Patents for G03C 1 - Photosensitive materials (26,817)
02/2007
02/06/2007US7172855 Silver halide photographic light-sensitive material and package thereof
02/06/2007US7172852 Thermographic recording material with improved developability
02/06/2007US7172849 Antireflective hardmask and uses thereof
02/06/2007US7172848 Chemical amplification type positive resist composition
02/06/2007US7171974 Production method of silver halide photographic emulsion and production apparatus thereof
02/01/2007WO2005072334A3 Photoresponsive hydrogels
02/01/2007US20070026349 Photothermographic material
02/01/2007US20070026348 Black and white photothermographic material and image forming method
02/01/2007US20070026344 Infrared-sensitive planographic printing plate precursor
02/01/2007US20070026343 Chemical amplification-type resist composition and production process thereof
02/01/2007US20070026342 Imageable printing plate for on-press development
02/01/2007US20070026341 Resist protective coating material and patterning process
02/01/2007US20070026340 Method of removing photoresist and photoresist rework method
02/01/2007US20070026339 photoresist mixtures including acid generators, curing agents, solvents, dissolution accelerators, surfactants, adhesion promoters and antifoam agents, used for generating image on substrates; lithography
01/2007
01/31/2007EP1747500A2 Image recording method
01/31/2007EP1747497A2 Marking on a thin film
01/31/2007CN1906538A Photosensitive printing sleeves and method of forming the same
01/31/2007CN1904724A Electric dialysis desalinating process for photosensitive emulsion preparing production line and its device
01/31/2007CN1297851C Silver halide photographic light-sensitive material
01/30/2007US7169836 Flame-retardant resin composition
01/30/2007US7169716 Photosensitive lacquer for providing a coating on a semiconductor substrate or a mask
01/30/2007US7169544 black and white photographic materials comprising supports having imaging layers comprising polymer binders, photosensitive silver halides, non-photosensitive source of reducible silver ions, reducing agents and amide solvents; thermographic and photothermographic materials
01/30/2007US7169543 Blocked aliphatic thiol stabilizers for photothermographic materials
01/30/2007US7169542 Compositions, systems, and methods for imaging
01/30/2007US7169541 Compound, polymer, resist composition, and patterning process
01/30/2007US7169531 Photoresist suitable for use in 157 nm photolithography and including a polymer based on fluorinated norbornene derivatives
01/30/2007US7169530 Addition polymer containing an unsaturated aromatic sulfonamide compound, unsaturated aromatic ether and acrylated resin; exposure to light; forming pattern
01/25/2007WO2007010777A1 Method for image formation
01/25/2007WO2006133346A3 Ferric and acid complex
01/25/2007WO2006104252A3 Transfer material, and process for producing liquid crystal cell substrate and liquid crystal display device using the same
01/25/2007US20070020566 Photothermographic material and image forming method
01/25/2007US20070020559 Positive-type photosensitive resin composition and cured film manufactured therefrom
01/25/2007US20070020558 Process for the preparation of a photoresist solution
01/25/2007US20070020557 polyurethanes or polyetherurethane copolymers, used in image processing by forming a thin layer between a reflective substrate and a photoresist coating; fabrication of semiconductors by photolithography
01/25/2007US20070020556 Photosensitive articles and related manufacturing process
01/25/2007US20070020555 Light sensitive composition containing a compounds capable of undergoing radical polymerization and cationic polymerization, a photopolymerization initiator of iron-arene complex and a halogenated alkyl group-containing compound; and polymeric binder; durability
01/25/2007US20070020406 Antireflection film and method for manufacturing the same
01/24/2007EP1745333A2 Method of making a photopolymer sleeve blank for flexographic printing
01/24/2007CN1902546A Antireflective coatings for via fill and photolithography applications and methods of preparation thereof
01/24/2007CN1902545A Imaging element having improved durability
01/23/2007US7166656 Smectite clay intercalated with polyether block polyamide copolymer
01/23/2007US7166558 Thermal imaging system
01/23/2007US7166422 Silver halide color photographic material, and method of image formation
01/23/2007US7166421 Black-and-white; imaging layer has a hydrophilic water-dispersible polymer latex binder; photosensitive silver halide, tetrafluoroborate salt of alkali metal, alkaline earth metal, imidazolium pyrazolium, pyridinium, pyrimidinium, quaternary ammonium, quaternary phosphonium or tertiary sulfonium
01/23/2007US7166420 Protection of transient documents using a photochromic protective layer
01/23/2007US7166414 Chemicallyamplified positive tone photoresist comprising a phenolic resin; a sulfonium or iodinium photoacid-generating compound; and an ether, ester, or amide; relief images; enhanced resolution
01/23/2007US7166413 Enabling chain scission of branched photoresist
01/23/2007US7166412 Photosensitive metal nanoparticle and method of forming conductive pattern using the same
01/23/2007US7166410 Colored photosensitive resin composition and color filter comprising the same
01/23/2007US7166408 Image forming method using photothermographic material
01/23/2007US7166407 Imaging element having protective overcoat layers
01/23/2007US7166178 Protective film and method for preparing same
01/23/2007CA2107400C Method of grinding pharmaceutical substances
01/18/2007US20070015095 Photothermographic material
01/18/2007US20070015087 Photosensitive composition
01/18/2007US20070015086 Photosensitive composition, photosensitive planographic printing plate material, and image forming method of photosensitive planographic printing plate material
