Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
03/2008
03/04/2008US7338820 Laser patterning of encapsulated organic light emitting diodes
03/04/2008US7338819 System and method for matching chip and package terminals
03/04/2008US7338818 Systems and arrangements to assess thermal performance
03/04/2008US7338817 Body bias compensation for aged transistors
03/04/2008US7338815 Semiconductor device manufacturing method
03/04/2008US7338814 Method for fabricating ferroelectric capacitive element and ferroelectric capacitive element
03/04/2008US7338755 Forming a photosensitive layer on a substrate, selectively irradiating the photosensitive layer with at least one of an ultraviolet ray and an ionizing radiation; heat treatment; developing the photosensitive layer to remove irradiated area
03/04/2008US7338753 Forming a resin mold, interposing a photosensitive polymer forming layers, exposing the layered structure with an electron beam, ultraviolet radiation or visible radiaton, removing an exposed photosensitive polymer, and filling the vacant portion with a metal
03/04/2008US7338750 Capable of efficiently forming a resist pattern reduced in thickness
03/04/2008US7338742 Photoresist polymer and photoresist composition containing the same
03/04/2008US7338736 Method of fabricating a phase shift mask
03/04/2008US7338723 For a semiconductor production and/or inspection apparatus; the average concentration of free carbon in the work mounting portion is different from the average concentration of free carbon in the base layer
03/04/2008US7338610 Etching method for manufacturing semiconductor device
03/04/2008US7338581 Sputtering apparatus
03/04/2008US7338578 Step edge insert ring for etch chamber
03/04/2008US7338577 Inductively coupled plasma processing apparatus having internal linear antenna for large area processing
03/04/2008US7338576 Plasma processing device
03/04/2008US7338575 Hydrocarbon dielectric heat transfer fluids for microwave plasma generators
03/04/2008US7338555 Highly crystalline aluminum nitride multi-layered substrate and production process thereof
03/04/2008US7338353 Loading device for chemical mechanical polisher of semiconductor wafer
03/04/2008US7338275 Formation of discontinuous films during an imprint lithography process
03/04/2008US7338223 Developing method and apparatus for performing development processing properly and a solution processing method enabling enhanced uniformity in the processing
03/04/2008US7338202 Ultra-high temperature micro-electro-mechanical systems (MEMS)-based sensors
03/04/2008US7337939 Bonding apparatus
03/04/2008US7337792 Liquid processing apparatus and liquid processing method
03/04/2008US7337745 Electrode, susceptor, plasma processing apparatus and method of making the electrode and the susceptor
03/04/2008US7337666 Movable sensor device
03/04/2008US7337656 Surface characteristic analysis apparatus
03/04/2008US7337513 Method of making chip type solid electrolytic capacitor having a small size and a simple structure
03/04/2008CA2399384C Supporting multiple fpga configuration modes using dedicated on-chip processor
02/2008
02/28/2008WO2008024932A2 Hotwall reactor and method for reducing particle formation in gan mocvd
02/28/2008WO2008024792A1 Low-k damage avoidance during bevel etch processing
02/28/2008WO2008024783A2 Lithographically patterned nanowire electrodeposition
02/28/2008WO2008024674A1 Concentric gate nanotube transistor devices
02/28/2008WO2008024633A1 Process for regenerating electrolytes in electrochemical polishing applications
02/28/2008WO2008024587A2 A heterojunction bipolar transistor (hbt) with periodic multi layer base
02/28/2008WO2008024580A2 Small footprint modular processing system
02/28/2008WO2008024572A2 Superjunction trench device and method
02/28/2008WO2008024566A2 Overall defect reduction for pecvd films
02/28/2008WO2008024432A2 Laser separation of thin laminated glass substrates for flexible display applications
02/28/2008WO2008024322A1 Shielding floating gate tunneling element structure
02/28/2008WO2008024258A1 Method and apparatus for silicon-on-insulator material characterization
02/28/2008WO2008024200A1 System and method for fabricating a fin field effect transistor
02/28/2008WO2008024171A1 Dram transistor with recessed gates and methods of fabricating the same
02/28/2008WO2008024161A2 Integrated circuity, electromagnetic radiation interaction components, transistor devices and semiconductor constructions; and methoda of forming these
02/28/2008WO2008023974A1 Device for treating a plate-shaped substrate in a bath.
