Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
03/2006
03/14/2006US7012301 Trench lateral power MOSFET and a method of manufacturing the same
03/14/2006US7012299 Storage layer optimization of a nonvolatile memory device
03/14/2006US7012298 Non-volatile memory device
03/14/2006US7012297 Scalable flash/NV structures and devices with extended endurance
03/14/2006US7012295 Semiconductor memory with peripheral transistors having gate insulator thickness being thinner than thickness of memory and select transistors
03/14/2006US7012294 Semiconductor constructions
03/14/2006US7012293 Fabricating an SRAM cell
03/14/2006US7012292 Oxidative top electrode deposition process, and microelectronic device structure
03/14/2006US7012291 Monolithic three-dimensional structures
03/14/2006US7012289 Memory cell having a thin insulation collar and memory module
03/14/2006US7012287 HEMT device with a mesa isolating multilayer film
03/14/2006US7012286 Heterojunction field effect transistor
03/14/2006US7012281 Light emitting diode device and manufacturing method
03/14/2006US7012278 Light-emitting apparatus driven with thin-film transistor and method of manufacturing light-emitting apparatus
03/14/2006US7012276 Organic thin film Zener diodes
03/14/2006US7012274 Modulation doped thyristor and complementary transistors combination for a monolithic optoelectronic integrated circuit
03/14/2006US7012265 Lithographic apparatus, integrated circuit device manufacturing method, and integrated circuit device manufactured thereby
03/14/2006US7012264 Lithographic apparatus and device manufacturing method
03/14/2006US7012263 Ion source apparatus and electronic energy optimized method therefor
03/14/2006US7012262 Corrector for correcting first-order chromatic aberrations of the first degree
03/14/2006US7012252 Method and an apparatus of an inspection system using an electron beam
03/14/2006US7012240 Image sensor with guard rings and method for forming the same
03/14/2006US7012125 Spin-on-glass anti-reflective coatings for photolithography
03/14/2006US7012051 Using mixture containing hydroxylamine compound
03/14/2006US7012031 Photoresist pattern, method of fabricating the same, and method of assuring the quality thereof
03/14/2006US7012030 Very low dielectric constant plasma-enhanced CVD films
03/14/2006US7012029 Method of forming a lamination film pattern and improved lamination film pattern
03/14/2006US7012028 Transistor fabrication methods using reduced width sidewall spacers
03/14/2006US7012027 Zirconium oxide and hafnium oxide etching using halogen containing chemicals
03/14/2006US7012026 Method for producing defined polycrystalline silicon areas in an amorphous silicon layer
03/14/2006US7012025 Tantalum removal during chemical mechanical polishing
03/14/2006US7012024 Methods of forming a transistor with an integrated metal silicide gate electrode
03/14/2006US7012023 Semiconductor device and method of manufacturing the same
03/14/2006US7012022 Self-patterning of photo-active dielectric materials for interconnect isolation
03/14/2006US7012021 Method for end point detection polysilicon chemical mechanical polishing in an anti-fuse memory device
03/14/2006US7012020 Multi-layered metal routing technique
03/14/2006US7012019 Circuit barrier structure of semiconductor packaging substrate and method for fabricating the same
03/14/2006US7012018 Metallic strain-absorbing layer for improved fatigue resistance of solder-attached devices
03/14/2006US7012017 Partially etched dielectric film with conductive features
03/14/2006US7012016 Method for growing group-III nitride semiconductor heterostructure on silicon substrate
03/14/2006US7012015 Wafer-level thick film standing-wave clocking
03/14/2006US7012014 Recessed gate structure with reduced current leakage and overlap capacitance
03/14/2006US7012013 Dielectric pattern formation for organic electronic devices
03/14/2006US7012012 Method of etching substrates
03/14/2006US7012011 Wafer-level diamond spreader
03/14/2006US7012010 Methods of forming trench isolation regions
03/14/2006US7012009 Method for improving the electrical continuity for a silicon-germanium film across a silicon/oxide/polysilicon surface using a novel two-temperature process
03/14/2006US7012008 Dual spacer process for non-volatile memory devices
03/14/2006US7012007 Strained silicon MOSFET having improved thermal conductivity and method for its fabrication
03/14/2006US7012006 Embedded ROM device using substrate leakage
03/14/2006US7012005 Self-aligned differential oxidation in trenches by ion implantation
03/14/2006US7012004 Method of manufacturing a nonvolatile memory cell with triple spacers and the structure thereof
03/14/2006US7012003 Memory for producing a memory component
03/14/2006US7012002 Semiconductor memory device and method for fabricating the same
03/14/2006US7012001 Method for manufacturing a semiconductor device for use in a memory cell that includes forming a composite layer of tantalum oxide and titanium oxide over a bottom capacitor electrode
