Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
03/2009
03/25/2009CN100472804C P-channel MOS transistor, semiconductor integrated circuit device and fabrication process thereof
03/25/2009CN100472803C Semiconductor device
03/25/2009CN100472802C Bipolar transistor
03/25/2009CN100472801C Method for the production of a bipolar semiconductor component and corresponding bipolar semiconductor component
03/25/2009CN100472800C Bipolar transistor and method for the production thereof
03/25/2009CN100472799C Display unit and method for fabricating the same
03/25/2009CN100472798C Organic light emitting display device and method of fabricating the same
03/25/2009CN100472796C Organic electroluminescent device and method for manufacturing the same
03/25/2009CN100472793C Circuit fabrication method
03/25/2009CN100472792C Solid state imaging device and method for producing the same
03/25/2009CN100472788C Quickflashing memory device and its forming method
03/25/2009CN100472787C Integrated circuit and method for reducing leakage current in circuit
03/25/2009CN100472783C Contact method and device generated by using the method
03/25/2009CN100472779C Module part
03/25/2009CN100472777C Physical quantity sensor and manufacturing method therefor
03/25/2009CN100472776C Small radio communication module and manufacturing method thereof
03/25/2009CN100472774C Semiconductor device cutting fusing wire and method
03/25/2009CN100472770C Area array package with non-electrically connected solder balls
03/25/2009CN100472769C Semiconductor device and method for manufacturing same, and semiconductor wafer
03/25/2009CN100472768C Electronic packaging materials for use with low-k dielectric-containing semiconductor devices and method for improving reliability thereof
03/25/2009CN100472767C Chip structure
03/25/2009CN100472762C Package circuit board and forming method thereof
03/25/2009CN100472761C Graded semiconductor layer
03/25/2009CN100472760C Forming a plurality of thin-film devices
03/25/2009CN100472759C Nonvolatile memory devices and methods of fabricating the same
03/25/2009CN100472758C Semiconductor memory and making method thereof
03/25/2009CN100472757C Method for producing auto-alignment retracting grid metal-oxide-semiconductor transistor element
03/25/2009CN100472756C Dual-metal CMOS transistors with tunable gate electrode work function and method of making the same
03/25/2009CN100472755C Integration method for single-wall carbon nano tube part
03/25/2009CN100472754C Electronic component and manufacturing method thereof
03/25/2009CN100472753C Method for adjusting and controlling single-wall carbon nano tube axial energy belt
03/25/2009CN100472752C Method for manufacturing a semiconductor device
03/25/2009CN100472751C Method of preventing energy analysis attack to RSA algorithm
03/25/2009CN100472750C Spread block lamination integrated with dielectric substance in interconnection structure and forming method thereof
03/25/2009CN100472749C Substrate with determinate thermal expansion coefficient
03/25/2009CN100472748C Layer transfer of low defect SiGe using etch-back process
03/25/2009CN100472747C Method for holding substrate in vacuum, method for manufacturing liquid crystal display device, and device for holding substrate
03/25/2009CN100472746C Transferring unit
03/25/2009CN100472745C Thin plate supporting container clamping device
03/25/2009CN100472744C Method and apparatus for measuring the size of free air balls on a wire bonder
03/25/2009CN100472743C Chip check apparatus
03/25/2009CN100472742C 倒装片安装方法以及凸块形成方法 Flip-chip mounting method, and a bump forming method
03/25/2009CN100472741C Manufacturing method for semiconductor device
03/25/2009CN100472740C Semiconductor device and method of manufacturing the same
03/25/2009CN100472739C Copper interconnect wiring and method of forming thereof
03/25/2009CN100472738C Method for producing non-volatile memory
03/25/2009CN100472737C Silicon carbide power devices with self-aligned source and well regions and methods of fabricating same
03/25/2009CN100472736C Silicon carbide-oxide layered structure, production method thereof, and semiconductor device
03/25/2009CN100472735C Field effect transistor having lateral depletion structure
03/25/2009CN100472734C Quick heat treatment method for semiconductor wafer
03/25/2009CN100472733C Post treatment of low K dielectric films