02/28/2008WO2008023858A1 Manufacturing methods of fine cerium oxide particles and its slurry for shallow trench isolation process of semiconductor
02/28/2008WO2008023849A1 Method for manufacturing semiconductor chip and method for processing semiconductor wafer
02/28/2008WO2008023821A1 Semiconductor and method for producing the same
02/28/2008WO2008023774A1 Method for producing nitride semiconductor and nitride semiconductor device
02/28/2008WO2008023766A1 Method for producing silicon carbide member
02/28/2008WO2008023756A1 Method for producing silicon carbide substrate and silicon carbide substrate
02/28/2008WO2008023754A1 Solution for removing residue after semiconductor dry process and method of removing the residue using the same
02/28/2008WO2008023753A1 Solution for removing residue after semiconductor dry process and method of removing the residue using the same
02/28/2008WO2008023750A1 Method of ion implantation and radiation-sensitive resin composition for use therein
02/28/2008WO2008023748A1 Method for oxide film formation and apparatus for the method
02/28/2008WO2008023738A1 Mis field effect transistor and method for manufacturing the same
02/28/2008WO2008023737A1 Semiconductor device and method for manufacturing the same
02/28/2008WO2008023730A1 Integrated circuit, electronic device and measuring method
02/28/2008WO2008023727A1 Soft x-ray shielding sheet used in soft x-ray electrostatic removal device and its manufacturing method
02/28/2008WO2008023711A1 Integrated gas panel apparatus
02/28/2008WO2008023701A1 Method for heat-treating silicon wafer
02/28/2008WO2008023700A1 Etching method, etching device, computer program, and recording medium
02/28/2008WO2008023697A1 Vapor phase growth system
02/28/2008WO2008023693A1 Coating developing machine, resist pattern forming device, coating developing method, resist pattern forming method, and storage medium
02/28/2008WO2008023687A1 SiC SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
02/28/2008WO2008023660A1 Mask pattern designing method and semiconductor device manufacturing method using the same
02/28/2008WO2008023635A1 SINGLE-CRYSTAL SiC AND PROCESS FOR PRODUCING THE SAME
02/28/2008WO2008023630A1 Method for manufacturing display device
02/28/2008WO2008023617A1 Semiconductor device manufacturing method
02/28/2008WO2008023614A1 Composition for removal of resist comprising poly(cyanoalkyl)ethyleneamine and method for removal of resist using the composition
02/28/2008WO2008023592A1 High-efficiency indirect transition semiconductor ultraviolet light-emitting element
02/28/2008WO2008023585A1 Method of treating substrate, process for manufacturing semiconductor device, substrate treating apparatus and recording medium
02/28/2008WO2008023560A1 Double arm robot
02/28/2008WO2008023555A1 Resist composition for liquid immersion lithography, and method for formation of resist pattern
02/28/2008WO2008023528A1 Semiconductor integrated circuit and evaluation circuit for semiconductor integrated circuit
02/28/2008WO2008023523A1 Method of forming thin film by microplasma processing and apparatus for the same
02/28/2008WO2008023487A1 Gate bias circuit
02/28/2008WO2008023460A1 Method for preventing contamination of reflection mirror for extreme ultraviolet light source, and exposure apparatus
02/28/2008WO2008023452A1 Adhesive tape, joint structure, and semiconductor package
02/28/2008WO2008023409A1 Method for manufacturing semiconductor device
02/28/2008WO2008023232A2 Buffer station for stocker system
02/28/2008WO2008023215A1 Post chemical mechanical polishing rinse formulation
02/28/2008WO2008023214A1 Rinse formulation for use in the manufacture of an integrated circuit
02/28/2008WO2008022901A2 Process for the collective manufacturing of electronic 3d modules
02/28/2008WO2008022712A1 Heat sink for semiconductor components or similar devices, and method for producing it
02/28/2008WO2008022671A1 Method for texturing silicon wafers for producing solar cells
02/28/2008WO2008022488A1 Schottky diode for sub-micro ic and method of making the same
02/28/2008WO2008022487A1 Method of manufacturing sti using self-aligned si3n4 as mask
02/28/2008WO2008022383A1 Thin-film solar module
02/28/2008WO2008011255A3 Systems and methods for laser processing during periods having non-constant velocities
02/28/2008WO2008008767A3 Methods of using ppar-gamma agonists and caspase-dependent chemotherapeutic agents for the treatment of cancer
02/28/2008WO2008005773A3 Cluster tool for advanced front-end processing
02/28/2008WO2007149113A9 Friction reducing aid for cmp
02/28/2008WO2007148277A3 Method of manufacturing a semiconductor device, and semiconductor device obtained by such a method
02/28/2008WO2007146964A3 Thin-film devices fromed from solid particles
02/28/2008WO2007144807A3 Double gate transistor and method of manufacturing same
02/28/2008WO2007143585A3 Residue free hardmask trim
02/28/2008WO2007143026A3 Linked periodic networks of alternating carbon and inorganic clusters for use as low dielectric constant materials
02/28/2008WO2007137073A3 Semiconductor device assembly with gap underfill
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