| Patents for G03C 1 - Photosensitive materials (26,817) |
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| 08/15/2007 | EP1817115A1 Lateral guide used for curtain coating |
| 08/15/2007 | CN1332265C Method and device for forming silver halide emulsion granulars and method for forming fine granulars |
| 08/15/2007 | CN101019017A 全息传感器 Holographic Sensors |
| 08/14/2007 | US7256221 Mixture of photopolymer, photoinitiator and viscosity adjustment; adhesives, seals |
| 08/14/2007 | US7255982 Black-and-white, organic solvent based, containing especially phenylboronic acid or derivatives that provide the materials with reduced initial image Dmin and improved hot-dark Dmin print stability without unacceptable loss in sensitometric properties. |
| 08/14/2007 | US7255974 Pattern formation method |
| 08/14/2007 | US7255973 Containing a polymer having exo-form ester units from a norbornanyl (meth)acrylate derivative and units from an ester having two hexafluoroisopropanol groups; minimized in line edge roughness by swelling during development and residue after development, and improved in adhesion |
| 08/14/2007 | US7255972 Chemically amplified positive photosensitive resin composition |
| 08/14/2007 | US7255971 A compound capable of generating an acid upon irradiation with one of an actinic ray and a radiation; (B) a resin that is insoluble or slightly soluble in alkalis, but becomes alkali-soluble under an action of an acid; (C) a basic compound; and |
| 08/14/2007 | US7255912 Antistatic layer comprises areas of patterned coverage that makes up a graphic design; photographic paper for example; simpler to manufacture, lower cost |
| 08/14/2007 | US7255896 die coater has a large width of 1 m or larger and is covered with a fluorine based resin at a portion coming in contact with liquid coating composition, thereby making it possible to obtain coated products having uniform coating layer thickness in the lateral direction of coating and few coating failures |
| 08/09/2007 | WO2007047840A3 Photopolymerizable medium comprising siloxane compounds that support cationic polymerization for holographic storage |
| 08/09/2007 | US20070185226 Novel polymerizable compound, polymer, positive-resist composition, and patterning process using the same |
| 08/09/2007 | US20070184388 Developing solution for lithographic printing plate precursor and method for preparing lithographic printing plate |
| 08/09/2007 | US20070184384 Novel sulfonium compound, photosensitive composition containing the compound and pattern-forming method using the photosensitive composition |
| 08/09/2007 | US20070184383 Photosensitive composition, photosensitive planographic printing plate material, and recording method of planographic printing plate material |
| 08/09/2007 | US20070184382 Salt suitable for an acid generator and a chemically amplified resist composition containing the same |
| 08/09/2007 | US20070184381 Lithographic printing plates with high print run stability |
| 08/09/2007 | US20070184380 Negative-working radiation-sensitive compositions and imageable materials |
| 08/09/2007 | US20070184379 Peeling-off method and reworking method of resist film |
| 08/09/2007 | US20070184366 Dye containing curable composition, color filter, and process of preparing color filter |
| 08/09/2007 | US20070184234 Photo-responsive high-molecular compound, photo-responsive high-molecular composition, dicarboxylic acid monomer, polyester, optical recording medium and optical record reproducing device |
| 08/08/2007 | CN1331006C Method of preparing nano fatty acid aluminium powder |
| 08/08/2007 | CN1331005C Silver halide type color photographic paper |
| 08/08/2007 | CN101013257A Application of metal organic acid salt as development accelerant |
| 08/07/2007 | US7253826 Thermal development apparatus |
| 08/07/2007 | US7252925 1-Alkoxy- or cycloalkoxy(poly)oxyethylenebenzimidazoles, e.g., 1-(2-methoxyethyl)-1H-benzimidazole, used to form amplified resists with excellent resolution, form precisely configured patterns with minimized roughness of sidewalls and useful in microfabrication using electron beams or deep-UV light. |
| 08/07/2007 | US7252865 Durability |
| 08/07/2007 | US7252710 for producing black matrices having high insulating characteristics and color filters having high transmissivity and high contrast, excellent in developing characteristics; consisting of a pigment derivative, pigment intermediate, colorant derivative and intermediate each reactive with a carbodiimide |
