Patents for G03C 1 - Photosensitive materials (26,817)
05/2007
05/10/2007US20070105046 Photosensitive composition
05/10/2007US20070105045 acid generators; irradiation polymerization; lithography
05/10/2007US20070105044 Fluorine-containing polymer coating composition, method for forming fluorine-containing polymer film using coating composition, and method for forming photoresist or lithographic pattern
05/10/2007US20070105043 Photosensitive coating for enhancing a contrast of a photolithographic exposure
05/10/2007US20070105042 Hydroxystyrene/indene/alkoxyisobutoxystyrene copolymer as base resin for chemical amplified positive resist; photoacid generators; increased dissolution contrast; high resolution; satisfactory resist pattern profile after development; improved etch resistance; micropatterning for integrated circuits
05/10/2007US20070105041 Lithographic printing plate comprising bi-functional compounds
05/10/2007US20070105040 Developable undercoating composition for thick photoresist layers
05/10/2007US20070105039 Dual band color forming composition
05/10/2007US20070105038 Positive resist composition and method for forming resist pattern
05/10/2007US20070105037 Thick film photoresist composition and method of forming resist pattern
05/10/2007US20070105036 Photosensitive element, resist pattern formation method and printed wiring board production method
05/10/2007US20070103655 Lithographic apparatus, device manufacturing method and a substrate
05/09/2007CN1961260A Photoactive compounds
05/09/2007CN1959526A Method for fabricating photo
05/08/2007US7214733 Positive type resist composition
05/08/2007US7214476 Image forming method using photothermographic material
05/08/2007US7214469 Image recording layer contains an infrared absorber and a graft polymer graft chain containing a hydrophilic segment; image recording by infrared laser scanning and an on-press development and excellent in fine line reproducibility and press life while maintaining good on-press developing properties
05/08/2007US7214464 Fog-density development in exposed areas of the image is imagewise inhibited by the presence of one of two organic silver salts that releases a density-inhibiting agent upon thermal development
05/08/2007US7214456 When the temporary image is exposed to indoor ambient conditions of darkness and/or indoor light, the contrast changes to the absence of contrast to erase the image; capable of undergoing multiple cycles of temporary image formation and temporary image erasure
05/08/2007US7214451 Rewriteable optical recording material having good solubility
05/08/2007US7213628 Photosensitive layer laminator and photosensitive layer laminating method
05/03/2007WO2007050778A2 Laser writable media substrate, and systems and methods of laser writng
05/03/2007WO2007050573A1 Volume-phase holographic diffraction grating optimized for the ultraviolet spectral region
05/03/2007WO2007050457A1 Image recording media and image layers
05/03/2007WO2006135465A3 Printing element with an integral printing surface
05/03/2007US20070099132 Photothermographic material
05/03/2007US20070099131 Silver halide emulsion including a water soluble red sensitizing trinuclear merocyanine dye and osmium complex bearing an NO or NS ligand, especially Os(NO)Cl5; optional iridium dopant (IrCl6); reducing the extent of or preventing speed gain over time; graphic arts films; manufacturing printed circuits
05/03/2007US20070099119 Photosensitive composition with low yellowing under UV-light and sunlight exposure
05/03/2007US20070099118 lithographic plates comprising supports having thermosensitive multilayersontaining water-insoluble but alkali-soluble polymer compounds, contain an infrared absorbing dyes, show a broad latitude in development for image formation and can form good images through exposure
05/03/2007US20070099117 Sulfonamide compound, polymer compound, resist material and pattern formation method
05/03/2007US20070099116 Photoconductive layer forming radiation image taking panel and radiation image taking panel
05/03/2007US20070099115 Photosensitive resin composition, image forming material and image forming method using thereof
05/03/2007US20070099114 High sensitivity and resolution, decreased pattern collapse during development, and minimized mask error factor, for micropatterning material for integrated circuit manufacture; heat treatment
