Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
12/2004
12/30/2004US20040266062 Underfill integration for optical packages
12/30/2004US20040266061 Manufacturing method of flip chip package
12/30/2004US20040266059 Integrated circuit incorporating wire bond inductance
12/30/2004US20040266058 Method for fabricating a packaging device for semiconductor die and semiconductor device incorporating same
12/30/2004US20040266057 Silicon carbide and method of manufacturing the same
12/30/2004US20040266055 Methods for the control of flatness and electron mobility of diamond coated silicon and structures formed thereby
12/30/2004US20040266054 OFET channel fabrication
12/30/2004US20040266053 Method of utilizing a top conductive layer in isolating pixels of an image sensor array
12/30/2004US20040266047 Thin film array panel and manufacturing method thereof
12/30/2004US20040266046 Method for making semiconductor device including band-engineered superlattice
12/30/2004US20040266045 Method for making semiconductor device including band-engineered superlattice
12/30/2004US20040266042 Electro-optical device and manufacturing method thereof
12/30/2004US20040266041 Method of fabricating array substrate having color filter on thin film transistor structure
12/30/2004US20040266040 In-plane switching mode liquid crystal display device and method for fabricating the same
12/30/2004US20040266039 Method of exposing layer with light and method of manufacturing thin film transistor substrate for liquid crytal display device using the same
12/30/2004US20040266038 Semiconductor structures having through-holes sealed with feed-through metalization
12/30/2004US20040266035 Methodology for measuring and controlling film thickness profiles
12/30/2004US20040266034 Method for forming ferroelectric film and semiconductor device
12/30/2004US20040266033 Manufacturing method of thin-film magnetic head with magnetoresistive effect element and manufacturing method of head gimbal assembly with the thin-film magnetic head
12/30/2004US20040266032 Method for fabricating ferroelectric random access memory device with merged-top electrode-plateline capacitor
12/30/2004US20040266031 Ferroelectric capacitor, semiconductor device equipped with ferroelectric capacitor, method of fabricating ferroelectric capacitor and method of fabricating semiconductor device
12/30/2004US20040266030 Method for fabricating ferroelectric random access memory device having capacitor with merged top-electrode and plate-line structure
12/30/2004US20040266029 Method for manufacturing ferroelectric random access memory capacitor
12/30/2004US20040266028 Method for improving retention reliability of ferroelectric ram
12/30/2004US20040266012 Using air flow variation in vaccum to identify defects in semiconductor wafer
12/30/2004US20040266011 In-situ analysis method for atomic layer deposition process
12/30/2004US20040265992 Multicompartment biochip for monitoring constituents of blood
12/30/2004US20040265907 Juxtaposing affinity moieties to a semiconductor to effect changes in the charge pair separation characteristics when the affinity molecules are bound to the target; detecting target moieties in situ using nanocrystalline semiconductors; genome sequencing, forensics, assays, and drug screening
12/30/2004US20040265765 Local exhaust system for VOC pollution control
12/30/2004US20040265754 Multilayer photoresist system
12/30/2004US20040265750 Selective surface exposure, cleans, and conditioning of the germanium film in a Ge photodetector
12/30/2004US20040265749 Overcoating substrate using masking layer; shrinkage ; etching
12/30/2004US20040265748 Pattern transfer of an extreme ultraviolet imaging layer via flood exposure of contact mask layer (EUV CML)
12/30/2004US20040265747 Process for forming features of 50 nm or less half-pitch with chemically amplified resist imaging
12/30/2004US20040265746 Forming multilayer photoresist; overlapping zones atre exposured to actinic radiation; adjust solubility; development
12/30/2004US20040265745 Forming photoresist on semiconductor substrate ; masking
12/30/2004US20040265744 Stencil mask having main and auxiliary strut and method of forming the same
12/30/2004US20040265743 Prevents collapse of patterns when photoresist patterns; for photolithography
12/30/2004US20040265732 Unsaturated monomers, polymers, chemically amplified resist composition, and process of pattern formation
12/30/2004US20040265713 Transferring exposure dosage; monitoring masking; calibrating photoresist film; diffraction grid; semiconductor
12/30/2004US20040265710 Lithographic processing method and device manufactured thereby
12/30/2004US20040265709 Method for manufacturing mask for focus monitoring, and method for manufacturing semiconductor device
12/30/2004US20040265708 Photomask, pattern formation method using photomask and mask data creation method for photomask
12/30/2004US20040265707 Source and mask optimization
12/30/2004US20040265703 Method for dry etching photomask material
12/30/2004US20040265615 Fineness particle sizes; spraying pyrolysis
12/30/2004US20040265599 thin films comprising polysiloxanes laminated between protective films, used for joining semiconductor chips to supports; bonding strength
12/30/2004US20040265594 cleaners comprising sheets or layers of polymers having tensile strength, used for cleaning substrates such as semiconductors, flat panel displays or printed circuits
