Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
01/2005
01/25/2005US6847073 Semiconductor device using ferroelectric film in cell capacitor, and method for fabricating the same
01/25/2005US6847069 Thin-film semiconductor device, manufacturing method of the same and image display apparatus
01/25/2005US6847068 Floating gate and fabrication method therefor
01/25/2005US6847067 A-C:H ISFET device, manufacturing method, and testing methods and apparatus thereof
01/25/2005US6847066 Semiconductor device
01/25/2005US6847065 Radiation-hardened transistor fabricated by modified CMOS process
01/25/2005US6847064 Semiconductor device having a thin film transistor
01/25/2005US6847063 Semiconductor device
01/25/2005US6847062 Semiconductor device
01/25/2005US6847061 Elimination of implant damage during manufacture of HBT
01/25/2005US6847060 Bipolar transistor with graded base layer
01/25/2005US6847059 Semiconductor input protection circuit
01/25/2005US6847052 Light-emitting diode device geometry
01/25/2005US6847051 Elevated photodiode in an image sensor
01/25/2005US6847050 Semiconductor element and semiconductor device comprising the same
01/25/2005US6847048 Organic thin film transistor (OTFT)
01/25/2005US6847046 Light-emitting device and method for manufacturing the same
01/25/2005US6847025 Semiconductor image position sensitive device
01/25/2005US6847015 Heat treatment apparatus and controller for heat treatment apparatus and control method for heat treatment apparatus
01/25/2005US6847014 Method and apparatus for controlling the spatial temperature distribution across the surface of a workpiece support
01/25/2005US6847006 Laser annealing apparatus and semiconductor device manufacturing method
01/25/2005US6846984 Solar cell and method for making a solar cell
01/25/2005US6846899 Poly(arylene ether) dielectrics
01/25/2005US6846789 Removing photoresist materials from electronic components. The composition is a mixture of at least one dense phase fluid and at least one dense phase fluid modifier. The method includes exposing a substrate to at least one pulse of
01/25/2005US6846757 Dielectric layer for a semiconductor device and method of producing the same
01/25/2005US6846756 Method for preventing low-k dielectric layer cracking in multi-layered dual damascene metallization layers
01/25/2005US6846755 Bonding a metal component to a low-k dielectric material
01/25/2005US6846754 Boron phosphide-based semiconductor layer and vapor phase growth method thereof
01/25/2005US6846753 Flash memory device and a fabrication process thereof, method of forming a dielectric film
01/25/2005US6846752 Methods and devices for the suppression of copper hillock formation
01/25/2005US6846751 Nitrogen implementation to minimize device variation
01/25/2005US6846750 High precision pattern forming method of manufacturing a semiconductor device
01/25/2005US6846749 N-containing plasma etch process with reduced resist poisoning
01/25/2005US6846748 Method for removing photoresist
01/25/2005US6846747 Method for etching vias
01/25/2005US6846746 Method of smoothing a trench sidewall after a deep trench silicon etch process
01/25/2005US6846745 High-density plasma process for filling high aspect ratio structures
01/25/2005US6846744 Method of fabricating a bottle shaped deep trench for trench capacitor DRAM devices
01/25/2005US6846743 Method for vapor deposition of a metal compound film
01/25/2005US6846742 Si seasoning to reduce particles, extend clean frequency, block mobile ions and increase chamber throughput
01/25/2005US6846741 Sacrificial metal spacer damascene process
01/25/2005US6846740 Wafer-level quasi-planarization and passivation for multi-height structures
01/25/2005US6846739 MOCVD process using ozone as a reactant to deposit a metal oxide barrier layer
01/25/2005US6846737 Plasma induced depletion of fluorine from surfaces of fluorinated low-k dielectric materials
01/25/2005US6846736 Creation of subresolution features via flow characteristics
01/25/2005US6846734 Method and process to make multiple-threshold metal gates CMOS technology
01/25/2005US6846733 Stacked capacitor-type semiconductor storage device and manufacturing method thereof
01/25/2005US6846732 Semiconductor device fabrication method
01/25/2005US6846730 Two stage etching of silicon nitride to form a nitride spacer
01/25/2005US6846728 Semiconductor thin film, semiconductor device employing the same, methods for manufacturing the same and device for manufacturing a semiconductor thin film
