Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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12/19/1989 | US4887904 Device for positioning a semi-conductor wafer |
12/19/1989 | US4887365 Apparatus for continuously drying coating layer on web |
12/14/1989 | WO1989012256A1 Process for making gravure formes of variable depth or variable depth and area |
12/14/1989 | WO1989012255A1 Image, in particular publicity image, process and photographic film for obtaining the same |
12/14/1989 | WO1989011924A1 Apparatus and process for processing printing plates |
12/14/1989 | WO1989011483A3 Radiation curable oligomers |
12/13/1989 | EP0346057A2 Imaging device |
12/13/1989 | EP0346048A2 Silver master plate recovery solution |
12/13/1989 | EP0345757A2 An ashing method for removing an organic film on a substance of a semiconductor device under fabrication |
12/13/1989 | EP0345714A2 Dyed photoresist compositions and process |
12/13/1989 | EP0345636A2 Light-sensitive negative lithographic printing plates |
12/13/1989 | EP0345573A2 2-[(Meth)acrylamidomethyl]-1,3-diketones |
12/13/1989 | EP0345534A1 Polyorganosiloxane with chloromethyl groups |
12/13/1989 | EP0345340A1 Photoimageable compositions. |
12/13/1989 | EP0345305A1 Image-reversible dry-film photoresists |
12/13/1989 | CN1037970A Illumination system |
12/13/1989 | CN1037905A Urethane acrylate compounds and compositions |
12/12/1989 | US4887283 X-ray mask and exposure method employing the same |
12/12/1989 | US4887282 Method and apparatus for changing the imaging scale in X-ray lithograph |
12/12/1989 | US4886958 Autofocus system for scanning laser inspector or writer |
12/12/1989 | US4886840 Acryloylmorpholine compound |
12/12/1989 | US4886773 Image recording system |
12/12/1989 | US4886735 Photopolymerizable recording materials and photoresist layers and lithographic printing plates based thereon |
12/12/1989 | US4886734 Dissolving areas made soluble by exposure to electron beam to form pattern |
12/12/1989 | US4886731 Multilayer photopolymeric printing plates with photoreactive diazo compounds and photopolymerizable compositions |
12/12/1989 | US4886728 Use of particular mixtures of ethyl lactate and methyl ethyl ketone to remove undesirable peripheral material (e.g. edge beads) from photoresist-coated substrates |
12/12/1989 | US4886727 Heated mixture of trichloroethane and aliphatic alcohol |
12/12/1989 | US4886012 Spin coating apparatus |
12/12/1989 | US4886001 High temperature decomposition; pollution control |
12/12/1989 | CA1263822A1 Method for producing a positive photoresist |
12/07/1989 | DE3915642A1 Ausricht- und belichtungsvorrichtung Alignment and exposure apparatus |
12/07/1989 | DE3818800A1 Process for introducing profiled patterns (profile patterns) onto or into surfaces whose cross-sections are parts of a circle (semicircle) or another geometrical figure, by using the single-stage or multi-stage photo-etching technique (ProMus process) |
12/06/1989 | EP0345097A2 Exposure method and apparatus |
12/06/1989 | EP0345016A2 Photosensitive composition and photosensitive lithographic printing plate |
12/06/1989 | EP0345010A2 Method and apparatus for use in transferring an image |
12/06/1989 | EP0344985A2 Radiation sensitive devices |
12/06/1989 | EP0344638A2 Apparatus and method for reproducing a pattern in an annular area |
12/05/1989 | US4885608 Picture recording apparatus |
12/05/1989 | US4885604 Exposure apparatus |
12/05/1989 | US4885603 Image recording apparatus for producing glossy image medium |
12/05/1989 | US4885602 Exposure system for photo-sensitive recording medium |
12/05/1989 | US4885601 Apparatus for developing imaging sheets employing photosensitive microcapsules |
12/05/1989 | US4885472 Silicon grid as a reference and calibration standard in a particle beam lithography system |
12/05/1989 | US4885344 Polymeric materials and their use as resists |
12/05/1989 | US4885232 High temperature post exposure baking treatment for positive photoresist compositions |
12/05/1989 | US4885231 In lithographically defined regions |
12/05/1989 | US4885230 Burn-in gumming composition for offset printing plates |
12/05/1989 | US4885229 Photopolymerizable compositions |
