Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
03/2008
03/26/2008CN100377295C Method for preparing silicon carbide/silicon dioxide co-axial nano cable
03/26/2008CN100377294C Manufacturing method of single crystal silicon film
03/26/2008CN100377293C Component mounting method, component mounting apparatus, and ultrasonic bonding head
03/26/2008CN100377292C Lighting device manufacturing method
03/26/2008CN100377028C Semiconductor device including encryption section or external interface, and content reproduction method
03/26/2008CN100377020C Voltage generation circuit and method using digital/analog conversion circuit to conduct voltage microregulation
03/26/2008CN100376997C Liquid crystal display and manufacturing method thereof
03/26/2008CN100376996C Liquid crystal display of horizontal electronic field applying type and fabricating method thereof
03/26/2008CN100376993C Thin film transistor array panel for a liquid crystal display
03/26/2008CN100376992C Manufacturing method for common electrode of liquid crystal display device
03/26/2008CN100376945C Substrate plying-up apparatus and substrate plying-up process
03/26/2008CN100376901C Electronic unit testing set
03/26/2008CN100376899C Semiconductor integrated circuit, and electrostatic withstand voltage test method and apparatus therefor
03/26/2008CN100376896C BGA tester on circuit board
03/26/2008CN100376864C Method for controlling a recess etch process
03/26/2008CN100376727C Method of manufacturing group-III nitride crystal
03/26/2008CN100376723C Shielding plate for enhancing flow field uniformity
03/26/2008CN100376722C Control method for removing residual gas for etching process
03/26/2008CN100376652C Cerium based abrasive material and abrasive material slurry, and method for producing cerium based abrasive material
03/26/2008CN100376622C Polyimide film and process for producing the same
03/26/2008CN100376393C Semiconductor laser and its manufacturing method, manufacturing device and optical device
03/25/2008USRE40163 Semiconductor light-emitting element
03/25/2008USRE40162 Thin film transistor array substrate for a liquid crystal display
03/25/2008US7350226 System and method for analyzing security policies in a distributed computer network
03/25/2008US7350181 Set of masks, method of generating mask data and method for forming a pattern
03/25/2008US7349750 Method for optimizing an industrial product, system for optimizing an industrial product and method for manufacturing an industrial product
03/25/2008US7349603 Optical arrangement with two optical inputs/outputs and production methods
03/25/2008US7349593 Optical wavelength switch having planar lightwave circuit structure
03/25/2008US7349575 Pattern inspection method and apparatus, and pattern alignment method
03/25/2008US7349506 Semiconductor integrated circuit and method for testing the same
03/25/2008US7349257 Combination nonvolatile memory using unified technology with byte, page and block write and simultaneous read and write operations
03/25/2008US7349247 Multi-layer magnetic switching element comprising a magnetic semiconductor layer having magnetization induced by applied voltage
03/25/2008US7349242 Magnetic device
03/25/2008US7349235 Non-volatile memory device
03/25/2008US7349217 IC socket assembly
03/25/2008US7349195 Thin film capacitor and method for manufacturing the same
03/25/2008US7349141 Method and post structures for interferometric modulation
03/25/2008US7349106 Apparatus and method for thin-layer metrology
03/25/2008US7349101 Lithographic apparatus, overlay detector, device manufacturing method, and device manufactured thereby
03/25/2008US7349088 Process monitoring system, process monitoring method, and method for manufacturing semiconductor device
03/25/2008US7349072 Lithographic apparatus and device manufacturing method
03/25/2008US7349065 Exposure apparatus and device fabrication method
03/25/2008US7349064 Immersion exposure technique
03/25/2008US7349063 Reflection mirror apparatus, exposure apparatus and device manufacturing method
03/25/2008US7349054 Method of mounting flexible circuit boards, and display device
03/25/2008US7348833 Bias circuit having transistors that selectively provide current that controls generation of bias voltage
03/25/2008US7348788 Probing card and inspection apparatus for microstructure
03/25/2008US7348787 Wafer probe station having environment control enclosure
03/25/2008US7348768 Tray transfer unit and automatic test handler having the same
