Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
12/2006
12/20/2006EP1734572A1 Method of evaluating crystal defect of silicon wafer
12/20/2006EP1734571A1 Thermal processing equipment calibration method
12/20/2006EP1734570A1 Method for packaging electronic component
12/20/2006EP1734569A1 Process for producing semiconductor module
12/20/2006EP1734568A2 Method of fabricating an insulated transistor having a strained channel
12/20/2006EP1734567A1 Method and apparatus for cleaning a substrate using non-newtonian fluids
12/20/2006EP1734566A2 Method of manufacturing nano scale semiconductor device using nano particles
12/20/2006EP1734565A1 Method for manufacturing semiconductor wafer and semiconductor wafer manufactured by such method
12/20/2006EP1734564A1 Vertical heat treatment system and method for transferring substrate
12/20/2006EP1734409A2 Lithographic apparatus and controllable patterning device utilizing a spatial light modulator with distributed digital to analog conversion
12/20/2006EP1734392A2 Laser production and product qualification via accelerated life testing based on statistical modeling
12/20/2006EP1734357A2 Damage evaluation method and production method of compound semiconductor member
12/20/2006EP1734151A1 A method and system for metalorganic chemical vapour deposition (MOCVD) and annealing of lead germanite (PGO) thin films films
12/20/2006EP1734032A1 Calixresorcinarene compounds, photoresist base materials, and compositions thereof
12/20/2006EP1733853A1 Vacuum suction unit
12/20/2006EP1733803A1 Viscous fluid application device
12/20/2006EP1733465A1 Reciprocating drive system for scanning a workpiece
12/20/2006EP1733438A1 Laser patterning of light emitting devices and patterned light emitting devices
12/20/2006EP1733431A1 Trench semiconductor device and method of manufacturing it
12/20/2006EP1733430A1 A bipolar junction transistor having a high germanium concentration in a silicon-germanium layer and a method for forming the bipolar junction transistor
12/20/2006EP1733429A1 Limiter and semiconductor device using the same
12/20/2006EP1733426A2 Buried-contact solar cells with self-doping contacts
12/20/2006EP1733425A1 Method for integrating sige npn and vertical pnp devices on a substrate and related structure
12/20/2006EP1733424A1 A semiconductor apparatus
12/20/2006EP1733423A1 Heat treatment for improving the quality of a taken thin layer
12/20/2006EP1733422A1 Plasma chamber having plasma source coil and method for etching the wafer using the same
12/20/2006EP1733421A2 Aqueous solution for removing post-etch residue
12/20/2006EP1733420A2 Semiconductor processing methods for forming electrical contacts, and semiconductor structures
12/20/2006EP1733419A1 Wafer scanning system with reciprocating rotary motion utilizing springs and counterweights
12/20/2006EP1733418A1 Method for the treatment of substrate surfaces
12/20/2006EP1733072A2 Remote chamber methods for removing surface deposits
12/20/2006EP1733071A2 Remote chamber methods for removing surface deposits
12/20/2006EP1733001A2 Composition useful for removal of bottom anti-reflection coatings from patterned ion-implanted photoresist wafers
12/20/2006EP1732999A2 Dispersion for the chemical-mechanical polishing of metal surfaces containing metal oxide particles and a cationic polymer
12/20/2006EP1732732A1 Methods and apparatuses for electrochemical-mechanical polishing
12/20/2006EP1732720A1 Pouring apparatus for molten metal and casting method
12/20/2006EP1521797A4 Antireflective silicon-containing compositions as hardmask layer
12/20/2006EP1497862B1 Semiconductor component comprising an integrated latticed capacitance structure
12/20/2006EP1430548B1 Manufacturing of non-volatile resistance variable devices and programmable memory cells
12/20/2006EP1385683B8 Substrate- layer cutting device and method associated therewith
12/20/2006EP1328970B1 Method for producing a dmos transistor
12/20/2006EP1266054B1 Graded thin films
12/20/2006EP1218934B1 Method for determining the endpoint of etch process steps
12/20/2006EP1097470B1 Infra-red transparent thermal reactor cover member
12/20/2006EP1086520B1 Protective circuit for electronic modules, especially driver modules
12/20/2006EP0988650B1 Method of manufacturing semiconductor devices with "chip size package"
12/20/2006EP0750340B1 Nitrogen gas supply system
12/20/2006CN2849970Y 半导体结构 Semiconductor structure
12/20/2006CN2849959Y Replaceable gas nozzle for semiconductor processing
