Manufacturing method for semiconductor device with high-K metal gate |
| 12/18/2013 | CN103456613A Method for manufacturing semiconductor device |
| 12/18/2013 | CN103456612A Method for forming Schottky contact and Schottky structure |
| 12/18/2013 | CN103456611A Method and application for improving N-type doping carrier concentration of germanium materials |
| 12/18/2013 | CN103456610A SiC optical material processing device |
| 12/18/2013 | CN103456609A Method for forming nanowire through gate-all-around device |
| 12/18/2013 | CN103456608A Method for growing single crystals and polycrystals on semiconductor substrate at same time |
| 12/18/2013 | CN103456607A Method for pre-processing substrate in carbon-based semiconductor device manufacturing technology |
| 12/18/2013 | CN103456606A Method for forming hard mask layer |
| 12/18/2013 | CN103456605A Full-automatic mote cleaning equipment for semiconductor package |
| 12/18/2013 | CN103456604A Substrate processing method capable of improving mobility of carbon-based semiconductor device |
| 12/18/2013 | CN103456603A Method for preparing gallium oxide film on gallium series heterogeneous semiconductor substrate and gallium oxide film |
| 12/18/2013 | CN103456602A Method for preparing non-polar surface gallium nitride nanometer cone material |
| 12/18/2013 | CN103456601A Capacitor for interposers and methods of manufacture thereof |
| 12/18/2013 | CN103456593A Hydride vapor deposition device and method for improving thickness distribution uniformity of multiple-piece epitaxial materials |
| 12/18/2013 | CN103454856A Photosenstive material and method of lithography |
| 12/18/2013 | CN103454854A Yield rate improving method of photolithographic mask |
| 12/18/2013 | CN103454853A Methods for electron beam patterning |
| 12/18/2013 | CN103454852A Mask and overlay precision measuring method |
| 12/18/2013 | CN103454819A Array substrate for liquid crystal display and manufacturing method thereof |
| 12/18/2013 | CN103450810A Chemical mechanical planarization slurry and applications thereof |
| 12/18/2013 | CN103448308A Biodegradable flexible conductive base plate and preparation method thereof |
| 12/18/2013 | CN103448187A Resin-sealing molding apparatus |
| 12/18/2013 | CN103448055A Transfer robot and equipment front end module including transfer robot |
| 12/18/2013 | CN102981359B Photoetching method |
| 12/18/2013 | CN102707586B Prebaking device and exhaust method of prebaking device |
| 12/18/2013 | CN102610574B Method for improving reading redundancy rate of static random access memory |
| 12/18/2013 | CN102583236B Method for growing nanopillar arrays |
| 12/18/2013 | CN102544122B Non-volatile memory with P+ single polycrystalline architecture and preparation method for non-volatile memory |
| 12/18/2013 | CN102544074B Non-volatile memory compatible with complementary metal oxide semiconductor (CMOS) logical process and preparation method for non-volatile memory |
| 12/18/2013 | CN102543892B Thin film transistor substrate and manufacturing method thereof and liquid crystal display device |
| 12/18/2013 | CN102543738B High-voltage LDMOS (Laterally Diffused Metal Oxide Semiconductor) device and manufacture method for same |
| 12/18/2013 | CN102537520B Wire cable auxiliary support mechanism and wire cable platform |
| 12/18/2013 | CN102530536B Collector for integrated circuit (IC) |
| 12/18/2013 | CN102520578B Testing photomask and application thereof |
| 12/18/2013 | CN102487030B Double-workpiece-platform clamping mechanism |
| 12/18/2013 | CN102468176B Method for making longitudinal region of super junction device |
| 12/18/2013 | CN102468129B Method for surface planarization in preparation process of semiconductor |
| 12/18/2013 | CN102468119B Thin film for fast selecting failed crystal grains from wafer and use method |
| 12/18/2013 | CN102456666B Digital coordinate axis and reliability test method of gate oxide film |
| 12/18/2013 | CN102456626B Method for manufacturing semiconductor device based on dual stress liner technology |
| 12/18/2013 | CN102446951B Semiconductor structure and forming method thereof |
| 12/18/2013 | CN102446851B Method for embedding high-voltage device in silicon oxide-nitride-oxide semiconductor (SONOS) nonvolatile memory process |
| 12/18/2013 | CN102427052B Silicon-on-insulator (SOI) material substrate with high-efficiency recombination center and preparation method for silicon-on-insulator (SOI) material substrate |
| 12/18/2013 | CN102412200B Process realizing method for PNP triode integrated with SiGe heterojunction NPN triode |
| 12/18/2013 | CN102412155B Manufacture method of isolated type LDMOS (Laterally Diffused Metal Oxide Semiconductor) |
| 12/18/2013 | CN102412126B Technological method for manufacturing supervoltage laterally diffused metal oxide semiconductor (LDMOS) |
| 12/18/2013 | CN102403366B Integrated circuit device and method of forming same |
| 12/18/2013 | CN102394216B Metal-oxide-metal capacitor manufacturing method |
| 12/18/2013 | CN102388453B Robust ESD protection circuit, method and design structure for tolerant and failsafe designs |
| 12/18/2013 | CN102386140B Method for developing thick gate oxide integrity layer in manufacturing process of silicon oxide nitride oxide semiconductor (SONOS) nonvolatile memory |
| 12/18/2013 | CN102386067B Epitaxial growth method for effectively restraining self-doping effect |
| 12/18/2013 | CN102376760B Enhanced high electron mobility transistor and manufacturing method thereof |
| 12/18/2013 | CN102371532B Reworking method for chemical mechanical lapping process |
| 12/18/2013 | CN102361018B Method for improving small-spherical defect in manufacture process of shallow trench isolation substrate |
| 12/18/2013 | CN102334026B Surface examining device and surface examining method |
| 12/18/2013 | CN102315085B Uniform ring inclination warning device for reaction cavity of plasma body etching machine |
| 12/18/2013 | CN102301464B Finishing method for substrate of silicon-on-insulator SOI type |
| 12/18/2013 | CN102299109B Semiconductor power component and manufacturing method thereof |
| 12/18/2013 | CN102272890B Method of forming semiconductor layer |
| 12/18/2013 | CN102257092B Slurry composition containing non-ionic polymer and method for use |
| 12/18/2013 | CN102244006B Thin film transistor and manufacturing method thereof |
| 12/18/2013 | CN102239093B Non-contact conveying device |
| 12/18/2013 | CN102227289B Polishing pad and method for producing same |
| 12/18/2013 | CN102224567B Integrated capacitor with grid plates |
| 12/18/2013 | CN102201414B Semiconductor memory device and manufacturing same |
| 12/18/2013 | CN102197462B Acoustic assisted single wafer wet clean for semiconductor wafer process |
| 12/18/2013 | CN102197454B Remote access gateway for semiconductor processing equipment |
| 12/18/2013 | CN102177576B Method and apparatus for detecting idle mode of processing equipment |
| 12/18/2013 | CN102163569B Substrate conveyance device and substrate processing system |