| Patents for G03C 1 - Photosensitive materials (26,817) |
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| 10/17/2006 | CA2148240C On-demand production of lat imaging films |
| 10/12/2006 | US20060228656 Squalirium compound, thermally developable photographic material containing said compound, and image forming method thereof |
| 10/12/2006 | US20060228648 Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process |
| 10/12/2006 | US20060228647 Photoresist composition |
| 10/12/2006 | US20060228646 Coating compositions for use with an overcoated photoresist |
| 10/12/2006 | US20060228645 Nanocomposite photosensitive composition and use thereof |
| 10/12/2006 | US20060228644 Nanocomposite photoresist composition for imaging thick films |
| 10/12/2006 | US20060228643 Heat-sensitive positive working lithographic printing plate precursor |
| 10/12/2006 | US20060228511 Tack free cauterized edge for pressure sensitive adhesive web |
| 10/11/2006 | EP1709488A1 Photosensitive printing sleeves and method of forming the same |
| 10/11/2006 | EP1709483A1 Silver halide color photographic light-sensitive material and color image-forming method |
| 10/11/2006 | EP1708891A2 Direct thermographic materials with improved protective layers |
| 10/11/2006 | CN1846169A Negative resist composition with fluorosulfonamide-containing polymer |
| 10/10/2006 | US7119368 Thin film transistor array panel and manufacturing method thereof |
| 10/10/2006 | US7118851 Silver halide emulsion and production process thereof |
| 10/10/2006 | US7118849 Photothermographic materials with UV absorbing compounds |
| 10/10/2006 | US7118847 Polymer and photoresist compositions |
| 10/10/2006 | US7118846 Positive resist composition and method of forming a resist pattern using the same |
| 10/10/2006 | US7118844 Storage stability and light fixation properties; synthesis intermediate for azo dye, an analytical reagent |
| 10/10/2006 | US7118836 Flatness, thinness; poly 3,4-ethylenedioxythiophene and polystyrene sulphonic acid film having silver metal randomly distributed throughout; high conductivity |
| 10/10/2006 | US7118806 Plastic molded product having photochromic characteristic and/or polarizing characteristics |
| 10/10/2006 | US7117807 Dynamically modifiable polymer coatings and devices |
| 10/05/2006 | WO2006104803A2 Novel photosensitive resin compositions |
| 10/05/2006 | WO2006103816A1 Support for image recording material, process for producing the same, and image recording material |
| 10/05/2006 | WO2006103238A1 Protective material comprising reversible and irreversible photochemical functional constituents, and coating method |
| 10/05/2006 | WO2006103225A1 Use of polypeptides in the form of adhesive agents |
| 10/05/2006 | US20060223013 Silver halide color photographic photosensitive material and image forming method |
| 10/05/2006 | US20060223009 Imaging methods |
| 10/05/2006 | US20060223002 Planographic printing plate precursor having an image-recording layer containing an infrared ray absorbent, a polymerization initiator, a polymerizable compound, and a thiol compound |
| 10/05/2006 | US20060223001 a polysilsesquioxane resin containing an acid-dissociable group and (B) a photoacid generator; chemically amplified resist excelling in depth of focus (DOF), decreasing development defects; specified water contact angle of exposed and unexposed regions |
| 10/05/2006 | US20060223000 Method of reducing sensitivity of EUV photoresists to out-of-band radiation and EUV photoresists formed according to the method |
| 10/05/2006 | US20060222999 Photopolymerization; ink jet printing; waterproofing; flexibility; useful as coatings, adhesives, inks and film coatings, ultraviolet inks for ink jet, sealers for display panels such as liquid crystals and organic electroluminescence, adhesives for bonding optical disks; improved adhesion |
| 10/05/2006 | US20060222998 Positive photosensitive composition |
| 10/05/2006 | US20060222969 Photosensitive colored composition and color filter |
| 10/05/2006 | US20060222839 Photosensitive material for non-substrate liquid crystal display |
| 10/05/2006 | US20060219143 Surface topography for non-toxic bioadhesion control |
| 10/04/2006 | EP1708021A1 Thermal processing method of silver salt photothermographic dry imaging material |
| 10/04/2006 | EP1707610A2 Photochromic polymerizable composition |
| 10/04/2006 | EP1706791A2 Photoresist compositions and processess of use |
| 10/04/2006 | EP1706789A1 Photographic materials having improved keeping properties |
| 10/04/2006 | EP1269469B1 Three-dimensional optical memory |
| 10/04/2006 | CN1842743A Photosensitive resin composition and LCD using the same |
| 10/04/2006 | CN1842580A Photochromic compounds |
| 10/04/2006 | CN1278186C UV-absorbing support layers and flexographic printing elements comprising same |
| 10/04/2006 | CN1278180C Silver halide photosensitive emulsion, and silver halide photosensitive material using the same |
| 10/04/2006 | CN1277886C Waveguide tube and composition |
| 10/03/2006 | US7115359 Leuco dye, polyhalomethane compound; a hydroxy compound with double bond, a benzotriazine-sulfonate compound, or a nitrogen containing heterocyclic ring compound as stabilizer |
| 10/03/2006 | US7115358 Photostable silver salt of an azole compound, a silver salt of a mercapto compound |
| 10/03/2006 | US7115357 Silver halide color reversal photosensitive material |
| 10/03/2006 | US7115356 Silver halide color photosensitive material |
| 10/03/2006 | US7114660 Non-image pixel data stored on hard-copy image media |
| 09/28/2006 | WO2006101714A1 Thermally developable materials with amorphous silica |
| 09/28/2006 | US20060216661 Photothermographic material |
| 09/28/2006 | US20060216660 Photothermographic material |
