| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 12/21/2006 | US20060285965 Apparatus and method for removing semiconductor chip |
| 12/21/2006 | US20060285945 Substrate processing apparatus |
| 12/21/2006 | US20060285944 FOUP loading load lock |
| 12/21/2006 | US20060285270 Cooling apparatus for electrostatic chuck |
| 12/21/2006 | US20060285098 Method for determining focus deviation amount in pattern exposure and pattern exposure method |
| 12/21/2006 | US20060285092 Exposure apparatus and device fabrication method |
| 12/21/2006 | US20060285027 Thin film transistor array panel for a liquid crystal display and a method for manufacturing the same |
| 12/21/2006 | US20060284554 Method of manufacturing organic electroluminescent display device and organic electroluminescent display device and display device equipped with organic electroluminescent display device |
| 12/21/2006 | US20060284312 Flip chip packaging using recessed interposer terminals |
| 12/21/2006 | US20060284311 Method of manufacturing self-aligned contact openings and semiconductor device |
| 12/21/2006 | US20060284307 Component with sensitive component structures and method for the production thereof |
| 12/21/2006 | US20060284295 Method and system for hermetically sealing packages for optics |
| 12/21/2006 | US20060284291 Lead frame structure with aperture or groove for flip chip in a leaded molded package |
| 12/21/2006 | US20060284290 Chip-package structure and fabrication process thereof |
| 12/21/2006 | US20060284283 Semiconductor device and manufacturing method thereof |
| 12/21/2006 | US20060284282 Heterjunction bipolar transistor with tunnelling mis emitter junction |
| 12/21/2006 | US20060284280 Electrodes, inner layers, capacitors, electronic devices and methods of making thereof |
| 12/21/2006 | US20060284277 Semiconductor device including bit line formed using damascene technique and method of fabricating the same |
| 12/21/2006 | US20060284272 Gate structure and method for preparing the same |
| 12/21/2006 | US20060284269 Method for forming raised structures by controlled selective epitaxial growth of facet using spacer |
| 12/21/2006 | US20060284267 Flash memory and fabrication method thereof |
| 12/21/2006 | US20060284262 Semiconductor wafer having different impurity concentrations in respective regions |
| 12/21/2006 | US20060284255 Complementary field-effect transistors having enhanced performance with a single capping layer |
| 12/21/2006 | US20060284253 Organic thin film transistor and method of manufacturing the same |
| 12/21/2006 | US20060284249 Impurity co-implantation to improve transistor performance |
| 12/21/2006 | US20060284246 Memory utilizing oxide nanolaminates |
| 12/21/2006 | US20060284242 Non-volatile memory device having floating gate and methods forming the same |
| 12/21/2006 | US20060284241 Nanocrystal non-volatile memory device and method of fabricating the same |
| 12/21/2006 | US20060284233 Acceptor doped barium titanate based thin film capacitors on metal foils and methods of making thereof |
| 12/21/2006 | US20060284231 Dielectric memory and method for manufacturing the same |
| 12/21/2006 | US20060284225 Memory cell array and method of forming the same |
| 12/21/2006 | US20060284224 Ferroelectric memory device and method of manufacturing the same |
| 12/21/2006 | US20060284223 CMOS image sensor and manufacturing method thereof |
| 12/21/2006 | US20060284221 Semiconductor device and electronic device |
| 12/21/2006 | US20060284217 Silicon carbide semiconductor device |
| 12/21/2006 | US20060284215 Solid-state imaging device and method of manufacturing said solid-state imaging device |
| 12/21/2006 | US20060284213 Semiconductor device and method for fabricating the same |
| 12/21/2006 | US20060284202 Electronic component and method of producing same |
| 12/21/2006 | US20060284201 Light-emitting diode incorporating gradient index element |
| 12/21/2006 | US20060284200 Optical radiation emitting device and method of manufacturing same |
| 12/21/2006 | US20060284188 Light-emitting diode and method for manufacturing the same |
| 12/21/2006 | US20060284184 Display device |
| 12/21/2006 | US20060284183 Semiconductor device and manufacturing method thereof |
| 12/21/2006 | US20060284172 Thin film transistor having oxide semiconductor layer and manufacturing method thereof |
