| Patents for G03C 1 - Photosensitive materials (26,817) |
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| 07/10/2007 | US7241561 Photothermographic reducing agents with bicyclic or tricyclic substitution |
| 07/10/2007 | US7241553 Polymer, resist composition, and patterning process |
| 07/05/2007 | US20070154853 Silver halide color photographic light-sensitive material and color image-forming method |
| 07/05/2007 | US20070154841 Exposing, baking and developing mixture of photoacid generator and reaction product of polymer containing an aliphatic monocyclic fluoroalcohol unit (poly(1,1,2,3,3-pentafluoro-4-trifluoromethyl-4-hydroxy-1,6-heptadiene) with an alkyloxycarbonylalkyl-group compound (methyl-norbornyloxycarbonylmethyl) |
| 07/05/2007 | US20070154840 cationically curable component having epoxy group containing component; oxetane group containing component, multifunctional acrylate and a radical photoinitiator and a cationic photoinitiator; use in stereolithography; flexibility, elongation, tensile strength, curl resistance, water resistance |
| 07/05/2007 | US20070154839 Hard mask composition for lithography process |
| 07/05/2007 | US20070154838 Hard Mask Composition and Method for Manufacturing Semiconductor Device |
| 07/05/2007 | US20070154837 Composition for hard mask and method for manufacturing semiconductor device |
| 07/05/2007 | US20070154836 Helical pixilated photoresist |
| 07/05/2007 | US20070154835 Positive photosensitive composition |
| 07/05/2007 | US20070154822 Imaging element having improved durability |
| 07/05/2007 | US20070154719 Coated base paper |
| 07/05/2007 | US20070153166 Method for fabricating color filter layer of liquid crystal display device and method for fabricating liquid crystal display device using the same |
| 07/04/2007 | EP1803502A2 Coating device and liquid agent coating method |
| 07/04/2007 | EP1803030A1 Silver halide color light-sensitive material |
| 07/04/2007 | EP1802726A1 Photochromic compounds comprising polymeric substituents and methods for preparation and use thereof |
| 07/04/2007 | EP1802592A1 Amphoteric 4,4'-bis(triazinylamino)stilbene-2,2'-disulfonic acid derivatives as optical brighteners for paper |
| 07/03/2007 | US7238468 higher sensitivity and higher contrast and free of reciprocity failure over wide exposure illuminance |
| 07/03/2007 | US7238467 Silver halide emulsion, method of preparing the same and silver halide photosensitive material using the same |
| 07/03/2007 | US7238466 Image forming layer with photosensitive silver halide, nonphotosensitive organic silver salt, reducing agent, and binder; nonphotosensitive layer on same side as image forming layer and farther from the support comprises shell-core copolymer latex having acrylic, methacrylic, or itaconic acid comonomer |
| 07/03/2007 | US7238465 Rapid processing; high contrast gradation even in digital exposure; employs gelatin coating and small grain size |
| 06/28/2007 | WO2007073463A1 Photochromic 2h-naphthopyrans |
| 06/28/2007 | WO2007073462A1 Photochromic materials having electron-withdrawing substituents |
| 06/28/2007 | WO2007050778A3 Laser writable media substrate, and systems and methods of laser writng |
| 06/28/2007 | WO2004111726A3 Novel photosensitive resin compositions |
| 06/28/2007 | US20070148604 matting agents; photosensitive silver halides |
| 06/28/2007 | US20070148595 Resin having a monocyclic or polycyclic alicyclic hydrocarbon structure, of which solubility in an alkali developer increases under an action of an acid, a photoacid generator, methacrylic resins having hydrolysable ester groups and solvent; profiles; pattern collapse; immersion exposure; ARF lasers |
| 06/28/2007 | US20070148594 acrylic ester polymers; photomasks; high resolution and improved in line edge roughness and bias |
| 06/28/2007 | US20070148593 Polymerizable composition and planographic printing plate precursor using the same |
| 06/28/2007 | US20070148592 Photosensitive composition, pattern-forming method using the photosensitive composition and compounds used in the photosensitive composition |
| 06/28/2007 | US20070148591 Pattern and wiring pattern and processes for producing them |
| 06/28/2007 | US20070148590 Siloxane compound, photoresist composition including the siloxane compound and method of forming a pattern using the photoresist composition |
| 06/28/2007 | US20070148589 Semiconductor such as IC, a circuit substrate of liquid crystal, thermal head , lithography of other photo-applications; for immersion exposure, which is suitable for exposure by an immersion-type projection exposure apparatus using a light source of of emitting far ultraviolet light |
