Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
03/2008
03/04/2008US7339207 Semiconductor device including a group III-V nitride semiconductor
03/04/2008US7339205 Gallium nitride materials and methods associated with the same
03/04/2008US7339204 Backside contact for touchchip
03/04/2008US7339203 Thyristor and method of manufacture
03/04/2008US7339195 Semiconductor light emitting device, its manufacturing method, semiconductor device and its manufacturing method
03/04/2008US7339193 Dual panel-type organic electroluminescent display device and method of fabricating the same
03/04/2008US7339191 Capacitors having doped aluminum oxide dielectrics
03/04/2008US7339188 Polycrystalline silicon film containing Ni
03/04/2008US7339187 Transistor structures
03/04/2008US7339185 Phase change memory device and method for forming the same
03/04/2008US7339109 Apparatus and method for optimizing the efficiency of germanium junctions in multi-junction solar cells
03/04/2008US7338913 Semiconductor device, manufacturing method thereof, and electronic device
03/04/2008US7338911 Method for etching and for forming a contact hole using thereof
03/04/2008US7338910 Method of fabricating semiconductor devices and method of removing a spacer
03/04/2008US7338909 Micro-etching method to replicate alignment marks for semiconductor wafer photolithography
03/04/2008US7338908 Method for fabrication of semiconductor interconnect structure with reduced capacitance, leakage current, and improved breakdown voltage
03/04/2008US7338907 Selective etching processes of silicon nitride and indium oxide thin films for FeRAM device applications
03/04/2008US7338906 Method for fabricating semiconductor device
03/04/2008US7338905 Semiconductor device manufacture method
03/04/2008US7338904 Method for manufacturing single-side mirror surface wafer
03/04/2008US7338903 Sequential reducing plasma and inert plasma pre-treatment method for oxidizable conductor layer
03/04/2008US7338902 Epitaxial growth method and substrate for epitaxial growth
03/04/2008US7338901 Method of preparing a film layer-by-layer using plasma enhanced atomic layer deposition
03/04/2008US7338900 Method for forming tungsten nitride film
03/04/2008US7338899 Method of forming contact plug in semiconductor device
03/04/2008US7338898 MOS transistor and fabrication thereof
03/04/2008US7338897 Method of fabricating a semiconductor device having metal wiring
03/04/2008US7338896 Formation of deep via airgaps for three dimensional wafer to wafer interconnect
03/04/2008US7338895 Method for dual damascene integration of ultra low dielectric constant porous materials
03/04/2008US7338894 Semiconductor device having nitridated oxide layer and method therefor
03/04/2008US7338893 Integration of pore sealing liner into dual-damascene methods and devices
03/04/2008US7338892 Circuit carrier and manufacturing process thereof
03/04/2008US7338891 Semiconductor chip, mounting structure thereof, and methods for forming a semiconductor chip and printed circuit board for the mounting structure thereof
03/04/2008US7338890 Low fabrication cost, high performance, high reliability chip scale package
03/04/2008US7338889 Method of improving copper interconnects of semiconductor devices for bonding
03/04/2008US7338888 Method for manufacturing a semiconductor device having a silicided gate electrode and a method for manufacturing an integrated circuit including the same
03/04/2008US7338887 Plasma control method and plasma control apparatus
03/04/2008US7338886 Implantation-less approach to fabricating strained semiconductor on isolation wafers
03/04/2008US7338885 Alignment mark and method for manufacturing a semiconductor device having the same
03/04/2008US7338884 Interconnecting substrate for carrying semiconductor device, method of producing thereof and package of semiconductor device
03/04/2008US7338883 Process for transferring a layer of strained semiconductor material
03/04/2008US7338882 Method of fabricating nano SOI wafer and nano SOI wafer fabricated by the same
03/04/2008US7338881 Method for manufacturing semiconductor element
03/04/2008US7338880 Method of fabricating a semiconductor device
03/04/2008US7338879 Method of fabricating a semiconductor device having dual stacked MIM capacitor
03/04/2008US7338878 Method for forming capacitor in semiconductor device
03/04/2008US7338876 Method for manufacturing a semiconductor device
03/04/2008US7338875 Method of fabricating a semiconductor device having a toroidal-like junction
03/04/2008US7338874 Highly integrated semiconductor device with silicide layer that secures contact margin and method of manufacturing the same