03/25/2008US7348695 Linear motor, moving stage system, exposure apparatus, and device manufacturing method
03/25/2008US7348678 Integrated circuit package to provide high-bandwidth communication among multiple dice
03/25/2008US7348676 Semiconductor device having a metal wiring structure
03/25/2008US7348675 Microcircuit fabrication and interconnection
03/25/2008US7348674 Low capacitance wiring layout
03/25/2008US7348671 Vias having varying diameters and fills for use with a semiconductor device and methods of forming semiconductor device structures including same
03/25/2008US7348670 Nanostructure, electronic device and method of manufacturing the same
03/25/2008US7348668 Semiconductor device and method of manufacturing the same
03/25/2008US7348654 Capacitor and inductor scheme with e-fuse application
03/25/2008US7348649 Transparent conductive film
03/25/2008US7348646 Micromechanical capacitive transducer and method for manufacturing the same
03/25/2008US7348644 Semiconductor device and method of manufacturing semiconductor device
03/25/2008US7348640 Memory device
03/25/2008US7348638 Rotational shear stress for charge carrier mobility modification
03/25/2008US7348637 Semiconductor device and method of manufacturing the same
03/25/2008US7348636 CMOS transistor having different PMOS and NMOS gate electrode structures and method of fabrication thereof
03/25/2008US7348632 NMOS device formed on SOI substrate and method of fabricating the same
03/25/2008US7348630 Semiconductor device for high frequency uses and manufacturing method of the same
03/25/2008US7348627 Nonvolatile semiconductor memory device having element isolating region of trench type
03/25/2008US7348626 Method of making nonvolatile transistor pairs with shared control gate
03/25/2008US7348623 Semiconductor device including a MIM capacitor
03/25/2008US7348616 Ferroelectric integrated circuit devices having an oxygen penetration path
03/25/2008US7348609 Thin film transistor and method of forming thin film transistor
03/25/2008US7348608 Planar avalanche photodiode
03/25/2008US7348607 Planar avalanche photodiode
03/25/2008US7348606 Nitride-based heterostructure devices
03/25/2008US7348605 Organic electroluminescent display device
03/25/2008US7348599 Semiconductor device and manufacturing method thereof
03/25/2008US7348596 Devices for detecting current leakage between deep trench capacitors in DRAM devices
03/25/2008US7348594 Test structures and models for estimating the yield impact of dishing and/or voids
03/25/2008US7348582 Light source apparatus and exposure apparatus having the same
03/25/2008US7348559 Defect inspection and charged particle beam apparatus
03/25/2008US7348535 Metal line structure of optical scanner and method of fabricating the same
03/25/2008US7348300 polyether surfactants used to reduce surface tension of aqueous or nonaqueous process solutions
03/25/2008US7348284 Non-planar pMOS structure with a strained channel region and an integrated strained CMOS flow
03/25/2008US7348283 Mechanically robust dielectric film and stack
03/25/2008US7348282 Forming method of gate insulating layer and nitrogen density measuring method thereof
03/25/2008US7348281 Method of filling structures for forming via-first dual damascene interconnects
03/25/2008US7348280 Method for fabricating and BEOL interconnect structures with simultaneous formation of high-k and low-k dielectric regions
03/25/2008US7348279 Method of making an integrated circuit, including forming a contact
03/25/2008US7348278 Method of making nitride-based compound semiconductor crystal and substrate
03/25/2008US7348277 Methods of fabricating semiconductor device using sacrificial layer
03/25/2008US7348276 Fabrication process of semiconductor device and polishing method
03/25/2008US7348275 Processing method for semiconductor wafer
03/25/2008US7348274 Method of aligning carbon nanotubes and method of manufacturing field emission device using the same
03/25/2008US7348273 Method of manufacturing a semiconductor device
03/25/2008US7348272 Method of fabricating interconnect
03/25/2008US7348271 Method for fabricating conductive bumps with non-conductive juxtaposed sidewalls
03/25/2008US7348270 Techniques for forming interconnects
03/25/2008US7348269 Manufacturing method of semiconductor device, semiconductor device, circuit board, electro-optic device, and electronic apparatus
03/25/2008US7348268 Controlled breakdown phase change memory device
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