Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
12/2006
12/21/2006WO2006134897A1 Semiconductor integrated circuit device
12/21/2006WO2006134879A1 Method for manufacturing semiconductor device and computer storage medium
12/21/2006WO2006134862A1 Heat treatment apparatus
12/21/2006WO2006134855A1 Large glass substrate for photomask and method for producing same, computer readable recording medium, and method for exposing mother glass
12/21/2006WO2006134854A1 Image processing device, image drawing device, and system
12/21/2006WO2006134825A1 Gold alloy wire for use as bonding wire exhibiting high initial bonding capability, high bonding reliability, high circularity of press bonded ball, high straight advancing property, high resin flow resistance and low specific resistance
12/21/2006WO2006134824A1 Gold alloy wire for use as bonding wire exhibiting high initial bonding capability, high bonding reliability, high circularity of press bonded ball, high straight advancing property and high resin flow resistance
12/21/2006WO2006134823A1 Gold alloy wire for use as bonding wire exhibiting high bonding reliability, high circularity of press bonded ball, high straight advancing property and high resin flow resistance
12/21/2006WO2006134814A1 Compound, positive resist composition, and method of forming resist pattern
12/21/2006WO2006134811A1 Polyhydric phenol compound, compound, positive resist composition, and method of forming resist pattern
12/21/2006WO2006134806A1 Positive resist composition and method of forming resist pattern
12/21/2006WO2006134785A1 Laser irradiation method and device thereof
12/21/2006WO2006134779A1 Quartz glass tool for heat treatment of silicon wafer and process for producing the same
12/21/2006WO2006134765A1 Method for production of silicon carbide layer, gallium nitride semiconductor device and silicon substrate
12/21/2006WO2006134761A1 Drawing device and drawing method
12/21/2006WO2006134760A1 Aligner
12/21/2006WO2006134743A1 Ruthenium-alloy sputtering target
12/21/2006WO2006134739A1 Positive resist composition and method of forming resist pattern
12/21/2006WO2006134737A1 Metal oxide film, laminate, metal member and process for producing the same
12/21/2006WO2006134724A1 Ultrahigh-purity copper and process for producing the same, and bonding wire comprising ultrahigh-purity copper
12/21/2006WO2006134709A1 Substrate transfer apparatus
12/21/2006WO2006134689A1 Semiconductor device, method for fabricating an electrode, and method for manufacturing a semiconductor device
12/21/2006WO2006134664A1 Semiconductor device and method for manufacturing same
12/21/2006WO2006134662A1 Thin film measuring apparatus, thin film measuring method and thin film manufacturing method
12/21/2006WO2006134643A1 Semiconductor device and method for manufacturing same
12/21/2006WO2006134289A1 Method for controlling the pressure in a process chamber
12/21/2006WO2006134233A1 Method for manufacturing a micromechanical motion sensor, and a micromechanical motion sensor
12/21/2006WO2006134216A2 Circuit board structure and method for manufacturing a circuit board structure
12/21/2006WO2006134206A2 Functionalized silane monomers with bridging hydrocarbon group and siloxane polymers of the same
12/21/2006WO2006134205A1 Method for producing a polymer for semiconductor optoelectronics comprising polymerizing functionalized silane monomers with bridging hydrocarbon group
12/21/2006WO2006134119A1 Method for maintaining stress in an etched island in a stressed thin film and structure obtained by implementing said method
12/21/2006WO2006133798A1 Device and method for positioning and blocking thin substrates on a cut substrate block
12/21/2006WO2006133695A1 Method for the removal of doped surface layers on the back faces of crystalline silicon solar wafers
12/21/2006WO2006122025B1 Process for minimizing electromigration in an electronic device
12/21/2006WO2006105077A3 Low voltage thin film transistor with high-k dielectric material
12/21/2006WO2006104926A3 Asymmetric bidirectional transient voltage suppressor and method of forming same
12/21/2006WO2006104877A3 Method for reducing dielectric overetch using a dielectric etch stop at a planar surface
12/21/2006WO2006088527A3 A semiconductor substrate processing method
12/21/2006WO2006086300A3 Control of process gases in specimen surface treatment system using plasma
12/21/2006WO2006083928A3 Apparatus and method for modifying an object
12/21/2006WO2006043000A3 Method for transferring at least one micrometer or millimetre-sized object by means of a polymer handle
12/21/2006WO2006037056A3 Stacked die module
12/21/2006WO2006036548A3 Method of forming a semiconductor package and structure thereof
12/21/2006WO2006033838A3 Poly-silicon-germanium gate stack and method for forming the same
12/21/2006WO2006015254A3 Quick swap load port
12/21/2006WO2005114715A8 Method for cleaning substrate surface
12/21/2006WO2005102872A3 Substrate container with fluid-sealing flow passageway