| 12/21/2006 | US20060284171 Methods of making thin film transistors comprising zinc-oxide-based semiconductor materials and transistors made thereby |
| 12/21/2006 | US20060284120 Method for correcting electron beam exposure data |
| 12/21/2006 | US20060284110 Demagnification measurement method for charged particle beam exposure apparatus, stage phase measurement method for charged particle beam exposure apparatus, control method for charged particle beam exposure apparatus, and charged particle beam exposure apparatus |
| 12/21/2006 | US20060284087 Defect inspection and changed particle beam apparatus |
| 12/21/2006 | US20060283917 Method of soldering or brazing articles having surfaces that are difficult to bond |
| 12/21/2006 | US20060283845 Laser processing |
| 12/21/2006 | US20060283840 second slurry comprising a resin particle having a primary particle diameter ranging from 0.05 to 5 mu m, and a surfactant having a hydrophilic moiety to greatly minimize the number of defects that may be caused due to the residue of resist |
| 12/21/2006 | US20060283839 Polishing equipment having a longer operating time length |
| 12/21/2006 | US20060283838 Chemical mechanical polish process and method for improving accuracy of determining polish endpoint thereof |
| 12/21/2006 | US20060283836 Fabrication and use of polished silicon micro-mirrors |
| 12/21/2006 | US20060283835 Method of operating a plasma reactor chamber with respect to two plasma parameters selected from a group comprising ion density, wafer voltage, etch rate and wafer current, by controlling chamber parameters of source power and bias power |
| 12/21/2006 | US20060283771 Workpiece container assembly and apparatus for opening/closing the same |
| 12/21/2006 | US20060283710 Methods of and apparatus for making high aspect ratio microelectromechanical structures |
| 12/21/2006 | US20060283624 Method and apparatus for providing hermetic electrical feedthrough |
| 12/21/2006 | US20060283553 Plasma chamber insert ring |
| 12/21/2006 | US20060283552 Thermomechanical refining of wood chips; steaming to soften; high compression; destructuring and dewatering; dilution; feeding to rotating disc primary refiner with discs having an inner and outer ring pattern of bars and grooves; pressurized macerating screw includes expansion wall that flares |
| 12/21/2006 | US20060283485 Substrate treating apparatus and substrate treating method |
| 12/21/2006 | US20060283390 Semiconductor manufacturing apparatus enabling inspection of mass flow controller maintaining connection thereto |
| 12/21/2006 | US20060283372 Lithium tantalate substrate and method of manufacturing same |
| 12/21/2006 | US20060283354 Method of producing composition for forming dielectric film, composition for forming dielectric film, dielectric film and method of producing dielectric film |
| 12/21/2006 | US20060283092 Abrasive compounds for semiconductor planarization |
| 12/21/2006 | US20060283005 Conductive pattern and method of making |
| 12/21/2006 | US20060282999 Electrodes, inner layers, capacitors and printed wiring boards and methods of making thereof - part II |
| 12/21/2006 | DE19650802B4 Verfahren zur Herstellung einer Halbleitervorrichtung A process for producing a semiconductor device |
| 12/21/2006 | DE112004000573T5 Plasmagleichförmigkeit Plasma uniformity |
| 12/21/2006 | DE10334841B4 Herstellungsverfahren für einen Grabenkondensator mit einem Isolationskragen, der über einen vergrabenen Kontakt einseitig mit einem Substrat elektrisch verbunden ist, insbesondere für eine Halbleiterspeicherzelle Manufacturing method for a grave capacitor with an insulation collar, which is electrically connected through a buried contact on one side with a substrate, in particular for a semiconductor memory cell |
| 12/21/2006 | DE10330005B4 Vorrichtung zur Inspektion eines Wafers Apparatus for inspecting a wafer |
| 12/21/2006 | DE10318299B4 Verfahren zur Bildung einer Doppeldamaszener-Zwischenverbindung A method of forming a dual damascene interconnect |
| 12/21/2006 | DE10230715B4 Verfahren zur Herstellung eines Vertikaltransistors A method for producing a vertical transistor |
| 12/21/2006 | DE10223957B4 Ein verbessertes Verfahren zum Elektroplattieren von Kupfer auf einer strukturierten dielektrischen Schicht An improved method for electroplating copper on a patterned dielectric layer |
