| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 07/22/2008 | US7402476 Method for forming an electronic device |
| 07/22/2008 | US7402475 Method of manufacturing a semiconductor integrated circuit device |
| 07/22/2008 | US7402474 Manufacturing method of semiconductor device |
| 07/22/2008 | US7402473 Semiconductor device and process for producing the same |
| 07/22/2008 | US7402472 Method of making a nitrided gate dielectric |
| 07/22/2008 | US7402471 Semiconductor device and method for manufacturing the same |
| 07/22/2008 | US7402470 Method of fabricating a thin film transistor array substrate |
| 07/22/2008 | US7402469 System and method for selectivity etching an integrated circuit |
| 07/22/2008 | US7402468 Flat panel display and method of fabricating the same |
| 07/22/2008 | US7402467 Method of manufacturing a semiconductor device |
| 07/22/2008 | US7402466 Strained silicon CMOS on hybrid crystal orientations |
| 07/22/2008 | US7402465 Method of fabricating single-crystal silicon film and method of fabricating TFT adopting the same |
| 07/22/2008 | US7402464 Fuse box of semiconductor device and fabrication method thereof |
| 07/22/2008 | US7402463 Adopting feature of buried electrically conductive layer in dielectrics for electrical anti-fuse application |
| 07/22/2008 | US7402462 Folded frame carrier for MOSFET BGA |
| 07/22/2008 | US7402461 Method of connecting base materials |
| 07/22/2008 | US7402460 Method for production of contactless chip cards and for production of electrical units comprising chips with contact elements |
| 07/22/2008 | US7402459 Quad flat no-lead (QFN) chip package assembly apparatus and method |
| 07/22/2008 | US7402458 Stress relieved flat frame for DMD window |
| 07/22/2008 | US7402457 Method for making contact with electrical contact with electrical contact surfaces of substrate and device with substrate having electrical contact surfaces |
| 07/22/2008 | US7402456 PCMO thin film with memory resistance properties |
| 07/22/2008 | US7402455 Manufacturing method of a contact structure and phase change memory cell with elimination of double contacts |
| 07/22/2008 | US7402454 Molded integrated circuit package with exposed active area |
| 07/22/2008 | US7402453 Microelectronic imaging units and methods of manufacturing microelectronic imaging units |
| 07/22/2008 | US7402452 Gate oxide film structure for a solid state image pick-up device |
| 07/22/2008 | US7402451 Optimized transistor for imager device |
| 07/22/2008 | US7402450 Solid-state image pickup device |
| 07/22/2008 | US7402449 Integrated micro electro-mechanical system and manufacturing method thereof |
| 07/22/2008 | US7402448 Photovoltaic cell and production thereof |
| 07/22/2008 | US7402447 Semiconductor laser device and method for fabricating the same |
| 07/22/2008 | US7402446 Method of manufacturing an electroluminescence device |
| 07/22/2008 | US7402445 Method of forming micro-structures and nano-structures |
| 07/22/2008 | US7402444 Method and apparatus for manufacturing a semiconductor device |
| 07/22/2008 | US7402442 Physically highly secure multi-chip assembly |
| 07/22/2008 | US7402378 Illuminating a phase shift mask including a pattern and a cyclic dummy pattern overlaid onto the pattern by making a part of the pattern to be resolved by effects of the dummy pattern thicker than the line width using light having a peak near an optical axis in an intensity distribution |
| 07/22/2008 | US7402372 CoPOLYMER OF a (METH)ACRYLATE ester with an alcoholic hydroxyl group, and polyoxypropylene glycol; improve alkali SOLUBILITY, hydroxy groups are protected; improve in resolution, depth of focus, suppression of scum and developing defects; photolithography in production of semiconductors |
| 07/22/2008 | US7402364 A mask for defining gate patterns on dynamic random access memory (DRAM) chips with open bit-line architecture; no unwanted images; only one exposure is needed to achieve high resolution |
| 07/22/2008 | US7402363 Pattern forming method and system, and method of manufacturing a semiconductor device |
| 07/22/2008 | US7402270 Method and system for integrated circuit packaging |
| 07/22/2008 | US7402261 Acidic aqueous solution, amphoteric surfactant/corrosion inhibitor of lysine, proline or arginine; glycol selected from diethylene glycol, ethylene glycol, and polyoxyethylene glycol; hydrogen peroxide, benzoyl peroxide, barium peroxide, calcium peroxide or sodium peroxide; applied to tungsten layer |
| 07/22/2008 | US7402259 Chemical-mechanical polishing methods |
| 07/22/2008 | US7402228 Manufacturing method and apparatus of phase shift mask blank |
| 07/22/2008 | US7402212 Apparatus and method for cleaning a glass substrate before photoresist coating |
| 07/22/2008 | US7402210 Apparatus and method for hybrid chemical processing |
| 07/22/2008 | US7402182 High-power LGA socket |
| 07/22/2008 | US7402094 Fixed-abrasive chemical-mechanical planarization of titanium nitride |
