Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
12/2010
12/30/2010US20100327314 Insulated Gate Bipolar Transistor (IGBT) Collector Formed with Ge/A1 and Production Method
12/30/2010US20100327312 Group III nitride semiconductor light-emitting device and method for producing the same
12/30/2010US20100327303 Light-emitting diode lamp with uniform resin coating
12/30/2010US20100327299 P-contact layer for a iii-p semiconductor light emitting device
12/30/2010US20100327298 Light-emitting element and method of making the same
12/30/2010US20100327294 Led package structure for increasing light-emitting efficiency and controlling light-projecting angle and method for manufacturing the same
12/30/2010US20100327291 Single crystal group III nitride articles and method of producing same by HVPE method incorporating a polycrystalline layer for yield enhancement
12/30/2010US20100327290 Manufacturing method of semiconductor device, manufacturing method of display device, semiconductor device, display device, and electronic device
12/30/2010US20100327288 Trench schottky diode and method for manufacturing the same
12/30/2010US20100327285 Semiconductor device and manufacturing method of semiconductor device and display device and manufacturing method of display device
12/30/2010US20100327281 Thin film transistor and method for manufacturing the same
12/30/2010US20100327280 Scaling of bipolar transistors
12/30/2010US20100327278 Laminated structures
12/30/2010US20100327276 Method and system for passivation of defects in mercury cadmium telluride based optoelectric devices
12/30/2010US20100327260 Single Electron Transistor Operating at Room Temperature and Manufacturing Method for Same
12/30/2010US20100327258 Method for producing core-shell nanowires, nanowires produced by the method and nanowire device comprising the nanowires
12/30/2010US20100327256 Controlling pit formation in a iii-nitride device
12/30/2010US20100327254 Methods to improve electrode diffusions in two-terminal non-volatile memory devices
12/30/2010US20100327252 Phase change memory apparatus and fabrication method thereof
12/30/2010US20100327251 Phase change memory device having partially confined heating electrodes capable of reducing heating disturbances between adjacent memory cells
12/30/2010US20100327250 Phase change memory device and method of manufacturing the same
12/30/2010US20100327249 Phase change memory device having an improved word line resistance, and methods of making same
12/30/2010US20100327247 Method and system of using nanotube fabrics as joule heating elements for memories and other applications
12/30/2010US20100327228 Group iii nitride semiconductor epitaxial substrate and method for manufacturing the same
12/30/2010US20100327218 Chemical solution for selectively treating or removing a deteriorated layer at a surface of an organic film, and method for using such
12/30/2010US20100327173 Integrated Direct Conversion Detector Module
12/30/2010US20100327085 Gas injection system for plasma processing
12/30/2010US20100327068 Compact millimeter wave packages with integrated antennas
12/30/2010US20100326953 Apparatus for etching substrate and method of fabricating thin-glass substrate
12/30/2010US20100326602 Electrostatic chuck
12/30/2010US20100326600 Plasma dry etching apparatus having coupling ring with cooling and heating units
12/30/2010US20100326599 Integrated apparatus for vacuum producing
12/30/2010US20100326596 Adhesive, method of connecting wiring terminals and wiring structure
12/30/2010US20100326513 Inverse opal structure having dual porosity, method of manufacturing the same, dye-sensitized solar cell, and method of manufacturing the dye-sensitized solar cell
12/30/2010US20100326469 Apparatus and method of fabricting thin film transistor array substrate
12/30/2010US20100326355 Semiconductor processing parts having apertures with deposited coatings and methods for forming the same
12/30/2010US20100326354 Substrate processing system, carrying device, and coating device
12/30/2010US20100326094 Plasma processing apparatus and maintenance method therefor
12/30/2010US20100325853 Method for fabricating capacitor
12/30/2010DE112009000345T5 Vorrichtung und Verfahren zur chargenweisen kontaktlosen Materialcharakterisierung Apparatus and method for batch-contact material characterization
12/30/2010DE112009000334T5 Doppelscheibenschleifvorrichtung für Werkstücke und Doppelscheibenschleifverfahren für Werkstücke Double disc grinding apparatus for workpieces and double glazing grinding method for workpieces
12/30/2010DE112008003340T5 Modulare Durchflusszelle und Einstellsystem Modular flow cell and adjustment
12/30/2010DE112008003321T5 Verfahren zum Schneiden eines Werkstücks mittels einer Drahtsäge sowie Drahtsäge A method of cutting a workpiece by means of a wire saw and wire saw
12/30/2010DE102010030339A1 Manufacturing method for semiconductor wafer, involves forming separation groove with depth, which is greater or same as thickness of completed component along each separation line on front side of semiconductor wafer
12/30/2010DE102010017278A1 Transistorebenen-Routing Transistor-level routing
12/30/2010DE102009033417A1 Verfahren und System zur Herstellung eines beschichteten Gegenstands mit Tempern A method and system for making a coated article with annealing
12/30/2010DE102009030292A1 Verfahren zum beidseitigen Polieren einer Halbleiterscheibe A method for double-sided polishing of a semiconductor wafer
12/30/2010DE102009029769A1 Electronic component has housing part made of plastic and another housing part made of plastic and electronic part media-tight enclosed by housing parts
12/30/2010DE102009027211A1 Aqueous cerium oxide and silicon dioxide-containing dispersion, obtained by mixing cerium oxide-starting dispersion and silica-starting dispersion under stirring and dispersing at specified shear rate, useful to polish dielectric surface
