Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
03/2008
03/18/2008US7344938 Method of fabricating memory
03/18/2008US7344936 Semiconductor wafer with a wiring structure, a semiconductor component, and methods for their production
03/18/2008US7344935 Method of manufacturing a semiconductor integrated circuit device
03/18/2008US7344934 CMOS transistor and method of manufacture thereof
03/18/2008US7344933 Method of forming device having a raised extension region
03/18/2008US7344932 Use of silicon block process step to camouflage a false transistor
03/18/2008US7344931 Semiconductor device, method of manufacturing the same, and electro-optical device
03/18/2008US7344930 Semiconductor device and manufacturing method thereof
03/18/2008US7344929 Method for manufacturing an integrated circuit using a capping layer having a degree of reflectivity
03/18/2008US7344928 Patterned-print thin-film transistors with top gate geometry
03/18/2008US7344927 Method and apparatus for manufacturing active matrix device including top gate type TFT
03/18/2008US7344926 Liquid crystal display device and method of manufacturing the same
03/18/2008US7344925 Semiconductor device, method of manufacturing the same, and method of designing the same
03/18/2008US7344924 Fuse structures, methods of making and using the same, and integrated circuits including the same
03/18/2008US7344923 NROM semiconductor memory device and fabrication method
03/18/2008US7344921 Integrated circuit device having reduced bow and method for making same
03/18/2008US7344920 Integrated circuit package and method for fabricating same
03/18/2008US7344919 Method for using gel package structure enhancing thermal dissipation between compressed printed circuit board and heat sink mechanical stiffener
03/18/2008US7344917 Method for packaging a semiconductor device
03/18/2008US7344916 Package for a semiconductor device
03/18/2008US7344915 Method for manufacturing a semiconductor package with a laminated chip cavity
03/18/2008US7344914 Organic semiconductor element having multi protection layers and process of making the same
03/18/2008US7344912 Method for patterning electrically conducting poly(phenyl acetylene) and poly(diphenyl acetylene)
03/18/2008US7344911 CMOS image sensor and method for fabricating the same
03/18/2008US7344910 Self-aligned photodiode for CMOS image sensor and method of making
03/18/2008US7344909 Method for producing semi-conducting devices and devices obtained with this method
03/18/2008US7344908 Atomic force microscope cantilever including field effect transistor and method for manufacturing the same
03/18/2008US7344907 Apparatus and methods for encapsulating microelectromechanical (MEM) devices on a wafer scale
03/18/2008US7344906 Structure and method for releasing stressy metal films
03/18/2008US7344905 Spatial bandgap modifications and energy shift of semiconductor structures
03/18/2008US7344903 Light emitting device processes
03/18/2008US7344902 Overmolded lens over LED die
03/18/2008US7344901 Hermetically sealed package and method of fabricating of a hermetically sealed package
03/18/2008US7344900 Laser scribe on front side of semiconductor wafer
03/18/2008US7344899 Die assembly and method for forming a die on a wafer
03/18/2008US7344898 Method for manufacturing semiconductor device
03/18/2008US7344897 Ferroelectric polymer memory structure and method therefor
03/18/2008US7344896 Ferromagnetic liner for conductive lines of magnetic memory cells and methods of manufacturing thereof
03/18/2008US7344827 Fine contact hole forming method employing thermal flow process
03/18/2008US7344826 Method for forming a capacitor
03/18/2008US7344825 Method of fabricating semiconductor device, and developing apparatus using the method
03/18/2008US7344822 Incompletely oxidized transition metal having oxygen content lower than stoichiometric oxygen content; selectively exposed and developed to pattern; resolution
03/18/2008US7344821 having high sensitivity and high resolution and being excellent in the pattern profile, line edge roughness, dissolution contrast, surface roughness and prevention of negative conversion
03/18/2008US7344808 Method of making photomask blank substrates
03/18/2008US7344806 Sputtering layers of phase shifting mask on substrates; concurrent discharging various targets; reducing defects
03/18/2008US7344805 Mask and method for producing thereof and a semiconductor device using the same
03/18/2008US7344754 Introducing a reactive gas into a space near a surface of a substrate to be processed is such a way as to prevent substantial deposition of the metal film, and depositing the metal film on the surface of the substrate from a gaseous phase including a metal carbonyl compound
03/18/2008US7344652 Plasma etching method
03/18/2008US7344603 Solvent for treating polysilazane and method of treating polysilazane with the solvent
