Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
01/2005
01/27/2005US20050020089 Etching method used in fabrications of microstructures
01/27/2005US20050020088 Dual depth trench isolation
01/27/2005US20050020087 Method and apparatus for removing an edge region of a layer applied to a substrate and for coating a substrate and a substrate
01/27/2005US20050020086 Self-aligned inner gate recess channel transistor and method of forming the same
01/27/2005US20050020085 Fabrication of silicon-on-nothing (SON) MOSFET fabrication using selective etching of Si1-xGex layer
01/27/2005US20050020084 Method of preparing a surface of a semiconductor wafer to make it epiready
01/27/2005US20050020083 Method of making photomask blank substrates
01/27/2005US20050020080 Method of depositing a diffusion barrier layer and a metal conductive layer
01/27/2005US20050020078 Method of planarizing a surface
01/27/2005US20050020077 Formation of protection layer by dripping DI on wafer with high rotation to prevent stain formation from H2O2/H2SO4 chemical splash
01/27/2005US20050020076 Method for manufacturing MTJ cell of magnetic random access memory
01/27/2005US20050020075 Method for forming isolation film for semiconductor devices
01/27/2005US20050020074 Sealing porous dielectrics with silane coupling reagents
01/27/2005US20050020073 Method and system for electronic spatial filtering of spectral reflectometer optical signals
01/27/2005US20050020072 Means and method for patterning a substrate with a mask
01/27/2005US20050020071 Method and apparatus for cleaning and method and apparatus for etching
01/27/2005US20050020070 Etching method and apparatus
01/27/2005US20050020069 Nickel bonding cap over copper metalized bondpads
01/27/2005US20050020068 Plating method
01/27/2005US20050020067 Chemistry for chemical vapor deposition of titanium containing films
01/27/2005US20050020066 Methods of forming a semiconductor device including a metal silicide layer between a conductive plug and a bottom electrode of a capacitor
01/27/2005US20050020065 Method of forming an oxidation-resistant TiSiN film
01/27/2005US20050020064 Stable electroless fine pitch interconnect plating
01/27/2005US20050020063 Method for forming flowable dielectric layer in semiconductor device
01/27/2005US20050020061 Method of modifying conductive wiring
01/27/2005US20050020060 Process for producing metal thin films by ALD
01/27/2005US20050020059 Method for forming aluminum-containing interconnect
01/27/2005US20050020058 Protecting metal conductors with sacrificial organic monolayers
01/27/2005US20050020057 Method for fabricating a semiconductor device
01/27/2005US20050020056 Method for an integrated circuit contact
01/27/2005US20050020054 Formation of a contact in a device, and the device including the contact
01/27/2005US20050020053 Method and structure for contacting an overlying electrode for a magnetoelectronics element
01/27/2005US20050020052 Method for fabricating thermal compliant semiconductor chip wiring structure for chip scale packaging
01/27/2005US20050020051 Method for forming bump protective collars on a bumped wafer
01/27/2005US20050020050 [bumping process]
01/27/2005US20050020049 Method for an integrated circuit contact
01/27/2005US20050020048 Method of depositing dielectric films
01/27/2005US20050020047 Methods of forming conductive structures including titanium-tungsten base layers and related structures
01/27/2005US20050020046 Planarization for integrated circuits
01/27/2005US20050020045 Semiconductor device having a low-resistance gate electrode
01/27/2005US20050020044 Method for fabricating semiconductor device having stacked-gate structure
01/27/2005US20050020043 Methods for reducing cell pitch in semiconductor devices
01/27/2005US20050020042 Methods of forming a semiconductor device having a metal gate electrode and associated devices
01/27/2005US20050020041 SOI device with reduced drain induced barrier lowering
01/27/2005US20050020040 Manufacturing method of a semiconductor device
01/27/2005US20050020039 Semiconductor integrated circuit device manufacturing method
01/27/2005US20050020037 Semiconductor film, semiconductor device and method of their production
01/27/2005US20050020036 Method of fabricating a compound semiconductor layer
01/27/2005US20050020034 [method of fabricating polysilicon film]
01/27/2005US20050020033 Doping-assisted defect control in compound semiconductors
01/27/2005US20050020032 Method for making thin film devices intended for solar cells or silicon-on-insulator (SOI) applications
01/27/2005US20050020031 Methods for preparing a semiconductor assembly
