Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
02/2008
02/28/2008US20080048247 Semiconductor device and semiconductor device fabrication method
02/28/2008US20080048245 Semiconductor device and manufacturing methods thereof
02/28/2008US20080048244 linoleic acid to gamma-linolenic acid and alpha-linolenic acid to stearidonic acid; added to pharmaceuticals, nutritional compositions, animal feeds, cosmetics; host cell; polypeptide; vector; nucleic acid sequence
02/28/2008US20080048243 Nonvolatile semiconductor memory and manufacturing method thereof
02/28/2008US20080048241 Nonvolatile semiconductor memory device and fabrication method therefor
02/28/2008US20080048240 Printed Non-Volatile Memory
02/28/2008US20080048235 Capacitor structure and method for preparing the same
02/28/2008US20080048234 Semiconductor memory device and method for fabricating same
02/28/2008US20080048233 Methods for manufacturing a finfet using a conventional wafer and apparatus manufactured therefrom
02/28/2008US20080048232 Trench-capacitor dram device and manufacture method thereof
02/28/2008US20080048230 Semiconductor device and method for manufacturing the same
02/28/2008US20080048229 Method for fabricating metallic bit-line contacts
02/28/2008US20080048228 Semiconductor device and method for manufacturing same
02/28/2008US20080048226 Direct cell via structures for ferroelectric random access memory devices and methods of fabricating such structures
02/28/2008US20080048224 Fabricating cmos image sensor
02/28/2008US20080048223 cmos image sensor and method of fabricating the same
02/28/2008US20080048219 Semiconductor Device Having Substrate-Driven Field-Effect Transistor and Schottky Diode and Method of Forming the Same
02/28/2008US20080048218 Method and flip chip structure for power devices
02/28/2008US20080048217 Semiconductor device and method of fabricating the same
02/28/2008US20080048216 Apparatus and method of forming metal oxide semiconductor field-effect transistor with atomic layer deposited gate dielectric
02/28/2008US20080048214 Junction field effect transistor and method of manufacturing the same
02/28/2008US20080048211 Trench isolated capacitive micromachined ultrasonic transducer arrays with a supporting frame
02/28/2008US20080048210 Semiconductor device and method for making the same
02/28/2008US20080048208 Electrostatic discharge protection device for an integrated circuit
02/28/2008US20080048207 Preparation method of a coating of gallium nitride
02/28/2008US20080048206 Vertical gallium nitride-based light emitting diode and method of manufacturing the same
02/28/2008US20080048200 LED with Phosphor Tile and Overmolded Phosphor in Lens
02/28/2008US20080048196 Component and Process for Manufacturing the Same
02/28/2008US20080048195 Gan-Based Light-Emitting Element and Method for Producing Same
02/28/2008US20080048189 Semiconductor Device and Method of Manufacturing the Same
02/28/2008US20080048188 Electronic devices integrated on a single substrate and method for fabricating the same
02/28/2008US20080048187 Semiconductor thin film, thin film transistor, method of manufacturing the semiconductor thin film, method of manufacturing the thin film transistor, and manufacturing device of semiconductor thin film
02/28/2008US20080048185 Field effect transistor and method of manufacturing the same
02/28/2008US20080048178 Tin phosphate barrier film, method, and apparatus
02/28/2008US20080048176 Semiconductor device and method for fabricating the same
02/28/2008US20080048171 Small electrode for phase change memories
02/28/2008US20080048170 Semiconductor memory device and fabrication method thereof
02/28/2008US20080048169 Heat-shielded low power pcm-based reprogrammable efuse device
02/28/2008US20080048164 Electro-resistance element, method of manufacturing the same and electro-resistance memory using the same
02/28/2008US20080048056 Fluid Discharging Device
02/28/2008US20080047934 Silicon wafer etching method and apparatus, and impurity analysis method
02/28/2008US20080047667 Substrate holding apparatus and substrate polishing apparatus
02/28/2008US20080047601 High Efficiency Solar Cells and Manufacturing Methods
02/28/2008US20080047600 Photoelectric conversion element and process thereof
02/28/2008US20080047582 Method and apparatus for wafer cleaning
02/28/2008US20080047490 Vapor deposition of benzotriazole (BTA) for protecting copper interconnects
02/28/2008US20080047366 Force sensor and method for producing the same
02/28/2008US20080047334 Scanning Microscope With Shape Correction Means
02/28/2008DE202005021435U1 Doppelseitige Prüfaufbauten Double-sided test setups
02/28/2008DE19951053B4 Kontaktierungsvorrichtung Contacting
02/28/2008DE19635722B4 Organisches Blei-, Magnesium- und Niobionen enthaltendes Sol (PMN-Sol) sowie Verfahren zur Herstellung dünner keramischer Schichten Organic lead, magnesium and niobium ion containing sol (PMN-Sol) and processes for preparing thin ceramic layers
02/28/2008DE112006000916T5 Gaslagerspindeln Gas bearing spindles
02/28/2008DE112006000411T5 Halbleiter-lichtemittierende-Vorrichtung und Verfahren zur Herstellung derselben A semiconductor light emitting device and method for manufacturing the same
02/28/2008DE112004001707T5 Substrataufbewahrungsbehälter Substrate storage box
02/28/2008DE10335460B4 Verfahren zum Betreiben einer CVD-Anlage A method of operating a CVD system
02/28/2008DE10256346B4 Halbleiterbauelement mit MIM-Kondensator und Zwischenverbindung und Herstellungsverfahren dafür A semiconductor device with MIM capacitor and the interconnect and production method thereof