05/03/2007US20070099113 Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
05/03/2007US20070099112 Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
05/03/2007US20070099111 heat resistance; relief imaging; plasticizer reduces sidewall angle of imaged and cured features in coated film on substrate to prevent stress failures in subsequent metallization of substrate due to steep angles of imaged features; microelectronics, microelectromechanical devices
05/03/2007US20070099110 Organic anti-reflective coating polymer, organic anti-reflective coating composition and method for forming photoresist pattern
05/03/2007US20070099109 System and method for radiation imaging by in-situ particle formation
05/03/2007US20070099108 Anti-reflective coatings
05/03/2007US20070099107 Copolymer of vinylphenol and (meth)acrylic ester, improves resolution and yields a resist pattern with a favorable shape; resist layer is formed on either a magnetic film or a metallic oxidation prevention film formed on magnetic film, layer is less prone to tailing and undercutting phenomena
05/03/2007CA2625221A1 Volume-phase holographic diffraction grating optimized for the ultraviolet spectral region
05/02/2007EP1613439B1 Device for coating a continuous web of material
05/02/2007EP1578613B1 Imaging media and materials used therein
05/02/2007CN1956799A Coating process and apparatus
05/02/2007CN1313880C Photoresist polymer, photoresist composition containing the same and pattern forming method
05/01/2007US7211374 For detecting the temperature-time history and single temperature events for packaged sheets of thermally developable materials
05/01/2007US7211373 Photothermographic material
05/01/2007US7210865 Automatic developing apparatus and process for forming image using the same
04/2007
04/26/2007WO2007001495A3 Thermal development system and method of using the same
04/26/2007US20070092845 Matrix mixture of an activator and color former (leuko dye) are adapted to form a mark, and fixer that retards fading of the dark mark when exposed to an oil; labeling of optical storage media and is a calcium salt of a monoalkyl phthalate or a resinic acid
04/26/2007US20070092838 Polymerized mercaptoalkyl or methylthioalkyl ester of an unsaturated acid such as 2-(methylthio)ethyl methacrylate or (poly)oxyethylene capped on one end with a mercaptomethyl group and the other with a p-tert-octylphenyl group; high-luminance fluorescent film with excellent processability
04/26/2007US20070092836 Lithographic printing plate precursor and lithographic printing method
04/26/2007US20070092835 decreased fish eye defects; improved workability
04/26/2007US20070092834 Photoimageable, thermosettable fluorinated resists
04/26/2007US20070092833 Matrix, radiation absorbing compound, phosphovanadic acids, and amino alcohols; reduction/oxidation
04/26/2007US20070092832 Method and apparatus for controlled triggering of oxygen scavenging compositions utilizing a wrap-around shade
04/26/2007US20070092831 Radiation-absorbing polymeric materials and ophthalmic devices comprising same
04/26/2007US20070092830 Polymeric radiation-absorbing materials and ophthalmic devices comprising same
04/26/2007US20070092829 Photosensitive coating for enhancing a contrast of a photolithographic exposure
04/26/2007US20070092828 NIR/IR curable coatings for light directed imaging
04/26/2007US20070092827 Imaging media containing matric and color forming agents such as mixture of leuco dyes overcoating a substrate; leuco dyes have different melting points
04/26/2007US20070092746 Microelectronic wafers having photosensitive antireflective polyester and photoresist multilayers used to form integrated circuits; relief images
04/26/2007US20070089294 Coating apparatus and die coater manufacturing method
04/26/2007DE10326501B4 Laserstrahlbeschriftbares mehrschichtiges Etikettenmaterial Laserstrahlbeschriftbares multilayer label material
04/26/2007CA2625161A1 Photopolymerizable medium comprising siloxane compounds that support cationic polymerization for holographic storage
04/24/2007US7208264 Photothermographic material and method of forming images
04/24/2007US7208260 Cross-linking monomers for photoresist, and process for preparing photoresist polymers using the same
04/24/2007US7208201 Coating apparatus and method having a slide bead coater and liquid drop applicator