01/25/2005US6846727 Patterned SOI by oxygen implantation and annealing
01/25/2005US6846726 Silicon parts having reduced metallic impurity concentration for plasma reaction chambers
01/25/2005US6846723 Semiconductor substrate, semiconductor device, and processes of production of same
01/25/2005US6846722 Method for isolating a hybrid device in an image sensor
01/25/2005US6846721 Manufacturing method of semiconductor device
01/25/2005US6846720 Method to reduce junction leakage current in strained silicon on silicon-germanium devices
01/25/2005US6846719 Process for fabricating wafer bumps
01/25/2005US6846718 Method for producing SOI wafer and SOI wafer
01/25/2005US6846717 Semiconductor device having a wire bond pad and method therefor
01/25/2005US6846716 Integrated circuit device and method therefor
01/25/2005US6846715 Gate technology for strained surface channel and strained buried channel MOSFET devices
01/25/2005US6846714 Voltage limited EEPROM device and process for fabricating the device
01/25/2005US6846713 Method for manufacturing a nonvolatile memory transistor
01/25/2005US6846712 Fabrication of gate dielectric in nonvolatile memories having select, floating and control gates
01/25/2005US6846711 Method of making a metal oxide capacitor, including a barrier film
01/25/2005US6846710 Method for manufacturing self-aligned BiCMOS
01/25/2005US6846709 Vertical gate CMOS with lithography-independent gate length
01/25/2005US6846708 Semiconductor device having improved doping profiles and a method of improving the doping profiles of a semiconductor device
01/25/2005US6846707 Method for forming a self-aligned LTPS TFT
01/25/2005US6846706 Power MOSFET with ultra-deep base and reduced on resistance
01/25/2005US6846705 Method for fabricating complementary metal oxide semiconductor image sensor having redundancy module
01/25/2005US6846703 Three-dimensional device
01/25/2005US6846702 Nanopore chip with N-type semiconductor
01/25/2005US6846701 Traceless flip chip assembly and method
01/25/2005US6846700 Method of fabricating microelectronic connections using masses of fusible material
01/25/2005US6846699 Semiconductor device and method of manufacture thereof, circuit board, and electronic instrument
01/25/2005US6846698 Semiconductor wafer handling method
01/25/2005US6846696 Method for manufacturing solar battery
01/25/2005US6846695 Solid state imaging device and method for manufacturing the same
01/25/2005US6846694 Semiconductor device with built-in light receiving element, production method thereof, and optical pickup incorporating the same
01/25/2005US6846686 Semiconductor light-emitting device and method of manufacturing the same
01/25/2005US6846684 Integrated enterprise resource planning and manufacturing system
01/25/2005US6846682 Chemically synthesized and assembled electronic devices
01/25/2005US6846618 Process for improving critical dimension uniformity
01/25/2005US6846609 Mixture of copolymer of hydroxystyrene with hydroxy-1-adamantyl (methy)acrylate and acid generators
01/25/2005US6846607 For increasing sensitivity of photoresist useful for microfabrication of integrated circuits utilizing deep ultraviolet rays (from excimer lasers) and x-rays; resolution; profile
01/25/2005US6846600 Electrophotographic photosensitive member, process for its production, and electrophotographic apparatus
01/25/2005US6846598 Overcoating with photoresist forming light shielding patterns; transferring pattern
01/25/2005US6846597 Photomask inspecting method
01/25/2005US6846595 Method of improving photomask geometry
01/25/2005US6846569 Carbon-doped hard mask and method of passivating structures during semiconductor device fabrication
01/25/2005US6846565 Light-emitting nanoparticles and method of making same
01/25/2005US6846550 Heat resistant sealing resin between wire circuit and semiconductor
01/25/2005US6846521 Apparatus and method for forming deposited film
01/25/2005US6846519 Method and apparatus for electroless deposition with temperature-controlled chuck
01/25/2005US6846514 Vapor deposition; positioning fluid flow nozzle; reducing leakage; sealing gas intake ports
01/25/2005US6846513 Method for fabricating a silicon thin-film
01/25/2005US6846427 Dry etching method and apparatus for use in the LCD device
01/25/2005US6846424 Plasma-assisted dry etching of noble metal-based materials
01/25/2005US6846391 Process for depositing F-doped silica glass in high aspect ratio structures