| 07/22/2008 | US7402091 Backlit displays including organic light-emissive material |
| 07/22/2008 | US7401988 Substrate processing apparatus and substrate processing method |
| 07/22/2008 | US7401549 Arrangement for transferring information/structures to wafers |
| 07/22/2008 | US7401399 Method of manufacturing a substrate heating device |
| 07/22/2008 | US7401393 Method for removing solder bumps from LSI |
| 07/22/2008 | CA2220782C Memory device with charge storage barrier structure |
| 07/17/2008 | WO2008086361A1 Line end shortening reduction during etch |
| 07/17/2008 | WO2008086295A1 Planarized metalization high-density power mosfet |
| 07/17/2008 | WO2008086211A1 Batch degassing of dielectric oil with vacuum sonication |
| 07/17/2008 | WO2008086210A2 Zirconium and hafnium boride alloy templates on silicon for nitride integration applications |
| 07/17/2008 | WO2008086113A1 Low temperature oxide formation |
| 07/17/2008 | WO2008086091A1 System and method for multi-pulse laser processing |
| 07/17/2008 | WO2008086039A1 A self-aligned patterning method by using non-conformal film and etch back for flash memory and other semiconductor applications |
| 07/17/2008 | WO2008085813A2 Methods for nanopatterning and production of nanostructures |
| 07/17/2008 | WO2008085795A1 Integrated complementary low voltage rf-ldmos |
| 07/17/2008 | WO2008085779A1 Methods and systems for wafer level packaging of mems structures |
| 07/17/2008 | WO2008085771A2 Improved sensitivity capacitive sensor |
| 07/17/2008 | WO2008085757A2 A system and method for using pre-equilibrium ballistic charge carrier refraction |
| 07/17/2008 | WO2008085687A2 Method of packaging semiconductor devices |
| 07/17/2008 | WO2008085686A2 Structure and method for mobility enhanced mosfets with unalloyed silicide |
| 07/17/2008 | WO2008085681A2 Wet clean system design |
| 07/17/2008 | WO2008085667A2 Forming a semiconductor device having a metal electrode and structure thereof |
| 07/17/2008 | WO2008085665A1 Supinating cartesian robot blade |
| 07/17/2008 | WO2008085604A2 Reel-to-reel reaction of precursor film to form solar cell absorber |
| 07/17/2008 | WO2008085523A1 Semiconductor device having improved interface adhesion of gate stack films and method of manufacturer therefore |
| 07/17/2008 | WO2008085498A2 Method for aligning die to substrate |
| 07/17/2008 | WO2008085495A2 Micromirror manufacturing method |
| 07/17/2008 | WO2008085390A2 Substrate cleaning processes through the use of solvents and systems |
| 07/17/2008 | WO2008085259A1 Hybrid composite wafer carrier for wet clean equipment |
| 07/17/2008 | WO2008085258A1 Megasonic precision cleaning of semiconductor process equipment components and parts |
| 07/17/2008 | WO2008085257A1 Process integration scheme to lower overall dielectric constant in beol interconnect structures |
| 07/17/2008 | WO2008085233A1 Loader and buffer for reduced lot size |
| 07/17/2008 | WO2008085226A1 Method of sealing glass |
| 07/17/2008 | WO2008085156A1 Integrated inspection system and defect correction method |
| 07/17/2008 | WO2008085144A1 Low shrinkage polyester thermosetting resins |
| 07/17/2008 | WO2008085129A1 Nitride nanowires and method of producing such |
| 07/17/2008 | WO2008084982A1 Apparatus for optically recognizing wafer indentification code |
| 07/17/2008 | WO2008084906A1 Semiconductor chip package carrier |
| 07/17/2008 | WO2008084887A1 Semiconductor manufacturing apparatus |
| 07/17/2008 | WO2008084867A1 Semiconductor device and process for producing the semiconductor device |
| 07/17/2008 | WO2008084866A1 Silver fine powder, method for producing the same, and ink |
| 07/17/2008 | WO2008084841A1 Semiconductor device |
| 07/17/2008 | WO2008084825A1 Liquid crystal photomask for exposure apparatus, exposure apparatus and exposure method |
| 07/17/2008 | WO2008084811A1 Adhesive for connection of circuit member and semiconductor device using the same |
| 07/17/2008 | WO2008084786A1 Compound and radiation-sensitive composition |
| 07/17/2008 | WO2008084770A1 Electrostatic chuck |
| 07/17/2008 | WO2008084765A1 Semiconductor device and method for manufacturing semiconductor device |
| 07/17/2008 | WO2008084736A1 Organic thin film transistor and method for manufacturing organic thin film transistor |
| 07/17/2008 | WO2008084680A1 Reflective mask blanc for euv lithography |
| 07/17/2008 | WO2008084673A1 Semiconductor device and method for manufacturing the semiconductor device |
| 07/17/2008 | WO2008084658A1 Semiconductor device manufacturing method, semiconductor manufacturing apparatus and storage medium |
| 07/17/2008 | WO2008084639A1 Multilayer film forming method and multilayer film forming apparatus |
| 07/17/2008 | WO2008084628A1 Method for manufacturing semiconductor device, method for manufacturing display device, semiconductor device, method for manufacturing semiconductor element, and semiconductor element |
| 07/17/2008 | WO2008084602A1 Equipment and method for mounting electronic component |