Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
03/2006
03/21/2006US7015566 Semiconductor wafer and a method for manufacturing a semiconductor wafer
03/21/2006US7015564 Capacitive element and semiconductor memory device
03/21/2006US7015563 On chip capacitor
03/21/2006US7015560 Light-receiving device, method for manufacturing the same, and optoelectronic integrated circuit comprising the same
03/21/2006US7015555 Magnetoresistive random access memory with high selectivity
03/21/2006US7015554 Semiconductor device and method for fabricating the same
03/21/2006US7015553 Compact mask programmable ROM
03/21/2006US7015552 Dual work function semiconductor structure with borderless contact and method of fabricating the same
03/21/2006US7015551 Semiconductor device and method of fabricating same
03/21/2006US7015550 Nonvolatile semiconductor memory device
03/21/2006US7015549 Integrated circuit structures including epitaxial silicon layers that extend from an active region through an insulation layer to a substrate
03/21/2006US7015548 Thin film transistor array panel including storage electrode
03/21/2006US7015547 Multi-configurable independently multi-gated MOSFET
03/21/2006US7015546 Deterministically doped field-effect devices and methods of making same
03/21/2006US7015543 Trench-gate semiconductor device and fabrication method thereof
03/21/2006US7015542 MONOS memory device
03/21/2006US7015541 Memory cell including stacked gate sidewall patterns and method for fabricating same
03/21/2006US7015540 Semiconductor memory device
03/21/2006US7015539 Nonvolatile semiconductor memory cell and method of manufacturing the same
03/21/2006US7015538 Non-volatile memory and method for manufacturing non-volatile memory
03/21/2006US7015537 Isolation-less, contact-less array of nonvolatile memory cells each having a floating gate for storage of charges, and methods of manufacturing, and operating therefor
03/21/2006US7015536 Charge trapping device and method of forming the same
03/21/2006US7015535 Nonvolatile semiconductor memory device
03/21/2006US7015534 Encapsulated MOS transistor gate structures and methods for making the same
03/21/2006US7015533 Capacitor constructions, semiconductor constructions, and methods of forming electrical contacts and semiconductor constructions
03/21/2006US7015532 Capacitor compatible with high dielectric constant materials having a low contact resistance layer and the method for forming same
03/21/2006US7015531 FeRAM having bottom electrode connected to storage node and method for forming the same
03/21/2006US7015530 Electronic systems comprising memory devices
03/21/2006US7015529 Localized masking for semiconductor structure development
03/21/2006US7015528 Reduced aspect ratio digit line contact process flow used during the formation of a semiconductor device
03/21/2006US7015527 Metal oxynitride capacitor barrier layer
03/21/2006US7015526 Dynamic memory cell and method of manufacturing same
03/21/2006US7015525 Folded bit line DRAM with vertical ultra thin body transistors
03/21/2006US7015524 Method of etching magnetic material, magnetoresistive film and magnetic random access memory
03/21/2006US7015523 Ferroelectric memory structure and fabrication method thereof
03/21/2006US7015518 HEMT device with a mesa isolating multilayer film
03/21/2006US7015517 Semiconductor device incorporating a defect controlled strained channel structure and method of making the same
03/21/2006US7015515 Group III nitride compound semiconductor device having a superlattice structure
03/21/2006US7015511 Gallium nitride-based light emitting device and method for manufacturing the same
03/21/2006US7015508 Thin film transistor structure
03/21/2006US7015507 Thin film transistor and method of fabricating the same
03/21/2006US7015505 Semiconductor device and method of fabricating the same
03/21/2006US7015502 Organic semiconductor device and process of manufacturing the same
03/21/2006US7015500 Memory device utilizing carbon nanotubes
03/21/2006US7015498 Quantum optical semiconductor device
03/21/2006US7015495 Metallic very thin film, metallic very thin film multilayer body, and method for manufacturing the metallic very thin film or the metallic very thin film laminate
03/21/2006US7015492 Method and apparatus for mapping of wafers located inside a closed wafer cassette
03/21/2006US7015489 Collector having unused region for illumination systems using a wavelength less than or equal to 193 nm
03/21/2006US7015487 Apparatus and method for exposing a radiation sensitive layer by means of charged particles as well as a mask for this purpose
03/21/2006US7015482 Electron beam writing equipment using plural beams and method
03/21/2006US7015456 Exposure apparatus that acquires information regarding a polarization state of light from a light source
03/21/2006US7015426 Purged heater-susceptor for an ALD/CVD reactor
