Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
03/2008
03/11/2008US7341924 Method for manufacturing semiconductor device
03/11/2008US7341923 Substrate, manufacturing method therefor, and semiconductor device
03/11/2008US7341922 Dry etching method, fabrication method for semiconductor device, and dry etching apparatus
03/11/2008US7341921 Photodiode
03/11/2008US7341920 Method for forming a bipolar transistor device with self-aligned raised extrinsic base
03/11/2008US7341919 Capacitor element, manufacturing method therefor, semiconductor device substrate, and semiconductor device
03/11/2008US7341918 Multi-state non-volatile integrated circuit memory systems that employ dielectric storage elements
03/11/2008US7341917 Solution deposition of chalcogenide films containing transition metals
03/11/2008US7341916 Self-aligned nanometer-level transistor defined without lithography
03/11/2008US7341915 Method of making planar double gate silicon-on-insulator structures
03/11/2008US7341914 Method for forming a non-volatile memory and a peripheral device on a semiconductor substrate
03/11/2008US7341913 Method of manufacturing non-volatile memory
03/11/2008US7341912 Split gate flash memory device having self-aligned control gate and method of manufacturing the same
03/11/2008US7341911 Method of making EEPROM transistor pairs for block alterable memory
03/11/2008US7341910 Method for forming a flash memory by using a microcrystalline polysilicon layer as a floating gate
03/11/2008US7341909 Methods of forming semiconductor constructions
03/11/2008US7341908 Semiconductor device and method of manufacturing the same
03/11/2008US7341907 Single wafer thermal CVD processes for hemispherical grained silicon and nano-crystalline grain-sized polysilicon
03/11/2008US7341906 Method of manufacturing sidewall spacers on a memory device, and device comprising same
03/11/2008US7341905 Method of making high-voltage bipolar/CMOS/DMOS (BCD) devices
03/11/2008US7341904 Capacitorless 1-transistor DRAM cell and fabrication method
03/11/2008US7341903 Method of forming a field effect transistor having a stressed channel region
03/11/2008US7341902 Finfet/trigate stress-memorization method
03/11/2008US7341901 Semiconductor processing methods of forming integrated circuitry
03/11/2008US7341900 Semiconductor device and method for manufacturing the same
03/11/2008US7341899 Method of fabricating a thin film transistor
03/11/2008US7341898 Thin film transistor circuit device, production method thereof and liquid crystal display using the thin film transistor circuit device
03/11/2008US7341897 Method of fabricating thin film transistor
03/11/2008US7341896 Method of manufacturing a vertical MOS transistor
03/11/2008US7341895 Thin film transistor substrate and fabricating method thereof
03/11/2008US7341894 Semiconductor, electrooptic apparatus and electronic apparatus
03/11/2008US7341893 Structure and method for thin film device
03/11/2008US7341892 Semiconductor memory cell and method of forming same
03/11/2008US7341891 Method for manufacturing a memory cell for modification of revision identifier in an integrated circuit chip
03/11/2008US7341889 Lead frame for semiconductor package and method of fabricating semiconductor package
03/11/2008US7341887 Integrated circuit die configuration for packaging
03/11/2008US7341886 Apparatus and method for forming vias
03/11/2008US7341885 CMOS image sensor and method for fabricating the same
03/11/2008US7341884 Thin-film microelectromechanical device fabrication process
03/11/2008US7341883 Silicon germanium semiconductive alloy and method of fabricating same
03/11/2008US7341882 Method for forming an opto-electronic device
03/11/2008US7341881 Methods of packaging and testing microelectronic imaging devices
03/11/2008US7341880 Light emitting device processes
03/11/2008US7341879 Method of manufacturing a point source light-emitting diode
03/11/2008US7341878 Wavelength-converted semiconductor light emitting device
03/11/2008US7341877 Calibration method in a chip mounting device
03/11/2008US7341876 Anti-parallel tab sensor fabrication
03/11/2008US7341875 Semiconductor memory device with a capacitor formed therein and a method for forming the same
03/11/2008US7341827 Separation-material composition for photo-resist and manufacturing method of semiconductor device
03/11/2008US7341822 capable of specifying a trajectory characterized as a mathematical smooth function to be followed by a substrate relative to a radiation beam comprising a position and/or an orientation as a function of time
03/11/2008US7341817 Acid generator of a specified fluoro-substituted arylsulfonic acid upon irradiation with an actinic ray or radiation; small post-exposure bake (PEB) temperature dependency and giving a good profile
03/11/2008US7341809 Photomask, method for manufacturing the same, and method for measuring optical characteristics of wafer exposure system using the photomask during operation