04/19/2007US20070087294 Imaged anti-copy film
04/19/2007US20070087293 An amorphous solid of a leuco, phthalein or infrared dye, an acrylic resin containing one or both of butyl methacrylate and methyl methacrylate, and a radiation absorber; labeling for optical or magnetic recording media
04/19/2007US20070087288 Resin having a repeating unit having a diamantane structure that can decompose under action of an acid to increase solubility in an alkali developer; photo-acid generator, especially sulfonium salts of fluorinated sulfonic acids
04/19/2007US20070087287 Containing a morpholine having a fluoroalkyl group, e.g., (poly)fluoroalkyl 3-morpholinopropionate; excellent resolution and a precise pattern profile; processing by photolithography for micropatterning using high energy radiation or an electron beam
04/19/2007US20070087286 Compositions and processes for photolithography
04/19/2007US20070087285 Top antireflective coating composition with low refractive index at 193nm radiation wavelength
04/18/2007EP1774402A1 Coated base paper
04/18/2007EP1773511A2 Enhanced scratch resistance of articles containing a combination of nano-crystalline metal oxide particles, polymeric dispersing agents, and surface active materials
04/18/2007CN1311251C Composition for light-scattering film and light-scattering film using the same
04/17/2007US7205090 Interpolymer of an adamantyl (meth)acrylate, a tetrahydrofuranonyl (meth)acrylate, and a cyclohexyl or cyclopentyl (meth)acrylate and an acid generator; gives particularly excellent pattern shape and excellent line edge roughness
04/17/2007US7205089 Cross-linking polymer for organic anti-reflective coating, organic anti-reflective coating composition comprising the same and method for forming photoresist pattern using the same
04/17/2007US7205088 Photochromic material capable of reversibly converting among a number of different forms, one of which has an absorption spectrum that overlaps with a predetermined wavelength scope; and a light absorbing material with a light absorption band that overlaps with the absorption spectrum of the one form
04/12/2007US20070082303 Silver salt particle of nitrogen-containing heterocyclic compound and photothermographic material containing the same
04/12/2007US20070082302 Imaging leading edge to mid range density; reducing distraction effects; readability, aesthetic qualities
04/12/2007US20070082301 Image forming method using photothermographic material
04/12/2007US20070082292 Water-soluble material, chemically amplified resist and pattern formation method using the same
04/12/2007US20070082291 Lithographic Printing Plate Precursor and Lithographic Printing Method
04/12/2007US20070082290 Planographic printing plate precursor
04/12/2007US20070082289 for exposure with ArF excimer laser
04/11/2007EP1771231A2 Method for the preparation of precipitates
04/11/2007CN1947060A Compositions, systems, and methods for imaging
04/11/2007CN1310092C Positive slushing agent composition and resist pattern forming method
04/10/2007US7202019 Comprises photosensitive silver halide particles on face of support; low photographic fog; improved storage stability
04/10/2007US7202018 For use in medical diagnosis and graphic arts; for producing silver images of blue black tone, in which image color or density and background density are hard to be deteriorated by influences of light or heat during storage
04/10/2007US7202014 Stimulus-sensitive composition, compound and pattern formation method using the stimulation-sensitive composition
04/10/2007US7202013 Antireflective film material, and antireflective film and pattern formation method using the same
04/10/2007US7202011 Mixture of fluoropolymer and acid generator
04/10/2007US7202006 is switched from a UV absorbing state to a UV transparent state to allow UV light of a sufficient wavelength to convert a photochromic material of the display layer to a colored state to form an image
04/05/2007WO2007038136A1 Thermally developable materials with backside antistatic layer
04/05/2007WO2007038030A2 Apparatus for the removal of a fluorinated polymer from a substrate and methods therefor
04/05/2007WO2007014153A3 System, apparatus, and method for increasing media storage capacity
04/05/2007US20070077527 Silver halide color photosensitive material
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