02/28/2008DE10227346B4 Ferroelektrische Speichervorrichtung, die eine ferroelektrische Planarisationsschicht verwendet, und Herstellungsverfahren The ferroelectric memory device using a ferroelectric planarization layer, and production method
02/28/2008DE102007036540A1 Processing semiconductor wafers in processing chamber, involves selecting frequency for light source based on absorption characteristics of dielectric layer material, and irradiating the layer with light at the frequency to heat the layer
02/28/2008DE102007034182A1 Elektronische Gehäuse mit aufgerauhten Benetzungs- und Nicht-Benetzungs-Zonen Electronic housing with roughened wetting and non-wetting zones
02/28/2008DE102006039269A1 Dispersion von Aluminiumoxid, Beschichtungszusammensetzung und tintenaufnehmendes Medium Dispersion of aluminum oxide, the coating composition and ink-medium
02/28/2008DE102006038243A1 Verfahren und Einrichtung zum Handhaben eines Gegenstandes im Rahmen einer Halbleiterfertigung Method and apparatus for handling an object as part of a semiconductor manufacturing
02/28/2008DE102006037433A1 Verfahren zur Herstellung mindestens eines Mehrschichtkörpers sowie Mehrschichtkörper A process for preparing at least one multi-layer body as well as multi-layer body
02/28/2008DE102006028719A1 Halbleiterbauteil mit Halbleiterchipstapel und Verbindungselementen sowie Verfahren zur Herstellung des Halbleiterbauteils A semiconductor device comprising semiconductor chip stack, and connecting elements and processes for producing the semiconductor device
02/28/2008DE102006025715B3 Herstellungsverfahren für eine integrierte Halbleiterstruktur Manufacturing method of an integrated semiconductor structure
02/28/2008DE102005051492B4 Nichtflüchtiges Speicherbauelement mit Ladungseinfangstruktur und Herstellungsverfahren Non-volatile memory device with charge trapping and manufacturing processes
02/28/2008DE102005027459B4 Herstellungsverfahren für eine Halbleiterstruktur mit einer Mehrzahl von überstehend gefüllten Isolationsgräben Manufacturing method of a semiconductor structure having a plurality of protruding isolation trenches filled
02/28/2008DE102004053338B4 Reduktion einer Oxidschicht auf einer Oberfläche eines Siliziumhalbleiters Reducing an oxide film on a surface of a silicon semiconductor
02/28/2008DE102004034572B4 Verfahren zum Herstellen einer Struktur auf der Oberfläche eines Substrats A method of producing a structure on the surface of a substrate
02/28/2008DE10060665B4 Nichtflüchtiger ferroelektrischer Speicher und Verfahren zu dessen Herstellung A non-volatile ferroelectric memory and method for its production
02/28/2008DE10034263B4 Verfahren zur Herstellung eines Quasisubstrats Process for the preparation of a quasi substrate
02/28/2008CA2661015A1 Process for regenerating electrolytes in electrochemical polishing applications
02/27/2008EP1893001A2 Lamp fasteners for semiconductor processing reactors
02/27/2008EP1892766A1 Method for manufacturing a device having a structure with one or a plurality of SI and GE-based micro or nanowires, using germanium condensation
02/27/2008EP1892765A1 Method for doping a fin-based semiconductor device
02/27/2008EP1892759A2 Method for Fabricating dual-metal gate CMOS transistors
02/27/2008EP1892758A2 Manufacturing of flexible display device panel
02/27/2008EP1892757A1 High aspect ratio via etch
02/27/2008EP1892756A2 Electrostatic chuck with heater and manufacturing method thereof
02/27/2008EP1892755A2 Substrate Container Opener and Opener-Side Door Drive Mechanism Thereof
02/27/2008EP1892754A2 Method of electroplating solder bumps of uniform height on integrated circuit substrates
02/27/2008EP1892753A2 Printed non-volatile memory and manufacturing method thereof
02/27/2008EP1892752A1 Method of film formation and computer-readable storage medium
02/27/2008EP1892751A1 Laser irradiation method and device thereof
02/27/2008EP1892750A1 Method for doping a fin-based semiconductor device
02/27/2008EP1892725A2 Semiconductor integrated circuit and testing method of same
02/27/2008EP1892571A1 Method for managing light exposure mask and light exposure mask
02/27/2008EP1892537A2 Manufacturing method for magnetic sensor and lead frame therefor
02/27/2008EP1892323A1 Silicon single crystal growing method, silicon wafer and soi substrate using such silicon wafer
02/27/2008EP1892285A2 Cleaning composition, cleaning method, and manufacturing method of semiconductor device
02/27/2008EP1892046A1 Method of cleaning storage case
02/27/2008EP1891845A2 Circuit board structure and method for manufacturing a circuit board structure
02/27/2008EP1891683A1 Method for the removal of doped surface layers on the back faces of crystalline silicon solar wafers
02/27/2008EP1891678A2 Photocathode structure and operation
02/27/2008EP1891670A1 Method for producing vertical electrical contact connections in semiconductor wafers
02/27/2008EP1891669A2 Method of curing hydrogen silses quioxane and densification in nano-scale trenches
02/27/2008EP1891668A1 Method for manufacturing a micromechanical motion sensor, and a micromechanical motion sensor
02/27/2008EP1891667A1 Thin film transistors comprising zinc-oxide-based semiconductor materials
02/27/2008EP1891666A1 Thin film transistors comprising zinc-oxide-based semiconductor materials
02/27/2008EP1891665A2 Methods of etching nickel silicide and cobalt silicide and methods of forming conductive lines
02/27/2008EP1891664A1 Electrical connector with load bearing features