03/25/2009CN100472732C Method for fabricating semiconductor device with deep opening
03/25/2009CN100472731C Semiconductor manufacturing device
03/25/2009CN100472730C Method for manufacturing semiconductor device and manufacturing system
03/25/2009CN100472729C Composition for copper wiring polishing and method of polishing surface of semiconductor integrated circuit
03/25/2009CN100472728C CMP polishing method, CMP polishing apparatus, and process for producing semiconductor device
03/25/2009CN100472727C Resist film removing apparatus, method of removing resist film, organic matter removing apparatus and method of removing organic matter
03/25/2009CN100472726C Laser beam machining method
03/25/2009CN100472725C Methods for reducing wordline sheet resistance
03/25/2009CN100472724C Method for depositing metal layers using sequential flow deposition
03/25/2009CN100472723C Method for forming an electrode
03/25/2009CN100472722C Conductive bond for through-wafer interconnection
03/25/2009CN100472721C N-type ohmic electrode, semiconductor light-emitting device with the electrode, and method for forming n-type ohmic electrode
03/25/2009CN100472720C Method for slowing down dopant-enhanced diffusion in substrates and devices fabricated therefrom
03/25/2009CN100472719C Box type zinc diffusion method made by indium gallium arsenide photoelectric detector chip
03/25/2009CN100472718C Free-standing substrate, manufacturing method thereof and semiconductor light-emitting device
03/25/2009CN100472717C Shower head of chemical vapor deposition apparatus
03/25/2009CN100472716C Method for manufacturing p-type group III nitride semiconductor, and group III nitride semiconductor light-emitting device
03/25/2009CN100472715C Epitaxial growth process
03/25/2009CN100472714C Method for the production of a hard mask
03/25/2009CN100472713C Exposure apparatus and device producing method
03/25/2009CN100472712C Method for forming a trench capacitor
03/25/2009CN100472711C Device for and method of creating a model for determining relationship between process and quality
03/25/2009CN100472710C Semiconductor substrate and fabricating method thereof
03/25/2009CN100472709C Method for fabricating a germanium on insulator (geoi) type wafer
03/25/2009CN100472708C Protective tape separation method, and apparatus using the same
03/25/2009CN100472707C Waferless automatic cleaning after barrier removal
03/25/2009CN100472706C Integrally formed bake plate unit for use in wafer fabrication system
03/25/2009CN100472676C Distribution capacitor in high density application
03/25/2009CN100472656C Nonvolatile semiconductor storage and method for writing data into the storage
03/25/2009CN100472651C Semiconductor storage device
03/25/2009CN100472650C 半导体存储器件和半导体集成电路 The semiconductor memory device and a semiconductor integrated circuit
03/25/2009CN100472331C Dephotoresist agent
03/25/2009CN100472329C Lithographic apparatus and device manufacturing method utilizing movement of clean air to reduce contamination
03/25/2009CN100472328C Lithographic apparatus and device manufacturing method
03/25/2009CN100472326C Method and device for producing analogue exposure tool imaging performance model and program product
03/25/2009CN100472325C Method and apparatus for forming pattens on workpieces
03/25/2009CN100472306C Substrate for display device, manufacturing method for same and display device
03/25/2009CN100472220C TCP handling device and positional deviation correcting method for the same
03/25/2009CN100472204C Wiring pattern check up apparatus
03/25/2009CN100472002C Reduction of carrot defects in silicon carbide epitaxy
03/25/2009CN100471996C Preparation method of thin film of oxidic materials having a high dielectric constant
03/25/2009CN100471992C Semiconductor manufacture reactor
03/25/2009CN100471990C Film forming method and film forming device using plasma CVD
03/25/2009CN100471984C Method of depositing a material layer
03/25/2009CN100471609C Manufacturing objects cutting method
03/24/2009US7509623 Manufacturing method of semiconductor device
03/24/2009US7509186 Method and system for reducing the variation in film thickness on a plurality of semiconductor wafers having multiple deposition paths in a semiconductor manufacturing process
03/24/2009US7508833 Wireless communication apparatus and base station detection method
03/24/2009US7508646 Substrate holding technique