| Patents for G03C 1 - Photosensitive materials (26,817) |
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| 12/12/2006 | US7147987 Positive resist composition and pattern formation method using the same |
| 12/12/2006 | US7147986 Resist compounds including acid labile groups attached to polymeric chains at anhydride linkages |
| 12/12/2006 | US7147985 Resist compounds including acid labile groups having hydrophilic groups attached thereto |
| 12/12/2006 | US7147984 Patterning semiconductors; using polymer and acid generator mixture |
| 12/12/2006 | US7147982 Ultrahigh speed imaging assembly for radiography |
| 12/07/2006 | WO2006063165A3 Composition for forming a laser-markable coating and process for forming a marking by laser exposure |
| 12/07/2006 | US20060275715 Image forming layer with photosensitive silver halide, nonphotosensitive organic silver salt, reducing agent, and binder; nonphotosensitive layer on same side as image forming layer and farther from the support comprises shell-core copolymer latex having acrylic, methacrylic, or itaconic acid comonomer |
| 12/07/2006 | US20060275704 Heating a precursor layer comprising a solution of an ionic form of a polymer formed over a top surface of a photoresist layer to remove the solvent; and converting the ionic form of the polymer to a non-ionic form that is insoluble in water and soluble in aqueous-base solution |
| 12/07/2006 | US20060275702 Negative-working photosensitive resin composition and photosensitive resin plate using the same |
| 12/07/2006 | US20060275701 Fluorinated vinyl ethers, copolymers thereof, and use in lithographic photoresist compositions |
| 12/07/2006 | US20060275700 photoresists comprising light-blocking layer on substrate, color filter layer, insulating layer, common electrode layer; acrylic ester, norbornene containing monomoers; 1,2-quinonediazides |
| 12/07/2006 | US20060275699 Novel photosensitive resin compositions |
| 12/07/2006 | US20060275698 Thermally reactive near-infrared absorbing acetal copolymers, methods of preparation and methods of use |
| 12/07/2006 | US20060275697 Top coating composition for photoresist and method of forming photoresist pattern using the same |
| 12/07/2006 | US20060275696 Coating compositions for use with an overcoated photoresist |
| 12/07/2006 | US20060275695 polyalkenamers, ring opening metathesis polymers, contains an attached photoacid generating group; copolymers of maleic anhydride, acrylic acid; not dissolved in aqueous solution; prevent the unexposed portion from being developed under low levels of exposure energy; prevent deformation, contamination |
| 12/07/2006 | US20060275694 photoresists; lithography; polysilsesquioxanes |
| 12/07/2006 | US20060275693 mixture of light to heat cnversion dyes dissolved in matrices, leuco dyes and activators; multiphase imaging material in which energy is absorbed by the light to heat cnversion dyes causes the reaction of an activator and leuco dyes |
| 12/07/2006 | US20060273070 Photoresist polymer, photoresist composition and method for manufacturing semiconductor device |
| 12/06/2006 | CN1874899A Imaging media and materials used therein |
| 12/06/2006 | CN1873529A Silver halide emulsion and silver halide color photographic sensitive material |
| 12/06/2006 | CN1287911C Coating device and coating method |
| 12/05/2006 | US7144960 Reversible crosslinking method for making an electro-optic polymer |
| 12/05/2006 | US7144695 Comprises photosensitive silver halide, non-photosensitive organic silver salt (annealed), reducing agent, and binder on surface of support; for medical diagnosis |
| 12/05/2006 | US7144694 Photothermographic imaging material and method for forming image |
| 12/05/2006 | US7144693 Photothermographic material |
| 12/05/2006 | US7144692 Photothermographic material |
| 12/05/2006 | US7144691 Oxiranylmethoxyhydrocarbyl-N-oxypiperidine derivatives as stabilizers; blue sensitive silver halide emulsion layer yellow coupler, green sensitive layer contains magenta coupler, and red sensitive layer contains cyan coupler; storage stability |
| 12/05/2006 | US7144689 Antistatic properties for thermally developable materials |
| 12/05/2006 | US7144688 silver halide having a high silver iodide content; binder contains polymer latex; reducing agent is a bisphenol, e.g., 2,2'-isobutylidenebis(4,6-dimethylphenol); high sensitivity, low fogging, and excellent image stability |
| 12/05/2006 | US7144679 Polyimide resin precursor solution, laminates for electronic components made by using the solution and process for production of the laminates |
