Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
12/2008
12/31/2008WO2009002762A1 Plasma ion implantation process control using reflectometry
12/31/2008WO2009002737A1 Techniques for detecting wafer charging in a plasma processing system
12/31/2008WO2009002716A1 Wafer level alignment structures using subwavelength grating polarizers
12/31/2008WO2009002692A2 Cathode having electron production and focusing grooves, ion source and related method
12/31/2008WO2009002670A1 High-k/metal gate mosfet with reduced parasitic capacitance
12/31/2008WO2009002644A2 Methods of making hierarchical articles
12/31/2008WO2009002560A1 Method of forming lutetium and lanthanum structures
12/31/2008WO2009002550A1 Recrystallization of semiconductor wafers in a thin film capsule and related processes
12/31/2008WO2009002415A1 Methods of and apparatus for reducing amounts of particles on a wafer during wafer de-chucking
12/31/2008WO2009002389A2 Method for selectively forming symmetrical or asymmetrical features using a symmetrical photomask during fabrication of a semiconductor device and electronic systems including the semiconductor device
12/31/2008WO2009002365A1 Pulsed selective area lateral epitaxy for growth of iii-nitride materials over non-polar and semi-polar substrates
12/31/2008WO2009002356A1 Hvpe showerhead design
12/31/2008WO2009002343A1 Inhibition of copper dissolution for lead-free soldering
12/31/2008WO2009002305A1 Photovoltaic device including semiconductor nanocrystals
12/31/2008WO2009002277A1 Growth of indium gallium nitride (ingan) on porous gallium nitride (gan) template by metal-organic chemical vapor deposition (mocvd)
12/31/2008WO2009002272A1 A method of making a secondary imprint on an imprinted polymer
12/31/2008WO2009002271A1 A wafer arrangement and a method for manufacturing the wafer arrangement
12/31/2008WO2009002050A2 Apparatus for transferring wafer carrier and system for fabricating semiconductor having the same
12/31/2008WO2009002035A2 Method of manufacturing film carrier tape
12/31/2008WO2009002019A2 Evaporation apparatus
12/31/2008WO2009001976A1 Method of duplicating nano pattern texture on object's surface by nano imprinting and electroforming
12/31/2008WO2009001935A1 Method for forming thin film, method for manufacturing organic electroluminescent device, method for manufacturing semiconductor device, and method for manufacturing optical device
12/31/2008WO2009001927A1 Method for production of cyclic compound having substituent introduced therein, and photoresist substrate
12/31/2008WO2009001896A1 Filming method, and treating system
12/31/2008WO2009001889A1 Chuck table and work inspecting apparatus
12/31/2008WO2009001888A1 Field-effect transistor and multilayer epitaxial film for use in fabrication of the filed-effect transistor
12/31/2008WO2009001866A1 Placement table structure and heat treatment device
12/31/2008WO2009001836A1 Manufacturing method of semiconductor device
12/31/2008WO2009001835A1 Optical characteristic measuring method, optical characteristic adjusting method, exposing device, exposing method, and exposing device manufacturing method
12/31/2008WO2009001834A1 Optical characteristic measurement method, optical characteristic adjusting method, exposure device, exposure method, and exposure device manufacturing method
12/31/2008WO2009001832A1 Display device and sputtering target
12/31/2008WO2009001816A1 Method for forming organic semiconductor thin film
12/31/2008WO2009001780A1 Semiconductor device and method for manufacturing the same
12/31/2008WO2009001774A1 Method for protecting semiconductor wafer and process for producing semiconductor device
12/31/2008WO2009001744A1 Etching method and etching apparatus
12/31/2008WO2009001733A1 Semiconductor device
12/31/2008WO2009001732A1 Method for grinding semiconductor wafer, and resin composition and protective sheet used for the method
12/31/2008WO2009001706A1 Magnetoresistive element and magnetic random access memory
12/31/2008WO2009001695A1 Semiconductor device
12/31/2008WO2009001627A1 Component placing apparatus
12/31/2008WO2009001605A1 Anisotropic elctroconductive material, connection structure, and process for producing the connection structure
12/31/2008WO2009001564A1 Semiconductor element mounting structure, method for manufacturing the semiconductor element mounting structure, semiconductor element mounting method and pressurizing tool
12/31/2008WO2009001501A1 Silicon wafer evaluation method
12/31/2008WO2009001492A1 Adhesive film and semiconductor device obtained with the same
12/31/2008WO2009001466A1 Heat treatment apparatus and process for producing semiconductor device
12/31/2008WO2009001453A1 Multi-wire saw and method of cutting ingot
12/31/2008WO2009001379A1 Drying apparatus and method for silicon-based electronic circuits
12/31/2008WO2009001280A2 A method for the production of a microelectronic sensor device
12/31/2008WO2009001252A1 An extended drain transistor and a method of manufacturing the same
