| Patents for G03C 1 - Photosensitive materials (26,817) |
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| 07/05/2006 | EP1550077A4 Laser engraving methods and compositions, and articles having laser engraving thereon |
| 07/05/2006 | CN1262879C Silver-halide photographic emulsion and silver halide photographic light-sensitive material made by same |
| 07/05/2006 | CN1262550C Green light spectrum sensitizer, and synthesis method and use thereof |
| 07/05/2006 | CN1262408C Deformed correcting method and cutting method, deformed correcting and cutting devices for thin sheet body |
| 07/04/2006 | US7072565 polysilsesquioxanes and polysiloxanes and second component containing a plurality of functional groups chosen from epoxides, oxetanes, vinyl ethers; can be used in forming the clad and/or core layers to be coated on copper foil and, in the dried state, bent around a conical Mandrel bar without cracking |
| 07/04/2006 | US7072564 Waveguide compositions and waveguides formed therefrom |
| 07/04/2006 | US7072563 polysilsesquioxanes and polysiloxanes and second component containing a plurality of functional groups chosen from hydroxy, amino, thiol, sulphonate ester, carboxylate ester, silyl ester, anhydride, aziridine, methylolmethyl, silyl ether to improve flexibility of the composition in a dried state |
| 07/04/2006 | US7071255 Radiation-sensitive composition capable of having refractive index distribution |
| 07/04/2006 | US7071143 Multilayer; support, heat sensitive imaging layer and protective polymer coating |
| 07/04/2006 | US7070916 Radiation image conversion panel and production method thereof |
| 07/04/2006 | US7070910 Silazane compound amd methods for using the same |
| 06/29/2006 | WO2005088397A3 A process of imaging a deep ultraviolet photoresist with a top coating and materials thereof |
| 06/29/2006 | US20060141406 Photosensitive coating on one side of a support; on the other side nonphotosensitive layers some of which contain a water soluble phthalocyanine dye and a polymer of a vinyl tert-amine or vinyl N-heteroaryl monomer or quaternary ammonium salt of the polymer or a polyvalent metal salt as dye-fixing agent |
| 06/29/2006 | US20060141405 Photothermographic material |
| 06/29/2006 | US20060141404 Boron compounds as stabilizers in photothermographic materials |
| 06/29/2006 | US20060141403 black and white photographic materials comprising supports having imaging layers comprising polymer binders, photosensitive silver halides, non-photosensitive source of reducible silver ions, reducing agents and sulfur compounds |
| 06/29/2006 | US20060141402 Aqueous-based photothermographic materials containing tetrafluoroborate salts |
| 06/29/2006 | US20060141401 Minimal graininess; storability; containing compound which undergoes one electron oxidation |
| 06/29/2006 | US20060141394 Radiating material of octafunctional epoxidized novolac resin, solvent, photopolymerization initiator; dialkyl phthalate, malonate, sebacate, and/or adipate plasticizer; and adhesion promoter of glycidoxypropanetrimethoxysilane, mercaptopropyltrimethoxysilane, and/or aminopropyltrimethoxysilane |
| 06/29/2006 | US20060141393 Alkali-soluble resin; a quinone diazide; and a mixture of surfactants including a 3-(perfluoroalkyl)-1,2-epoxypropane, reaction product between methylhydrobis(trimethylsiloxy)silane and polyalkylene glycol monoallyl ether preferably having a molecular weight from 200 to 500 and a 2nd ether silicone |
| 06/29/2006 | US20060141392 Photosensitive resin composition, method for preparing the same, and dry film resist comprising the same |
| 06/29/2006 | US20060141391 Laser marking of documents of value |
| 06/29/2006 | US20060141390 Composition for coating a photoresist pattern |
| 06/29/2006 | US20060141389 For use in the formation of connection terminals such as bumps or metal posts, and wiring patterns, during both the manufacture of circuit substrates, and the manufacture of electronic components |
| 06/29/2006 | US20060141388 Chemically amplified positive photoresist composition for thick film, thick-film photoresist laminated product, manufacturing method for thick-film resist pattern, and manufacturing method for connection terminal |
| 06/29/2006 | US20060141387 Chemically amplified positive photoresist composition for thick film, thick-film photoresist laminated product, manufacturing method for thick-film resist pattern, and manufacturing method for connection terminal |
