| Patents for G03C 1 - Photosensitive materials (26,817) |
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| 06/07/2007 | WO2007063332A2 Laser-imageable marking compositions |
| 06/07/2007 | US20070128560 Color photography, light-sensitive silver halide emulsion layer or a non silver-containing light-insensitive layer, colorless heterocyclic compound having either one or two hetero atoms in the ring or ring system, other than an imidazole compound, that undergoes less than 10% chemical or redox reaction |
| 06/07/2007 | US20070128548 Photosensitive composition comprising triazine-based photoactive compound containing oxime ester |
| 06/07/2007 | US20070128547 Polymer of styrene modified with alkoxy or alcohol substituents capable of increasing its solubility in an alkali developer under action of an acid, a compound capable of generating an acid upon irradiation with an actinic ray or radiation, and a solvent; nanolithography processes for manufacturing VLSI |
| 06/07/2007 | US20070128546 Imageable members with improved chemical resistance |
| 06/07/2007 | US20070128543 Topcoats for use in immersion lithography |
| 06/07/2007 | US20070128542 Iradiating a CO2 laser having a wavelength of 9 to 11 mu m onto a recording material composed of a recording layer having microcapsules encapsulating a basic dye precursor and a protective binder layer on a support; can be used for making labels for, e.g., beverage cans |
| 06/07/2007 | US20070128541 Materials for photoresist, negative-tone photoresist composition, method of forming resist pattern, and semiconductor device |
| 06/07/2007 | US20070128540 improved flatness, and thus defects on a display screen may be prevented and/or reduced; composition capable of improving fluidity and coating stability |
| 06/07/2007 | US20070128539 Composition for removing photoresist and method of forming a pattern using the same |
| 06/06/2007 | EP1793272A1 Silver halide color photographic photosensitive material and method of image forming |
| 06/06/2007 | EP1312621B1 Process for producing a photochromic cured product |
| 06/06/2007 | CN1320049C Synergistic UV absorber combination |
| 06/05/2007 | US7226728 Photothermographic material |
| 06/05/2007 | US7226727 Silver halide color photographic light-sensitive material |
| 06/05/2007 | US7226724 Positive-type photosensitive composition |
| 06/05/2007 | US7226717 Resin composition comprising: an alkali-soluble resin (A); an infrared absorbing agent (B); and a thiol compound (C), wherein a solubility thereof in an alkaline aqueous solution is changed by exposure with a infrared laser ray, and a |
| 05/31/2007 | WO2007061640A1 Photothermographic materials containing post-processing stabilizers |
| 05/31/2007 | US20070122745 Surface formed by a hydrophilic addition polymer such as polyacrylamide having alkoxysilylalkylthio- end groups crosslinked with a Si, Al, Ti or Zr alkoxide or aryl oxide; improved resistance to stains during printing |
| 05/31/2007 | US20070122744 Positive-working photoresist composition and photosensitive material using same |
| 05/31/2007 | US20070122743 comprising supports having recording layer including multilayers containing water-insoluble and alkali-soluble resin containing infrared absorbers, development inhibitors that exhibiting enhanced solubility in an aqueous alkali solution through light exposure |
| 05/31/2007 | US20070122742 Photocurable and thermosetting resin composition, dry film using the same, and cured product thereof |
| 05/31/2007 | US20070122741 Resist protective coating material and patterning process |
| 05/31/2007 | US20070122740 Resist undercoat-forming material and patterning process |
| 05/31/2007 | US20070122739 Planographic printing plate material and printing process |
| 05/31/2007 | US20070122738 Image forming material |
| 05/31/2007 | US20070122736 Resist protective film material and pattern formation method |
| 05/31/2007 | US20070122734 Molecular photoresist |
| 05/31/2007 | US20070122723 Process |
| 05/31/2007 | DE102005056787A1 Connecting system for metal valve and plastic pipe comprises plastic sleeve which fits over pipe, between it and connection on valve, snap-ring with C-shaped cross-section fitting over flange on end of connection and shoulder on sleeve |
| 05/30/2007 | EP1790429A1 Imaging methods |
| 05/30/2007 | EP1789845A1 Thermally developable materials with backside conductive layer |
