Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03C - Photosensitive materials for photographic purposes; Photographic processes, e.g. cine, x-ray, colour or stereo-photographic processes; Auxiliary processes in photography › G03C 1 - Photosensitive materials
Patents for G03C 1 - Photosensitive materials (26,817)
11/2007
11/22/2007US20070269745 Al substrate with a hydrophilic surface and a radiation-sensitive coating on the hydrophilic surface containing monomeric or polymeric compounds, each comprising at least one ethylenically unsaturated group accessible to a free radical polymerization, a polyarylenevinylene sensitizer, coinitiator
11/22/2007US20070269744 Resist Composition for Electron Beam or Euv (Extreme Ultraviolet) and Method for Forming Resist Pattern
11/22/2007US20070269743 Conductive lithographic polymer and method of making devices using same
11/22/2007US20070269741 Copolymer for positive type lithography, polymerization initiator used in production of said copolymer, and composition for semiconductor lithography
11/22/2007US20070269740 Methods of marking and related structures and compositions
11/22/2007US20070269739 Materials for lithographic plates coatings, lithographic plates and coatings containing same, methods of preparation and use
11/22/2007US20070269737 Color forming compositions and associated methods
11/22/2007US20070269736 NEW SUB 40 NM RESOLUTION Si CONTAINING RESIST SYSTEM
11/22/2007US20070269735 Radiation-Sensitive Resin Composition
11/21/2007EP1857875A1 Heat developing recorder and heat developing recording method
11/21/2007EP1654126B1 Process for providing marking on security papers
11/21/2007CN101076860A Photoactive film, its preparation and use, and preparation of surface relief and optically anisotropic structures by irradiating said film
11/20/2007US7297616 Methods, photoresists and substrates for ion-implant lithography
11/20/2007US7297465 Postive working lithography printing plate on support, infrared radiadiation absorber, binder and polysiloxane; sensitivity
11/20/2007US7297464 comprising: a siloxane resin, photoacid generator or photobase generator, and a solvent capable of dissolving component and curing acceleration catalyst
11/20/2007US7297463 photosensitive polymer without a footing phenomenon even if there is a post exposure delay between an exposure process and a post-exposure-bake process
11/20/2007US7297462 Heat-sensitive lithographic printing plate precursor
11/20/2007US7297461 An acid- dissociable group-containing polysiloxane and a photoacid generator containing a trifluoromethane sulfonic acid or other fluoroalkyl sulfonic acid compounds
11/20/2007US7297460 Radiation curable ink compositions suitable for ink-jet printing
11/20/2007US7297297 Organic dye molecules and nonlinear optical polymeric compounds containing chromophores
11/15/2007US20070264592 Resist polymer, preparing method, resist composition and patterning process
11/14/2007EP1551886A4 Fluorinated polymers useful as photoresists, and processes for microlithography
11/13/2007US7294605 Thermographic recording materials containing a mesionic, 1,2,4-triazolium-3-thiolate compound
11/13/2007US7294448 Polymer comprising a 1-alkoxy- or 1-aryloxy-alkyl alkacrylate repeating unit, e.g., 1-n-propoxy-2-methylpropyl methacrylate, a compound that generates an acid by visible light irradiation, and a sensitizing dye; useful as an electronic circuit forming material, a lithographic printing material, etc.
11/13/2007US7294290 Photochromic composition in a solid matrix
11/13/2007US7294171 Method and apparatus for degassing coating liquid
11/08/2007WO2007125937A1 Photoreactive composition, optical material, optical recording material, volume hologram recording material, optical recording medium, and optical recording method therefor
11/08/2007US20070259287 Resin Composition for Forming Fine Pattern and Method for Forming Fine Pattern
11/08/2007US20070259286 Reversible Piezochromic Systems
11/08/2007US20070259279 Near Infrared Ray Activation Type Positive Resin Composition
11/08/2007US20070259274 photoresist mixtures including acid generators, curing agents, solvents, dissolution accelerators, surfactants, adhesion promoters and antifoam agents, used for generating image on substrates; lithography
11/07/2007EP1800184A4 Silver halide color photographic light-sensitive material
11/07/2007CN101069128A Silver halide color photographic light-sensitive material
11/06/2007US7291689 Thermally stable low dielectric norbornene polymers with improved solubility and adhesion property
11/06/2007US7291449 Methine dye containing furan or pyrrole rings fused with amidine or oxazole or thiazole rings; high sensitive and generates less residual colors after processing
11/06/2007US7291448 Photothermographic material
11/06/2007US7291447 Cut sheet; an opaque planar film and ribs that extend a length of the film; facilitating rolling of the film in one direction as opposed to an opposite direction providing flat print viewing surface
11/06/2007US7291443 Mixture of dye, free radical catalyst and unsaturated compound in binder
11/01/2007WO2007123399A1 Multi-layer support
11/01/2007WO2006124552A3 Method of forming a photoresist element
11/01/2007US20070254249 Photothermographic material
11/01/2007US20070254247 Radiation-sensitive resin composition
11/01/2007US20070254240 Dye-containing negative curable composition, color filter and method for producing the same
11/01/2007US20070254239 Resist for printing and patterning method using the same
11/01/2007US20070254238 Method for Making a Lithographic Plate
11/01/2007US20070254237 Photoresist polymer, photoacid generator and solvent; exposing to actinic radiation through patterned photomask; development; immersion lithography; 1,1,1,3,3,3-hexafluoroisopropyl methacrylate-1-ethyl-cyclopentyl methacrylate copolymer; semiconductors; highly soluble in developer