| 06/29/2006 | US20060141386 For use in the formation of connectors such as bumps or metal posts, and wiring patterns, during both the manufacture of circuit substrates, and the manufacture of electronic components |
| 06/29/2006 | US20060141385 Coating a substrate with a first photoresist, exposing the first photoresist with radiation, developing the first photoresist;applying a second photoresist layer onto the substrate, exposing the second photoresist with radiation in the second image area;developing the second photoresist |
| 06/29/2006 | US20060141384 Process for refining crude resin for electronic material |
| 06/29/2006 | US20060141383 Sulfonium salts, radiation- sensitive acid generators, and positive radiator-sensitive resin compositions |
| 06/29/2006 | US20060141382 Resist composition and method of forming resist pattern using same |
| 06/29/2006 | US20060141381 Photosensitive resin composition, and photosensitive element, method for forming resist pattern and printed wiring board using the composition |
| 06/29/2006 | US20060137276 Construction material based on gypsum |
| 06/28/2006 | EP1673662A1 Low-polydispersity photoimageable polymers and photoresists and processes for microlithography |
| 06/28/2006 | EP1470448B1 Mixture of substances which can be hardened by heat and by actinic radiation, method for the production and use thereof |
| 06/28/2006 | EP1269257B1 Method of forming image on support |
| 06/28/2006 | CN1795417A Information recording medium and its manufacturing method, recording/reproducing method, and optical information recording/reproducing device |
| 06/27/2006 | US7068928 Method and apparatus for photographically recording an image |
| 06/27/2006 | US7067243 Sensitizing silver halide grains in aqueous dispersion comprising merocyanine dyes |
| 06/27/2006 | US7067242 a support with layers of a non-photosensitive source of reducible silver ions, a reducing agent and a binder with a conductive metal oxide; reducing electrostatic charge |
| 06/27/2006 | US7067233 a photoresist composition of a polyether; a diphenyl propenol polymerized with epichlorhydrin, an acrylate resin, a curing agent, and an organic solvent; a high curing efficiency, brightness; prevents the formation of remnant in photoresist patterns |
| 06/27/2006 | US7067231 Polymers, resist compositions and patterning process |
| 06/22/2006 | WO2006065466A1 Thermally developable materials having improved backside conductive layers |
| 06/22/2006 | WO2006065443A1 Thermally developable materials having improved backside layers |
| 06/22/2006 | US20060135730 Beads of a phenolic compound and a method of obtaining same |
| 06/22/2006 | US20060135663 Fluorinated copolymer process for its production and resist composition containing it |
| 06/22/2006 | US20060134567 Heat-developable photosensitive material and heat-developing method using the same |
| 06/22/2006 | US20060134566 Silver halide photographic light-sensitive material |
| 06/22/2006 | US20060134553 Photoresist pattern; smooth surface and edges; resolution; wide depth of focus range; acid generator upon exposure |
| 06/22/2006 | US20060134552 Smooth surface photresist pattern; using acrylated ester and acid generator |
| 06/22/2006 | US20060134551 Lithium salt of polyacetylene as radiation sensitive filaments and preparation and use thereof |
| 06/22/2006 | US20060134550 Precursor comprising a hydrophilic support and provided thereon, a photopolymerizable light sensitive layer containing an (meth)acrylic ester compound with tert-amine group; sensitivity, printing durability, stain elimination property, dot reproduction, and sludge restraining property |
| 06/22/2006 | US20060134549 P-hydroxystyrene-alkyl alkacrylate copolymer in an organic solvent; good reproducibility, stability, fine patterning accuracy and uniform thickness; reduced line-edge roughness, high resolution |
| 06/22/2006 | US20060134548 (Mercaptoalkyl)alkoxysilane-endcapped addition polymer (polyacrylamide, polyvinylacetamide) crosslinked with an alkoxide of Si, Ti, Zr or Al; improved resistance to stains during printing; can be scan-exposed on the basis of digital signals and processed into a printing plate by aqueous development |
| 06/22/2006 | US20060134547 Low refractive index polymers as underlayers for silicon-containing photoresists |
| 06/22/2006 | US20060134546 Low refractive index polymers as underlayers for silicon-containing photoresists |