03/18/2008US7344600 Substrate treatment apparatus
03/18/2008US7344597 Vapor-phase growth apparatus
03/18/2008US7344589 Solution/suspension of precursors of lead, zirconium and titanium, which do not undergo ligand exchange (2,2,6,6-tetramethyl-3,5-heptanedione complexes); vaporized including Ar, N2, H2, He, or NH3 as a carrier and O2, N2O, or O3 as an oxidizing reactant
03/18/2008US7344579 Pipe trap
03/18/2008US7344431 Pad assembly for electrochemical mechanical processing
03/18/2008US7344350 Transporting apparatus with air-supplying support means and drive-force application means
03/18/2008US7344061 Multi-functional solder and articles made therewith, such as microelectronic components
03/18/2008US7344031 Substrate storage container
03/18/2008US7343922 Wafer drying apparatus
03/18/2008US7343698 Reduced pressure drying apparatus and reduced pressure drying method
03/18/2008CA2308369C Quantum ridges and tips
03/13/2008WO2008031058A2 Self-regenerating nanotips for low-power electric propulsion (ep) cathodes
03/13/2008WO2008031031A2 Cartesian cluster tool configuration for lithography type processes
03/13/2008WO2008030966A1 Semiconductor thin films formed from group iv nanoparticles
03/13/2008WO2008030802A2 Method for fabricating high-speed thin-film transistors
03/13/2008WO2008030713A1 Substrate cleaning method
03/13/2008WO2008030665A1 Metal filled through via structure for providing vertical wafer-to wafer interconnection
03/13/2008WO2008030663A1 Thermal processing system for curing dielectric films
03/13/2008WO2008030588A1 One-transistor dram floating-body cell with a bias gate in a bulk substrate and methods of fabricating and operating the same
03/13/2008WO2008030574A1 Defect reduction using aspect ratio trapping
03/13/2008WO2008030420A1 Silicon carbide polishing method utilizing water-soluble oxidizers
03/13/2008WO2008030371A2 Implant at shallow trench isolation corner
03/13/2008WO2008030262A1 Method for atomizing material for coating processes
03/13/2008WO2008030047A1 Apparatus and method of depositing films using bias and charging behavior of nanoparticles formed during chemical vapor deposition
03/13/2008WO2008029966A1 Vacuum isolation valve for liquid crystal display panel manufacturing device
03/13/2008WO2008029956A1 Semiconductor integrated circuit device, and wire forming method
03/13/2008WO2008029943A1 Lift pin mechanism
03/13/2008WO2008029918A1 Semiconductor substrate for solid state imaging device, solid state imaging device, and method for manufacturing them
03/13/2008WO2008029917A1 Mask, exposure apparatus and device manufacturing method
03/13/2008WO2008029903A1 Semiconductor integrated circuit, system device including semiconductor integrated circuit, and semiconductor integrated circuit control method
03/13/2008WO2008029885A1 Normal temperature joining method and normal temperature joining device
03/13/2008WO2008029884A1 Cleaning member, cleaning method and device manufacturing method
03/13/2008WO2008029854A1 Apparatus and method for dry etching
03/13/2008WO2008029852A1 Optical device, exposure apparatus, and method for manufacturing device
03/13/2008WO2008029848A1 Substrate processing apparatus and substrate processing method
03/13/2008WO2008029843A1 Electrode catalyst and enzyme electrode
03/13/2008WO2008029840A1 Photodetector
03/13/2008WO2008029834A1 Composition for forming siliceous film and process for producing siliceous film from the same
03/13/2008WO2008029800A1 Substrate processing method and storage medium
03/13/2008WO2008029758A1 Mobile body driving method, mobile body driving system, pattern forming method and apparatus, exposure method and apparatus and device manufacturing method
03/13/2008WO2008029757A1 Mobile object driving method, mobile object driving system, pattern forming method and apparatus, exposure method and apparatus, device manufacturing method and calibration method
03/13/2008WO2008029742A1 Annealing apparatus
03/13/2008WO2008029725A1 Polishing pad
03/13/2008WO2008029696A1 Electron beam dimension measuring device and electron beam dimension measuring method
03/13/2008WO2008029680A1 Transfer roller and substrate transfer apparatus
03/13/2008WO2008029673A1 Radiation-sensitive composition and process for producing low-molecular compound for use therein
03/13/2008WO2008029654A1 Semiconductor sensor device and method for manufacturing same
03/13/2008WO2008029611A1 Mask pattern design method, mask pattern design device, and semiconductor device manufacturing method
03/13/2008WO2008029609A1 Substrate positioning method, substrate position detecting method, and substrate retrieving method
03/13/2008WO2008029608A1 Substrate transfer device, substrate processing device, and method of transferring substrate
03/13/2008WO2008029607A1 Manufacturing method of semiconductor substrate and manufacturing method of semiconductor device