| 08/07/2007 | CA2427696C Photopatternable sorbent and functionalized films |
| 08/02/2007 | WO2007086523A1 Silver halide photosensitive material, conductive metal film, translucent electromagnetic wave shielding film, optical filter and plasma display panel |
| 08/02/2007 | WO2007031712A3 Method of forming conductive tracks |
| 08/02/2007 | US20070178417 Photothermographic material and an image forming method |
| 08/02/2007 | US20070178416 Photothermographic material includes polycycloolefin, a cycloolefin copolymer, or a copolymer of olefin and maleimide or maleamide; image forming layer comprising photosensitive silver halide, non-photosensitive organic silver salt, reducing agent, and binder; film surface properties; photography |
| 08/02/2007 | US20070178415 Silver halide color photographic light-sensitive material |
| 08/02/2007 | US20070178414 Developing solution and method for producing lithography printing plate |
| 08/02/2007 | US20070178407 Polymer, resist protective coating material, and patterning process |
| 08/02/2007 | US20070178406 Coating compositions for use with an overcoated photoresist |
| 08/02/2007 | US20070178405 Positive resist composition and method of pattern formation with the same |
| 08/02/2007 | US20070178404 Methods of preventing defects in antireflective coatings |
| 08/02/2007 | US20070178394 Resist composition |
| 08/01/2007 | EP1812236A1 Multi-layer support |
| 08/01/2007 | CN1329776C Silver halide photographic emulsion and silver halide sensitive material using such emulsion |
| 08/01/2007 | CN1329477C Photochromic polymer compositions and articles thereof |
| 08/01/2007 | CN1329380C Trisresorcinyltriazines |
| 08/01/2007 | CN101010630A Improved slip film compositions containing layered silicates |
| 07/31/2007 | US7250249 Black and white photothermographic material |
| 07/31/2007 | US7250246 Positive resist composition and pattern formation method using the same |
| 07/31/2007 | CA2304576C A laminate comprising a thin borosilicate glass substrate as a constituting layer |
| 07/26/2007 | WO2007068410A3 Photochromic plastic object |
| 07/26/2007 | US20070172978 Manufacture of a polymer device |
| 07/26/2007 | US20070172779 Hologram silver halide photographic material, hologram and method for producing the same |
| 07/26/2007 | US20070172777 Image forming method using a silver halide color photographic light-sensitive material, and silver halide color photographic light-sensitive material |
| 07/26/2007 | US20070172764 Multilayer imageable element containing sulfonamido resin |
| 07/26/2007 | US20070172763 Fluorine-containing ethylenic monomer having hydroxyl group or fluoroalkyl carbonyl group and fluorine-containing polymer prepared by polymerization of same |
| 07/26/2007 | US20070172762 Reacting a polymer containing an aliphatic monocyclic fluoroalcohol unit (poly(1,1,2,3,3-pentafluoro-4-trifluoromethyl-4-hydroxy-1,6-heptadiene) with an alkyloxycarbonylalkyl-group compound (methyl-norbornyloxycarbonylmethyl) in the presence of an organic base. |
| 07/26/2007 | US20070172761 Positive photosensitive composition and method of forming pattern using the same |
| 07/26/2007 | US20070172760 Photosensitive polymer and photoresist composition having the same |
| 07/26/2007 | US20070172758 Planographic printing plate material and its manufacturing process |
| 07/26/2007 | US20070172757 base resin comprises homo-/copolyenes having alkali soluble group, exhibits changed alkali solubility under action of acid, acid generator, and tertiary alkanolamines; for patterning semiconductor integrated circuit via lithography; improved resolution |
| 07/26/2007 | US20070172756 Photosensitive resin composition, photosensitive element comprising the same, process for producing resist pattern, and process for producing printed wiring board |
| 07/26/2007 | US20070172755 Positive photoresist and method for producing structure |
| 07/26/2007 | US20070172754 Recording paper used for an electrophotographic system and image recording method |
| 07/24/2007 | US7247659 Oligomers or polymers with carboxylic acid groups, photosensitive resins and polymers with double bonds |
| 07/24/2007 | US7247590 Blend of liquid crystalline aromatic polyester and dielectric ceramics |
| 07/24/2007 | US7247422 Heat—developable photosensitive material containing latex polymer in outermost layer |
