Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
03/2005
03/08/2005US6863733 Apparatus for fabricating thin-film semiconductor device
03/08/2005US6863732 Heat treatment system and method
03/08/2005US6863727 Method of depositing transition metal nitride thin films
03/08/2005US6863726 Vapor phase growth method of oxide dielectric film
03/08/2005US6863700 Cerium oxide abrasive and method of polishing substrates
03/08/2005US6863595 Methods for polishing a semiconductor topography
03/08/2005US6863593 Chemical mechanical polishing a substrate having a filler layer and a stop layer
03/08/2005US6863592 Chemical/mechanical polishing slurry and chemical mechanical polishing method using the same
03/08/2005US6863590 Wafer planarization apparatus
03/08/2005US6863584 Image display unit and production method thereof
03/08/2005US6863491 Catch-pin water support for process chamber
03/08/2005US6863485 Conveyance system
03/08/2005US6863378 Inkjet printer having enclosed actuators
03/08/2005US6863281 Chucking apparatus and production method for the same
03/08/2005US6863206 Bonding apparatus
03/08/2005US6863109 In-line die attaching and curing apparatus for a multi-chip package
03/08/2005US6863079 Semiconductor wafer washing system and method of supplying chemicals to the washing tanks of the system
03/08/2005US6863077 Method and apparatus for enhanced chamber cleaning
03/08/2005US6863020 Segmented electrode apparatus for plasma processing
03/08/2005US6862934 Tuning fork gyroscope
03/08/2005US6862817 Method and apparatus for kinematic registration of a reticle
03/03/2005WO2005020657A1 Part mounting device and part mounting method
03/03/2005WO2005020651A1 Method for manufacturing an electronic module, and an electronic module
03/03/2005WO2005020648A2 Copper-faced modules, imprinted copper circuits, and their application to suptercomputers
03/03/2005WO2005020395A1 Light-emitting semiconductor device and a method of manufacturing it
03/03/2005WO2005020379A1 Electrical connector
03/03/2005WO2005020343A1 Method for sealing thin film transistors
03/03/2005WO2005020331A1 Electric power transforming apparatus
03/03/2005WO2005020329A1 Transition metal alloys for use as a gate electrode and devices incorporating these alloys
03/03/2005WO2005020327A1 Magnetic storage cell and magnetic memory device
03/03/2005WO2005020326A1 Magnetic storage cell and magnetic memory device
03/03/2005WO2005020325A1 Semiconductor device and manufacturing method thereof
03/03/2005WO2005020319A2 Method for ltcc zero x-y shrinkage
03/03/2005WO2005020318A1 Self-aligned drain/channel junction in vertical pass transistor dram cell design for device scaling
03/03/2005WO2005020317A2 Ruthenium layer formation for copper film deposition
03/03/2005WO2005020316A1 Mems based multi-polar electrostatic chuck
03/03/2005WO2005020314A1 High mobility misfet semiconductor device on silicon substrate with cavity and a method for producing same
03/03/2005WO2005020313A1 Thin film transistor array substrate and its manufacturing method
03/03/2005WO2005020312A1 Method of fabricating an ultra-narrow channel semiconductor device
03/03/2005WO2005020311A1 Process for producing oxide thin film and production apparatus therefor
03/03/2005WO2005020310A1 Stress reduction of sioc low k films
03/03/2005WO2005020309A1 Method for manufacturing semiconductor device and substrate processing apparatus
03/03/2005WO2005020308A1 Localized annealing of metal-silicon carbide ohmic contacts and devices so formed
03/03/2005WO2005020307A1 Internal gettering in simox soi silicon substrates
03/03/2005WO2005020306A1 Method for forming impurity-introduced layer, method for cleaning object to be processed, apparatus for introducing impurity and method for producing device
03/03/2005WO2005020304A1 Apparatus for forming thin film
03/03/2005WO2005020303A1 Disperser for carburetor, carburetor for mocvd using the disperser for carburetor, and carrier gas vaporizing method
03/03/2005WO2005020302A1 Disperser for carburetor, carburetor for mocvd using the disperser for carburetor, rod used for the disperser for carburetor or the carburetor for mocvd, carrier gas dispersing method, and carrier gas vaporizing method
03/03/2005WO2005020301A1 Method of producing thin-film semiconductor and production device
03/03/2005WO2005020300A1 Production method for thin-film semiconductor
03/03/2005WO2005020299A1 Exposure apparatus, exposure method, and device producing method
03/03/2005WO2005020298A1 Optical element and exposure device
