Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
06/2005
06/01/2005EP1535143A1 Automated material handling system for semiconductor manufacturing based on a combination of vertical carousels and overhead hoists
06/01/2005EP1535116A2 Improved photomask having an intermediate inspection film layer
06/01/2005EP1535113A2 Exposure method, exposure mask, and exposure apparatus
06/01/2005EP1535109A1 Manufacture of electronic devices comprising thin-film circuit elements
06/01/2005EP1535100A1 Objective with birefringent lenses
06/01/2005EP1534875A1 Systems and methods for forming metal oxides using alcohols
06/01/2005EP1534873A2 Repairing defects on photomasks using a charged particle beam and topographical data from a scanning probe microscope
06/01/2005EP1534795A2 Method for chemical mechanical polishing (cmp) of low-k dielectric materials
06/01/2005EP1534788A1 Electrodepositable dielectric coating compositions to coat a substrate and methods to form dielectric coating
06/01/2005EP1534643A1 Compositions for removing etching residue and use thereof
06/01/2005EP1534632A1 Anomalous expansion materials
06/01/2005EP1534624A1 Microchip with thermal stress relief means
06/01/2005EP1534616A1 Universal reticle transfer system
06/01/2005EP1436842B1 Bipolar transistor and method for producing the same
06/01/2005EP1407148B1 Apparatus for controlling the pressure in a process chamber and method of operating same
06/01/2005EP0975548B1 Process for producing nanoporous dielectric films at high ph
06/01/2005EP0836746B1 Removal rate behavior of spin-on dielectrics with chemical mechanical polish
06/01/2005CN1623238A Based, triple-well fully depleted SOI structure, and various methods of making and operating same
06/01/2005CN1623237A Doping methods for fully-depleted soi structures, and device comprising the resulting doped regions
06/01/2005CN1623236A A method of forming a metal pattern and a method of fabricating tft array panel by using the same
06/01/2005CN1623235A Contact portion of semiconductor device and manufacturing method thereof including thin film transistor array panel for contact portion display device and manufacturing method thereof
06/01/2005CN1623234A Semiconductor device having a retrograde dopant profile in a channel region and method for fabricating the same
06/01/2005CN1623233A 双极晶体管结构 Bipolar transistor structure
06/01/2005CN1623228A Interconnect structures containing conductive electrolessly deposited etch stop layers, liner layers, and via plugs
06/01/2005CN1623227A Method for forming an improved metal silicide portion in a silicon-containing conductive region in an integrated circuit
06/01/2005CN1623226A Semiconductor device formed over a multiple thickness buried oxide layer, and methods of making same
06/01/2005CN1623225A Method for quantifying uniformity patterns and inclusion of expert knowledge for tool development and control
06/01/2005CN1623224A Method and structure for calibrating scatterometry-based metrology tool used to measure dimensions of features on a semiconductor device
06/01/2005CN1623223A Chemistry for etching quaternary interface layers on InGaAsP mostly formed between GaAs and InxGa(1-x)P layers
06/01/2005CN1623222A Method of forming different silicide portions on different silicon- containing regions in a semiconductor device
06/01/2005CN1623221A Method for fabricating a semiconductor device having different metal silicide portions
06/01/2005CN1623220A Crystal manufacturing method
06/01/2005CN1623219A High-performance non-contact support platforms
06/01/2005CN1623204A Memory storage device with heating element
06/01/2005CN1623156A Association of process context with configuration document for manufacturing process
06/01/2005CN1623128A System for brokering fault detection data
06/01/2005CN1623121A Photoresist composition for deep UV radiation containing an additive
06/01/2005CN1623099A Cooling assembly with direct cooling of active electronic components
06/01/2005CN1623098A Multiple-capture dft system for detecting or locating crossing clock-domain faults during self-test or scan test
06/01/2005CN1623097A Scatterometry structure with embedded ring oscillator, and methods of using same
06/01/2005CN1623096A Electronic unit testing set
06/01/2005CN1623086A Method of using high yielding spectra scatterometry measurements to control semiconductor manufacturing processes and systems for accomplishing same
06/01/2005CN1623075A Continuous process furnace
06/01/2005CN1623012A Method and associated apparatus for tilting a substrate upon entry for metal deposition