12/20/2006CN2849953Y Pneumatic central controlled multi-point safety lock device
12/20/2006CN2848367Y Dual gas faceplate for showerhead in semiconductor wafer processing system
12/20/2006CN1883054A NROM flash memory devices on ultrathin silicon
12/20/2006CN1883051A IGBT cathode design with improved safe operating area capability
12/20/2006CN1883049A Testing apparatus and method for determining an etch bias associated with a semiconductor-processing step
12/20/2006CN1883048A Customized microelectronic device and method for making customized electrical interconnections
12/20/2006CN1883047A Apparatus and method for split gate NROM memory
12/20/2006CN1883046A Charge-trapping memory device and methods for operating and manufacturing the cell
12/20/2006CN1883045A Method for preventing an increase in contact hole width during contact formation
12/20/2006CN1883044A Semiconductor surface protecting sheet and method
12/20/2006CN1883043A Electronic component manufacturing method
12/20/2006CN1883042A Semiconductor device with silicided source/drains
12/20/2006CN1883041A Self aligned damascene gate
12/20/2006CN1883040A Method for improving transistor performance through reducing the salicide interface resistance
12/20/2006CN1883039A Method of forming a low voltage gate oxide layer and tunnel oxide layer in an EEPROM cell
12/20/2006CN1883038A Method of forming dielectric layers with low dielectric constants
12/20/2006CN1883037A Plasma processing method and plasma processing apparatus
12/20/2006CN1883036A Notch-free etching of high aspect SOI structures using a time division multiplex process and RF bias modulation
12/20/2006CN1883035A Substrate cleaning method, substrate cleaning apparatus and computer-readable recording medium
12/20/2006CN1883034A Ultrasonic assisted etch using corrosive liquids
12/20/2006CN1883033A Protecting thin semiconductor wafers during back-grinding in high-volume production
12/20/2006CN1883032A Process for producing silicon epitaxial wafer
12/20/2006CN1883031A Method of producing a plate-shaped structure, in particular, from silicon, use of said method and plate-shaped structure thus produced, in particular from silicon
12/20/2006CN1883030A Method and apparatus for printing patterns with improved CD uniformity
12/20/2006CN1883029A Light flux conversion element, lighting optical device, exposure system, and exposure method
12/20/2006CN1882720A Method of producing self-supporting substrates comprising iii-nitrides by means of heteroepitaxy on a sacrificial layer
12/20/2006CN1882719A Improved copper bath for electroplating fine circuitry on semiconductor chips
12/20/2006CN1882432A Method of embossing cured silicone resin substrates
12/20/2006CN1882425A Vacuum suction head, and vacuum suction device and table using the same
12/20/2006CN1882398A Exhaust gas treatment
12/20/2006CN1882397A Cleaning masks
12/20/2006CN1882241A Component mounting apparatus including a demagnetizing device and method thereof
12/20/2006CN1882217A 等离子体处理装置 Plasma processing apparatus
12/20/2006CN1881625A Method for MOCVD growth nitride light-emitting diode structure extension sheet
12/20/2006CN1881619A 半导体器件 Semiconductor devices
12/20/2006CN1881618A 便携式信息终端 A portable information terminal
12/20/2006CN1881617A Display device and method for manufacturing same
12/20/2006CN1881615A Electrically erasable programmable read only memory (eeprom) cell and method for making the same
12/20/2006CN1881614A Mosfet-type semiconductor device, and method of manufacturing the same
12/20/2006CN1881612A Semiconductor device with trench structure and method for manufacturing same
12/20/2006CN1881611A Semiconductor device with trench structure and method for manufacturing same
12/20/2006CN1881610A 半导体器件 Semiconductor devices
12/20/2006CN1881609A Electro-optical device and electronic device
12/20/2006CN1881607A Semiconductor device and manufacturing method thereof
12/20/2006CN1881603A CMOS image sensor and method for fabrication thereof
12/20/2006CN1881602A A touching microlens structure for a pixel sensor and method of fabrication
12/20/2006CN1881601A Image sensor and pixel having an optimized floating diffusion
12/20/2006CN1881598A Electromagnetic radiation detection device, radiation detection device and system, and laser processing method
12/20/2006CN1881596A Semiconductor device and a method of manufacturing the same
12/20/2006CN1881595A Semiconductor device and its manufacturing method
12/20/2006CN1881594A Semiconductor device and its manufacturing method