| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 03/21/2006 | CA2127238C Photopolymerisable compositions |
| 03/16/2006 | WO2006029414A2 Method of making a microelectronic and/or optoelectronic circuitry sheet |
| 03/16/2006 | WO2006029388A2 Method and apparatus for fabricating low-k dielectrics, conducting films, and strain-controlling conformable silica-carbon materials |
| 03/16/2006 | WO2006029374A2 System and method for processing a wafer including stop-on-aluminum processing |
| 03/16/2006 | WO2006029363A1 Methods of cleaning optical substrates |
| 03/16/2006 | WO2006029250A2 Process and fabrication methods for emitter wrap through back contact solar cells |
| 03/16/2006 | WO2006029169A2 Grooved substrates for uniform underfilling solder ball assembled electronic devices |
| 03/16/2006 | WO2006029160A2 Copper processing using an ozone-solvent solution |
| 03/16/2006 | WO2006029096A1 Thermally controlled fluidic self-assembly |
| 03/16/2006 | WO2006029091A2 Thermally controlled fluidic self-assembly method and support |
| 03/16/2006 | WO2006029061A1 A method for making a semiconductor device that includes a metal gate electrode |
| 03/16/2006 | WO2006029025A2 Substrate carrier having reduced height |
| 03/16/2006 | WO2006028983A2 Megasonic processing system with gasified fluid |
| 03/16/2006 | WO2006028942A2 Thermally controlled self-assembly method and support |
| 03/16/2006 | WO2006028858A2 Methods of removing photoresist on substrates |
| 03/16/2006 | WO2006028844A1 Method to deposit functionally graded dielectric films via chemical vapor deposition using viscous precursors |
| 03/16/2006 | WO2006028811A2 Amorphous silicon thin-film transistors and methods of making the same |
| 03/16/2006 | WO2006028793A1 Metal oxide semiconductor device including a shielding structure for low gate-drain capacitance |
| 03/16/2006 | WO2006028777A1 Dram cells with vertical u-shaped transistors |
| 03/16/2006 | WO2006028775A2 Dram transistor with a gate buried in the substrate and method of forming thereof |
| 03/16/2006 | WO2006028731A2 Multiple-depth sti trenches in integrated circuit fabrication |
| 03/16/2006 | WO2006028705A2 Mask material conversion |
| 03/16/2006 | WO2006028690A1 A method for making a semiconductor device having a high-k gate dielectric layer and a metal gate electrode |
| 03/16/2006 | WO2006028673A1 Etch with uniformity control |
| 03/16/2006 | WO2006028597A2 Laser separation of encapsulated submount |
| 03/16/2006 | WO2006028577A2 Using different gate dielectrics with nmos and pmos transistors of a complementary metal oxide semiconductor integrated circuit |
| 03/16/2006 | WO2006028568A1 Soft de-chucking sequence |
| 03/16/2006 | WO2006028299A1 Antiferromagnetic half metallic semiconductor and method for forming the same |
| 03/16/2006 | WO2006028260A1 Method and apparatus for forming metal film |
| 03/16/2006 | WO2006028228A1 Glass substrate storage case, glass substrate exchange device, glass substrate management device, glass substrate distribution method, seal member, and seal structure using the seal member |
| 03/16/2006 | WO2006028215A1 Thin film capacitor, method for forming same, and computer readable recording medium |
| 03/16/2006 | WO2006028195A1 Wireless chip |
| 03/16/2006 | WO2006028188A1 Stage apparatus and exposure apparatus |
| 03/16/2006 | WO2006028173A1 Coating/developing apparatus, exposure apparatus and resist pattern forming method |
| 03/16/2006 | WO2006028168A1 Photomask blank and photomask |
| 03/16/2006 | WO2006028066A1 Pattern generation method |
| 03/16/2006 | WO2006028040A1 Wafer chuck |
| 03/16/2006 | WO2006028017A1 Method for producing silicon wafer |
| 03/16/2006 | WO2006028014A1 Resist composition and process for formation of resist patterns |
| 03/16/2006 | WO2006027997A1 Electron-beam or euv (extreme ultraviolet) resist composition and process for the formation of resist patterns |
| 03/16/2006 | WO2006027996A1 Resist composition for euv and method of forming resist pattern |
| 03/16/2006 | WO2006027972A1 Plasma processing apparatus |
| 03/16/2006 | WO2006027942A1 Immersion liquid for liquid immersion lithography process and method for forming resist pattern using such immersion liquid |
| 03/16/2006 | WO2006027928A1 Photomask blank, photomask and method for producing those |
| 03/16/2006 | WO2006027920A1 Nonvolatile semiconductor storage device |
| 03/16/2006 | WO2006027912A1 Semiconductor device |
| 03/16/2006 | WO2006027909A1 Pump unit for feeding chemical liquid |
| 03/16/2006 | WO2006027900A1 Coating and developing apparatus, resist pattern forming method, exposure apparatus and cleaning apparatus |
| 03/16/2006 | WO2006027891A1 Substrate cleaning method and developing apparatus |