03/14/2006US7011999 Method of manufacturing an integrated circuit device including forming an oxidation resistant film over an isolation region and subsequently forming a gate insulating film of a misfet
03/14/2006US7011998 High voltage transistor scaling tilt ion implant method
03/14/2006US7011997 Method of fabricating a HEMT device
03/14/2006US7011996 Method of manufacturing thin film transistor
03/14/2006US7011995 Electro-optical device and semiconductor circuit
03/14/2006US7011994 Method of forming wiring and method of manufacturing image display system by using the same
03/14/2006US7011993 Transistor and method for manufacturing the same
03/14/2006US7011992 Method of fabricating a thin film transistor using dual or multiple gates
03/14/2006US7011990 Alloying method using laser irradiation for a light emitting device
03/14/2006US7011989 Method for producing encapsulated chips
03/14/2006US7011988 Build-up structures with multi-angle vias for Chip to Chip interconnects and optical bussing
03/14/2006US7011987 Method of fabricating organic electroluminescence panel package
03/14/2006US7011986 Method for manufacturing a housing for a chip with a micromechanical structure
03/14/2006US7011985 Method for producing miniature amplifier and signal processing unit
03/14/2006US7011984 Methods of forming switchable circuit devices
03/14/2006US7011983 Large organic devices and methods of fabricating large organic devices
03/14/2006US7011982 Nitride semiconductor laser device and method for manufacturing the same
03/14/2006US7011981 Method for forming thin film and method for fabricating liquid crystal display using the same
03/14/2006US7011980 Method and structures for measuring gate tunneling leakage parameters of field effect transistors
03/14/2006US7011979 Detecting pinholes in vertical cavity surface-emitting laser passivation
03/14/2006US7011978 Methods of forming capacitor constructions comprising perovskite-type dielectric materials with different amount of crystallinity regions
03/14/2006US7011935 Method for the removal of an imaging layer from a semiconductor substrate stack
03/14/2006US7011934 Forming a first molecular layer of trimethylsilyl groups on underlying film by reaction with hexamethyldisilazane while annealing; allowing the film to stand outside the firstchamber; forming a trimethylsilyl layer on the first
03/14/2006US7011929 Forming barrier sidewall spacers; overcoating substrate with dielectric; anisotropic etching
03/14/2006US7011915 Exposure parameter obtaining method, exposure parameter evaluating method, semiconductor device manufacturing method, charged beam exposure apparatus, and method of the same
03/14/2006US7011912 Rapid, error free semiconductor batch production
03/14/2006US7011911 Mask for polycrystallization and method of manufacturing thin film transistor using polycrystallization mask
03/14/2006US7011890 Modulated/composited CVD low-k films with improved mechanical and electrical properties for nanoelectronic devices
03/14/2006US7011889 Organosiloxanes
03/14/2006US7011874 Ceramic substrate for semiconductor production and inspection devices
03/14/2006US7011868 Low dielectrics; elastic modulus; integrated circuits
03/14/2006US7011866 contacting hydrogen carrier gases and silane gases with heated catalysts and electric fields not higher than glow discharge voltage, to provide kinetic energy and carry vapor growth film on substrates; chemical vapor deposition; quality thin films
03/14/2006US7011864 First coating apparatus coating a foaming insulation film material on the wafer, a second coating apparatus coating a non-porous insulation film material on the wafer
03/14/2006US7011863 Substrate processing apparatus and substrate processing method
03/14/2006US7011862 Method for producing wiring substrate
03/14/2006US7011762 Metal bridging monitor for etch and CMP endpoint detection
03/14/2006US7011734 Method of manufacturing semiconductor device having silicide layer
03/14/2006US7011717 Method for heat treatment of silicon wafers and silicon wafer
03/14/2006US7011716 Water-reactive agent is used for removing water, the reaction product is more soluble in the supercritical fluid than water; 1,1,1,5,5,5-hexafluoro-2,4-pentanedione; acetic anhydride; without damage to image
03/14/2006US7011715 Rotational thermophoretic drying
03/14/2006US7011712 Fixing structures and supporting structures of ceramic susceptors, and supporting members thereof
03/14/2006US7011710 Concentration profile on demand gas delivery system (individual divert delivery system)
03/14/2006US7011709 Crystallization apparatus, optical member for use in crystallization apparatus, crystallization method, thin film transistor, and display
03/14/2006US7011707 Production method for semiconductor substrate and semiconductor element
03/14/2006US7011706 Device substrate and method for producing device substrate