| 12/05/2006 | US7144676 Xanthene senstitizers that affect color or shade change upon application of low energy; oxidizers, and aminocarboxylic acid amphoteric surfactant; may be peeled from workpiece in which they are coated; boats, vehicles |
| 12/05/2006 | US7144674 Positive resist composition |
| 12/05/2006 | US7144663 Transferring, with a pump, the photographic reagent to be measured to a measuring tank via piping without being heated; heating the photographic reagent to be melted after measuring; repeating the procedure |
| 12/05/2006 | US7144525 Elastic member of semiconductive polymer and OA equipment using the same |
| 12/05/2006 | US7143709 Surface topography for non-toxic bioadhesion control |
| 12/05/2006 | US7143674 Imaging element having improved crack propagation during conversion |
| 11/30/2006 | WO2006126739A1 Photosensitive material, method of manufacturing conductive metal film, conductive metal film and light-transmitting film shielding electromagnetic wave for plasma display panel |
| 11/30/2006 | WO2006019450A3 Improved method for bump exposing relief image printing plates |
| 11/30/2006 | WO2005079330A3 Permanent resist composition, cured product thereof, and use thereof |
| 11/30/2006 | WO2004076465A8 Silyl acrylate and poss compositions used in microlithographic processes |
| 11/30/2006 | US20060270552 Thermal imaging system |
| 11/30/2006 | US20060269878 Radiation transparent and nonabsorbent protective layer contains chromenes (naphthopyrans), diarylperfluorocyclopentenes, azobenzenes, and/or dithienylethenes; display layer contains spiropyrans; prevents uniintentional writing; ultraviolet radiation resistance; discoloration inhibition |
| 11/30/2006 | US20060269871 Polymer, resist composition and patterning process |
| 11/30/2006 | US20060269870 2-Fluoro-, 2-fluoroalkyl-, or 2-fluorocycloalkyl- acrylate ester monomers; photoresist processed by lithography involving argon fluoride exposure; resolution, clarity, radiation transparent, minimal line edge roughness, etch resistance |
| 11/30/2006 | US20060269869 Aluminum support for light sensitive planographic printing plate material and light sensitive planographic printing plate material |
| 11/30/2006 | US20060269868 Low thermal expansion, low dielectric constant, and high glass transition temperature; heat resistance; obtained by polymerizing diamine, an acid dianhydride, and a dialdehyde; etched by an alkali, photopatterning |
| 11/30/2006 | US20060269867 Antireflective hardmask composition and methods for using same |
| 11/29/2006 | EP1726990A1 Photosensitive material for silver halide color photograph |
| 11/29/2006 | CN1871550A Low-activation energy silicon-containing resist system |
| 11/29/2006 | CN1871549A Fluorinated photoresists prepared, deposited, developed and removed in carbon dioxide |
| 11/29/2006 | CN1871546A Electrochromic material with improved lifetime |
| 11/29/2006 | CN1287218C Silver halide photographic optical sensitive material |
| 11/29/2006 | CN1287217C Process for preparing nano silver colloidal water solution |
| 11/29/2006 | CN1286905C Novolak resin mixtures and photosensitive compositions comprising the same |
| 11/28/2006 | US7141614 Photosensitive resin composition and photosensitive films and laminates made by using the same |
| 11/28/2006 | US7141361 Thermally developable materials with improved conductive layer |
| 11/28/2006 | US7141360 A matrix having dissolved in it a radiation absorbing compound and two activators: a primary activator that has a higher acidity and a lower solubility than a secondary activator activator; and a color former that is insoluble in and uniformly distributed throughout the matrix |
| 11/28/2006 | US7141359 High colored image density and superior in preservation stability (particularly heat resistance and moisture resistance) of recorded images and non-image areas, while satisfying recent requirements for high sensitivity |
| 11/28/2006 | US7141354 Benzene substituted with an unsaturated group and either a tert-aminoalkanoyl group or a 1-hydroxycyclohexanecarbonyl group; suppresses volatilization of low molecular weight decomposition materials during radiation and post-baking, and leaves almost no decomposition residues in the final product |
| 11/23/2006 | WO2006124552A2 Method of forming a photoresist element |
| 11/23/2006 | WO2005119359A3 Enhanced scratch resistance of articles containing a combination of nano-crystalline metal oxide particles, polymeric dispersing agents, and surface active materials |
