Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
10/1989
10/31/1989US4877480 Lithographic technique using laser for fabrication of electronic components and the like
10/31/1989US4876957 Apparatus for applying an emulsion screen film of screen-printing
10/31/1989CA1262579A1 Thermal stabilization of photoresist images
10/31/1989CA1262518A1 Selective metallization process, additive method for manufacturing printed circuit boards, and composition for use therein
10/26/1989DE3830636C1 Baseplate for producing metallised holes in printed circuit boards or substrates, and a method for producing the baseplate
10/25/1989EP0338828A2 Pressure developing device
10/25/1989EP0338808A2 Alkyl salicylate resin for carbonless copy paper and imaging use
10/25/1989EP0338786A2 Water developable, negative working overlay or transfer type color proofing system
10/25/1989EP0338751A2 Stereolithographic supports
10/25/1989EP0338625A1 Method of manufacturing a shear plate for a dry-shaver
10/25/1989EP0338612A1 Process and device for preparing a rotary silk-screen printing stencil for printing
10/25/1989EP0338200A2 Method and apparatus for characterization of optical systems
10/25/1989EP0338110A1 Method for forming a photoresist pattern and apparatus applicable with said method
10/25/1989CN1036643A Microcapsule imaging system having improved dynamic range
10/24/1989US4876569 Image exposure apparatus
10/24/1989US4876322 Irradiation cross-linkable thermostable polymer system, for microelectronic applications
10/24/1989US4876178 Electroconductive film system for aircraft windows
10/24/1989US4876176 Deposition of tantalum, molybdenum, tungsten, gold and/or their oxides before circuit removal
10/24/1989US4876175 Shift exposure response to longer wavelengths
10/24/1989US4876173 Photopolymerizable composition on polyethylene terephthalate film support
10/24/1989US4876172 Exposing to actinic radiation,transferring tacky particles to image receiver sheets; photodegradation
10/24/1989US4876170 Light-sensitive material comprising light-sensitive layer containing microcapsules provided on specific paper support
10/24/1989US4876167 Color filter array containing a photocrosslinked polymeric mordant
10/24/1989US4876166 Color filter array
10/24/1989US4876165 Coating substrate with soluble heat resistant dye in curable resin vehicle
10/24/1989US4875989 Wafer processing apparatus
10/24/1989US4875765 Method for correction of distortions of a mirror
10/24/1989US4875570 Apparatus for transferring a lithographic plate
10/24/1989US4875434 Apparatus for coating a substrate with a coating material
10/19/1989WO1989009687A1 Laser based plastic model making workstation
10/19/1989DE3908757A1 Photopolymerisable material
10/18/1989EP0337812A2 Method and apparatus for creating a photomask for projecting an image
10/18/1989EP0337754A2 Process for the preparation of acetal copolymers with backbone bromo functional groups
10/18/1989EP0337698A2 Photosensitive Polymer
10/18/1989EP0337442A2 Photosensitive resin plate for flexography
10/18/1989EP0337403A2 Photopolymerizable compositions
10/18/1989EP0337342A1 Process for the stripping of a photoresist
10/18/1989EP0337258A2 Light sensitive compositions for light sensitive coating materials and processes for obtaining relief patterns and images
10/18/1989EP0337257A2 Light photosensitive positive compounds obtained from cleavable and photochemical acid compounds and process for obtaining relief patterns and images
10/18/1989EP0337188A1 Binder,soluble in aqueous alkali,containing silanyl groups in the side chain,method for its preparation and light-sensitive composition containing that compound
10/17/1989US4875074 Image recording apparatus
10/17/1989US4875073 Color picture image recording apparatus capable of adjusting color tone in the copy sheet
10/17/1989US4875067 Processing apparatus
10/17/1989US4875061 Color image recording apparatus
10/17/1989US4874954 Projection exposure apparatus
10/17/1989US4874930 Electroconductive film system for aircraft windows
10/17/1989US4874799 Aqueous akaline developable, UV curable urethane acrylate compounds and compositions useful for forming liquid 100 percent solids, solvent-free solder mask coatings
10/17/1989US4874798 Photocopolymerizable compositions based on epoxy and hydroxyl-containing organic materials and substituted cycloaliphatic monoepoxide reactive diluents
10/17/1989US4874686 Photosensitive lithographic plate necessitating no dampening water
10/17/1989US4874685 Photocurable composition containing a photoreducible dye a thiol and an N,N'-dialkylaniline