| 12/21/2006 | DE10223945B4 Verfahren zum Verbessern der Herstellung von Damaszener-Metallstrukturen A method for improving the manufacture of damascene metal structures |
| 12/21/2006 | DE102006028342A1 Semiconductor device e.g. insulated gate bipolar transistor, manufacture for e.g. microwave oven, involves providing device structure in main surface of substrate by optimizing silicon concentration and thickness of electrode |
| 12/21/2006 | DE102006016550A1 Feldeffekttransistoren mit vertikal ausgerichteten Gate-Elektroden und Verfahren zum Herstellen derselben Field effect transistors having vertically oriented gate electrodes and methods of making the same |
| 12/21/2006 | DE102006016327A1 Silicon carbide semiconductor device e.g. metal oxide semiconductor field effect transistor, manufacturing method, involves treating surface of silicon carbide semiconductor substrate with hydrogen in reaction furnace with reduced pressure |
| 12/21/2006 | DE102006015975A1 Multilevel semiconductor device manufacture involves depositing preliminary ohmic contact layer non-conformally in contact hole and depositing another preliminary ohmic contact layer conformally in contact hole |
| 12/21/2006 | DE102006011473A1 Verfahren zum MCP-Häusen für eine ausgeglichene Leistung A method for MCP-housings for balanced performance |
| 12/21/2006 | DE102005040596A1 Verfahren zur Entfernung einer dotierten Oberflächenschicht an Rückseiten von kristallinen Silizium-Solarwafern A process for the removal of a doped surface layer on back sides of crystalline silicon solar wafers |
| 12/21/2006 | DE102005028112A1 Verfahren zur Positionierung und Lageerhaltung von Substraten, insbesondere von dünnen Siliziumwafern nach dem Drahtsägen zu deren Vereinzelung A method for positioning and station keeping of substrates, especially of thin silicon wafers after wire sawing at their singulation |
| 12/21/2006 | DE102005027713A1 Halbleiterspeicherbauelement und Herstellungsverfahren The semiconductor memory device and manufacturing method |
| 12/21/2006 | DE102005026961A1 Substrate e.g. compact disc, treating device, has treatment arm with end that is movable by pivoting over surface of substrate, and transport device with transport arm that swivels about swivel axis, where arms swivel about same swivel axis |
| 12/21/2006 | DE102005026528A1 Halbleiterbauteil mit Medienkanal und Verfahren zur Herstellung desselben Of the same semiconductor device with media channel and methods for preparing |
| 12/21/2006 | DE102005026435B3 Eine Speicherkarte, ihre Herstellung und eine Mobiltelefonvorrichtung mit einer Speicherkarte A memory card, its preparation and a mobile phone device with a memory card |
| 12/21/2006 | DE102005019553B4 Verfahren zur Herstellung eines Gehäuses eines Halbleiterbauelements in Chipmaßstab auf Waferebene A method of manufacturing a housing of a semiconductor device in wafer-level chip scale |
| 12/21/2006 | DE102005008476B4 Leitbahnanordnung sowie zugehöriges Herstellungsverfahren Interconnect arrangement and manufacturing method thereof |
| 12/21/2006 | DE102004062835B4 Verfahren zum Bilden einer Dual-Damascene-Struktur A method of forming a dual damascene structure |
| 12/21/2006 | DE102004003341B4 Halbtonphasenmaske mit mehreren Transmissionen und Verfahren zu ihrer Herstellung Halbtonphasenmaske with several transmissions and processes for their preparation |
| 12/21/2006 | DE10014315B4 Verfahren zum Herstellen eines Halbleiterspeichers A method of manufacturing a semiconductor memory |
| 12/21/2006 | CA2612283A1 Method for manufacturing a micromechanical motion sensor, and a micromechanical motion sensor |
| 12/20/2006 | EP1734647A1 Semiconductor device and module using the same |
| 12/20/2006 | EP1734586A1 Method for manufacturing semiconductor device |
| 12/20/2006 | EP1734582A1 Integrated circuit and method for manufacturing an integrated circuit |
| 12/20/2006 | EP1734580A2 Wiring board with core board having a ceramic sub-core and method for manufacturing the same |
| 12/20/2006 | EP1734576A1 Semiconductor device having through electrode and method of manufacturing the same |
| 12/20/2006 | EP1734575A1 Method for manufacturing simox wafer and simox wafer |
| 12/20/2006 | EP1734574A1 Method and apparatus for transporting a substrate using non-newtonian fluid |
| 12/20/2006 | EP1734573A1 Thin-plate supporting container |