12/21/2006WO2005057622A3 Structure and method for iii-nitride device isolation
12/21/2006WO2005055281A3 Flexible electronics using ion implantation to adhere polymer substrate to single crystal silicon substrate
12/21/2006WO2005045997A3 An electrical circuit assembly with improved shock resistance
12/21/2006WO2005041366A3 Quantum dot structures
12/21/2006WO2005027192A3 Structure and method of making strained channel cmos transistors having lattice-mismatched epitaxial extension and source and drain regions
12/21/2006WO2004073849A3 Sub-atmospheric pressure delivery of liquids, solids and low vapor pressure gases
12/21/2006US20060288324 Semiconductor device, and design method, inspection method, and design program therefor
12/21/2006US20060288321 Method for computer aided design of semiconductor integrated circuits
12/21/2006US20060287208 Methods of Forming Corrosion-Inhibiting Cleaning Compositions for Metal Layers and Patterns on Semiconductor Substrates
12/21/2006US20060287200 Substrate processing system and substrate processing method
12/21/2006US20060286828 Contact Structures Comprising A Core Structure And An Overcoat
12/21/2006US20060286820 Method for treating substrates and films with photoexcitation
12/21/2006US20060286819 Method for silicon based dielectric deposition and clean with photoexcitation
12/21/2006US20060286818 Method for silicon based dielectric chemical vapor deposition
12/21/2006US20060286817 Cvd method for forming silicon nitride film
12/21/2006US20060286816 Method for fabricating semiconductor device and semiconductor device
12/21/2006US20060286815 Interlayer insulating film formation method and film structure of interlayer insulating film
12/21/2006US20060286814 Semiconductor device and method of fabricating the same
12/21/2006US20060286813 Silica and silica-like films and method of production
12/21/2006US20060286812 Modification of semiconductor surfaces in a liquid
12/21/2006US20060286811 Method of optically imaging and inspecting a wafer in the context of edge bead removal
12/21/2006US20060286810 Atomic layer deposition (ALD) method and reactor for producing a high quality layer
12/21/2006US20060286809 Method for etching a patterned silicone layyer
12/21/2006US20060286808 System and method of processing substrates using sonic energy having cavitation control
12/21/2006US20060286807 Use of active temperature control to provide emmisivity independent wafer temperature
12/21/2006US20060286806 Plasma etching method and plasma etching apparatus
12/21/2006US20060286805 Planarization process for pre-damascene structure including metal hard mask
12/21/2006US20060286804 Method for forming patterned material layer
12/21/2006US20060286803 Method for activating nitride surfaces for amine-reactive chemistry
12/21/2006US20060286802 Low work function metal alloy
12/21/2006US20060286801 Process chamber assembly and apparatus for processing a substrate
12/21/2006US20060286800 Method for adhesion and deposition of metal films which provide a barrier and permit direct plating
12/21/2006US20060286799 Electrode structure for flexible display device and method for forming the same
12/21/2006US20060286798 Cap for semiconductor device package, and manufacturing method thereof
12/21/2006US20060286797 Grain boundary blocking for stress migration and electromigration improvement in CU interconnects
12/21/2006US20060286796 Method of forming a contact in a flash memory device
12/21/2006US20060286795 Method of manufacturing semiconductor device
12/21/2006US20060286794 Stacked structure for forming damascene structure, method of fabricating the stacked structure, and damascene process
12/21/2006US20060286793 Stacked structure for forming damascene structure, method of fabricating the stacked structure, and damascene process
12/21/2006US20060286792 Dual damascene process
12/21/2006US20060286791 Semiconductor wafer package and manufacturing method thereof
12/21/2006US20060286790 Method of manufacturing a semiconductor device
12/21/2006US20060286789 Semiconductor device having through electrode and method of manufacturing the same
12/21/2006US20060286788 Method for making a wire nanostructure in a semiconductor film
12/21/2006US20060286787 Method of manufacturing semiconductor device and semiconductor device
12/21/2006US20060286786 Method and apparatus for increase strain effect in a transistor channel
12/21/2006US20060286785 A Stretchable Form of Single Crystal Silicon for High Performance Electronics on Rubber Substrates
12/21/2006US20060286784 Method for implantation of high dopant concentrations in wide band gap materials
12/21/2006US20060286783 Post-ion implant cleaning for silicon on insulator substrate preparation
12/21/2006US20060286782 Layer Growth Using Metal Film and/or Islands
12/21/2006US20060286781 Crystal imprinting methods for fabricating subsrates with thin active silicon layers
12/21/2006US20060286780 Method for forming silicon thin-film on flexible metal substrate
12/21/2006US20060286779 Patterned Silicon-on-Insulator layers and methods for forming the same