01/27/2005US20050020030 Production method for silicon wafer and soi wafer, and soi wafer
01/27/2005US20050020029 Method of producing a contact system on the rear of a component with stacked substrates and a component equipped with one such contact system
01/27/2005US20050020028 Method for fabricating trench isolation
01/27/2005US20050020027 Method for manufacturing shallow trench isolation in semiconductor device
01/27/2005US20050020026 Capacitor constructions, semiconductor constructions, and methods of forming electrical contacts and semiconductor constructions
01/27/2005US20050020025 Semiconductor device and method of manufacturing the same
01/27/2005US20050020024 Method for fabricating a trench capacitor with an insulation collar which is electrically connected to a substrate on one side via a buried contact, in particular for a semiconductor memory cell
01/27/2005US20050020023 Bipolar transistor and method for producing the same
01/27/2005US20050020022 Transistor sidewall spacer stress modulation
01/27/2005US20050020021 Semiconductor integrated circuit device and process for manufacturing the same
01/27/2005US20050020020 Integrated semiconductor fin device and a method for manufacturing such device
01/27/2005US20050020019 Method for semiconductor gate line dimension reduction
01/27/2005US20050020018 Method of manufacturing a semiconductor integrated circuit device
01/27/2005US20050020017 Lanthanide oxide / hafnium oxide dielectric layers
01/27/2005US20050020016 Method of controlling implantation dosages during coding of read-only memory devices
01/27/2005US20050020015 Method for converting a planar transistor design to a vertical double gate transistor design
01/27/2005US20050020014 Etch stop layer in poly-metal structures
01/27/2005US20050020013 Non-volatile semiconductor memory device and a method of producing the same
01/27/2005US20050020012 Method for manufacturing a nonvolatile memory transistor
01/27/2005US20050020011 Magnetic memory device and method of manufacturing the same
01/27/2005US20050020010 Method for forming non-volatile memory cell with low-temperature-formed dielectric between word and bit lines, and non-volatile memory array including such memory cells
01/27/2005US20050020009 Memory for producing a memory component
01/27/2005US20050020008 Collar formation using selective SiGe/Si etch
01/27/2005US20050020007 Semiconductor element and method for its production
01/27/2005US20050020006 Semiconductor device and method for manufacturing the same
01/27/2005US20050020005 Manufacturing method of a micro structure
01/27/2005US20050020004 Method and apparatus for simultaneously removing multiple conductive materials from microelectronic substrates
01/27/2005US20050020003 Semiconductor process and integrated circuit
01/27/2005US20050020002 Semiconductor device, method of fabricating same, and, electrooptical device
01/27/2005US20050020001 Selective treatment of the surface of a microelectronic workpiece
01/27/2005US20050020000 Transistor manufacturing method, electro-optic device and electronic instrument
01/27/2005US20050019999 Semiconductor chip having multiple functional blocks integrated in a single chip and method for fabricating the same
01/27/2005US20050019997 Laser annealing method and laser annealing device
01/27/2005US20050019996 Method for fabricating a low temperature polysilicon thin film transistor
01/27/2005US20050019995 [method of fabricating polysilicon film]
01/27/2005US20050019994 [method of fabricating polysilicon film]
01/27/2005US20050019993 Methods for fabricating fin field effect transistors using a protective layer to reduce etching damage
01/27/2005US20050019992 Method for manufacturing gate electrode for use in semiconductor device
01/27/2005US20050019991 Method of manufacturing semiconductor device having thin film SOI structure
01/27/2005US20050019990 [method of fabricating polysilicon film]
01/27/2005US20050019989 Method for making a module comprising at least an electronic component
01/27/2005US20050019988 Method and apparatus for attaching microelectronic substrates and support members
01/27/2005US20050019987 Large area flat image sensor assembly
01/27/2005US20050019986 Method for making electronic devices including silicon and LTCC and devices produced thereby
01/27/2005US20050019985 Charge coupled device package
01/27/2005US20050019982 Semiconductor package having semiconductor constructing body and method of manufacturing the same
01/27/2005US20050019981 [method of fabricating flip chip ball grid array package]
01/27/2005US20050019980 Semiconductor manufacturing apparatus and method of manufacturing semiconductor device