| 05/30/2007 | EP1789842A1 Stabilized electrochromic media |
| 05/30/2007 | EP1695142A4 Antireflective coatings for via fill and photolithography applications and methods of preparation thereof |
| 05/30/2007 | EP1163550B1 Hydroxy-amino thermally cured undercoat for 193 nm lithography |
| 05/30/2007 | CN2906691Y Cropping-free self-adhesive photograph |
| 05/30/2007 | CN1972803A Imageable element with solvent-resistant polymeric binder |
| 05/29/2007 | US7224545 Methods and systems for overwrite protected storage media |
| 05/29/2007 | US7223531 Photosensitive silver halide, organic silver salt, and reducing agent, and nonphotosensitive layer on support comprising a crosslinking agent precursor of acylurea, sulfonylurea, semicarbazide, aminocarbonylsulfonate, or aminocarbonyloxycarbonyl derivative; waterproof, wear resistance |
| 05/29/2007 | US7223530 Photographic imaging element with reduced fringing |
| 05/29/2007 | US7223529 Hydrophilic colloid layer comprises cyan image dye forming coupler of 2-chloro-6-(ballast-carbonylamino)phenol and saturated high boiling alcohol solvent of 2-hexyl-1-decanol; wear resistance; protective overcoatings |
| 05/29/2007 | US7223528 photographic films comprising supports having photosensitive silver halides, nonphotosensitive organic silver salt, reducing agents and nonphotosensitive layers containing a water soluble magenta dye; quality images having good contrast, discoloration inhibition and surface gloss |
| 05/29/2007 | US7223523 Hydrophilic surfaces; applying peroxy compound; exposure to electromagnetic radiation |
| 05/29/2007 | US7223519 Imaging compositions and methods |
| 05/29/2007 | US7223518 polymer resin does not substantially absorb about 1 to 450 nanometer (nm) wavelength energy and photoacid generator does substantially absorb about 1 to 450 nanometer (nm) wavelength energy |
| 05/29/2007 | US7223445 Process for the deposition of uniform layer of particulate material |
| 05/24/2007 | WO2007059265A2 Imagewise patterning of films and devices comprising the same |
| 05/24/2007 | US20070117876 Alkali-soluble resin containing fluorenediphenoxy residues; photopolymerizable monomer (dipentaerythritol hexaacrylate); photoinitiator; solvent; black pigment; coatable on a liquid crystal display substrate by slit coating; heat resistance |
| 05/24/2007 | US20070117054 Photothermographic material |
| 05/24/2007 | US20070117053 Photothermographic materials containing post-processing stabilizers |
| 05/24/2007 | US20070117052 Mixing the dispersion with an organic polymer to separate the silver halide particles from the dispersion; low fogging, high image density, high sensitivity and superior storage stability |
| 05/24/2007 | US20070117049 Form crosslinks of repeating -(CO-O-CH(-CH3)-O)-; reaction of multifunctional vinyl ether and a polymer with free acid groups, e.g. poly(methacryloyloxy ethyl phthalate); eliminate the bottom anti-reflective coating etch step by using a wet-developable bottom anti-reflective coating; high resolution |
| 05/24/2007 | US20070117045 Alkali soluble reaction product of a copolymer having optionally alkylated styrene and hydroxystyrene units and bisvinyloxyalkylene curing agent; photoacid generator; organic solvent; high sensitivity, heat resistance and resolution; undulation suppression |
| 05/24/2007 | US20070117044 photomasks; etch selectivity; photolithography |
| 05/24/2007 | US20070117043 Photoacid generators and lithographic resists comprising the same |
| 05/24/2007 | US20070117042 Imaging methods |
| 05/24/2007 | US20070117041 Photosensitive coating for enhancing a contrast of a photolithographic exposure |
| 05/24/2007 | US20070117040 Water castable-water strippable top coats for 193 nm immersion lithography |
| 05/24/2007 | US20070117039 Water dispersion latexes, photopolymerizable alkyl methacrylate, nonionic surfactant |
| 05/23/2007 | EP1787165A1 Method for forming an image suitable for multi-colour printing |
| 05/23/2007 | EP1787104A1 Holographic sensor |
| 05/23/2007 | EP1786851A1 Method for preparing photochromic film or plate |
| 05/23/2007 | CN1317611C Determining method and appts. for composing quantity of functional mixture |
| 05/22/2007 | US7220537 Sensitivity, good gradation, coating formulatio store stability and latent image store stability |
| 05/22/2007 | US7220536 Exhibits minimum contamination of the interior of an imager, low level of odor as well as high abrasion resistance during performing a thermal development, image keeping stability after development |
