Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
12/2013
12/12/2013WO2013184170A2 Semiconductor wafer isolated transfer chuck
12/12/2013WO2013184028A1 Method for producing conductive tracks
12/12/2013WO2013184000A1 Plasma jet etching device and method for removing an encapsulation portion of a sample via plasma jet etching
12/12/2013WO2013183862A1 Electrical terminal structure for ceramic heater
12/12/2013WO2013183799A1 Cmp device
12/12/2013WO2013183741A1 Substrate inspection device
12/12/2013WO2013183740A1 Wafer inspection interface and wafer inspection device
12/12/2013WO2013183733A1 Thin film transistor
12/12/2013WO2013183726A1 Thin film transistor
12/12/2013WO2013183689A1 Active light-sensitive or radiation-sensitive resin composition, and pattern-formation method using same
12/12/2013WO2013183686A1 Overlay film forming composition and resist pattern formation method using same
12/12/2013WO2013183677A1 Semiconductor device and method for manufacturing same
12/12/2013WO2013183671A1 Method for manufacturing semiconductor device
12/12/2013WO2013183660A1 Film-forming apparatus
12/12/2013WO2013183560A1 Method for joining metal members
12/12/2013WO2013183547A1 Semiconductor ferroelectric storage transistor and method for manufacturing same
12/12/2013WO2013183507A1 Component press-bonding device
12/12/2013WO2013183495A1 Semiconductor device and method for manufacturing same
12/12/2013WO2013183475A1 Polishing pad
12/12/2013WO2013183472A1 Variable capacitance element, high-frequency device, and communication device
12/12/2013WO2013183468A1 Photocured product
12/12/2013WO2013183467A1 Curable composition and patterning method using the same
12/12/2013WO2013183437A1 Gas treatment method
12/12/2013WO2013183393A1 Display device, manufacturing method, and electronic apparatus
12/12/2013WO2013183384A1 Conveyance system and exclusive control method in conveyance vehicle system
12/12/2013WO2013183376A1 Conveyance system and temporary storage method of articles in conveyance system
12/12/2013WO2013183318A1 High-frequency wiring structure, high-frequency mounting substrate, method for producing high-frequency wiring structure, and method for shaping waveform of high-frequency signal
12/12/2013WO2013183289A1 Thin film transistor, display panel, and method for manufacturing thin film transistor
12/12/2013WO2013183263A1 Imprint device and template
12/12/2013WO2013183262A1 Imprint method and imprint device
12/12/2013WO2013183260A1 Chemical solution treatment device
12/12/2013WO2013183255A1 Thin-film transistor and method for manufacturing thin-film transistor
12/12/2013WO2013183254A1 Thin-film transistor and method for manufacturing thin-film transistor
12/12/2013WO2013183251A1 Thin-film transistor and method for manufacturing thin-film transistor
12/12/2013WO2013183242A1 Method for driving non-volatile semiconductor device
12/12/2013WO2013183230A1 Liquid crystal display apparatus and method for manufacturing liquid crystal display apparatus
12/12/2013WO2013183220A1 Method for manufacturing thin film transistor substrate
12/12/2013WO2013183158A1 Semiconductor device manufacturing method, and semiconductor device
12/12/2013WO2013183138A1 Substrate housing container provided with impact absorbing function
12/12/2013WO2013182969A1 Process for improving the electrical and optical performance of a transparent electrically conductive material based on silver nanowires
12/12/2013WO2013182854A1 Selective sidewall growth of semiconductor material
12/12/2013WO2013182637A1 Method for forming closed planar layers of sp2-hybridized carbon atoms or graphene on the surface of a substrate and substrate coated by means of the method
12/12/2013WO2013182591A2 Bonding agent, method for bonding two bodies and electronic arrangement
12/12/2013WO2013182236A1 Apparatus and method for ascertaining orientation errors
12/12/2013WO2013182010A1 Aluminum metal wire manufacturing method
12/12/2013WO2013181915A1 Tft array substrate, method of fabricating same, and display device
12/12/2013WO2013181909A1 Thin-film transistor and array substrate and methods of fabricating same
12/12/2013WO2013181908A1 Array substrate, method of fabricating same, and display device
12/12/2013WO2013181905A1 Transistor, array substrate and manufacturing method thereof, liquid crystal panel, and display device
12/12/2013WO2013181902A1 Thin film transistor and manufacturing method thereof, array substrate, and display device
12/12/2013WO2013181900A1 Method for testing resistance of polysilicon thin film on polysilicon array substrate
12/12/2013WO2013181879A1 Magnetron sputtering system
12/12/2013WO2013181768A1 Precast mold cavity stereoscopic package module having wire layout
12/12/2013WO2013154485A9 A method for manufacturing a semiconductor device based on epitaxial growth.
