Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
04/2006
04/04/2006US7022211 Semiconductor wafer holder and electroplating system for plating a semiconductor wafer
04/04/2006US7022199 Method for fabricating LCD
04/04/2006US7022193 Gas streams ejected from nozzle; forming recesses, apertures
04/04/2006US7022192 Semiconductor wafer susceptor
04/04/2006US7022191 Method of crystallizing amorphous silicon layer and crystallizing apparatus thereof
04/04/2006US7022190 Substrate coating unit and substrate coating method
04/04/2006US7022184 Atomic layer CVD
04/04/2006US7022183 Semiconductor thin film and process for production thereof
04/04/2006US7022181 Liquid phase growth process, liquid phase growth system and substrate member production method
04/04/2006US7022009 Air cleaning system for semiconductor manufacturing equipment
04/04/2006US7022001 Polishing apparatus
04/04/2006US7022000 Wafer processing machine
04/04/2006US7021995 CMP pad conditioner having working surface inclined in radially outer portion
04/04/2006US7021993 Method of polishing a substrate with a polishing system containing conducting polymer
04/04/2006US7021991 Polishing apparatus
04/04/2006US7021915 Layer thickness control for stereolithography utilizing variable liquid elevation and laser focal length
04/04/2006US7021903 Fore-line preconditioning for vacuum pumps
04/04/2006US7021882 Drive-section-isolated FOUP opener
04/04/2006US7021881 Semiconductor processing apparatus comprising chamber partitioned into reaction and transfer sections
04/04/2006US7021635 Vacuum chuck utilizing sintered material and method of providing thereof
04/04/2006US7021521 Bump connection and method and apparatus for forming said connection
04/04/2006US7021520 Stacked chip connection using stand off stitch bonding
04/04/2006US7021517 Method and device for applying pieces of material to a workpiece
04/04/2006US7021467 Carrier tape for containing good therein, and container using the carrier tape
04/04/2006US7021323 Dust-incompatible article transfer container cleaner
04/04/2006US7021320 Method of removing a via fence
04/04/2006US7021319 Assisted rinsing in a single wafer cleaning process
04/04/2006US7021238 Molecular beam epitaxy equipment
04/04/2006US7021208 Compress and position apparatus
04/04/2006US7021119 Liquid flow proximity sensor for use in immersion lithography
04/04/2006US7020981 comprises two reaction chambers, inlets and exhaust lines and a flow control system configured to alternately constrict flow through the first and second exhausts; diffusion barrier forms between first inlet and the substrate; atomic layer deposition
04/04/2006US7020954 Apparatus for placing a semiconductor chip as a flipchip on a substrate
04/04/2006US7020953 Apparatus and method for mounting component
04/04/2006US7020941 Method for manufacturing a multilayer ceramic capacitor
04/04/2006CA2371630C Semiconductor chip having an arrayed waveguide grating and method of manufacturing the semiconductor chip and module containing the semiconductor chip
04/04/2006CA2286699C Latch-up free power mos-bipolar transistor
03/2006
03/30/2006WO2006033957A1 Method to fabricate copper-cobalt interconnects
03/30/2006WO2006033923A2 Enhanced resurf hvpmos device with stacked hetero-doping rim and gradual drift region
03/30/2006WO2006033872A2 Method of forming an in-situ recessed structure
03/30/2006WO2006033838A2 Poly-silicon-germanium gate stack and method for forming the same
03/30/2006WO2006033746A2 Method of forming a semiconductor device having a metal layer
03/30/2006WO2006033673A2 Apparatus and method for transverse characterization of materials
03/30/2006WO2006033465A1 Semiconductor device and method for manufacturing the same, and treatment liquid
03/30/2006WO2006033461A1 Semiconductor device and voltage regulator using the semiconductor device
03/30/2006WO2006033451A1 Semiconductor device and method for manufacturing the same
03/30/2006WO2006033442A1 Reflective mask, reflective mask manufacturing method and exposure apparatus
03/30/2006WO2006033375A1 Optical semiconductor device and method of manufacturing thereof
03/30/2006WO2006033359A1 Adamantane derivative, process for producing the same, and photosensitive material for photoresist
03/30/2006WO2006033336A1 Lighting apparatus, exposure apparatus and maicrodevice manufacturing method
03/30/2006WO2006033292A1 Method for manufacturing semiconductor wafer
03/30/2006WO2006033282A1 Thin film transistor and thin film transistor element sheet, and method for fabricating thin film transistor and thin film transistor element sheet