| 06/28/2007 | US20070148588 Methods of releasing photoresist film from substrate and bonding photoresist film with second substrate |
| 06/28/2007 | US20070148587 Process for preparing stable photoresist compositions |
| 06/28/2007 | US20070148586 Hardmask compositions for resist underlayer film and method for producing semiconductor integrated circuit device using the same |
| 06/28/2007 | US20070148585 Hyperbranched polymer, production method therefor and resist composition containing hyperbranched polymer |
| 06/28/2007 | US20070148584 Base resin is a polyvinylphenol derivative having an alkoxyisobutoxy as a reactive group which is decomposable under the action of an acid to increase solubility in alkali; enhanced contrast of alkali dissolution rate before and after exposure; high sensitivity and resolution in fine feature size regions |
| 06/28/2007 | US20070148583 Lithographic printing plate precursors with mercapto-functionlalized free-radical polymerizable monomers |
| 06/28/2007 | US20070148582 Negative photosensitive composition and negative photosensitve lithographic printing plate |
| 06/28/2007 | US20070148581 Photoresist composition and method of forming resist pattern |
| 06/28/2007 | US20070148557 Composition for forming nitride coating film for hard mask |
| 06/28/2007 | US20070144384 Image recording method |
| 06/27/2007 | EP1800184A1 Silver halide color photographic light-sensitive material |
| 06/27/2007 | EP1716450A4 Use of mixed bases to enhance patterned resist profiles on chrome or sensitive substrates |
| 06/27/2007 | EP1709483A4 Silver halide color photographic light-sensitive material and color image-forming method |
| 06/27/2007 | EP1495061B1 Photochromic compositions, preparation thereof and articles made therefrom or coated therewith |
| 06/27/2007 | EP1451394A4 Aluminum oxide material for optical data storage |
| 06/27/2007 | EP0758469B1 Method for telemanipulation with telepresence |
| 06/27/2007 | CN1987641A Material for increasing absorptive red light of anti-halo dye and its preparing method |
| 06/27/2007 | CN1987640A Polymer for silver halide light sensitive material and its preparing method |
| 06/27/2007 | CN1323327C Composition of refrared sensitive and forebody of lithographic printing plate |
| 06/26/2007 | US7235352 Photothermographic material |
| 06/26/2007 | US7235351 Squalirium compound, thermally developable photographic material containing said compound, and image forming method thereof |
| 06/26/2007 | US7235344 includes first moiety such as photoacid generator capable of modifying the composition in response to an energy transfer, second moiety capable of harvesting energy from an external energy source (photons) positioned in composition such that energy harvested at second moiety is transferred to the first |
| 06/26/2007 | US7235341 Positive resist composition |
| 06/26/2007 | US7235299 Beads of a phenolic compound and a method of obtaining same |
| 06/21/2007 | WO2007068410A2 Photochromic plastic object |
| 06/21/2007 | US20070141518 Sensitized with a selenium compound and containing a metal halide complex of Cr, Mo, Re, Fe, Ru, Os, Co, Rh, Pd, or Pt; high sensitivity, low fog, and hard gradation; excellent latent-image stability even when undergoes high-illumination exposure |
| 06/21/2007 | US20070141514 Method for forming photoresist pattern and photoresist laminate |
| 06/21/2007 | US20070141513 For use in production of semiconductor devices; acid generator that generates an acid upon irradiation of an actinic ray or radiation, resin that has a monocyclic or polycyclic alicyclic hydrocarbon structure and is decomposed by action of an acid to increase solubility in an alkali developing solution |
| 06/21/2007 | US20070141512 Photosensitive composition, pattern-forming method using the photosensitve composition and compound in the photosensitive composition |
| 06/21/2007 | US20070141511 Cyclic compound, photoresist composition and method of forming a photoresist pattern using the same |
| 06/21/2007 | US20070141510 Nanocomposite photosensitive composition and use thereof |
| 06/21/2007 | US20070141509 composed of a polyimide having pendant carboxyl groups, wherein a portion of the carboxyl groups reacted with glycidyl (meth)acrylate monomers to form covalent bonds; photosensitizer |
| 06/21/2007 | US20070141508 Negative resist composition and method for forming resist pattern |