12/12/2013WO2013131868A3 Method for producing a doped region in a semiconductor layer
12/12/2013WO2013072760A4 Semiconductor wafer handling and transport
12/12/2013US20130330938 Rotatable and tunable heaters for semiconductor furnace
12/12/2013US20130330937 Process for Producing Silicon and Oxide Films from Organoaminosilane Precursors
12/12/2013US20130330936 METHOD OF DEPOSITION OF Al2O3/SiO2 STACKS, FROM ALUMINIUM AND SILICON PRECURSORS
12/12/2013US20130330935 REMOTE PLASMA BASED DEPOSITION OF SiOC CLASS OF FILMS
12/12/2013US20130330934 Method of forming thin film poly silicon layer
12/12/2013US20130330933 Method for Forming Silicon-Containing Dielectric Film by Cyclic Deposition with Side Wall Coverage Control
12/12/2013US20130330932 Hardmask materials
12/12/2013US20130330931 Method of making a semiconductor device
12/12/2013US20130330930 Substrate processing apparatus, method for manufacturing substrate, and method for manufacturing semiconductor device
12/12/2013US20130330929 Seal member, etching apparatus, and a method of manufacturing a semiconductor device
12/12/2013US20130330928 Film forming device, substrate processing system and semiconductor device manufacturing method
12/12/2013US20130330927 Cleaning liquid for lithography and method for forming wiring
12/12/2013US20130330926 Depositing tungsten into high aspect ratio features
12/12/2013US20130330925 Methods of treating a device-substrate and support-substrates used therein
12/12/2013US20130330924 Gas Cluster Ion Beam Process for Opening Conformal Layer in a High Aspect Ratio Contact Via
12/12/2013US20130330923 Middle of line structures and methods for fabrication
12/12/2013US20130330922 Semiconductor Constructions and Assemblies and Electronic Systems
12/12/2013US20130330921 Plating Process and Structure
12/12/2013US20130330920 Method and apparatus for substrate preclean with hydrogen containing high frequency rf plasma
12/12/2013US20130330919 Manufacturing process of gate stack structure with etch stop layer
12/12/2013US20130330918 Patterned doping of semiconductor substrates using photosensitive monolayers
12/12/2013US20130330917 Apparatus and process for integrated gas blending
12/12/2013US20130330916 Methods of forming high mobility fin channels on three dimensional semiconductor devices
12/12/2013US20130330915 Method of making a thin crystalline semiconductor material
12/12/2013US20130330914 Semiconductor device and manufacturing method thereof
12/12/2013US20130330913 Method for manufacturing semiconductor device
12/12/2013US20130330912 Silicon oxycarbide, growth method of silicon oxycarbide layer, semiconductor device and manufacture method for semiconductor device
12/12/2013US20130330911 Method of semiconductor film stabilization
12/12/2013US20130330910 Dicing die bond film and method of manufacturing semiconductor device
12/12/2013US20130330908 Semiconductor component with vertical structures having a high aspect ratio and method
12/12/2013US20130330907 Methods of forming semiconductor devices by forming semiconductor channel region materials prior to forming isolation structures
12/12/2013US20130330906 Method of semiconductor integrated circuit fabrication
12/12/2013US20130330905 Edge connect wafer level stacking
12/12/2013US20130330904 Overlay mark assistant feature
12/12/2013US20130330903 Manufacturable high-k dram mim capacitor structure
12/12/2013US20130330902 Enhanced non-noble electrode layers for dram capacitor cell
12/12/2013US20130330900 Methods of tailoring work function of semiconductor devices with high-k/metal layer gate structures by performing a fluorine implant process
12/12/2013US20130330899 Preventing fully silicided formation in high-k metal gate processing
12/12/2013US20130330898 Mos transistor process
12/12/2013US20130330897 Semiconductor memory device including multi-layer gate structure
12/12/2013US20130330895 Method of manufacturing the trench power semiconductor structure
12/12/2013US20130330893 Integrating formation of a replacement gate transistor and a non-volatile memory cell using a high-k dielectric
12/12/2013US20130330890 Method of manufacturing semiconductor device with offset sidewall structure
12/12/2013US20130330889 Method of making a finfet device
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