Patents for G03C 1 - Photosensitive materials (26,817)
09/2007
09/12/2007CN100337159C 卤化银彩色照相感光材料 The silver halide color photographic light-sensitive material
09/11/2007US7268188 Heating a crosslinkable polymer to form a softened polymer, the crosslinkable polymer, subjecting the softened polymer to an electric field to provide a poled polymer having aligned, polarizable chromophore moieties; cooling the poled polymer to provide a hardened, crosslinked polymer
09/11/2007US7267936 For use in graphic arts or in the manufacture of printed circuits having a photographic emulsion layer; and 0.4 g/m2 or less of an antihalation underlayer or a pelloid layer and a solid particle dye; increased dimensional stability
09/11/2007US7267935 Thermally developable materials stabilized with crown ethers
09/11/2007US7267933 Image forming method using photothermographic material
09/11/2007US7267929 Producing barrier ribs for a pixel pattern from a mixture of an alkali-soluble photosensitive resin having acidic groups and at least three ethylenic double bonds per molecule; an ink repellent copolymer having fluoroalkyl groups; and a photopolymerization initiator
09/11/2007US7267924 Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the same
09/11/2007US7267150 Method of and apparatus for manufacturing instant photographic film units
09/07/2007WO2007063332A3 Laser-imageable marking compositions
09/06/2007US20070207925 applying an UV curable resin blends comprising a thermosetting resin or an alkyd resin and a colorless color former, exposure to UV or high energy radiation whereby the color is formed; without the need of a developer
09/06/2007US20070207417 Photosensitive silver halide, a photo-insensitive organic silver salt, a reducing agent for silver ion and a binder, one of which contains an oxazoline compound
09/06/2007US20070207416 includes a substrate containing a colorless image deposited thereon, a developer composition reactive with the colorless image; for developing and blocking or concealing images to provide clandestine messages and other unique effects
09/06/2007US20070207410 Planar inorganic device
09/06/2007US20070207408 Polymers, positive resist compositions and patterning process
09/06/2007US20070207407 Light sensitive planographic printing plate material
09/06/2007US20070207406 Anti-reflective coatings using vinyl ether crosslinkers
09/06/2007US20070207405 photoresists; photomasks; etching
09/06/2007US20070207404 photoresist is patterned and annealed in an atmosphere comprising at least one gas selected from hydrogen, nitrogen and fluorine-containing materials; preferably, the anneal is performed after patterning the photoresist, but either immediately after, or subsequent to, the trim
09/06/2007US20070207403 Branching self-assembling photoresist with decomposable backbone
09/06/2007DE4426119B4 Photobildfähige Massen, enthaltend 1,2-dihalogenierte Ethane auf Schichtträgermaterial, zur Verbesserung des Druckbildes Photo image-capable compounds containing 1,2-dihalogenated ethanes on substrate material, to improve the print image
09/05/2007EP1829035A2 Photoactive film, its preparation and use, and preparation of surface relief and optically anisotropic structures by irradiating said film
09/05/2007EP1735661B1 Thermally developable materials containing organic silver salts
09/05/2007CN100335967C Polyoxyalkylene ammonium salts and their use as antistatic agents
09/04/2007US7265234 Hydrolysis catalysts; polymerization catalysts; condensation polymerization; photoresists; photomasks; solvent extraction; etching
09/04/2007US7265161 manufacture of three dimensional inorganic structures without molding or embossing steps; nanostructure; photoinitiator, reactive curable organic polymer, transparent oxide particles (silica); formed structure can be pyrolyzed to remove organic components and leave an inorganic structure; resolution
09/04/2007US7264920 Image forming layer containing photosensitive silver halide emulsions, nonphotosensitive organic silver compound, reducing agent and binder; medical imaging for diagnosis; high speed resolution
09/04/2007US7264919 Mono-sheet heat-developable photosensitive material and method of forming image
09/04/2007US7264916 Laser marking method
09/04/2007US7264914 Especially interpolymers from substituted cyclobutanorbornenes and fluoroolefins or fluorinated vinyl ethers; photoresists have high UV transparency (particularly at short wavelengths, e.g., 157 nm)
