Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
07/2008
07/10/2008WO2008083134A1 Methods of fabricating shield plates for reduced field coupling in nonvolatile memory
07/10/2008WO2008083127A1 Media selection
07/10/2008WO2008083068A1 Strained silicon on insulator (ssoi) with layer transfer from oxidized donor
07/10/2008WO2008083026A1 Active particle trapping for process control
07/10/2008WO2008083023A1 Method and apparatuses for providing electrical contact for plasma processing applications
07/10/2008WO2008082978A2 Electrostatic chuck and method of forming
07/10/2008WO2008082976A2 Method for leakage reduction in fabrication of high -density fram arrays
07/10/2008WO2008082942A2 High-z structure and method for co-alignment of mixed optical and electron beam lithographic fabrication levels
07/10/2008WO2008082933A1 Trench structure and method for co-alignment of mixed optical and electron beam lithographic fabrication levels
07/10/2008WO2008082923A2 Methods and apparatus for wafer edge processing
07/10/2008WO2008082922A1 Method and apparatus for processing a substrate using plasma
07/10/2008WO2008082920A1 Methods for producing smooth wafers
07/10/2008WO2008082859A2 Stiffener assembly for use with testing devices
07/10/2008WO2008082801A2 Eeprom cell with adjustable barrier in the tunnel window region
07/10/2008WO2008082723A2 Method and structure for fabricating solar cells using a thick layer transfer process
07/10/2008WO2008082660A1 Semiconductor wafer pre-process annealing & gettering method and system for solar cell formation
07/10/2008WO2008082653A2 Piezoelectric actuators and methods of fabricating same
07/10/2008WO2008082650A1 Imprint fluid control
07/10/2008WO2008082614A1 Semiconductor device and method of manufacturing the same
07/10/2008WO2008082518A2 Methods and apparatuses for controlling gas flow conductance in a capacitively-coupled plasma processing chamber
07/10/2008WO2008082448A1 Solution processed thin films and laminates, devices comprising such thin films and laminates, and method for their use and manufacture
07/10/2008WO2008082151A1 Silicon wafer with controlled distribution of embryos that become oxygen precipitates by succeeding annealing and its manufacturing method
07/10/2008WO2008082026A1 Chiller system for semiconductor manufacturing equipment
07/10/2008WO2008082000A1 Aberration evaluation pattern, aberration evaluation method, aberration correction method, electron beam drawing apparatus, electron microscope, master, stamper, recording medium, and structure
07/10/2008WO2008081987A1 Joining method and joining members
07/10/2008WO2008081969A1 Connecting method of electronic component
07/10/2008WO2008081968A1 Manufacturing method of semiconductor chip
07/10/2008WO2008081943A1 Polishing liquid composition
07/10/2008WO2008081936A1 Organic transistor element, its manufacturing method, organic light emitting transistor, and light emitting display device.
07/10/2008WO2008081916A1 Semiconductor integrated circuit device and power supply voltage control system
07/10/2008WO2008081894A1 Method for synthesis of core-shell-type hyperbranched polymer
07/10/2008WO2008081873A1 X-ray condensing method and its device using phase restoration method
07/10/2008WO2008081832A1 Core-shell-type hyperbranched polymer, resist composition, method for production of semiconductor device, and semiconductor device
07/10/2008WO2008081824A1 Semiconductor device and method for manufacturing the same
07/10/2008WO2008081822A1 Polymer for resist, resist composition, and method for production of substrate having fine pattern formed thereon
07/10/2008WO2008081806A1 Method for forming wiring film, transistor, and electronic device
07/10/2008WO2008081805A1 Method for forming wiring film, transistor, and electronic device
07/10/2008WO2008081794A1 Light emitting device and method for manufacturing the same
07/10/2008WO2008081769A1 Substrate treatment device
07/10/2008WO2008081768A1 Alicyclic structure-containing chloromethyl ether, polymerizable monomer for photoresist, and method for producing the same
07/10/2008WO2008081756A1 Semiconductor device and its manufacturing method
07/10/2008WO2008081753A1 Mis field effect transistor and method for fabricating the same
07/10/2008WO2008081752A1 Inspecting method, inspecting apparatus and computer readable storage medium having program stored therein
07/10/2008WO2008081746A1 Process for synthesis of hyperbranched polymer, hyperbranched polymer, resist compositions, semiconductor integrated circuits, and process for production of semiconductor integrated circuits
07/10/2008WO2008081743A1 Semiconductor chip manufacturing method, semiconductor chip manufacturing apparatus, semiconductor chip dividing jig
07/10/2008WO2008081740A1 Sram cell and sram device
07/10/2008WO2008081731A1 Positive-type resist composition and method for formation of resist pattern
07/10/2008WO2008081725A1 Pressure sensitive adhesive sheet for semiconductor substrate processing
07/10/2008WO2008081724A1 Method for forming insulating film and method for manufacturing semiconductor device