03/21/2006US7015422 System and process for heating semiconductor wafers by optimizing absorption of electromagnetic energy
03/21/2006US7015418 Method and system for calibrating a laser processing system and laser marking system utilizing same
03/21/2006US7015413 Plasma generation system having a refractor
03/21/2006US7015183 Resist remover composition
03/21/2006US7015168 Low dielectric constant fluorine and carbon-containing silicon oxide dielectric material characterized by improved resistance to oxidation
03/21/2006US7015166 superior in capability of covering up an electrode pattern, volume resistivity at high temperature, and accuracy of temperature measurement with a thermoviewer; matrix contains 0.1% to 10% by weight sintered aid comprising an alkali metal oxide or alkali earth metal oxide
03/21/2006US7015163 Glass member resistant to plasma corrosion
03/21/2006US7015154 Removing vapor deposition material adhering to equipment walls without atmospheric exposure; irradiation sublimation and vacuum pump exhaustion
03/21/2006US7015153 Method for forming a layer using a purging gas in a semiconductor process
03/21/2006US7015152 Providing an aluminum alkoxide precursor that is dissolved, emulsified or suspended in a liquid; providing a vapor generated from the aluminum alkoxide precursor; depositing an aluminum oxide film from vaporized precursor on a substrate
03/21/2006US7015151 Transistor fabrication methods comprising selective wet oxidation
03/21/2006US7015150 Exposed pore sealing post patterning
03/21/2006US7015149 Simplified dual damascene process
03/21/2006US7015148 Reduce line end pull back by exposing and etching space after mask one trim and etch
03/21/2006US7015147 Fabrication of silicon-on-nothing (SON) MOSFET fabrication using selective etching of Si1-xGex layer
03/21/2006US7015146 for die or wafer backside thinning prior to electrical probing and/or characterization of a site specific MOSFET device; using collimated ion plasma; avoids damaging or rupturing the gate film
03/21/2006US7015145 Self-aligned collar and strap formation for semiconductor devices
03/21/2006US7015144 Compositions including perhydro-polysilazane used in a semiconductor manufacturing process and methods of manufacturing semiconductor devices using the same
03/21/2006US7015143 Structure including multiple wire-layers and methods for forming the same
03/21/2006US7015142 Patterned thin film graphite devices and method for making same
03/21/2006US7015141 Semiconductor device and manufacturing method thereof
03/21/2006US7015140 Selective salicidation methods
03/21/2006US7015139 Two-dimensionally arrayed quantum device
03/21/2006US7015138 Multi-layered barrier metal thin films for Cu interconnect by ALCVD
03/21/2006US7015137 Semiconductor device with reduced interconnection capacity
03/21/2006US7015136 Method for preventing formation of photoresist scum
03/21/2006US7015135 Method and system for reducing contact defects using non conventional contact formation method for semiconductor cells
03/21/2006US7015134 Method for reducing anti-reflective coating layer removal during removal of photoresist
03/21/2006US7015133 Dual damascene structure formed of low-k dielectric materials
03/21/2006US7015132 Forming an electrical contact on an electronic component
03/21/2006US7015131 Semiconductor device using bumps, method for fabricating same, and method for forming bumps
03/21/2006US7015130 Method for making UBM pads and bumps on wafer
03/21/2006US7015129 Bond pad scheme for Cu process
03/21/2006US7015128 Method of making a semiconductor chip assembly with an embedded metal particle
03/21/2006US7015127 Semiconductor device and a method of manufacturing the same
03/21/2006US7015126 Method of forming silicided gate structure
03/21/2006US7015125 Trench MOSFET device with polycrystalline silicon source contact structure
03/21/2006US7015124 Use of amorphous carbon for gate patterning
03/21/2006US7015123 Amorphous silicon crystallization method
03/21/2006US7015122 Method of forming polysilicon thin film transistor
03/21/2006US7015121 Semiconductor device and method of manufacturing the same
03/21/2006US7015120 Method of fabricating semiconductor devices employing at least one modulation doped quantum well structure and one or more etch stop layers for accurate contact formation
03/21/2006US7015119 Fabrication method of semiconductor integrated circuit device
03/21/2006US7015118 Method for forming a scribe line on a semiconductor device and an apparatus for forming the scribe line
03/21/2006US7015117 Methods of processing of gallium nitride
03/21/2006US7015116 Stress-relieved shallow trench isolation (STI) structure and method for forming the same
03/21/2006US7015115 Method for forming deep trench isolation and related structure
03/21/2006US7015114 Trench in semiconductor device and formation method thereof