03/03/2005WO2005020297A2 Technique for evaluating a fabrication of a semiconductor component and wafer
03/03/2005WO2005020296A2 Uniform gas cushion wafer support
03/03/2005WO2005020295A2 Filling vias with thick film paste using contact printing
03/03/2005WO2005020294A2 “control of etch and deposition processes”
03/03/2005WO2005020291A2 Method for fabricating a nitrided silicon-oxide gate dielectric
03/03/2005WO2005020284A2 Thin film dielectrics with perovskite structure and preparation thereof
03/03/2005WO2005020282A2 Methods of forming a transistor with an integrated metal silicide gate electrode
03/03/2005WO2005020279A2 Semiconductor device having electrical contact from opposite sides and method therefor
03/03/2005WO2005020278A2 System and method for validating and visualizing apc assisted semiconductor manufacturing processes
03/03/2005WO2005020241A2 Fowler-nordheim block alterable eeprom memory cell
03/03/2005WO2005020225A1 Spin coating apparatus and coated substrate manufactured using the same
03/03/2005WO2005019986A2 Enhanced parimutuel wagering
03/03/2005WO2005019939A1 Stripping and cleaning compositions for microelectronics
03/03/2005WO2005019937A1 Material for forming resist-protecting film for immersion exposure process, resist-protecting film made of such material, and method for forming resist pattern using such resist-protecting film
03/03/2005WO2005019508A1 Ferroelectric thin-film production method, voltage-application etching apparatus, ferroelectric crystal thin-film substrate, and ferroelectric crystal wafer
03/03/2005WO2005019497A2 Methods of reducing plasma-induced damage for advanced plasma cvd dielectrics
03/03/2005WO2005019495A2 Control system for a sputtering system
03/03/2005WO2005019364A1 Periodic acid compositions for polishing ruthenium/high k substrates
03/03/2005WO2005019303A1 Low dielectric organosilicate polymer composite
03/03/2005WO2005019284A1 Fluorocopolymer, process for producing the same, and resist composition containing the same
03/03/2005WO2005019234A1 Rare earth metal complex, material for thin-film formation, and process for producing thin film
03/03/2005WO2005019141A2 Process for producing hexafluoroethane and use thereof
03/03/2005WO2005019095A1 Fabricating nanoscale and atomic scale devices
03/03/2005WO2005019094A1 Stacked structure and production method thereof
03/03/2005WO2005018879A1 Flexible formed sheets for treating surfaces
03/03/2005WO2005018870A1 Vacuum chuck apparatus and method for holding a wafer during high pressure processing
03/03/2005WO2005018864A2 Capillary with contained inner chamfer
03/03/2005WO2005004226B1 Die bonding
03/03/2005WO2005001859A3 Micromechanical apparatus and method of forming a micromechanical device layer
03/03/2005WO2005000765A3 Dummy wafer and method for manufacture thereof
03/03/2005WO2004114376A3 Automated dense phase fluid cleaning system
03/03/2005WO2004109705A3 Ferroelectric memory device
03/03/2005WO2004106454A3 Foamable underfill encapsulant
03/03/2005WO2004105134A8 An integrated circuit package
03/03/2005WO2004102624A3 Unitary dual damascene process using imprint lithography
03/03/2005WO2004102277B1 Method providing an improved bi-layer photoresist pattern
03/03/2005WO2004097933A3 Method and apparatus for optically aligning integrated circuit devices
03/03/2005WO2004093151A3 Tray carrier with ultraphobic surfaces
03/03/2005WO2004090950A3 Creation of a permanent structure with high three-dimensional resolution
03/03/2005WO2004086460B1 Method and systems for single- or multi-period edge definition lithography
03/03/2005WO2004073025A3 Methods of reducing photoresist distortion while etching in a plasma processing system
03/03/2005WO2004068556A3 Semiconductor structures with structural homogeneity
03/03/2005WO2004053945A3 Re-crystallization of semiconductor surface film and doping of semiconductor by energetic cluster irradiation
03/03/2005WO2004025729A3 Integrated circuit comprising intermediate materials and corresponding components
03/03/2005WO2003104921A3 Characterization adn reduction of variation for integrated circuits
03/03/2005US20050050511 System and method of correcting mask rule violations after optical proximity correction
03/03/2005US20050050507 Basic cell, edge cell, wiring shape, wiring method, and shield wiring structure
03/03/2005US20050050502 Method and apparatus for designing semiconductor integrated circuit
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