| 05/22/2007 | US7220535 Use of separate bands of UV light for the curing and imaging steps ensures that the techniques provide for a marking that is non-interfering with data read out |
| 05/22/2007 | US7220534 Photosensitive composition and color filter |
| 05/22/2007 | US7220533 For laser scanning exposure; irradiation polymerizaion with high pressure mercury lamp |
| 05/22/2007 | US7220530 Light sensitive planographic printing plate material |
| 05/22/2007 | US7220529 Mixture of addition polymer and cyanine dye, sensitivity, storability of unprocessed stock, surface yellowing (stain) resistance, and light fixation |
| 05/22/2007 | US7220307 Treated pigment, use thereof, and compound for pigment treatment |
| 05/22/2007 | US7220306 Pigment produced by treating an organic pigment or carbon black each having a functional group reactive with a carbodiimide group; and a polyester side chains, polyether side chain, or a polyacrylic side chain |
| 05/18/2007 | WO2006098877A3 Method and apparatus for analyzing an imaging material |
| 05/17/2007 | US20070112140 Reversible crosslinking method for making an electro-optic polymer |
| 05/17/2007 | US20070111145 Thermally developable materials with backside conductive layer |
| 05/17/2007 | US20070111143 Method of fixing organic molecule and micro/nano article |
| 05/17/2007 | US20070111141 Negative-working photosensitive resin composition and photosensitive resin plate using the same |
| 05/17/2007 | US20070111140 Excellent resist pattern after development in liquid immersion lithography; high resolution, high sensitivity and high resolution to high energy beam; reduced line edge roughness because reduced swelling; copolymer comprising a vinyl naphthalene monomer and an unsaturated sulfonium monomer |
| 05/17/2007 | US20070111139 Negative resist composition and patterning process |
| 05/17/2007 | US20070111138 Photoactive compounds |
| 05/17/2007 | US20070111137 Resist polymer solution and process for producing the same |
| 05/17/2007 | US20070111136 photopolymerizing compound with two or more acrylic ester bonds in the molecule which further containing ether or carbamate characteristic groups with a bond, breaks when monomer is heated, a photopolyerization initiator, acid generator e.g. halogenonium, sulfonium etc. a binder; curing; plating, etching |
| 05/17/2007 | US20070111135 Positive resist composition and method of forming resist pattern using same |
| 05/17/2007 | US20070111108 High refractive index; flexibility; high sensitivity; low scattering; weatherproofing; durability; containing organometallic compound and fine metal oxide particles |
| 05/17/2007 | US20070111107 Hologram recording material, and hologram recording medium |
| 05/16/2007 | EP1784689A1 Improved antistatic properties for thermally developable materials |
| 05/16/2007 | EP1784686A2 Green electrochromic (ec) material and device |
| 05/16/2007 | CN1964796A Enhanced scratch resistance of articles containing a combination of nano-crystalline metal oxide particles, polymeric dispersing agents, and surface active materials |
| 05/16/2007 | CN1963664A Photosensitive hologram recording material of shortwave wide band and preparing method of the same |
| 05/16/2007 | CN1316421C Laser engraving methods and compositions, and articles having laser engraving thereon |
| 05/16/2007 | CN1316314C Photographic silver halide emulsion and photographic sensitive silver halide material using sand emulsion |
| 05/16/2007 | CN1315951C Laser light absorber |
| 05/15/2007 | US7217501 Development; wear resistance; using computers; support , heat sensitive layer |
| 05/15/2007 | US7217498 Heat-sensitive lithographic printing plate precursor |
| 05/15/2007 | US7217497 Undercoating for ultraviolet radiation lithography; chemical amplified photoresists; semiconductor |
| 05/15/2007 | US7217496 Fluorinated photoresist materials with improved etch resistant properties |
| 05/15/2007 | US7217495 Fluorinated polymers, photoresists and processes for microlithography |
| 05/15/2007 | US7217492 Onium salt compound and radiation-sensitive resin composition |
| 05/15/2007 | US7217490 Processes for producing silane monomers and polymers and photoresist compositions comprising same |
| 05/10/2007 | US20070105059 Image forming method using photothermographic material |