11/01/2007US20070254236 High contact angle topcoat material and use thereof in lithography process
11/01/2007US20070254235 Self-topcoating resist for photolithography
11/01/2007US20070251638 Method and composition for the adhesion of materials
11/01/2007US20070251304 Demonstration Kit And Method For Enhancing And/Or Demonstrating Photoactive Properties
10/2007
10/31/2007EP1849566A2 Method for telemanipulation with telepresence
10/31/2007EP1848584A1 Support for image recording material and image recording material
10/31/2007EP1803030A4 Silver halide color light-sensitive material
10/30/2007US7288363 2,4,6-Triisopropylbenzenesulfonate compound capable of generating an acid upon exposure to radiation or electron beams, polymer which changes solubility in alkaline developer under action of acid, and basic compound having high sensitivity, contrast, resolution, storage stability
10/30/2007US7288362 Immersion topcoat materials with improved performance
10/30/2007US7288360 A support and a photo/thermosensitive layer formed on the support which contains an alkali-soluble resin, a photothermal converting substance and an ester compound; increases solubility to an alkaline developer as a result of exposure to an infrared laser
10/30/2007US7288359 Radiation-sensitive resin composition
10/25/2007WO2007121456A2 Wet developable bottom antireflective coating composition and method for use thereof
10/25/2007WO2007120714A1 Thermally developable materials with buried conductive backside coatings
10/25/2007WO2007120698A1 Thermally developable materials with buried conductive backside coatings
10/25/2007US20070249748 Copolymer of (meth)acrylic acid with ethylenically unsaturated compounds, 1-[4-morpholinophenyl]-2-dialkylamino-2-(4-alkylbenzyl)-alkane-1-one photoinitiator, and a polyol that is partially or fully esterified with an ethylenically unsaturated carboxylic acid
10/25/2007US20070248919 Lithographic pellicle
10/25/2007US20070248918 Compositions, systems and methods for imaging
10/25/2007US20070248911 Pattern forming method and bilayer film
10/25/2007US20070248910 Polyamide
10/25/2007US20070248908 Advanced chemically amplified resist for sub 30nm dense feature resolution
10/24/2007EP1846802A1 Thermally developable materials with improved conductive layer
10/24/2007EP1846236A1 Support for image recording material and image recording material
10/24/2007CN200963571Y Electrodialysis desalting equipment for photographic emulsions preparing production line
10/23/2007US7285373 Terpolymer or copolymer comprising comonomers of (meth)acrylic acid, (meth)acrylate monomer, olefin, and/or 2-(trifluoromethyl)acrylic acid derivative; triphenyl sulfonium nonaplate as a photoacid generator; adhesiveness with low dependency to substrate, etch resistance, transparency, resolution
10/23/2007US7285369 Positive resist composition and pattern formation method using the same
10/23/2007US7285368 Radiation transparent; etching resistance; high resolution; micropatterning using electron beams or ultraviolet radiation
10/23/2007US7285363 Photoactivators, methods of use, and the articles derived therefrom
10/18/2007WO2007117504A2 Substrate having dye layers that locationally change in color upon exposure to beam
10/18/2007US20070243488 Resin composition
10/18/2007US20070243487 Forming method of resist pattern and writing method of charged particle beam
10/18/2007US20070243486 Composition for forming adhesive layer and relief printing plate using the same, and method for manufacturing relief printing plate
10/18/2007US20070243484 Wet developable bottom antireflective coating composition and method for use thereof
10/18/2007US20070243473 Hologram Recording Material and Hologram Recording Medium
10/18/2007US20070242592 Three-dimensional optical memory
10/17/2007EP1845109A2 Optical devices made from radiation curable fluorinated compositions
10/17/2007CN101056896A Less shear-thinning polyvinyl acetals
10/17/2007CN100343283C Cellulose acylate and solution thereof
10/16/2007US7282324 Photoresist compositions, hardened forms thereof, hardened patterns thereof and metal patterns formed using them
10/16/2007US7282322 Sensitivity, no inhibition time, and low shrinkage; long-term storage and archival life stabilities under high temperature and humidity conditions; holographic optical data storage, optical lenses, beam steerers, and waveguides
10/16/2007US7282321 Lithographic printing method and presensitized plate
10/16/2007US7282319 Photoresist composition and method of forming a pattern using same
10/16/2007US7282318 Photoresist composition for EUV and method for forming photoresist pattern using the same
10/16/2007US7282310 Alkali metal halide stimulable phosphor formed by a vapor-accumulation method, decreased bending property, decreased sensitivity unevenness
10/16/2007US7282256 Photosensitive resin laminate for sign boards
10/11/2007US20070238050 Photoresist, can suppress contamination of a mirror tower, has high etching resistance, can solve problems in edge roughness, can be adapted to developer solutions having various alkali concentrations; irradiating photosensitive layer, heat treatment; developing
10/11/2007US20070238049 Planographic printing plate material and printing process
10/11/2007US20070238047 Photosensitive resin composition for color filters
10/11/2007US20070238046 Laser marking
10/11/2007US20070238045 Multi-layered radiation imageable coating
10/11/2007US20070236764 Silver halide holograhic sensitive material and system for taking holograhic images by using the same
10/10/2007EP1842663A1 White multilayer film
10/10/2007EP1841918A1 Apparatus for regulating the application width of a slide-fed curtain coater
10/10/2007EP1841917A1 Supporting arrangement in the curtain coating of a paper/board web
10/10/2007CN200959073Y Handwriting sampler band against print
1 ... 16 17 18 19 20 21 22 23 24 25 26 27 28 29 30 31 32 33 34 35 36 ... 269