12/05/1989 | US4885227 Image-receiving material and image-forming method employing the same |
12/05/1989 | US4885224 Light-sensitive material containing silver halide, reducing agent, polymerizable compound and a decolorizable dye |
12/05/1989 | US4885055 Layered devices having surface curvature and method of constructing same |
12/05/1989 | US4885048 Laminator |
12/05/1989 | US4885047 Using oxidizer |
12/05/1989 | US4884869 Fly's eye lens unit for illumination system |
12/05/1989 | US4884501 Pressure developing apparatus |
12/05/1989 | CA1263795A1 Photopatternable dielectric compositions and method for making and using |
12/05/1989 | CA1263763A1 Printed circuit with chromium adhesion layer |
12/05/1989 | CA1263561A1 Silk-screen printing method |
11/30/1989 | WO1989011776A1 Arrangement for irradiating objects |
11/30/1989 | WO1989011683A1 Process for changing the image scale in x-ray lithography |
11/30/1989 | WO1989011682A1 Process for changing the image scale in x-ray lithography |
11/30/1989 | WO1989011680A1 Process and device for producing models of industrial parts by the action of light |
11/30/1989 | WO1989011679A1 A color filter array |
11/30/1989 | WO1989011659A1 Novel method of making, testing and test device for integrated circuits |
11/30/1989 | WO1989011553A1 Selective area nucleation and growth method for metal chemical vapor deposition using focused ion beams |
11/30/1989 | WO1989011526A1 Low toxicity liquid solvent |
11/30/1989 | WO1989011483A2 Radiation curable oligomers |
11/30/1989 | DE3817382A1 Method for changing the image scale in X-ray lithography |
11/30/1989 | DE3817378A1 Anordnung zur belichtung von objekten Arrangement for exposure of objects |
11/30/1989 | DE3817377A1 Method for changing the image scale in X-ray lithography |
11/29/1989 | EP0344110A2 Substituted naphthacenes-5,12-diones and their use |
11/29/1989 | EP0344109A2 Substituted naphthacene-5,12-diones and their use |
11/29/1989 | EP0343984A2 Color filter array for liquid crystal display device |
11/29/1989 | EP0343915A2 Franking machine |
11/29/1989 | EP0343729A1 Illumination system |
11/29/1989 | EP0343666A2 Correct-reading images from photopolymer electrographic master |
11/29/1989 | EP0343609A2 Method of manufacturing main plates for exposure printing |
11/29/1989 | EP0343603A2 High-sensitivity, high-resolution positive-type electron-beam resist |
11/29/1989 | EP0343470A2 Alkenylphosphonic and alkenylphosphinic-acid esters, their preparation and radiation-curable compositions containing these compounds |
11/29/1989 | EP0343246A1 Ultraviolet-absorptive polymer material |
11/28/1989 | US4884101 Apparatus capable of adjusting the light amount |
11/28/1989 | US4884098 Image recording apparatus |
11/28/1989 | US4884083 Printer compensated for vibration-generated scan line errors |
11/28/1989 | US4884082 Color image recording apparatus |
11/28/1989 | US4883744 Forming a polymide pattern on a substrate |
11/28/1989 | US4883743 Optical fiber connector assemblies and methods of making the assemblies |
11/28/1989 | US4883742 Printing plates |
11/28/1989 | US4883740 Radiation-sensitive mixture for photosensitive coating materials |
11/28/1989 | US4883739 Photoresists |
11/28/1989 | US4883738 Silver halide and polymerizable compound containing light-sensitive layer provided on support of defined roughness |
11/28/1989 | US4883737 Light-sensitive material containing silver halide, reducing agent and polymerizable compound and containing core/shell grains doped with iridium |
11/28/1989 | US4883730 Solder resist and insulating layers in microelectronics |
11/28/1989 | US4883352 Deep-uv lithography |
11/28/1989 | US4883345 Projection optical apparatus |
11/27/1989 | EP0312551A4 Additive method for manufacturing printed circuit boards using aqueous alkaline developable and strippable photoresists. |
11/23/1989 | EP0342881A1 Linewidth loss measurement |
11/23/1989 | EP0342840A2 Urethane acrylate compounds and solder masks |
11/23/1989 | EP0342812A2 Photopolymerisable compositions suitable for recording holographic information |
11/23/1989 | EP0342737A1 Method of manufacturing a semi-conductor device |
11/23/1989 | EP0342650A2 Printing plate |