| 03/16/2006 | WO2006027778A2 Core-alloyed shell semiconductor nanocrystals |
| 03/16/2006 | WO2006027739A2 Semiconductor devices and methods of manufacture thereof |
| 03/16/2006 | WO2006027332A1 Method for selective etching |
| 03/16/2006 | WO2006026974A2 Dmos-transistor and corresponding production method |
| 03/16/2006 | WO2006026886A1 Substrate processing system |
| 03/16/2006 | WO2006008747A3 On-chip inductor |
| 03/16/2006 | WO2006007142A3 Ultra-thin die and method of fabricating same |
| 03/16/2006 | WO2006001001A3 An electroluminescent device for the production of ultra-violet light |
| 03/16/2006 | WO2005122275A3 Semiconductor on insulator semiconductor device and method of manufacture |
| 03/16/2006 | WO2005093116A3 Replacing chamber components in a vacuum environment |
| 03/16/2006 | WO2005056499A3 Oligo(p-phenylene vinylene) amphiphiles and methods for self-assembly |
| 03/16/2006 | WO2005038995A3 Memory link processing with picosecond lasers |
| 03/16/2006 | WO2005031233A3 Thermal processing system with cross-flow liner |
| 03/16/2006 | WO2005027200A3 Method and device for contacting vo semiconductor chips on a metallic substrate |
| 03/16/2006 | US20060059501 Method of manufacturing an optical data storage medium, optical data storage medium and apparatus for performing said method |
| 03/16/2006 | US20060059445 Method of designing wiring structure of semiconductor device and wiring structure designed accordingly |
| 03/16/2006 | US20060058489 Silicon-containing compositions for spin-on arc/hardmask materials |
| 03/16/2006 | US20060057942 Polishing apparatus, polishing head and polishing method |
| 03/16/2006 | US20060057886 Holding device for holding an electronic component |
| 03/16/2006 | US20060057875 Probe card covering system and method |
| 03/16/2006 | US20060057866 Microelectronic packaging and components |
| 03/16/2006 | US20060057861 Movable operating device and method of controlling the movable operating device |
| 03/16/2006 | US20060057860 Manufacturing method of semiconductor device and semiconductor manufacturing device |
| 03/16/2006 | US20060057859 Buffer layer for selective SiGe growth for uniform nucleation |
| 03/16/2006 | US20060057858 Method for oxidation of a layer and corresponding holder device for a substrate |
| 03/16/2006 | US20060057857 Aperture masks for circuit fabrication |
| 03/16/2006 | US20060057856 Manufacturing method for strained silicon wafer |
| 03/16/2006 | US20060057855 Method for making toughening agent materials |
| 03/16/2006 | US20060057854 High frequency power supply device and plasma generator |
| 03/16/2006 | US20060057853 Thermal oxidation for improved silicide formation |
| 03/16/2006 | US20060057852 Process for low k dielectric plasma etching with high selectivity to deep uv photoresist |
| 03/16/2006 | US20060057851 Method for fabricating fine features by jet-printing and surface treatment |
| 03/16/2006 | US20060057850 Method of manufacturing carrier wafer and resulting carrier wafer structures |
| 03/16/2006 | US20060057849 Apparatus and method for stripping silicon nitride |
| 03/16/2006 | US20060057848 Method for preparing a deep trench and an etching mixture for the same |
| 03/16/2006 | US20060057847 Resin forming mold and production method for the resin forming mold |
| 03/16/2006 | US20060057846 Composition for use as sanitary earthenware material, method for production thereof, method for manufacturing sanitary earthenware using said composition |
| 03/16/2006 | US20060057845 Method of forming nickel-silicon compound, semiconductor device, and semiconductor device manufacturing method |
| 03/16/2006 | US20060057844 Structure and method for enhanced uni-directional diffusion of cobalt silicide |
| 03/16/2006 | US20060057843 Methods and apparatus for forming barrier layers in high aspect ratio vias |
| 03/16/2006 | US20060057842 Ultra-thick metal-copper dual damascene process |
| 03/16/2006 | US20060057841 Interconnection structure for IC metallization |
| 03/16/2006 | US20060057840 Guard ring for improved matching |
| 03/16/2006 | US20060057839 Method and apparatus for forming metal film |
| 03/16/2006 | US20060057838 Low k ILD layer with a hydrophilic portion |
| 03/16/2006 | US20060057837 Treating agent materials |
| 03/16/2006 | US20060057836 Method of stacking thin substrates by transfer bonding |
| 03/16/2006 | US20060057835 Air-gap insulated interconnections |
| 03/16/2006 | US20060057834 Semiconductor device and fabrication process thereof |
| 03/16/2006 | US20060057833 Method of forming solder ball, and fabricating method and structure of semiconductor package using the same |
| 03/16/2006 | US20060057832 Wafer level packages and methods of fabrication |