07/10/2008WO2008081723A1 Method for forming insulating film and method for manufacturing semiconductor device
07/10/2008WO2008081717A1 Method for producing group iii nitride semiconductor layer, group iii nitride semiconductor light-emitting device, and lamp
07/10/2008WO2008081663A1 Fluorine-containing polymer compound and coating composition using the same
07/10/2008WO2008081630A1 Semiconductor device and method for manufacturing the same
07/10/2008WO2008081567A1 Silicon wafer evaluation method
07/10/2008WO2008081566A1 Electrode structure, semiconductor device, method for producing the electrode structure, and method for producing the semiconductor device
07/10/2008WO2008081561A1 Perforated support plate
07/10/2008WO2008081225A1 Semiconductor device and method of forming a semiconductor device
07/10/2008WO2008080991A1 Method for determining the cooling efficiency and method for determining a heat sink surface
07/10/2008WO2008080982A1 Method for producing asymmetric double-gate transistors, whereby symmetric and asymmetric double-gate transistors can be produced on the same substrate
07/10/2008WO2008080981A1 Method for producing asymmetric double-gate transistors, whereby symmetric and asymmetric double-gate transistors can be produced on the same substrate
07/10/2008WO2008080978A1 Method for producing asymmetric double-gate transistors, whereby symmetric and asymmetric double-gate transistors can be produced on the same substrate
07/10/2008WO2008080977A1 Improved method for producing asymmetric double-gate transistors
07/10/2008WO2008080958A2 Composition for polishing surface made of silicon dioxide
07/10/2008WO2008080828A1 Self-constrained anisotropic germanium nanostructure from electroplating
07/10/2008WO2008080274A1 Packaging structure of pcb and element module and packaging method of the same
07/10/2008WO2008080213A1 High speed otp sensing scheme
07/10/2008WO2008064246A3 Method of clustering sequential processing for a gate stack structure
07/10/2008WO2008063469A3 Recessed access device for a memory
07/10/2008WO2008061122A3 Semiconductor device manufactured using an electrochemical deposition process for copper interconnects
07/10/2008WO2008060244A3 Net block assembly
07/10/2008WO2008059350A3 Semiconductor device and method for production thereof
07/10/2008WO2008058270A3 A susceptor and method of forming a led device using such susceptor
07/10/2008WO2008058131A3 Method and structure for thick layer transfer using a linear accelerator
07/10/2008WO2008057814A3 Device with patterned semiconductor electrode structure and manufacturing method thereof
07/10/2008WO2008057257A3 One-time-programmable logic bit with multiple logic elements
07/10/2008WO2008055089A3 Semiconductor device, design method and structure
07/10/2008WO2008054692B1 Baffled liner cover
07/10/2008WO2008054332A3 A unit lifter assembly
07/10/2008WO2008045593A3 Dual-gate memory device and optimization of electrical interaction between front and back gates to enable scaling
07/10/2008WO2008045328B1 Iii-nitride heterojunction semiconductor device and method of fabrication
07/10/2008WO2008042528A3 Uv-assisted dielectric formation for devices with strained germanium-containing layers
07/10/2008WO2008041169A3 Redundantable robot assembly for workpiece transfer
07/10/2008WO2008033680A3 Method and apparatus for creating rfid devices using masking techniques
07/10/2008WO2008030922A3 Nanocomposite devices, methods of making them, and uses thereof
07/10/2008WO2008026967A3 Method for producing complementary vertical bipolar transistors for integrated circuits
07/10/2008WO2008022165A3 Selective removal of gold from a lead frame
07/10/2008WO2008021647A3 Contactless nonvolatile memory array
07/10/2008WO2008014519A3 Addressable flexible patterns
07/10/2008WO2007127197A3 Mask structure for manufacture of trench type semiconductor device
07/10/2008WO2007111722A3 Aluminum - boron solar cell contacts
07/10/2008WO2007108952A3 High throughput deposition apparatus with magnetic support
07/10/2008WO2007103896A3 Wafer center finding
07/10/2008WO2005013326A3 Epitaxial growth of relaxed silicon germanium layers
07/10/2008US20080167744 Controlling device for substrate processing apparatus and method therefor
07/10/2008US20080167209 Particulate and metal ion contamination is removed from a surface, such as a semiconductor wafer containing copper damascene or dual damascene features, employing a fluo-ride-free aqueous composition comprising a dicarboxylic acid and/or salt thereof; and a hydroxycarboxylic acid and/or salt thereof
07/10/2008US20080166981 Compact Low Loss High Frequency Switch With Improved Linearity Performance
07/10/2008US20080166952 Carrier For Double-Side Polishing Apparatus, Double-Side Polishing Apparatus And Double-Side Polishing Method Using The Same
07/10/2008US20080166949 Method and apparatus for dry-in, dry-out polishing and washing of a semiconductor device
07/10/2008US20080166894 method for improving heat transfer of a focus ring to a target substrate mounting device
07/10/2008US20080166893 Low temperature oxide formation