06/01/2005CN1623009A Method of electroless plating and semiconductor wafer having metal plating layer formed thereon
06/01/2005CN1623008A Method for formation of titanium nitride film
06/01/2005CN1622985A 钨抛光溶液 Tungsten polishing solution
06/01/2005CN1622716A Flat panel display and method for fabricating the same
06/01/2005CN1622715A Organic light-emitting display and manufacturing method thereof
06/01/2005CN1622703A 平板显示装置 Flat panel display devices
06/01/2005CN1622462A 半导体器件 Semiconductor devices
06/01/2005CN1622409A Zinc oxide bluish violet light semiconductor growth using liquid phase epitaxial method
06/01/2005CN1622404A Semiconductor chip electrode making method for perforating on bonding pad table top and joint face
06/01/2005CN1622361A 平面显示器 Flat Panel Display
06/01/2005CN1622351A Manufacturing method of light-emitting device with crystal coated light emitting diode
06/01/2005CN1622348A Thin-film electrode, gallium nitride base optical device and method of manufacturing the same
06/01/2005CN1622344A Photodiode and method of fabricating the same
06/01/2005CN1622341A 薄膜晶体管 Thin film transistor
06/01/2005CN1622340A Thin-film transistor element and manufacturing method thereof
06/01/2005CN1622339A Thin film transistor, method of fabricating the same, and flat panel display using the thin film transistor
06/01/2005CN1622338A Thin film transistor, method of fabricating the same, and flat panel display using thin film transistor
06/01/2005CN1622337A Thin film transistor and method of manufacturing the same
06/01/2005CN1622336A Non-planar transistor having germanium channel region and method of manufacturing the same
06/01/2005CN1622335A Solid-state imaging apparatus and method for producing same
06/01/2005CN1622333A Memory cell and forming method thereof
06/01/2005CN1622332A Storing device and manufacturing method therefor
06/01/2005CN1622331A Semiconductor integrated circuit and microprocessor unit switching method
06/01/2005CN1622330A Integrated inductance and manufacturing method therefor
06/01/2005CN1622323A Partial inter-locking metal contact structure for semiconductor devices and method of manufacture
06/01/2005CN1622321A Semiconductor device and manufacturing method the same
06/01/2005CN1622320A Semiconductor device and method of manufacturing the same
06/01/2005CN1622314A Single transistor planar ram cell and method of manufacture
06/01/2005CN1622313A Method for manufacturing semiconductor device
06/01/2005CN1622312A Method for verifying consistency of chip hardware behavior and software simulation behavior
06/01/2005CN1622311A Method of manufacturing a semiconductor device and semiconductor device
06/01/2005CN1622310A Semiconductor device with trench isolation structure and method for fabricating the same
06/01/2005CN1622309A Method for isolating semiconductor devices
06/01/2005CN1622308A Silicon wafer carrier
06/01/2005CN1622307A Method and apparatus for cutting adhesive tape
06/01/2005CN1622306A Case base and wafer detection device
06/01/2005CN1622304A Flip chip bonding method and layered metal architecture of substrate for stud bump
06/01/2005CN1622303A Wire rack free wafer packaging process
06/01/2005CN1622302A Three buffer layer method for preparing high quality zinc oxide monocrystalline film
06/01/2005CN1622301A Method for preparing quasi dual gate field effect transistor
06/01/2005CN1622300A Method for manufacturing thin-film transistor element
06/01/2005CN1622299A Method for manufacturing thin-film transistor element
06/01/2005CN1622298A Method and device for manufacturing thin film transistor
06/01/2005CN1622297A Method for manufacturing thin-film transistor element
06/01/2005CN1622296A Method for manufacturing thin-film transistor
06/01/2005CN1622295A Method for preparing field effect transistor
06/01/2005CN1622294A Method of improving the quality of defective semiconductor material
06/01/2005CN1622293A 半导体器件 Semiconductor devices
06/01/2005CN1622292A Method of manufacturing semiconductor device having oxide films with different thickness
06/01/2005CN1622291A Method and structure for forming adhesive force between dielectric layers
06/01/2005CN1622290A Polishing cloth and method of manufacturing semiconductor device
06/01/2005CN1622289A Polishing pad with high optical transmission window
06/01/2005CN1622288A Method for fabricating semiconductor device
06/01/2005CN1622287A Soldering tin lug forming method
06/01/2005CN1622286A Photolithography evaluating method and photolithography process
06/01/2005CN1622285A Composite substrate for epitaxy growth of gallium nitride
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