03/11/2008US7341787 doping silicon or germanium with group III compounds for p-type doping and to group V compounds for n-type doping, coating with an epitaxial layer and optionally having structures formed by electronic components; substrates having low electrical resistance
03/11/2008US7341786 Indium-containing wafer and method of its manufacture
03/11/2008US7341775 Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device
03/11/2008US7341764 Gas for plasma reaction, process for producing the same, and use
03/11/2008US7341673 Methods and apparatus for in situ substrate temperature monitoring by electromagnetic radiation emission
03/11/2008US7341649 Apparatus for electroprocessing a workpiece surface
03/11/2008US7341644 Method for predicting consumption of consumable part, method for predicting deposited-film thickness, and plasma processor
03/11/2008US7341642 Manufacturing method for electric device
03/11/2008US7341634 Apparatus for and method of processing substrate
03/11/2008US7341633 Apparatus for electroless deposition
03/11/2008US7341628 Method to reduce crystal defects particularly in group III-nitride layers and substrates
03/11/2008US7341441 Nanoprint equipment and method of making fine structure
03/11/2008US7341065 Single wafer cleaning method to reduce particle defects on a wafer surface
03/11/2008US7340972 Apparatus and method for balancing and for providing a compliant range to a test head
03/11/2008US7340828 Method for producing metal/ceramic bonding circuit board
03/11/2008US7340826 Method for producing an electronic device connected to a printed circuit board
03/06/2008WO2008027968A1 Method and apparatus for making semiconductor packages
03/06/2008WO2008027956A2 Continuous dopant addition
03/06/2008WO2008027890A2 Electro-optic lenses employing resistive electrodes
03/06/2008WO2008027845A2 Dopant activation in doped semiconductor substrates
03/06/2008WO2008027761A2 Method and apparatus for workpiece surface modification for selective material deposition
03/06/2008WO2008027680A1 Methods and tools for controlling the removal of material from microfeature workpieces
03/06/2008WO2008027593A2 Improved structure and method for fabrication of field effect transistor gates with or without field plates
03/06/2008WO2008027473A2 A transistor having a locally provided metal silicide region in contact areas and a method of forming the transistor
03/06/2008WO2008027471A1 A field effect transistor having a stressed contact etch stop layer with reduced conformality
03/06/2008WO2008027362A1 Measuring diffractive structures by parameterizing spectral features
03/06/2008WO2008027313A1 Lateral trench mosfet with direct trench polysilicon contact and method of forming the same
03/06/2008WO2008027305A2 Method of tuning thermal conductivity of electrostatic chuck support assembly
03/06/2008WO2008027265A2 Porous substrates, articles, systems and compositions comprising nanofibers and method of their use and production
03/06/2008WO2008027196A2 Dynamic surface annealing of implanted dopants with low temperature hdpcvd process for depositing a high extinction coefficient optical absorber layer
03/06/2008WO2008027147A1 Semiconductor constructions, and methods of forming semiconductor constructions and flash memory cells
03/06/2008WO2008027143A2 Semiconductor devices, assemblies and contructions, and methods of forming semiconductor devices, assemblies and constructions
03/06/2008WO2008027039A1 Improved z-axis motion system for a wire bonding machine
03/06/2008WO2008026924A1 Apparatus for carrying and transporting a product
03/06/2008WO2008026893A1 A method of antistatic deposition on components of mobile phone
03/06/2008WO2008026742A1 Mobile body drive method and mobile body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method
03/06/2008WO2008026739A1 Mobile body drive method and mobile body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method
03/06/2008WO2008026732A1 Mobile body drive system and mobile body drive method, pattern formation apparatus and method, exposure apparatus and method, device manufacturing method, and decision method
03/06/2008WO2008026731A1 Method and system for mounting circuit design on reconfigurable device
03/06/2008WO2008026712A1 Plasma generating method, organic material film etching method, negative ion generating method and oxidizing or nitriding treatment method
03/06/2008WO2008026709A1 Discharge lamp, light source apparatus, exposure apparatus and exposure apparatus manufacturing method
03/06/2008WO2008026593A1 Exposure apparatus, device production method, cleaning method, and cleaning member
03/06/2008WO2008026565A1 Electronic component taking out apparatus, surface mounting apparatus and method for taking out electronic component
03/06/2008WO2008026542A1 Etchant and etching process
03/06/2008WO2008026531A1 Method of plasma oxidation processing
03/06/2008WO2008026520A1 Semiconductor device and multilayer wiring board
03/06/2008WO2008026491A1 Thin film manufacturing apparatus using discharge electrode, and solar cell manufacturing method
03/06/2008WO2008026488A1 Polishing pad