01/18/2007US20070015085 Planographic printing plate material and method of forming visible image
01/18/2007US20070015084 Iodonium or sulfonium di-(tetrafluoroethyl sulfonate) ether acid generators; imaging negative and positive patterns in semiconductors and photoresists; microlithography; high photosensitivity
01/18/2007US20070015083 Antireflective composition and process of making a lithographic structure
01/18/2007US20070015081 Polycarbonate compositions having infrared absorbance, method of manufacture, and articles prepared therefrom
01/18/2007US20070015080 Photoresist composition for imaging thick films
01/17/2007EP1743363A2 Thermally cured undercoat for lithographic application
01/17/2007EP1743219A2 Anti-reflective coatings using vinyl ether crosslinkers
01/17/2007EP1505098B1 Fluorine-containing water-soluble nonionic surface -active compounds, use thereof and process for preparation of the compounds
01/17/2007CN1295027C Multilayered coating method
01/16/2007US7163786 Thermographic materials containing ionic liquids
01/16/2007US7163785 high sensitivity, excellent gradation, good storage stability and pressure resistance, exhibiting superiority in reproduction of text and colors
01/16/2007US7163784 superior in latent image stability and exhibit relatively less volatility with changes over time from exposure to developing processing, and are also superior in processing stability in rapid processing conditions (being sensitivity fluctuation), and resistance to radioactive rays
01/16/2007US7163782 high density and superior light radiated image stability, improved silver color tone, and storage stability at high temperature; use of reducing agent such as 2,2'-methylenebis(6-t-butyl-4-methylphenol) and coupler such as 2,5-bis(phenylcarbonylamino)-4-chlorophenol
01/16/2007US7163751 Coating compositions for use with an overcoated photoresist
01/11/2007WO2007005721A2 Image stabilization system
01/11/2007WO2007005169A2 Color film developer composition and process therefor
01/11/2007WO2007003508A1 Stabilized electrochromic media
01/11/2007US20070009834 Photosensitive thermosetting resin composition, and photosensitive cover lay and flexible printed wiring board using the composition
01/11/2007US20070009833 Using a photoresist film of an alkali-soluble resin, especially a novolak, and a photosensitive compound having a ballast structure, especially 2,2'-methylene bis[6-(2-hydroxy-5-methylphenyl)methyl]-4-methyl-1,2-naphtoquinonediazide-5-sulfonate; may also contain a bisphenol heat resistance additive
01/11/2007US20070009832 Fluorinated cyclic structure-bearing silicon compounds and silicone resins, resist compositions using the same, and patterning process
01/11/2007US20070009831 Planographic printing plate material and image formation method
01/11/2007US20070009830 Underlayer compositons containing heterocyclic aromatic structures
01/11/2007US20070009829 Photosensitive polymeric binder, free radical polymerizable (meth)acrylate monomer or oligomer, free radical initiator, sensitizing dye and water soluble overcoat are exposed and hardened; rinsing; removing overcoat; developing exposed and deactivated plate with both ink and fountain solution; durability
01/11/2007US20070009828 Positive resist composition, resist laminates and process for forming resist patterns
01/11/2007US20070009685 Support for image recording material
01/11/2007US20070009606 Manufacturing process, such as three dimensional printing, including binding of water-soluble material followed by softening and flowing and forming films of organic-solvent-soluble material
01/11/2007CA2612774A1 Color film developer composition and process therefor
01/10/2007EP1742105A2 Photothermographic material
01/10/2007CN1294453C Silver halides colour negative photographic photochromic and image processing method using the photoelectromic
01/09/2007US7162131 Combination of hydrolyzates of fluoroalkylsilanes and a photoacid generator for producing waveguides for increasing the capacity and speed of data processing in optical communication systems and computers
01/09/2007US7161010 Methine dyes; coloring compound
01/09/2007US7160675 Topside of printing paper is provided with a pigmented polymeric coating based on clay and/or other pigments, having clay content less than 3.3 g/m2 and coating has an average surface roughness RA of<= 1.0 mu m
01/09/2007US7160668 Light absorbent agent polymer useful for organic anti-reflective coating, its preparation method and organic anti-reflective coating composition comprising the same
01/09/2007US7160666 Photosensitive resin composition
01/04/2007WO2007001806A1 Thermographic materials with highly polymerized binder polymer
01/04/2007WO2007001802A1 Dual-wavelength positive-working radiation-sensitive elements
01/04/2007WO2007001495A2 Thermal development system and method of using the same
01/04/2007WO2007001008A1 Method for producing printed board and printed board
01/04/2007WO2006061419A3 Photoactive film, its preparation and use, and preparation of surface relief and optically anisotropic structures by irradiating said film
01/04/2007WO2005111720A3 Marking on a thin film
01/04/2007US20070004923 Methine compound and silver halide photographic material containing the same
01/04/2007US20070003887 Black and white silver image-forming; photosensitive silver halide, a nonphotosensitive organic silver salt, a reducing agent and a binder, and, on the other side of the support, a non-photosensitive back side layer with specified total content of alkaline earth metal; fewer cissing defects on backside
01/04/2007US20070003886 Silver salt photothermographic dry imaging material
01/04/2007US20070003885 Black and white photothermographic material and image forming method
1 ... 25 26 27 28 29 30 31 32 33 34 35 36 37 38 39 40 41 42 43 44 45 ... 269