10/17/1989US4874684 Light-sensitive material containing silver halide, reducing agent and polymerizable compound in microcapsules separately sensitized
10/17/1989US4874646 Ultrafine tube and method for its production
10/17/1989US4874450 Coating with photohardenable compound, exposure to actinic radiation
10/17/1989US4874282 Pallet stocker apparatus for printer
10/17/1989US4874240 Characterization of semiconductor resist material during processing
10/11/1989EP0336904A2 Apparatus for the transport of printing plates
10/11/1989EP0336605A2 High sensitivity mid and deep UV resist
10/11/1989EP0336604A2 Mixed aldehyde novolak resins and high contrast high thermal stability positive photoresists prepared therefrom
10/11/1989EP0336400A2 Developer for dry ps plates
10/11/1989EP0336276A2 Silylation reagents for the preparation of binding agents soluble in aqueous alkyla and containing silanyl groups in the side chain
10/11/1989EP0336213A2 Silicium naphthalocyanines, and thin radiation-sensitive coatings containing these compounds
10/10/1989US4873219 Desensitizable self-contained record material useful for security documents and the like
10/10/1989US4873177 Method for forming a resist pattern on a substrate surface and a scum-remover therefor
10/10/1989US4873176 Reticulation resistant photoresist coating
10/10/1989US4873175 Light shielding electrodeposition in a transparent pattern
10/10/1989US4873174 To remove the non-image portions after exposing photographic element to actinic radiation to form a latent image
10/10/1989US4873170 Method for making lithographic printing plate
10/10/1989US4873169 Reacting naphthoquinone diazide sulfonic acid halide with mono- or polyvalent phenolic compound
10/10/1989US4873168 Of imaging sheet coated with a layer of microcapsules containing a radiation curable composition
10/10/1989US4873167 Self cleaning sheet for dissolving a photo-sensitive material containing microcapsules on both sides of substrate
10/10/1989US4872888 Microporous membrane filter and method of producing same
10/10/1989US4872358 Driving mechanism having a pressure member
10/05/1989DE3909289A1 Holograms
10/04/1989EP0335836A2 High resolution positive photoresist in near UV
10/04/1989EP0335629A2 Process for preparing photocured coatings
10/04/1989EP0335620A1 Novel polymeric compounds and recording medium employing same
10/04/1989EP0335399A2 A novel photoresin relief printing plate
10/04/1989EP0335330A2 Electrodeposition coating process of photoresist for printed circuit board
10/04/1989EP0335247A2 A photosensitive resin composition for producing a relief printing plate
10/04/1989EP0335220A2 Positive-working light-sensitive mixture and recording material of high thermal stability prepared therefrom
10/04/1989EP0335219A2 Positive-working radiation-sensitive mixture and recording material prepared therefrom
10/04/1989EP0334906A1 Silicon-containing negative resist material, and process for its use in patterning substrates.
10/04/1989CN1036083A Process of forming reflection holograms in photopolymerizable layers
10/03/1989US4872189 Target structure for x-ray lithography system
10/03/1989US4872032 Image fixing device
10/03/1989US4871844 Diazepihium dyes
10/03/1989US4871651 Cryogenic process for metal lift-off
10/03/1989US4871650 Coating plate cylinders or sleeves with a continuous, seamless photosensitive layer
10/03/1989US4871646 Polysilane compound and photosensitive composition
10/03/1989US4871645 Naphthoquinonediazide and novolak resin; high speed, high resolving power
10/03/1989US4871644 Development promoters for positive images; sensitivity; heat resistance
10/03/1989US4871643 Photopolymerization; transferring unpolymerized compound to image receiver
10/03/1989US4871642 Hydrophobic hardener-crosslinked polymer; eliminates low density spots
10/03/1989US4871641 Light-sensitive material containing silver halide reducing agent and polymerizable compound and process for preparation thereof
10/03/1989US4871584 Process of coating and drying both sides of printed circuit boards
10/03/1989US4871418 Etching of polyoxymethylene glycol substrate which has patterned photoresist coating
10/03/1989US4871417 Method and apparatus for surface treating of substrates
10/03/1989US4871411 Method of preparing volume type hologram film
10/03/1989US4871257 Optical apparatus for observing patterned article
10/03/1989US4871237 Method and apparatus for adjusting imaging performance of projection optical apparatus
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