| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 04/01/2009 | CN100474573C Semiconductor device and manufacturing method thereof |
| 04/01/2009 | CN100474571C Semiconductor device and power supply system |
| 04/01/2009 | CN100474570C Methods for the control of flatness and electron mobility of diamond coated silicon and structures formed thereby |
| 04/01/2009 | CN100474569C Method of manufacturing flash memory device |
| 04/01/2009 | CN100474568C Method of manufacturing a flash memory device |
| 04/01/2009 | CN100474567C Flash memory device and method of manufacturing the same |
| 04/01/2009 | CN100474566C Radio chip |
| 04/01/2009 | CN100474565C Front technique for manufacturing high voltage LCD driving device |
| 04/01/2009 | CN100474564C Method for fabricating integrated circuit |
| 04/01/2009 | CN100474563C Process for dividing integrated devices in thin semiconductor chips |
| 04/01/2009 | CN100474562C Jet printing type aggregates removing equipment |
| 04/01/2009 | CN100474561C Method for integrating insulation film between fluorine doped silicon oxide glass layers |
| 04/01/2009 | CN100474560C Method for making thick metal inductance in integrated circuit |
| 04/01/2009 | CN100474559C Wiring over substrate, semiconductor device, and methods for manufacturing thereof |
| 04/01/2009 | CN100474558C Process for producing the semiconductor device |
| 04/01/2009 | CN100474557C Method for the catastrophic transfer of a thin layer after co-implantation |
| 04/01/2009 | CN100474556C Catastrophic transfer of thin film after co-implantation |
| 04/01/2009 | CN100474555C Solution method of metal silicide deposit extension by STI edge |
| 04/01/2009 | CN100474554C Pasted SOI substrate, process for producing the same and semiconductor device |
| 04/01/2009 | CN100474553C Electrostatic chuck and manufacturing method thereof |
| 04/01/2009 | CN100474552C Method for manufacturing element substrate and supporting apparatus for the substrate |
| 04/01/2009 | CN100474551C Locating calibration device and locating calibration system |
| 04/01/2009 | CN100474550C Substrate attaching method |
| 04/01/2009 | CN100474549C Preparation method of extension testing piece |
| 04/01/2009 | CN100474548C Device for detecting metal etching defect |
| 04/01/2009 | CN100474547C Temperature inspecting method in range of 250 to 550 DEG C in semiconductor technology |
| 04/01/2009 | CN100474546C Method and apparatus for mapping a position of a capillary tool tip using a prism |
| 04/01/2009 | CN100474545C Test board for high-frequency system level test |
| 04/01/2009 | CN100474544C Semiconductor device and method of making the same |
| 04/01/2009 | CN100474543C Semiconductor device and method of making the same |
| 04/01/2009 | CN100474542C Method for forming conduction protruding block and structure of the conduction protruding block |
| 04/01/2009 | CN100474541C Making method for chip encapsulation structure |
| 04/01/2009 | CN100474540C Method and system for performing die attach using a flame |
| 04/01/2009 | CN100474539C Wafer-level coated copper stud bumps |
| 04/01/2009 | CN100474538C Method for chemical vapor deposition in high aspect ratio spaces |
| 04/01/2009 | CN100474537C Method for manufacturing groove type MOS transistor |
| 04/01/2009 | CN100474536C A non extension method for making high-voltage part groove |
| 04/01/2009 | CN100474535C Field effect transistor with local source/drain insulation and associated method of production |
| 04/01/2009 | CN100474534C Mos transistor with elevated source and drain structures and method of fabrication thereof |
| 04/01/2009 | CN100474533C Production of extra-high resistance on surface of active zone |
| 04/01/2009 | CN100474532C Method for manufacturing semiconductor device |
| 04/01/2009 | CN100474531C Growth of silicon-nitride film |
| 04/01/2009 | CN100474530C Process for producing modified porous silica film, modified porous silica film obtained by the process, and semiconductor device employing the modified porous silica film |
| 04/01/2009 | CN100474529C Method for manufacturing silicon dioxide layer |
| 04/01/2009 | CN100474528C Film formation method and apparatus for semiconductor process |
| 04/01/2009 | CN100474527C 等离子体蚀刻方法 The plasma etching method |
| 04/01/2009 | CN100474526C Plasma processing apparatus |
| 04/01/2009 | CN100474525C Vertical heat treatment apparatus and method for using the same |
| 04/01/2009 | CN100474524C Plasma etching method and computer-readable storage medium |
| 04/01/2009 | CN100474523C Method for etching silicon carbide single crystal |
