| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
|---|
| 06/22/2011 | CN102104047A Nonvolatile semiconductor memory device and method for producing the same |
| 06/22/2011 | CN102104046A High-voltage device with multilayer gate structure and manufacturing method thereof |
| 06/22/2011 | CN102104045A P-type one time programmable (OTP) device and manufacturing method thereof |
| 06/22/2011 | CN102104044A Separate gate flash memory and manufacturing method thereof |
| 06/22/2011 | CN102104042A Semiconductor device |
| 06/22/2011 | CN102104041A Integrated circuit with dummy structure for isolating devices |
| 06/22/2011 | CN102104040A Semiconductor device with shallow-trench isolation structure and manufacturing method thereof |
| 06/22/2011 | CN102104037A Luminous device with integrated circuit and manufacturing method thereof |
| 06/22/2011 | CN102104035A Stacked semiconductor packages, methods of fabricating the same, and systems employing the same |
| 06/22/2011 | CN102104034A Three-dimensional semiconductor device |
| 06/22/2011 | CN102104033A Three-dimensional mixed signal chip stacking package body and preparation method thereof |
| 06/22/2011 | CN102104032A Surface-mount LED with specific bracket and production process thereof |
| 06/22/2011 | CN102104030A Rebuilt wafer assembly |
| 06/22/2011 | CN102104028A Semiconductor plastic-sealed body and layered scanning method |
| 06/22/2011 | CN102104027A Manufacturing method for integrating high-performance device and low-power consumption device on single chip |
| 06/22/2011 | CN102104026A Method for manufacturing power metal oxide semiconductor (MOS) transistor device integrated with Schottky diodes |
| 06/22/2011 | CN102104025A Method for manufacturing gate oxide layer of EEPROM and gate oxide layer manufactured thereby |
| 06/22/2011 | CN102104024A Method for manufacturing structure of complementary metal-oxide-semiconductor field effect transistors (CMOSFETs) device |
| 06/22/2011 | CN102104023A Method for manufacturing self-aligned high voltage complementary metal oxide semiconductor (CMOS) in bipolar-CMOS-double-diffused metal oxide semiconductor (DMOS) (BCD) process |
| 06/22/2011 | CN102104022A Laser scribing process of amorphous silicon solar battery |
| 06/22/2011 | CN102104021A Wafer dicing method |
| 06/22/2011 | CN102104020A Method for fabricating semiconductor device |
| 06/22/2011 | CN102104019A Method for filling aluminum in complementary metal oxide semiconductor process |
| 06/22/2011 | CN102104018A Method for reducing Schottky contact electric leakage formed in contact holes |
| 06/22/2011 | CN102104017A Complementary metal oxide semiconductor (CMOS) active region isolating process |
| 06/22/2011 | CN102104016A Substrate holder and clipping device |
| 06/22/2011 | CN102104015A Chip picking and position aligning confirmation method for ink dot-free test |
| 06/22/2011 | CN102104014A Method for determining quality of composite dielectric layer |
| 06/22/2011 | CN102104013A Data card and assembling method thereof |
| 06/22/2011 | CN102104012A Manufacturing method of light-emitting diode |
| 06/22/2011 | CN102104011A Electronic element packager and manufacturing method thereof |
| 06/22/2011 | CN102104010A Module structural member capable of improving isolation voltage VISO and reducing crusting thermal resistance Rthjc |
| 06/22/2011 | CN102104009A Method for making three-dimensional silicon-based capacitor |
| 06/22/2011 | CN102104008A Chip packaging method |
| 06/22/2011 | CN102104007A Method and equipment for manufacturing special circuit board |
| 06/22/2011 | CN102104006A Preparation method of field effect transistor |
| 06/22/2011 | CN102104005A Method of fabricating vertical channel transistor |
| 06/22/2011 | CN102104004A Semiconductor device and fabricating method thereof |
| 06/22/2011 | CN102104003A Metal gate fill and method of making |
| 06/22/2011 | CN102104002A Method for preparing metal-oxide-semiconductor field effect transistors (MOSFETs) with extremely short-gate length bulk-silicon surrounding gates |
| 06/22/2011 | CN102104001A Method for improving breakdown voltage of trench type power MOS device |
| 06/22/2011 | CN102104000A Method for improving performance of trench MOS device |
| 06/22/2011 | CN102103999A Method for improving breakdown voltage of longitudinal trench MOS device |
| 06/22/2011 | CN102103998A Structure and preparation method of trench metal oxide semiconductor (MOS) transistor |
| 06/22/2011 | CN102103997A Structure of groove type power MOS (Metal Oxide Semiconductor) device and preparation method thereof |
| 06/22/2011 | CN102103996A Preparation method of groove in preparation of groove MOS (Metal Oxide Semiconductor) device |
| 06/22/2011 | CN102103995A Method for fabricating an integrated circuit device |
| 06/22/2011 | CN102103994A Method of fabricating high-k/metal gate device |
| 06/22/2011 | CN102103993A Preparation method of grid in groove metal oxide semiconductor (MOS) device |