| 07/24/2007 | US7247421 Photothermographic material is developed in a thermal developing device configured such that a distance between an exposing section and a developing section is not more than 50 cm |
| 07/24/2007 | US7247419 Nanocomposite photosensitive composition and use thereof |
| 07/19/2007 | WO2007080877A1 Heat-developable photosensitive material and method for heat-development treatment of heat-developable photosensitive material |
| 07/19/2007 | US20070166652 Digital Mold Texturizing Methods, Materials, and Substrates |
| 07/19/2007 | US20070166644 Photoresist composition and method of forming a photoresist pattern using the same |
| 07/19/2007 | US20070166643 Photosensitive resin composition and manufacturing method of semiconductor device using the same |
| 07/19/2007 | US20070166642 Photosensitive resin composition, and cured product and use thereof |
| 07/19/2007 | US20070166641 improve lithography characteristics, and reduction in defects; increase solubility in developing solution under the action of acid which is generated by acid generator on irradiation; tetra- or tripolymers contains monomers of methacrylic acid, adamantyl methacrylate, butyrolactone acrylate |
| 07/19/2007 | US20070166640 Defect reduction in immersion lithography |
| 07/19/2007 | US20070166639 Laminated resist used for immersion lithography |
| 07/18/2007 | CN1326960C Coating compositions for use with an overcoated photoresist |
| 07/18/2007 | CN1326959C Coating compositions for use with an overcoated photoresist |
| 07/18/2007 | CN1326843C Diamino-1,2-diphenyl ethylene derivs. |
| 07/18/2007 | CN100999582A Photosensitive bottom anti-reflective coatings |
| 07/17/2007 | US7244551 Minimal graininess; storability; containing compound which undergoes one electron oxidation |
| 07/17/2007 | US7244550 Silver halide color photographic photosensitive material |
| 07/17/2007 | US7244549 Pattern forming method and bilayer film |
| 07/17/2007 | US7244548 Photopolymerizing composition and photopolymerizing recording medium manufactured using the same and used to manufacture 3D optical memory having ultra-high information storage capacity |
| 07/17/2007 | US7244545 Fluorinated compound, fluoropolymer and process for its production |
| 07/17/2007 | US7244473 Active ray curable ink-jet composition, image forming method using the same, ink-jet recording apparatus, and triarylsulfonium salt compound |
| 07/17/2007 | CA2337820C Method of making motion picture release-print film |
| 07/12/2007 | WO2007078529A1 Photochromic indeno-fused naphthopyrans |
| 07/12/2007 | US20070160940 Laminated film for dye-sensitized solar cell and electrode for dye-sensitized solar cell, and process for their production |
| 07/12/2007 | US20070160934 Actinic radiation absorbing compound uniformly distributed throughout support layer, with photopolymerizable material deposited thereon, and masking layer; relief imaging |
| 07/12/2007 | US20070160930 Fluorine-free resin, acid generator, and a fluorinated component such as fluorinated surfactant; use in photoresist overcoat layers, including in immersion lithography processing; fewer post-development watermark defects |
| 07/12/2007 | US20070160929 photoresists; photomasks; heat treatment; high resolution and prevent dissolution in water and penetration of water when processed by immersion lithography |
| 07/12/2007 | US20070160928 Photosensitive resin composition for printing substrate capable of laser sculpture |
| 07/12/2007 | US20070160927 Radiation-sensitive resin composition, process for producing the same and process for producing semiconductor device therewith |
| 07/11/2007 | EP1805559A2 Low-k dielectric functional imprinting materials |
| 07/11/2007 | EP1805558A1 Silver halide color photosensitive material and method of processing the same |
| 07/11/2007 | EP1805157A2 Tricyclic spacer systems for nonlinear optical devices |
| 07/10/2007 | US7241564 Silver halide holographic sensitive material and system for taking holographic images by using the same |
| 07/10/2007 | US7241563 Silver halide emulsion layer, light-insensitive dye-forming-coupler-containing layer, and non-color-forming intermediate layer of a color-mixing inhibitor and a non-color-forming intermediate layer free of color-mixing inhibitor |
| 07/10/2007 | US7241562 Color photographic element having improved speed |