| 04/01/2009 | CN100474522C Silicon chip surface pattern etching method and silicon chip thereof |
| 04/01/2009 | CN100474521C Temperature controlled hot edge ring assembly, and device comprising the same and the use thereof |
| 04/01/2009 | CN100474520C Lactate-containing corrosion inhibitor |
| 04/01/2009 | CN100474519C Three beam MEMS device and correlation method |
| 04/01/2009 | CN100474518C Method for machining substrate and method for manufacturing element |
| 04/01/2009 | CN100474517C Ti film method for forming the same |
| 04/01/2009 | CN100474516C Operating method of vertical heat treatment device |
| 04/01/2009 | CN100474515C Film formation apparatus and method for semiconductor process |
| 04/01/2009 | CN100474514C Fabrication method of semiconductor integrated circuit device |
| 04/01/2009 | CN100474513C Method for manufacturing a semiconductor device and semiconductor device made thereby |
| 04/01/2009 | CN100474512C Method for producing III-V family semiconductor compound and solid solution thin film |
| 04/01/2009 | CN100474511C Gallium nitride crystal, homoepitaxial gallium-nitride-based devices and method for producing the same |
| 04/01/2009 | CN100474510C Reflow method, pattern generating method, and fabrication method for TFT element for LCD |
| 04/01/2009 | CN100474509C Integrated circuit with a capacitor and method for the production thereof |
| 04/01/2009 | CN100474508C Plasma treatment apparatus |
| 04/01/2009 | CN100474507C Heat treatment unit |
| 04/01/2009 | CN100474506C Substrate processing apparatus and lid supporting apparatus for the same |
| 04/01/2009 | CN100474505C Method for forming silicon epitaxy test chip |
| 04/01/2009 | CN100474504C Vacuum obtaining system |
| 04/01/2009 | CN100474503C Nitrogen protecting cover |
| 04/01/2009 | CN100474502C Method for manufacturing semiconductor device |
| 04/01/2009 | CN100474495C Method and apparatus for micro-jet enabled, low energy ion generation and transport in plasma processing |
| 04/01/2009 | CN100474494C In-process wafer charge monitor and control system for ion implanter |
| 04/01/2009 | CN100474457C Test method for a semiconductor memory |
| 04/01/2009 | CN100474443C Semiconductor memory device having memory cells requiring no refresh operation |
| 04/01/2009 | CN100474442C Fault removing circuit for storage and power control method thereof |
| 04/01/2009 | CN100474440C Magnetic memory device and method |
| 04/01/2009 | CN100474438C Resistance cross point array connecting storage location |
| 04/01/2009 | CN100474437C Magnetic RAM |
| 04/01/2009 | CN100474362C Light-emitting device |
| 04/01/2009 | CN100474185C Method for inspecting substrate processing apparatus |
| 04/01/2009 | CN100474125C Method of controlling photoresist stripping process and regenerating photoresist stripper composition based on near infrared spectrometer |
| 04/01/2009 | CN100474123C Self-adapting technique changing method for self-adapting focusing and leveling adjustment sensor system |
| 04/01/2009 | CN100474121C Substrate processing system and substrate processing method |
| 04/01/2009 | CN100474120C Method for computing values related to parts of multi-value picture element of the polygon brims |
| 04/01/2009 | CN100474119C Resist pattern forming method and semiconductor device manufacturing method |
| 04/01/2009 | CN100474118C Method for improving silicon scraps contamination when back grinding |
| 04/01/2009 | CN100474115C Aberration field measuring method for imaging optical system of photoetching apparatus |
| 04/01/2009 | CN100474114C Supporting rack |
| 04/01/2009 | CN100474113C Method of through hole etching for RF device products |
| 04/01/2009 | CN100474111C Method for designing phase grating pattern, and method for producing photomask system |
| 04/01/2009 | CN100474108C Critical dimension control using full phase and trim masks |
| 04/01/2009 | CN100474090C Preparation method of thin film transistor matrix substrate |
| 04/01/2009 | CN100474087C Pixel structure of thin film transistor liquid crystal display |
| 04/01/2009 | CN100474081C Apparatus for fabricating bonded substrate |
| 04/01/2009 | CN100474045C Liquid crystal display device |
| 04/01/2009 | CN100473974C Time-resolved measurement apparatus |
| 04/01/2009 | CN100473956C Gas flow rate calibrating method |
| 04/01/2009 | CN100473919C Cooling/heating apparatus and mounting apparatus |
| 04/01/2009 | CN100473760C Method for producing metal material having formed thereon chromium oxide passive film |