Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
11/2007
11/01/2007WO2007024774A3 Apparatus and methods for high-density chip connectivity
11/01/2007WO2007024277A3 Method of transferring a thin crystalline semiconductor layer
11/01/2007WO2007011613A3 Method of protecting a bond layer in a substrate support adapted for use in a plasma processing system
11/01/2007WO2006130696A3 Technique for the growth and fabrication of semipolar (ga,al,in,b)n thin films, heterostructures, and devices
11/01/2007WO2006130410A3 Active material emitting device
11/01/2007WO2006105195A3 Transfer chamber between workstations
11/01/2007WO2006104670A3 Treatment of a dielectric layer using supercritical co2
11/01/2007WO2006093631A3 Method of making a nitrided gate dielectric
11/01/2007WO2006078740A3 Structure and method to optimize strain in cmosfets
11/01/2007WO2004068540A3 Hardmask with high selectivity for ir barriers for ferroelectric capacitor manufacturing
11/01/2007WO2004063698A3 System for detection of wafer defects
11/01/2007US20070255988 Computer-aided design (CAD) multiple-capture DFT system for detecting or locating crossing clock-domain faults
11/01/2007US20070255983 Semiconductor integrated circuit and electronic device
11/01/2007US20070255513 Inspecting method, inspecting apparatus, and method of manufacturing semiconductor device
11/01/2007US20070255442 Process fault analyzer and method and storage medium
11/01/2007US20070254565 Substrate polishing apparatus
11/01/2007US20070254558 Polishing Apparatus and Polishing Method
11/01/2007US20070254557 Polishing state monitoring apparatus and polishing apparatus and method
11/01/2007US20070254494 Faceplate with rapid temperature change
11/01/2007US20070254493 Integrated thermal unit having vertically arranged bake and chill plates
11/01/2007US20070254492 Technique for forming a silicon nitride layer having high intrinsic compressive stress
11/01/2007US20070254491 Protective layer for a low k dielectric film and methods of forming the same
11/01/2007US20070254490 Method of Making a Microelectronic and/or Optoelectronic Circuitry Sheet
11/01/2007US20070254489 Method for removing a halogen-containing residue
11/01/2007US20070254488 Methods for forming roughened surfaces and applications thereof
11/01/2007US20070254487 Submicron device fabrication
11/01/2007US20070254486 Plasma etch process with separately fed carbon-lean and carbon-rich polymerizing etch gases in independent inner and outer gas injection zones
11/01/2007US20070254485 Abrasive composition for electrochemical mechanical polishing
11/01/2007US20070254484 Substantially spherical composite ceria/titania particles
11/01/2007US20070254483 Plasma etch process using polymerizing etch gases and an inert diluent gas in independent gas injection zones to improve etch profile or etch rate uniformity
11/01/2007US20070254482 Method and system for manufacturing a semiconductor device
11/01/2007US20070254481 Method for forming tungsten materials during vapor deposition processes
11/01/2007US20070254480 Semiconductor device and method of manufacturing the same
11/01/2007US20070254479 Method for forming self-aligned metal silicide contacts
11/01/2007US20070254478 Silicide gate field effect transistors and methods for fabrication thereof
11/01/2007US20070254477 Film forming method, fabrication process of semiconductor device, computer-readable recording medium and sputtering apparatus
11/01/2007US20070254476 Cleaning porous low-k material in the formation of an interconnect structure
11/01/2007US20070254475 Semiconductor device with a barrier layer and a metal layer
11/01/2007US20070254474 Method for manufacturing a semiconductor device
11/01/2007US20070254473 Method for fabricating semiconductor device
11/01/2007US20070254472 Manufacturing method of semiconductor device and semiconductor storage device including fine contact holes
11/01/2007US20070254471 Semiconductor device and manufacturing method thereof
11/01/2007US20070254470 Method for fabricating a semiconductor device having a repair fuse
11/01/2007US20070254469 Surface Mounting Method
11/01/2007US20070254468 Lithography transfer for high density interconnect circuits
11/01/2007US20070254467 Hexagonal array structure for ball grid array packages
11/01/2007US20070254466 Method for fabricating semiconductor device
11/01/2007US20070254465 Method of fabricating recess channel in semiconductor device
11/01/2007US20070254464 Method and structure to reduce contact resistance on thin silicon-on-insulator device
11/01/2007US20070254463 Semiconductor device and method of manufacturing the same
11/01/2007US20070254462 Method and apparatus for doping semiconductors
