Patents for G03C 1 - Photosensitive materials (26,817)
04/2006
04/27/2006US20060088787 Nanocomposite negative resists for next generation lithographies
04/27/2006US20060088785 Silver salt photothermographic dry imaging material, thermal development method of the same, and thermal development apparatus for the same
04/27/2006US20060088257 Photosensitive resin composition for optical waveguides, and optical waveguide and manufacturing method thereof
04/26/2006EP1650599A1 Multi-layer support
04/26/2006EP1650598A1 Squarylium compound and photothermographic material containing the same
04/26/2006EP1649322A1 Planarization films for advanced microelectronic applications and devices and methods of production thereof
04/26/2006CN1253759C Photoresists, polymers and process for microlithography
04/25/2006US7033743 Barrier layers for use in substantially light-insensitive thermographic recording materials
04/25/2006US7033742 Method of photothermographic imaging for transmission electron microscopy
04/25/2006US7033735 Water soluble negative tone photoresist
04/25/2006US7033733 Photosensitive resin composition for color filters
04/25/2006US7033732 Method of preparing anti-reflective coating polymer and anti-reflecting coating composition comprising an anti-reflecting coating polymer
04/25/2006US7033729 Light absorbent agent polymer for organic anti-reflective coating and preparation method and organic anti-reflective coating composition comprising the same
04/25/2006US7033728 Photoresist composition
04/25/2006US7033727 Photosensitive composition and acid generator
04/25/2006US7033726 an acrylic ester copolymer with a monomer unit having a 2,6-dioxabicyclo[3.3.0]octane ring and two other monomers having different bridged bicyclic or tricyclic lactones and a photosensitive acid generator; semiconductors; dry etch resistance; well balanced solubility
04/25/2006US7033723 photographic paper support with a pit camouflaging flange layer between the support and imaging layers; core layer is a closed cell foam; single in-line manufacturing; high stiffness, smoothness, opacity, whiteness and curl resistance
04/25/2006US7032324 Coating process and apparatus
04/20/2006WO2005049681A3 Antireflective coatings for via fill and photolithography applications and methods of preparation thereof
04/20/2006US20060084016 Photosensitive layer having silver behenate, silver halide, reducing agent and binder; and a cyan coloring leuco dye derivative of P,P*-methylenediphenol or bis/P-hydroxyphenyl/sulfide; high density; light radiated image stability and silver color tone; heat resistance
04/20/2006US20060084015 Color diffusion transfer film unit and image-forming method using the color diffusion transfer film unit
04/20/2006US20060084014 Photographic colour material containing a resorcinol derivative as black coupler
04/20/2006US20060084007 Method for curing aminoplasts
04/20/2006US20060084005 Means to enable slitting of micro-encapsulated media
04/20/2006US20060083993 Process for the production of photomasks for structuring semiconductor substrates by optical lithography
04/20/2006US20060083760 Preparation of oil-in-water emulsions stabilised with recombinant collagen-like material and related products
04/20/2006US20060081557 Low-k dielectric functional imprinting materials
04/20/2006DE4318232B4 Hohlräume enthaltende Verbundfolie auf Polyesterbasis The void-containing composite film based on polyester
04/19/2006EP1647411A2 Method of printing thermal media by aligning image
04/19/2006CN1761535A Method for controlling solute loading of polymer microparticles
04/18/2006US7029837 Photographic film element containing an emulsion with dual peek green responsivity
04/18/2006US7029836 Radiographic image conversion panel and method for manufacturing the same
04/18/2006US7029835 Photothermographic element comprising improved base precursors and methods for their use
04/18/2006US7029834 Photothermography; antifogging agents; shelf life; storage stability; mixture of silver halide emulsion and reducible silver compound with stabilizer on support; exposure to electromagneti waves; forming latent images
04/18/2006US7029833 Image display medium, process for forming image, and multicolor image-forming apparatus
04/18/2006US7029825 Uniformity in thickness and high dimensional precision, but also enables easy laser engraving without suffering problems caused by the generation of debris
04/18/2006US7029820 Support for lithographic printing plate and presensitized plate and method of producing lithographic printing plate
04/18/2006US7029819 Absorption x-rays; emission of electromagnetic waves; on support having a reflective polyester surfaces containing barium sulfate particles; radiology images
04/13/2006WO2006037279A1 Recording medium for three dimension operating memory
04/13/2006WO2006009441A3 Method for the preparation of precipitates
04/13/2006WO2004024778A3 Self-assembled hybrid compositions and method of making, using and ordering same
04/13/2006US20060078835 Photothermographic material and image forming method
04/13/2006US20060078834 Exhibits excellent storage stability under high temperature and high humidity; infrared dyes
04/13/2006US20060078833 Increasing photospeed by chemical sensitizing with specific gold(III)-organic complexes and diphenylphosphine sulfides at a molar ratio of the gold (III)-containing compound to the sulfur-containing compound of at least 1:1
04/13/2006US20060078832 Compositions for multi-color, light activated imaging
04/13/2006US20060078824 Photosensitive element, photosensitive element roll, process for the preparation of resist pattern using the same, resist pattern, resist pattern laminated substrate, process for the preparation of wiring pattern and wiring pattern
04/13/2006US20060078823 comprising acrylate resin having a monocyclic or polycyclic alicyclic hydrocarbon structure, and a surfactant containing a fluorine compound or fluorine containing polyethers; resist pattern with good sensitivity, resolution, adhesion, and little in development defects; for an immersion exposure
04/13/2006US20060078822 Lithographic printing plate precursor requiring no dampening water
04/13/2006US20060078821 Positive-tone radiation-sensitive resin composition
04/13/2006US20060078820 Resist with reduced line edge roughness
04/13/2006US20060078819 Photopolymer composition suitable for lithographic printing plates
04/12/2006EP1645907A1 Protein-coated substrates and their preparation
04/12/2006CN1758141A Coating compositions for use with an overcoated photoresist
04/12/2006CN1251021C Photoresist compositions comprising polycyclic polymers with acid labile pendant groups
04/12/2006CN1251019C Chemical sensitiveness enhancing method for nano silver halide granular emulsion
04/12/2006CN1250342C Coating method
04/11/2006US7026497 Improved adhesive strength between a substrate and a photoresist film provided by a bis(photoacid)oxy-)2)amino-)silyl-)amine; no residue left on the substrate after cleaning; semiconductors; photolithography; accuracy; efficiency
04/11/2006US7026109 Photothermographic material
04/11/2006US7026108 Coprecipitated microcrystalline dye dispersion, the absorption spectrum of which exceeds the summoned spectra of individually dispersed dyes, which comprises, as consecutive preparation steps: adding to one vessel, an amount of at
04/11/2006US7026107 Silver halide color photosensitive material
04/11/2006US7026105 Photothermographic materials containing silver halide sensitized with combination of compounds
04/11/2006US7026104 Heat-developable photosensitive material and method of forming images
04/11/2006US7026103 Multiphoton sensitizer capable of simultaneously absorbing at least two photons, an electron acceptor capable of transformation to a dye-activating species upon interaction with the sensitizer after photon absorption
04/11/2006US7026094 oxime sulfonates, e.g., 2-[Cyano-(5-n-propanesulfonyloxyimino-5H-thiophen-2-ylidene)-methyl]-benzoic acid methyl ester with high stability and good solubility in the field of chemically amplified photoresists.