12/31/2008WO2009000682A1 Device for pressing against semiconductor chips
12/31/2008WO2009000645A1 Method of manufacturing optimized light devices using artificial materials
12/31/2008WO2009000636A1 Method for manufacturing boards including at least one electronic module, assembly used in said method and intermediate product
12/31/2008WO2009000608A2 Method for producing filmlike semiconductor materials and/or electronic elements by primary forming and/or coating
12/31/2008WO2009000258A1 Method for producing substrates
12/31/2008WO2009000136A1 Polycrystalline silicon thin film transistors with bridged-grain structures
12/31/2008WO2008137478A3 Small geometry mos transistor with thin polycrystalline surface contacts and method for making
12/31/2008WO2008137441A3 Junction field effect dynamic random access memory cell and applications therefor
12/31/2008WO2008131713A3 Apparatus for the production of a rigid power module
12/31/2008WO2008121552A3 Semiconductor die stack having heightened contact for wire bond
12/31/2008WO2008118941A3 Plasma dry etch process for metal-containing gates
12/31/2008WO2008106207A3 Technique for patterning differently stressed layers formed above transistors by enhanced etch control strategies
12/31/2008WO2008093120A3 Protective coatings
12/31/2008WO2008073485B1 Plastic electronic component package
12/31/2008WO2008073485A4 Plastic electronic component package
12/31/2008WO2008067379A3 System and method for depositing a gaseous mixture onto a substrate surface using a showerhead apparatus
12/31/2008WO2008021782A3 An etching mask usable in a process for manufacturing solar cells
12/31/2008WO2007140421A9 Process chamber for dielectric gapfill
12/31/2008WO2007120175A9 Apparatus and methods for solar energy conversion using nanoscale cometal structures
12/31/2008WO2007103609A3 Semiconductor process integrating source/drain stressors and interlevel dielectric layer stressors
12/31/2008WO2007019493A3 Process for making single crystalline flakes using deep etching
12/31/2008EP2009971A1 Solder layer, substrate for device junction utilizing the same, and process for manufacturing the substrate
12/31/2008EP2009706A1 Method for manufacturing light emitting element, compound semiconductor wafer, and light emitting element
12/31/2008EP2009697A1 Fabrication process of a matrix-shaped radiation detector and process for exchanging single detection modules of this matrix
12/31/2008EP2009695A2 Thin film transistor method of fabricating the same organic light emitting diode display device including the same and method of fabricating the same
12/31/2008EP2009694A2 Semiconductor device and manufacturing method thereof
12/31/2008EP2009689A1 Semiconductor device with dual workfunction gate electrodes
12/31/2008EP2009688A2 Semiconductor device and method of manufacturing the same
12/31/2008EP2009687A2 Method of manufacturing an SOI substrate and method of manufacturing a semiconductor device
12/31/2008EP2009686A1 Deep trench isolation structures in integrated semiconductor devices
12/31/2008EP2009685A1 Vertical substrate conveyance device and film deposition equipment
12/31/2008EP2009684A1 Semiconductor device
12/31/2008EP2009683A2 Zinc oxide semiconductor and method of manufacturing the same
12/31/2008EP2009682A1 FinFET field-effect transistor isolated from the substrate
12/31/2008EP2009681A2 Methods for high temperature etching a high-k material gate structure
12/31/2008EP2009680A1 Method of fabricating a polycrystalline silicon layer, a TFT fabricated thereof, and an organic light emitting diode display device fabricated thereof
12/31/2008EP2009679A1 Semiconductor device
12/31/2008EP2009678A1 Illuminating optical apparatus, exposure apparatus and device manufacturing method
12/31/2008EP2009677A1 Exposure device, device-manufacturing method, and exposing method
12/31/2008EP2009676A2 A Semiconductor Materials Inspection System
12/31/2008EP2009675A1 Manufacturing apparatus installing method and model
12/31/2008EP2009674A2 Device for producing and presenting fluid layers
12/31/2008EP2009673A2 Method for manufacturing fluid layers with pre-determined thickness on a framework
12/31/2008EP2009672A1 Conductive isostructural compounds
12/31/2008EP2009671A2 Substrate treating apparatus
12/31/2008EP2009643A1 Steering gate and bit line segmentation in non-volatile memories
12/31/2008EP2009499A1 Material of the resist-protecting membrane for immersion lithography
12/31/2008EP2009148A1 Group iii-v nitride layer and method for producing the same
12/31/2008EP2009139A1 Cyclic Deposition Method for Depositing a Metal Silicon Nitride Film
12/31/2008EP2009137A1 Liquid material vaporizer
12/31/2008EP2009135A1 Base substrate for epitaxial diamond film, method for manufacturing the base substrate for epitaxial diamond film, epitaxial diamond film manufactured by the base substrate for epitaxial diamond film, and method for manufacturing the epitaxial diamond film
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