09/04/2007US7264913 Coatings comprising mixtures of polyesters, curing agents and acids or acid generators, used to form semiconductors by photolithographic
09/04/2007US7264912 Filtration raw materials; dissolving in solvent
09/04/2007US7264855 Imaging member with vacuous core base
08/2007
08/30/2007US20070202448 Selenium-sensitized silver chloride content of 90 mole % or above; N-(o-oxyphenyl)-alpha-(cyclo)alkanoyl-alpha-1-cyclicimidoacetamide yellow dye-forming coupler; magenta and cyan dye-forming couplers; light-insensitive hydrophilic colloid layer
08/30/2007US20070202443 Method for processing lithographic printing plate precursor, plate inspection method, image quality control method and dyeing aqueous solution used therein
08/30/2007US20070202440 Developing a photoresist film by exposing the resist to deep ultraviolet radiation (365 nm) to activate a radiation-sensitive acid generator to release an acid to effect acid and/or carbonol labile groups on the polymer; single or bilayers; positives and negatives; improved sensitivity/resolution
08/30/2007US20070202439 Polymerizable composition and planographic printing plate precursor
08/30/2007US20070202438 Light sensitive planographic printing plate material and its manufacturing process
08/30/2007US20070202437 Photosensitive composition
08/30/2007US20070202436 Photosensitive compositions useful for forming active patterns, methods of forming such active patterns and organic memory devices incorporating such active patterns
08/30/2007US20070202435 Methods of forming optical waveguides
08/30/2007US20070202434 Light Sensitive Coating Compositions Useful For Lithographic Elements
08/29/2007EP1825325A1 Low refractive index polymers as underlayers for silicon-containing photoresists
08/29/2007EP1824890A1 Less shear-thinning polyvinyl acetals
08/29/2007EP1708891B1 Direct thermographic materials with improved protective layers
08/28/2007US7262294 Wear resistance and high colourability characteristics; for use in paints, lacquers, paints or lacquers based on hybrid polysiloxanes and/or silica gel, plastics
08/28/2007US7262002 Capable of ensuring high sensitivity, hard gradation, and excellent latent-image stability even when undergoes high-illumination exposure
08/28/2007US7262001 Support with organic silver salt, silver halide, binder, and a reducing agent; roughness; high image density; storage stability, heat resistance
08/28/2007US7262000 Photothermographic material and image forming method for the photothermographic material
08/28/2007US7261999 Photothermographic materials containing post-processing stabilizers
08/28/2007US7261998 Imageable element with solvent-resistant polymeric binder
08/28/2007US7261996 For use in the surface of printed circuit boards or semiconductor packages as a protective dry film solder mask
08/28/2007US7261995 Provide a precise pattern profile and are useful in microfabrication using electron beams or deep-UV light
08/28/2007US7261993 Photoresists and processes for microlithography
08/28/2007US7261842 Photochromic compositions, preparation thereof and articles made therefrom or coated therewith
08/23/2007WO2007094784A1 Adamantane based molecular glass photoresists for sub-200 nm lithography
08/23/2007US20070196779 Black and white photothermographic material
08/23/2007US20070196778 Black and white photothermographic material
08/23/2007US20070196777 Black and white photothermographic material
08/23/2007US20070196773 Top coat for lithography processes
08/23/2007US20070196766 Photosensitive composition, pattern-forming method using the photosensitive composition and compounds used in the photosensitive composition
08/23/2007US20070196765 Radiation-sensitive positive resin composition for producing platings, transfer film, and process for producing platings
08/23/2007US20070196764 Resist composition for supercritical development
08/23/2007US20070196742 Mask-Patterns Including Intentional Breaks
08/23/2007US20070196004 Method and apparatus for transforming coordinate systems in a telemanipulation system
08/23/2007DE102006007622A1 Hochechte Diketopyrrolopyrrol-Pigmente True high Diketopyrrolopyrrole pigments