| 09/28/2006 | US20060216659 Silver halide photosensitive material |
| 09/28/2006 | US20060216657 Image forming method using photothermographic material |
| 09/28/2006 | US20060216648 Nanopastes for use as patterning compositions |
| 09/28/2006 | US20060216644 Method for preparing photosensitive aqueous developable coating composition |
| 09/28/2006 | US20060216643 Positive photoresist composition with a polymer including a fluorosulfonamide group and process for its use |
| 09/28/2006 | US20060216642 Lithographic printing plate precursor and lithographic printing method |
| 09/28/2006 | US20060216641 Novel photosensitive resin compositions |
| 09/28/2006 | US20060216640 Photosensitive lithographic printing plate |
| 09/28/2006 | US20060216639 Planographic printing plate precursor and method of producing the same |
| 09/28/2006 | US20060216638 Infrared-ray photosensitive planographic printing plate precursor |
| 09/28/2006 | US20060216637 Planographic printing plate precursor and plate-making method thereof |
| 09/28/2006 | US20060216636 Catalytic resist including metal precursor compound and method of patterning catalyst particles using the same |
| 09/28/2006 | US20060216635 Positive resist composition and pattern forming method using the same |
| 09/28/2006 | US20060216634 Photoactive adhesion promoter in a slam |
| 09/27/2006 | EP1379918A4 Imageable element comprising graft polymer |
| 09/27/2006 | EP1171877B1 Erasable optical recording material for blue lasers |
| 09/26/2006 | US7113627 Location of extended linear defects |
| 09/26/2006 | US7112640 fluoropolymer, whereby a laminate can be formed by a simple method such as co-extrusion, without requiring the surface treatment of the layer of the fluoropolymer |
| 09/26/2006 | US7112617 A gas phase oxidizer (e.g. ozone, H2O2, or N2O) is photodissociated with ultraviolet light into a reactive gas that is patternwise directed (e.g., through a mask) onto a surface of a material, e.g. an organosilicate. The reactive species reacts with the material to form a polar oxidation product OH |
| 09/26/2006 | US7112616 Two-photon absorbing polymerizable composition and polymerization process thereof |
| 09/26/2006 | US7112402 comprising, on a support, an image forming layer containing a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent and a binder, and a non-photosensitive layer, wherein non-photosensitive layer contains an ester slipping agent liquid at a ordinary temperature |
| 09/26/2006 | US7112401 Photothermographic material and image forming method using the same |
| 09/26/2006 | US7112399 Photothermographic materials with opaque crossover control means |
| 09/26/2006 | US7112398 blocked compound, preferably a developer, that decomposes by a 1,2 elimination mechanism to release a photographically useful group on thermal activation |
| 09/26/2006 | US7112348 Coating method and apparatus |
| 09/21/2006 | WO2006098296A1 Optical storage medium making use of oligothiophene |
| 09/21/2006 | US20060210935 non-photosensitive aliphatic carboxylic acid silver salts; a photosensitive emulsion containing photosensitive silver halide grains; a silver ion reducing agent; a binder; and a cyan coloring leuco dye |
| 09/21/2006 | US20060210934 Black and white photothermographic material |
| 09/21/2006 | US20060210933 Photothermographic material |
| 09/21/2006 | US20060210932 Photothermographic material |
| 09/21/2006 | US20060210931 Thermally developable materials with narrow disperse amorphous silica |
| 09/21/2006 | US20060210924 Photostorage solid drawing medium |
| 09/21/2006 | US20060210923 Photosensitive composition, image-recording material and image-recording method |
| 09/21/2006 | US20060210922 Comprising resin insoluble or sparingly soluble in an alkali but capable of decomposing under action of an acid to increase solubility in an alkali developer, the resin having a beta (meth)acroyloxy-gamma -butyrolactone repeating unit, and compound capable of generating an organic acid |
| 09/21/2006 | US20060210921 Positive photosensitive composition and image recording material using the same |
| 09/21/2006 | US20060210920 Photosensitive composition and lithographic printing plate precursor |
| 09/21/2006 | US20060210919 Photosensitive composition and pattern-forming method using the same |
| 09/21/2006 | US20060210918 Negative working light sensitive planographic printing plate material and planographic printing plate manufacturing process |
| 09/21/2006 | US20060210917 Positive-working, thermally sensitive imageable element |
| 09/21/2006 | US20060210916 Positive photoresist composition and method of forming resist pattern |
| 09/21/2006 | US20060210915 Having a high dry etching rate compared with photoresist, and causing no intermixing with the photoresist, manufacture of semiconductor device |
| 09/21/2006 | US20060210914 dissolution promoter(s) of given formula such as 1,1-bis(4-hydroxyphenyl)cyclohexane and an alkali-soluble novolak containing hydroxyalkyl ether units that can be substituted with 1,2-naphthoquinonediazidesulfonyl groups; excellent resolution and good suppression of crack generation during plating |
| 09/21/2006 | US20060210913 Photoresist composition and, used in the photoresist composition, low-molecular compound and high-molecular compound |
| 09/21/2006 | US20060210912 Alkali-soluble copolymer of p-isopropenylphenol, unsaturated carboxy acid, acrylic ester, and unsaturated aliphatic polycyclic compound, especially isobornyl (meth)acrylate and tricyclo[5.2.1.02,6]decanyl (meth)acrylate; unsaturated compound; and radical polymerization initiator; used for forming bumps |
| 09/20/2006 | EP1701835A1 Process for laser welding polyester compositions |
| 09/20/2006 | EP1326910B1 Films and compositions |