03/04/2008US7338873 Method of fabricating a field effect transistor structure with abrupt source/drain junctions
03/04/2008US7338872 Method of depositing a layer of a material on a substrate
03/04/2008US7338871 Method for fabricating semiconductor device
03/04/2008US7338870 Methods of fabricating semiconductor devices
03/04/2008US7338869 Semiconductor device and its manufacturing method
03/04/2008US7338868 Method for forming gate oxide layer in semiconductor device
03/04/2008US7338867 Semiconductor device having contact pads and method for manufacturing the same
03/04/2008US7338866 Strapping word lines of NAND memory devices
03/04/2008US7338865 Method for manufacturing dual work function gate electrodes through local thickness-limited silicidation
03/04/2008US7338864 Memory device and method for fabricating the same
03/04/2008US7338863 Semiconductor memory device and method of manufacturing the semiconductor memory device
03/04/2008US7338862 Methods of fabricating a single transistor floating body DRAM cell having recess channel transistor structure
03/04/2008US7338861 Nonvolatile memory device and method of manufacturing the same
03/04/2008US7338859 Non-volatile memory cells having floating gate and method of forming the same
03/04/2008US7338858 Methods of fabricating nonvolatile memory using a quantum dot
03/04/2008US7338857 Increasing adherence of dielectrics to phase change materials
03/04/2008US7338856 Double-doped polysilicon floating gate
03/04/2008US7338855 Method for fabricating semiconductor device
03/04/2008US7338854 Method for manufacturing multilayer ceramic capacitor
03/04/2008US7338853 High power radio frequency integrated circuit capable of impeding parasitic current loss
03/04/2008US7338852 Method of forming a semiconductor device having a capacitor and a resistor
03/04/2008US7338851 Diode/superionic conductor/polymer memory structure
03/04/2008US7338850 Method for manufacturing device isolation film of semiconductor device
03/04/2008US7338849 Methods of fabricating flash memory devices and flash memory devices fabricated thereby
03/04/2008US7338848 Method for opto-electronic integration on a SOI substrate and related structure
03/04/2008US7338847 Methods of manufacturing a stressed MOS transistor structure
03/04/2008US7338846 Fabricating method of pixel structure
03/04/2008US7338845 Fabrication method of a low-temperature polysilicon thin film transistor
03/04/2008US7338844 Method of manufacturing electro-optical device having a plurality of unit regions arranged in a matrix
03/04/2008US7338843 Method for producing an electronic component, especially a memory chip
03/04/2008US7338842 Process for exposing solder bumps on an underfill coated semiconductor
03/04/2008US7338841 Leadframe with encapsulant guide and method for the fabrication thereof
03/04/2008US7338840 Method of forming a semiconductor die with heat and electrical pipes
03/04/2008US7338839 Method for producing an electrical component
03/04/2008US7338838 Resin-encapsulation semiconductor device and method for fabricating the same
03/04/2008US7338837 Semiconductor packages for enhanced number of terminals, speed and power performance
03/04/2008US7338836 Method for integrating pre-fabricated chip structures into functional electronic systems
03/04/2008US7338835 OFETs with active channels formed of densified layers
03/04/2008US7338834 Strained silicon with elastic edge relaxation
03/04/2008US7338833 Dual dielectric structure for suppressing lateral leakage current in high fill factor arrays
03/04/2008US7338832 CMOS image sensor and method of fabricating the same
03/04/2008US7338831 Method of fabricating semiconductor probe with resistive tip
03/04/2008US7338830 Hollow dielectric for image sensor
03/04/2008US7338829 Semiconductor structures having through-holes sealed with feed through metalization
03/04/2008US7338828 Growth of planar non-polar {1 -1 0 0} m-plane gallium nitride with metalorganic chemical vapor deposition (MOCVD)
03/04/2008US7338827 Nitride semiconductor laser and method for fabricating the same
03/04/2008US7338826 Silicon nitride passivation with ammonia plasma pretreatment for improving reliability of AlGaN/GaN HEMTs
03/04/2008US7338825 Structure for optical device and method of fabricating the same
03/04/2008US7338823 Side-emitting LED package and manufacturing method of the same
03/04/2008US7338822 LED fabrication via ion implant isolation
03/04/2008US7338821 Method for the passivation of the mirror-faces surfaces of optical semi-conductor elements