08/23/2007DE102006007621A1 Diketopyrrolopyrrol-Pigmente mit erhöhten Echtheiten und Verfahren zu deren Herstellung Diketopyrrolopyrrole pigments with increased fastness properties and processes for their preparation
08/22/2007CN1333307C Over-coating composition for photoresist and process for forming photoresist pattern using the same
08/22/2007CN101023393A Photosensitive material for silver halide color photograph
08/22/2007CN101021679A Silver halide photographic material and image-forming method using the same
08/21/2007US7258970 Silver halide; a non-photosensitive organic silver salt; a heat developer; a binder; and a alkyl fluoroalkyl sulfosuccinate
08/21/2007US7258969 Exhibits high sensitivity, high contrast, little sensitivity variation with humidity conditions at the time of exposure, and excellent reciprocity law properties at high illumination intensities
08/21/2007US7258968 Thermally developable materials with buried conductive backside coatings
08/21/2007US7258967 Photothermographic materials containing print stabilizers
08/21/2007US7258964 Printing plates using binder resins having polyethylene oxide segments
08/21/2007US7258962 Positive-tone radiation-sensitive resin composition
08/21/2007US7258822 Tertiary amine derivative dispersed in or bonded to a polymer binder, in which the nitrogen is bonded to three aromatic groups, one of which is substituted by one or more cyclic pi conjugated electron-attractive groups; superior nonlinear optical performance, heat and sublimation resistance; amorphous
08/21/2007CA2215134C Stabilizer combination
08/16/2007WO2007092242A1 Photothermographic reducing agents with bicyclic or tricyclic substitution
08/16/2007WO2007092208A1 Photothermographic materials incorporating arylboronic acids
08/16/2007US20070190468 Black-and-white, organic solvent based, containing especially phenylboronic acid or derivatives that provide the materials with reduced initial image Dmin and improved hot-dark Dmin print stability without unacceptable loss in sensitometric properties.
08/16/2007US20070190467 Silver halide photographic material and image-forming method using the same
08/16/2007US20070190458 Resist composition and patterning process using the same
08/16/2007US20070190457 Photoacid generator, organonitrogen compound, and a silicone prepared by cohydrolysis of a mixture of three silane monomers containing a fluorinated norbornane group, an organic group having a carboxyl group protected with an acid labile group, and a lactone ring-bearing organic group, respectively
08/16/2007US20070190456 Planographic printing plate material
08/16/2007US20070190455 Smooth surface photresist pattern; using acrylated ester and acid generator; for use with a wavelength of no more than 200 nm, and particularly an ArF excimer laser
08/16/2007US20070190454 Photoresist composition, method of patterning thin film using the same, and method of manufacturing liquid crystal display panel using the same
08/16/2007US20070190453 Liquid immersion exposure; can transmit Argon fluoride excimer laser lights
08/16/2007US20070190452 Flexographic printing plate precursor and imaging method
08/16/2007US20070190451 Calixresorcinarene compounds, photoresist base materials, and compositions thereof
08/16/2007US20070190450 photoresists contains an amide or ester monomers increasing affinity of a resist for a plating solution; forming a barrier metal layer on a wafer; producing a plated shaped article, highly precisely forming a high bump having a height of 20 to 200 mu m on a chip base; wettability; photolithography
08/16/2007US20070190449 Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer
08/16/2007US20070190448 Positive-type resist composition for liquid immersion lithography and method for forming resist pattern
08/16/2007US20070190447 Photoresist composition and method of forming resist pattern
08/16/2007US20070190446 Lithographic printing original plate and lithographic printing plate
08/16/2007US20070190436 Resist composition
08/15/2007EP1818860A2 RFID device
08/15/2007EP1818719A1 Silver halide photographic material and image-forming method using the same
08/15/2007EP1818718A2 Photothermographic material and method of thermal development of the same
08/15/2007EP1817633A1 Thermally developable materials having improved backside layers
08/15/2007EP1817632A1 Thermally developable materials with improved conductive layer
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