12/30/2010DE102009025243A1 Verfahren zur Herstellung und Verfahren zur Bearbeitung einer Halbleiterscheibe Methods for making and method for processing a semiconductor wafer
12/30/2010DE102009025242A1 Verfahren zum beidseitigen chemischen Schleifen einer Halbleiterscheibe Method for two-sided chemical grinding a semiconductor wafer
12/30/2010DE102009024982A1 Maskierungsverfahren Masking method
12/30/2010DE102009024377A1 Zerstörungsfreies Analyseverfahren zur Güteermittlung einer Dünnschichtsolarzelle mittels Photolumineszenzspektroskopie Non-destructive analysis method for determining a quality thin-film solar cell by means of photoluminescence spectroscopy
12/30/2010DE102009020540A1 Method of producing electronic module, involves moving carrier to downstream processing point while aligning position of electronic component with respect to structure on liquid meniscus
12/30/2010DE102008059646B4 Verfahren zur Herstellung eines Halbleiterbauelements als Mehr-Gatetransistor mit Stegen mit einer Länge, die durch die Gateelektrode definiert ist und Halbleiterbauelement A process for producing a semiconductor device as a multi-gate transistor with fins having a length, which is defined by the gate electrode and the semiconductor component
12/30/2010DE102008045037B4 Statischer RAM-Zellenaufbau und Mehrfachkontaktschema zum Anschluss von Doppelkanaltransistoren Static RAM cell structure and multiple contact schema for connection of dual channel transistors
12/30/2010DE102005001168B4 Verfahren und System zum Erzeugen einer Mehrzahl von Dünnfilmvorrichtungen Method and system for generating a plurality of thin-film devices
12/30/2010DE10003066B4 Halbleitersensor für eine physikalische Größe und Verfahren zum Herstellen desselben Of the same semiconductor sensor for a physical quantity and methods of making
12/29/2010WO2010151857A2 Method for forming iii-v semiconductor structures including aluminum-silicon nitride passivation
12/29/2010WO2010151856A2 Chemical vapor deposition process for aluminum silicon nitride
12/29/2010WO2010151855A2 Iii-v semiconductor structures including aluminum-silicon nitride passivation
12/29/2010WO2010151844A2 Metal oxide structures, devices, & fabrication methods
12/29/2010WO2010151604A2 Methods for fabricating passivated silicon nanowires and devices thus obtained
12/29/2010WO2010151471A1 Methods of wet etching a self-assembled monolayer patterned substrate and metal patterned articles
12/29/2010WO2010151400A2 Fet with replacement gate structure and method of fabricating the same
12/29/2010WO2010151337A1 Improving the adhesiveness of fluorocarbon(cfx) film by doping of amorphous carbon
12/29/2010WO2010151336A1 Plasma treatment method
12/29/2010WO2010151290A1 System for directly measuring the depth of a high aspect ratio etched feature on a wafer
12/29/2010WO2010151224A1 Thin-film solar cell interconnection
12/29/2010WO2010151087A2 Manufacturing method of half tone mask
12/29/2010WO2010151057A2 Plasma deposition of a thin film
12/29/2010WO2010150966A1 Gas scrubber for removing ammonia from waste gas
12/29/2010WO2010150957A1 Nonvolatile resistance change ram
12/29/2010WO2010150928A1 Material arranging system
12/29/2010WO2010150917A1 Chemical amplification resist composition, and mold preparation method and resist film using the same
12/29/2010WO2010150912A1 Semiconductor device, method for manufacturing semiconductor device, and circuit device using semiconductor device
12/29/2010WO2010150864A1 Cis-based thin film solar cell
12/29/2010WO2010150861A1 Product of polysiloxane condensation
12/29/2010WO2010150821A1 Resonator
12/29/2010WO2010150814A1 Copper alloy bonding wire for semiconductor
12/29/2010WO2010150766A1 Polishing pad, manufacturing method therefor, and polishing method
12/29/2010WO2010150742A1 Template treatment device and imprint system
12/29/2010WO2010150741A1 Imprint system, imprinting method, and computer storage medium
12/29/2010WO2010150740A1 Template processing device, imprint system, template processing method, and computer storage medium
12/29/2010WO2010150723A1 Variable resistance element and method for manufacturing same
12/29/2010WO2010150720A1 Semiconductor device and method for manufacturing same
12/29/2010WO2010150671A1 Method for reprocessing semiconductor substrate and method for manufacturing soi substrate
12/29/2010WO2010150659A1 Probe card, probe card laminated body, and probe card using the probe card laminated body
12/29/2010WO2010150637A1 Reconfigurable semiconductor device
12/29/2010WO2010150590A1 Vacuum heating/cooling apparatus and method of producing magnetoresistive element
12/29/2010WO2010150584A1 Substrate treatment method, computer recording medium, and substrate treatment system
12/29/2010WO2010150550A1 Optical element, illumination apparatus, exposure apparatus, and method for manufacturing device
12/29/2010WO2010150547A1 Method of washing silicon wafer and method of producing epitaxial wafer using method of washing
12/29/2010WO2010150531A1 Storage container
12/29/2010WO2010150522A1 Method for producing module having built-in component and module having built-in component
12/29/2010WO2010150495A1 Junction structure, junction material, and method for manufacturing a junction material
12/29/2010WO2010150460A1 Ingot cutting method reusing waste sludge and system using same
12/29/2010WO2010150446A1 Thin film transistor, method for manufacturing same, active matrix substrate, display panel and display device
12/29/2010WO2010150442A1 Semiconductor device and method for manufacturing same
12/29/2010WO2010150430A1 Semiconductor device and process for manufacture thereof
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