12/30/2004US20040265562 Method of electroplating copper layers with flat topography
12/30/2004US20040265537 Supported greensheet structure and method in mlc processing
12/30/2004US20040265506 Process of surface treatment, surface treating device, surface treated plate, and electro-optic device, and electronic equipment
12/30/2004US20040265493 Substrate holder for holding a wafer, a coating solution discharge nozzle, and anti-drying boards opposed to a surface of the wafer; coating solution on or over the surface of the wafer is restrained from being dried and a coating film is formed with even thickness on or over the surface of the wafer
12/30/2004US20040265490 Method of fabricating patterned polymer film with nanometer scale
12/30/2004US20040265489 Methods of fabricating a composite carbon nanotube thermal interface device
12/30/2004US20040265482 Wiring substrate manufacturing method
12/30/2004US20040265480 Liquid crystal dispensing apparatus
12/30/2004US20040265215 open-celled ceramic structure, provides sufficient heat exchange and mixing to cause the oxygen and hydrogen to combine to form water vapor
12/30/2004US20040265195 Gas injector for use in semiconductor fabricating apparatus
12/30/2004US20040265107 Stocker and transfer system including the same
12/30/2004US20040265100 Semiconductor wafer processing machine
12/30/2004US20040265099 Conveyer system
12/30/2004US20040264950 Light irradiation type thermal processing apparatus and method of adjusting light irradiation intensity
12/30/2004US20040264867 Optical interconnection circuit among wavelength multiplexing chips, electro-optical device, and electronic apparatus
12/30/2004US20040264862 Method of and structure for fixing optical element
12/30/2004US20040264760 Defect inspecting method, defect inspecting apparatus and inspection machine
12/30/2004US20040264759 Pattern inspection method and apparatus, and pattern alignment method
12/30/2004US20040264512 Laser-produced plasma EUV light source with pre-pulse enhancement
12/30/2004US20040264274 Semiconductor integrated circuit device and process for manufacturing the same
12/30/2004US20040264270 Semiconductor storage device and manufacturing method therefor, semiconductor device, portable electronic equipment and IC card
12/30/2004US20040264257 Semiconductor storage device, mobile electronic apparatus, method for controlling erase operation, and method for controlling program operation
12/30/2004US20040264252 Semiconductor memory device and portable electronic apparatus
12/30/2004US20040264248 Crystal growth method of nitride semiconductor
12/30/2004US20040264246 Nonvolatile semiconductor memory
12/30/2004US20040264243 Non-volatile ferromagnetic memory having sensor circuitry shared with its state change circuitry
12/30/2004US20040264242 Stacked 1T-nMTJ MRAM structure
12/30/2004US20040264240 Protective layers for MRAM devices
12/30/2004US20040264236 Nonvolatile semiconductor memory device having a gate stack and method of manufacturing the same
12/30/2004US20040264235 Capacitor layout orientation
12/30/2004US20040264227 Semicondutor integrated circuit and electronic system
12/30/2004US20040264134 Heatsink device and method
12/30/2004US20040264132 Method for forming storage node contact plug of semiconductor device
12/30/2004US20040264104 Gapped-plate capacitor
12/30/2004US20040264102 Dual-sided capacitor and method of formation
12/30/2004US20040264101 Silicon nanocrystal capacitor and process for forming same
12/30/2004US20040264100 Stacked capacitor and method for fabricating same
12/30/2004US20040263868 Method for measuring thickness of thin film-like material during surface polishing, and surface polishing method and surface polishing apparatus
12/30/2004US20040263867 Method and apparatus for the determination of characteristic layer parameters at high temperatures
12/30/2004US20040263866 Apparatus for optical proximity correction, method for optical proximity correction, and computer program product for optical proximity correction
12/30/2004US20040263836 Method and apparatus for inspecting a wafer surface
12/30/2004US20040263835 Method for inspecting surface and apparatus for inspecting it
12/30/2004US20040263832 Method to grain inspect directionally solidified castings
12/30/2004US20040263830 Method and apparatus for inspecting semiconductor device
12/30/2004US20040263829 Method and device for inspecting an object using a time delay integration sensor
12/30/2004US20040263828 Alignment measuring system and method of determining alignment in a photolithography process
12/30/2004US20040263823 Lithographic projection assembly, load lock and method for transferring objects
12/30/2004US20040263821 Advanced illumination system for use in microlithography
12/30/2004US20040263820 Lithographic apparatus, device manufacturing methods, devices manufactured thereby, method of manufacturing a reflector, reflector manufactured thereby and phase shift mask
12/30/2004US20040263819 Airtight processing apparatus, airtight processing method, and electron beam processing apparatus
12/30/2004US20040263817 Illumination optical apparatus and exposure apparatus provided with illumination optical apparatus
12/30/2004US20040263813 Projection optical system for maskless lithography