11/01/2007US20070254461 Transistor having an embedded tensile strain layer with reduced offset to the gate electrode and a method for forming the same
11/01/2007US20070254460 Method for introducing impurities and apparatus for introducing impurities
11/01/2007US20070254459 Method of growing non-polar m-plane nitride semiconductor
11/01/2007US20070254458 Buffer-layer treatment of MOCVD-grown nitride structures
11/01/2007US20070254457 Technique for Stable Processing of Thin/Fragile Substrates
11/01/2007US20070254456 Method for manufacturing semiconductor device
11/01/2007US20070254455 Semiconductor integrated circuit, manufacturing method thereof, and semiconductor device using semiconductor integrated circuit
11/01/2007US20070254454 Process for bonding and electrically connecting microsystems integrated in several distinct substrates
11/01/2007US20070254453 Method of Improving a Shallow Trench Isolation Gapfill Process
11/01/2007US20070254452 Mask structure for manufacture of trench type semiconductor device
11/01/2007US20070254451 Process for forming a silicon-based single-crystal portion
11/01/2007US20070254450 Process for forming a silicon-based single-crystal portion
11/01/2007US20070254449 Tunable temperature coefficient of resistance resistors and method of fabricating same
11/01/2007US20070254448 Integrated circuit with inductor having horizontal magnetic flux lines
11/01/2007US20070254447 Decoupled pocket and LDD formation
11/01/2007US20070254446 Self-aligned biopolar junction transistors
11/01/2007US20070254445 Method of forming nitride film and nitride structure
11/01/2007US20070254444 A semiconductor device having stressed etch stop layers of different intrinsic stress in combination with pn junctions of different design in different device regions
11/01/2007US20070254443 Method for reducing overlap capacitance in field effect transistors
11/01/2007US20070254442 Vertical device with sidewall spacer, methods of forming sidewall spacers and field effect transistors, and patterning method
11/01/2007US20070254441 Method of forming a field effect transistor
11/01/2007US20070254440 Thermal oxidation of a sige layer and applications thereof
11/01/2007US20070254439 Method for making semiconductor transistor
11/01/2007US20070254438 Double gated transistor and method of fabrication
11/01/2007US20070254437 Method for reducing silicide defects by removing contaminants prior to drain/source activation
11/01/2007US20070254436 Flash memory and methods of fabricating the same
11/01/2007US20070254435 Method for forming a semiconductor device having a fin an structure thereof
11/01/2007US20070254434 Semiconductor device and manufacturing method thereof
11/01/2007US20070254433 Method of fabricating flash memory device
11/01/2007US20070254432 Semiconductor device and manufacturing method thereof
11/01/2007US20070254431 Nitride semiconductor device
11/01/2007US20070254430 A trench capacitor and method for fabricating the same
11/01/2007US20070254429 Display device and manufacturing method thereof
11/01/2007US20070254428 Integrated circuit including resistivity changing memory cells
11/01/2007US20070254427 Method for fabricating semiconductor
11/01/2007US20070254426 Method of manufacturing a semiconductor integrated circuit and semiconductor integrated circuit
11/01/2007US20070254425 Methods of fabricating a semiconductor device
11/01/2007US20070254424 Method for fabricating CMOS image sensor with plasma damage-free photodiode
11/01/2007US20070254423 High performance stress-enhance mosfet and method of manufacture
11/01/2007US20070254422 High performance stress-enhance mosfet and method of manufacture
11/01/2007US20070254421 Metal oxide semiconductor field effect transistor and method of fabrication thereof
11/01/2007US20070254420 Source/drain implantation and channel strain transfer using different sized spacers and related semiconductor device
11/01/2007US20070254419 Semiconductor device and method for fabricating the same
11/01/2007US20070254418 Methods of fabricating nitride-based transistors with a cap layer and a recessed gate
11/01/2007US20070254417 Method of fabricating a semiconductor device having a capacitor
11/01/2007US20070254416 Manufacturing method for semiconductor device
11/01/2007US20070254415 Thin film transistor substrate, method of manufacturing the same and method of manufacturing liquid crystal display panel including the same
11/01/2007US20070254414 Method of manufacturing semiconductor device, and semiconductor device
11/01/2007US20070254413 CCD with improved charge transfer
1 ... 2823 2824 2825 2826 2827 2828 2829 2830 2831 2832 2833 2834 2835 2836 2837 2838 2839 2840 2841 2842 2843 ... 6590