| 11/23/2006 | WO2005089150A3 Thermally cured undercoat for lithographic application |
| 11/23/2006 | US20060263723 Negative resist composition, a method for forming a resist pattern thereof, and a method for fabricating a semiconductor device |
| 11/23/2006 | US20060263722 Mixture of alkali soluble novolaks and photosensitive naphthoquinone diazide compound |
| 11/23/2006 | US20060263721 Image formation process and planographic printing plate material |
| 11/23/2006 | US20060263720 Photosensitive lithographic printing plate |
| 11/23/2006 | US20060263719 Resist material and pattern formation method using the same |
| 11/23/2006 | US20060263718 Sacrificial compositions and methods of fabricating a structure using sacrificial compositions |
| 11/23/2006 | US20060263717 Photoresist coating composition and method for forming fine pattern using the same |
| 11/23/2006 | US20060263716 Water soluble poly[bis(2-chloroethyl)ether-alt-1,3-bis[3-(dimethylamino)propyl]urea], an aqueous solvent and a surfactant or alcohol additive; reduced size of a photoresist contact hole and a space |
| 11/23/2006 | US20060263715 Block copolymer composition for photosensitive flexographic plate |
| 11/23/2006 | US20060263714 Resist composition and organic solvent for removing resist |
| 11/23/2006 | US20060263706 Overlay vernier and method for manufacturing semiconductor device using the same |
| 11/23/2006 | US20060263607 Photochromic multilayer body and method for producing same |
| 11/23/2006 | DE19546948B4 Beschichtungsverfahren, bei welchem eine Precoat-Lösung vor einer Beschichtungszusammensetzung aufgebracht wird Coating method is applied in which a pre-coat solution before coating composition |
| 11/23/2006 | CA2605579A1 Method of forming a photoresist element |
| 11/22/2006 | EP1723208A1 Reversible piezochromic systems |
| 11/22/2006 | EP1540382A4 Plastic photochromic lens and method for preparation thereof |
| 11/22/2006 | EP1397459B1 Polyoxyalkylene ammonium salts and their use as antistatic agents |
| 11/21/2006 | US7138550 Bridged carbocyclic compounds and methods of making and using same |
| 11/21/2006 | US7138438 Polymeric nanoparticle formulations and their use for improving the dirt pick up resistance of a coating |
| 11/21/2006 | US7138225 Silver salt photothermographic dry imaging material |
| 11/21/2006 | US7138224 Squarylium compound and photothermographic material containing the same |
| 11/21/2006 | US7138223 Photothermographic material |
| 11/21/2006 | US7138222 Includes coupler-containing sensitive emulsion layer units on a support, each of units are constituted of at least two photosensitive emulsion layers having sensitivities which are different from each other; high sensitivity, excellent graininess, and latent image storability |
| 11/21/2006 | US7138221 Photothermographic material containing a transparent support, and a photosensitive layer of a photosensitive silver halide, a photostable silver behenate and polyvinyl butyral binder with a glass transition temperature of 45 degree C or more |
| 11/16/2006 | US20060258764 Method of preparing photopolymer with enhanced optical quality using nanoporous membrane and photopolymer prepared by the same |
| 11/16/2006 | US20060257786 Method for employing vertical acid transport for lithographic imaging applications |
| 11/16/2006 | US20060257785 Method of forming a photoresist element |
| 11/16/2006 | US20060257784 Copolymer for semiconductor lithography and process for production thereof |
| 11/16/2006 | US20060257783 Polymerizable composition and lithographic printing plate precursor |
| 11/16/2006 | US20060257782 Photosensitive lithographic printing plate |
| 11/16/2006 | US20060257781 Photoresist polymer compositions |
| 11/16/2006 | US20060257780 Method of making an article bearing a relief image using a removable film |
| 11/16/2006 | US20060257779 Stimulable phosphor screens or panels and manufacturing control thereof |
| 11/14/2006 | US7135277 Image forming layer of a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent, and a binder; high sensitivity for medical images used in making diagnoses, and high recording speeds |
| 11/14/2006 | US7135276 Photothermographic material and method for preparing photosensitive silver halide emulsion |
| 11/14/2006 | US7135274 Exposure to laser diode beams; mixture of silver halide emulsion, silver compound, binder and reducing agent |
| 11/14/2006 | US7135271 Photosensitive composition |