04/11/2006US7026079 Process for preparing a substantially transparent conductive layer configuration
04/11/2006US7025830 Coating apparatus and method
04/06/2006WO2006036028A1 Silver halide color photographic light-sensitive material
04/06/2006WO2006036011A1 Silver halide color light-sensitive material
04/06/2006WO2006035996A1 Silver halide color photosensitive material and method of processing the same
04/06/2006WO2006014708A9 Thermally sensitive coating compositions useful for lithographic elements
04/06/2006US20060073429 Photothermographic material
04/06/2006US20060073428 Image forming layer of photosensitive silver halide emulsions, nonphotosensitive organosiliver compound, reducing agents, and binder; medical images for diagnosis; high speed recording
04/06/2006US20060073420 Resist pattern thickening material, resist pattern and process for forming the same, and semiconductor device and process for manufacturing the same
04/06/2006US20060073419 thickening material comprises a polyvinyl acetal resin, is capable of thickening the resist pattern by coating on the resist pattern; basic compound succinimide and cyclohexane carboxyamide; superior storage stability
04/06/2006US20060073415 Useful as lithographic printing plate precursors, resistance to solvents used in aggressive blanket washes, such as a "UV wash" to remove ultraviolet curable inks; layer of a styrene, acrylonitrile, polyethylene glycol dimethacrylate, and 2-[(methacryloyloxy)ethyl]-trimethylammonium chloride copolymer
04/06/2006US20060073414 Hydrophilic polymer having silane coupling group terminal and lithographic printing plate base
04/06/2006US20060073413 Silicon-containing resist composition and patterning process
04/06/2006US20060073412 Positive type photosensitive paste composition for PDP electrode, PDP electrode prepared therefrom, and PDP comprising the PDP electrode
04/06/2006US20060073411 Chemically amplified resist composition
04/06/2006US20060073410 For use as lithographic printing plate precursor
04/06/2006US20060073409 Imaging compositions and methods
04/06/2006US20060073408 photoresist for use in lithography, exhibiting excellent transparency with respect to the light for use in exposure, having bonding strength to substrates and etch resistance
04/06/2006US20060073407 Coloring matter absorbing near-infrared light and filter for cutting off near-infrared ray
04/05/2006EP1642895A2 Novel substituted naphthopyrans
04/05/2006EP1641429A1 Metal oxide formulations
04/05/2006EP1558654A4 Novel copolymer, photoresist compositions thereof and deep uv bilayer system thereof
04/05/2006CN1756604A Device for coating a continuous web of material
04/05/2006CN1249518C Optical sensitive silver halide emulsion and photosensitive material therewith
04/04/2006US7022823 A benzothiazole ring containing compound with at least one diazonium salt
04/04/2006US7022471 mixing nanostructure particles comprising photostable group IB compounds and photosensitive group IB halides in solvents and binders, to form silver halide emulsions used to form photographic films exhibiting antifogging and high density images
04/04/2006US7022470 Photothermographic imaging material
04/04/2006US7022469 Silver halide photographic light-sensitive material
04/04/2006US7022468 photographic films for providing images with superior graininess and enhanced sharpness, comprising support blue-sensitive, green-sensitive and red-sensitive silver emulsion layers, containing yellow dye, magenta dye and cyan dye forming couplers respectively; interimage effects
04/04/2006US7022467 Thermally developable materials having improved backside conductive layers
04/04/2006US7022461 lithographic printing plates comprising aluminum or polyester supports having layers of thermosensitive compounds and light to heat conversion dyes; thermal printing
04/04/2006US7022460 Including polymeric azo dyes capable of changing its spatial arrangement upon irradiation with polarized electromagnetic radiation; units of 4-(2-methacryloyloxyethyloxy)-3,4'-dicyanoazobenzene for example
04/04/2006US7022457 Photoresists with hydroxylated, photoacid-cleavable groups
04/04/2006US7022456 For producing semiconductor integrated- circuit elements, masks for integrated circuit production, printed wiring boards, liquid-crystal panels
04/04/2006US7022455 Photoacid-labile polymers and photoresists comprising same
04/04/2006US7022454 Binders; resolution of relief image
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