| 06/21/2007 | US20070141507 Curable polyester having an oxetanyl group at end and process for preparing the same, resist composition, jet printing ink composition, curing methods and uses thereof |
| 06/21/2007 | US20070141485 Multilayered imaging element |
| 06/21/2007 | US20070141262 Coating apparatus and method having a slide bead coater and liquid drop applicator |
| 06/21/2007 | US20070137563 Curtain coater and curtain coating method |
| 06/20/2007 | CN1985216A Improved method for bump exposing relief image printing plates |
| 06/20/2007 | CN1985214A Stabilized electrochromic media |
| 06/19/2007 | US7232652 Photothermographic material and image forming method |
| 06/19/2007 | US7232651 Optical recording materials |
| 06/19/2007 | US7232648 Photosensitive resin composition and coating film cured product thereof |
| 06/19/2007 | US7232647 For laser scanning exposure; irradiation polymerizaion with high pressure mercury lamp |
| 06/19/2007 | US7232642 Resin of an acrylic ester with pendant cyclic or heterocyclic groups and an acid generator; suitable for ArF excimer laser lithography, showing excellent resolution, sensitivity, pattern shape, excellent line edge roughness |
| 06/19/2007 | US7232641 Base resin polymer for a positive-resist composition of acrylic ester monomers with pendant adamantine and norbornene groups ; high sensitivity, high resolution in exposure with a high energy beam, reduced line edge roughness due to suppressed swelling at the time of development |
| 06/19/2007 | US7232639 Monomer having fluorine-containing acetal or ketal structure, polymer thereof, and chemical-amplification-type resist composition as well as process for formation of pattern with use of the same |
| 06/19/2007 | US7232637 Light sensitive media for optical devices using organic mesophasic materials |
| 06/14/2007 | US20070134603 Photothermographic material |
| 06/14/2007 | US20070134593 transparent with respect to exposure light; having substantially no compatibility with a liquid for liquid immersion lithography; and causing no mixing with the resist film |
| 06/14/2007 | US20070134592 Photosensitive lithographic printing plate and method for making a printing plate |
| 06/14/2007 | US20070134591 Positive photoresist composition |
| 06/14/2007 | US20070134590 Resin showing an increase in solubility in alkali developer by action of an acid, a compound being capable of generating an acid when irradiated with an actinic ray or radiation, an acrylic resin with silicon-containing units and being stable to acids but insoluble in alkali developer, solvent |
| 06/14/2007 | US20070134589 Positive resist composition and pattern forming method using the same |
| 06/14/2007 | US20070134588 Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist composition |
| 06/14/2007 | US20070134587 Lithographic printing plate precursor and lithographic printing method |
| 06/14/2007 | US20070134586 Excellent resolution and can be developed with an aqueous alkaline solution such as tetramethylammonium hydroxide (TMAH); forms a stable benzoxazole ring by heating; heat resistant film; p-(o-hydroxyphenylaminocarbonyl)styrene for example |
| 06/14/2007 | US20070134585 Dissolution inhibitors in photoresist compositions for microlithography |
| 06/13/2007 | EP1794651A2 Improved slip film compositions containing layered silicates |
| 06/13/2007 | CN1981240A Anti-reflective coatings using vinyl ether crosslinkers |
| 06/12/2007 | US7229753 Photothermographic material and method for forming images |
| 06/12/2007 | US7229752 Silver salt photothermographic dry imaging material |
| 06/12/2007 | US7229751 Silver salt photothermographic dry imaging material and image forming method using the same |
| 06/12/2007 | US7229750 Photosensitizer is a sulfur, selenium or tellurium compounds; low in fogging, storage stability, stable in solution, nondegrading |
| 06/12/2007 | US7229749 Silver halide photographic emulsion and silver halide photosensitive material using thereof |
| 06/12/2007 | US7229741 Asymmetric acrylate or vinyl ether compound containing sulfide groups, aromatic moieties, and optionally bromine is mixed with a matrix polymer precursor (expecially polyurethane) and reacted; holography recording medium |
| 06/12/2007 | US7229738 Silver halide emulsion layer on a support, contains a fluorine compound with >/=2 fluoroalkyl groups, and anionic and nonionic hydrophilic groups |
| 06/12/2007 | US7229631 Preparation of oil-in-water emulsions stabilised with recombinant collagen-like material and related products |