| 06/22/2011 | CN102103992A Method for manufacturing gate oxide |
| 06/22/2011 | CN102103991A Manufacturing methods of epitaxial layer and transistor |
| 06/22/2011 | CN102103990A Preparation method of multiple quantum well structure for photoelectric device |
| 06/22/2011 | CN102103989A Method for forming crystal silicon film |
| 06/22/2011 | CN102103988A Substrate processing method, program and computer storage medium |
| 06/22/2011 | CN102103987A Film adhering method and device of wafer |
| 06/22/2011 | CN102103986A Method for processing wafer |
| 06/22/2011 | CN102103985A Method for preparing small-sized patterned substrate |
| 06/22/2011 | CN102103984A Stack capacitor of memory device and fabrication method thereof |
| 06/22/2011 | CN102103983A Method of preparing metal oxide semiconductor capacitor on germanium substrate |
| 06/22/2011 | CN102103982A Bonding apparatus |
| 06/22/2011 | CN102103981A Method and device for monitoring wafer transmission accuracy and bench using device |
| 06/22/2011 | CN102103980A Reaction chamber for plasma processing equipment and plasma processing equipment |
| 06/22/2011 | CN102103979A Method for manufacturing three-dimensional silicon-based passive circuit consisting of through silicon vias |
| 06/22/2011 | CN102103819A Positioning and clamping device for detection of flat-panel display |
| 06/22/2011 | CN102103647A I/O (input/output)pin allotting method for nano CMOS (Complementary Metal-Oxide-Semiconductor Transistor) circuit structure |
| 06/22/2011 | CN102103644A Chip with version number and method for modifying version number of chip |
| 06/22/2011 | CN102103284A Display device and method of manufacturing the same |
| 06/22/2011 | CN102102223A Group IIIA nitride semiconductor substrate and manufacturing method of the same |
| 06/22/2011 | CN102102208A Display liquid for layered display of titanium layer and titanium nitride layer of semiconductor chip and preparation and application thereof |
| 06/22/2011 | CN102102192A Method for promoting crystallization of silicon film on glass substrate by using light with specific wavelength |
| 06/22/2011 | CN102102191A Silicon film processing method and flash lamp irradiation device |
| 06/22/2011 | CN102101979A Chemical mechanical polishing solution |
| 06/22/2011 | CN102101978A Chemical-mechanical polishing solution |
| 06/22/2011 | CN102101976A Chemical mechanical polishing solution |
| 06/22/2011 | CN102101263A Chemically mechanical polishing method |
| 06/22/2011 | CN101826494B Heat dissipation device based on carbon nanotube arrays and low temperature co-fired ceramics and preparation method |
| 06/22/2011 | CN101814528B Semiconductor element with improved terminal and manufacturing method thereof |
| 06/22/2011 | CN101789446B Double-heterojunction MOS-HEMT component |
| 06/22/2011 | CN101750899B Lithography layout and method for measuring lithography deformation thereof |
| 06/22/2011 | CN101740521B Manufacturing method of flash memory |
| 06/22/2011 | CN101738881B Two-stage image precise contraposition method for upper plate and lower plate, and device thereof |
| 06/22/2011 | CN101702406B Preparation technique of gradient diffusion impervious layer used for deep submicron integrated circuit Cu interconnection |
| 06/22/2011 | CN101685821B Floating gate memory device with interpoly charge trapping structure and manufacturing method thereof |
| 06/22/2011 | CN101681839B Method for multiple millisecond anneals for forming doped region |
| 06/22/2011 | CN101681833B Micro wave plasma processing device, micro wave plasma processing method, and micro wave transmitting plate |
| 06/22/2011 | CN101673763B Ldmos transistor and preparation method thereof |
| 06/22/2011 | CN101661886B Method for preparing source-drain injection structures in preparation of semiconductors |
| 06/22/2011 | CN101656261B Integrated circuits and methods for manufacturing |
| 06/22/2011 | CN101655641B Method for forming mesh-like film |
| 06/22/2011 | CN101652832B Thick pseudomorphic nitride epitaxial layers |
| 06/22/2011 | CN101651129B Structure for repairing a line defect of an organic light emitting display and a method of repairing the defect |
| 06/22/2011 | CN101635264B Method of producing semiconductor module |
| 06/22/2011 | CN101635252B Welding wire machine and driving device thereof |
| 06/22/2011 | CN101632155B Semiconductor device and method for manufacturing the same |
| 06/22/2011 | CN101620039B Sample positioning template of precision cutting machine table |
| 06/22/2011 | CN101611499B Display device |
| 06/22/2011 | CN101593727B Method of manufacturing organic light emitting display and organic light emitting display |
| 06/22/2011 | CN101589479B Light-emitting device and method for manufacturing the same |
| 06/22/2011 | CN101587900B Flexible display device and manufacturing method thereof |
| 06/22/2011 | CN101587896B Semiconductor device and method of fabricating the same |