03/30/2006WO2006033086A2 Method of making shallow semiconductor junctions
03/30/2006WO2006033073A1 Analogue measurement of alignment between layers of a semiconductor device
03/30/2006WO2006033041A1 Integrated circuit fabrication using solid phase epitaxy and silicon on insulator technology
03/30/2006WO2006032963A2 Methods for producing noble metal films, noble metal oxide films, and noble metal silicide films
03/30/2006WO2006032930A1 Substrate handling device for a charged particle beam system
03/30/2006WO2006032836A1 Thick-film hybrid production process
03/30/2006WO2006032756A1 Indium nitride layer production
03/30/2006WO2006032681A1 Formation of lattice-tuning semiconductor substrates
03/30/2006WO2006032250A1 Semi-conductor component provided with through contacts which pass through plastic housing material and method for the production thereof
03/30/2006WO2006016972A3 Fabrication of an eeprom cell with emitter-polysilicon source/drain regions
03/30/2006WO2006016367A3 Semiconductor cooling system and process for manufacturing the same
03/30/2006WO2005124828A3 Active matrix electronic array device having built in resistive heating arrangement
03/30/2006WO2005119747A3 Semiconductor wafer with ditched scribe street
03/30/2006WO2005096747A3 Highly selective silicon oxide etching compositions
03/30/2006WO2005094244A3 System, method and apparatus for self-cleaning dry etch
03/30/2006WO2005089184A3 Method of magnetic field assisted self-assembly
03/30/2006WO2005088722A3 Trench field effect transistor and method of making it
03/30/2006WO2005084342A3 A semiconductor device having a silicided gate electrode and method of manufacture therefor
03/30/2006WO2005067677A3 High performance strained silicon finfets device and method for forming same
03/30/2006WO2005067048A3 Contactless flash memory array
03/30/2006WO2005066325A3 Cleaner compositions containing free radical quenchers
03/30/2006WO2005065433A3 Electrochemical fabrication methods incorporating dielectric materials and/or using dielectric substrates
03/30/2006WO2005057637A3 Method for the molecular bonding of microelectronic components to a polymer film
03/30/2006WO2005048296A3 Nanotube-based switching elements with multiple controls and circuits made from same
03/30/2006WO2005041269A3 Maskless lateral epitaxial overgrowth of aluminum nitride and high aluminum composition aluminum gallium nitride
03/30/2006WO2004070795A3 Radiation detector assembly
03/30/2006US20060069172 Nanoporous structures produced from self-assembling molecules
03/30/2006US20060068992 Method for growing thin oxide films
03/30/2006US20060068683 Machining apparatus using a rotary machine tool to machine a workpiece
03/30/2006US20060068681 Wafer polishing method and apparatus
03/30/2006US20060068607 Laser illumination apparatus
03/30/2006US20060068606 Method and apparatus for forming silicon nitride film
03/30/2006US20060068605 Method of manufacturing oxide film and method of manufacturing semiconductor device
03/30/2006US20060068604 Barrier layer and fabrication method thereof
03/30/2006US20060068603 A method for forming a thin complete high-permittivity dielectric layer
03/30/2006US20060068602 Electronic device having organic material based insulating layer and method for fabricating the same
03/30/2006US20060068601 Wafer for compound semiconductor devices, and method of fabrication
03/30/2006US20060068600 Method of manufacturing semiconductor device
03/30/2006US20060068599 Methods of forming a thin layer for a semiconductor device and apparatus for performing the same
03/30/2006US20060068598 Film formation apparatus and method of using the same
03/30/2006US20060068597 Method for texturing surfaces of silicon wafers
03/30/2006US20060068596 Formation of Controlled Sublithographic Structures
03/30/2006US20060068595 Semiconductor substrate thinning method for manufacturing thinned die
03/30/2006US20060068594 Method for line etch roughness (LER) reduction for low-k interconnect damascene trench etching
03/30/2006US20060068593 Patterning method
03/30/2006US20060068592 Method for etch-stop layer etching during damascene dielectric etching with low polymerization
03/30/2006US20060068591 Fabrication of channel wraparound gate structure for field-effect transistor
03/30/2006US20060068590 Transistor formed on a heavily doped substrate is described. Metal gates are used in low temperature processing to prevent doping from the substrate from diffusing into the channel region of the transistor
03/30/2006US20060068589 Selective barrier slurry for chemical mechanical polishing