| 06/22/2006 | US20060134545 Negative resist composition and process for formation of resist patterns |
| 06/22/2006 | DE19537291B4 Bis-Resorcinyltriazine Up-Resorcinyltriazine |
| 06/21/2006 | EP1672427A1 Radiation-curing composition, method for storing same, method for forming cured film, method for forming pattern, method for using pattern, electronic component, and optical waveguide |
| 06/21/2006 | EP1671184A2 Photoresist compositions comprising diamondoid derivatives |
| 06/20/2006 | US7064861 Method for recording a digital image and information pertaining to such image on an oriented polymer medium |
| 06/20/2006 | US7063941 Method for chemical sensitization of silver halide for photothermographic use |
| 06/20/2006 | US7063940 Curl resistant media |
| 06/20/2006 | US7063939 Nanoimprint lithography; pressing an embossed, transparent mold into a photoresist film applied to substrate to transfer the pattern of protrusions and recesses by deforming the resist; efficient development; nonseparating, dimensional stability if overexposed to developer and/or etchant; semiconductors |
| 06/20/2006 | US7063931 Positive photoresist composition with a polymer including a fluorosulfonamide group and process for its use |
| 06/20/2006 | US7063925 Layer comprising a photographic image formed by combination of dyes formed from couplers wherein areas of said photo image are colored without dyes formed by couplers; printing of text, graphics and images applied to packaging material. |
| 06/20/2006 | US7063924 Security device with patterned metallic reflection |
| 06/15/2006 | WO2006063165A2 Composition for forming a laser-markable coating and process for forming a marking by laser exposure |
| 06/15/2006 | WO2006061419A2 Photoactive film, its preparation and use, and preparation of surface relief and optically anisotropic structures by irradiating said film |
| 06/15/2006 | WO2006047772A3 Tricyclic spacer systems for nonlinear optical devices |
| 06/15/2006 | US20060127826 Photothermographic material and image forming method |
| 06/15/2006 | US20060127809 Unsaturated compound (dipentaerythritol hexaacrylate) and macromolecular compound having units of sulfonium, iodonium, diazonium or azinium salts of carboxylic acid, ketocarboxylic acid, sulfonic acids or sulfonamides; superior in recording sensitivity and printing durability |
| 06/15/2006 | US20060127808 Positive type resist composition and resist pattern formation method using same |
| 06/15/2006 | US20060127807 Smooth surface photresist pattern; using acrylated ester and acid generator; for use with a wavelength of no more than 200 nm, and particularly an ArF excimer laser |
| 06/15/2006 | US20060127806 Copolymers of (meth)acrylic esters containing an adamantyl, 1,4-methanonaphthyl, 1,4:5,8-dimethanonaphthyl, 4,7-methanoindanyl, or 4,7-methanoisobenzofuranyl moiety as a dissolution inhibitor, an acid generator and a polar solvent; improved edge and surface smoothness, resolution and depth of focus range |
| 06/15/2006 | US20060127805 Kit for making relief images |
| 06/15/2006 | US20060127804 Is not water-soluble and acts as a photoacid generator, it can be used to prepare a top anti-reflective coating for immersion lithography |
| 06/15/2006 | US20060127803 Pentapolymer of tert-butyl acrylate, (meth)acrylic acid, alkyl (meth)acrylate, maleic anhydride, and N-perfluoroalkylsulfonyloxynorbornene-2,3-dicarboximide; immersion lithography; prevents the multiple interference of light inside a photoresist during formation |
| 06/15/2006 | US20060127802 Infrared sensitive mixture of a hydroxy substituted polymer such as a novolak or resole and a diphenylcarbinol solubility suppressor, e.g.,4,4'-bis(dimethylamino)benzhydrol, benzhydrol or 4,4'-dimethoxybenzhydrol; may also contain an infrared radiation absorbing compound. |
| 06/15/2006 | US20060127801 Resist polymer and resist composition |
| 06/15/2006 | US20060127800 Imaging polymer (ketal-functionalized); radiosensitive dissolution-inhibiting acid generator; and unprotected acidic group-functionalized radiation sensitive acid generator; used with electron projection, extreme UV , and soft x-ray radiation |
| 06/15/2006 | US20060127799 Method for forming resist pattern and resist pattern |
| 06/15/2006 | US20060127798 Resist and method of forming resist pattern |
| 06/15/2006 | US20060125911 Image display medium, process for forming image, and multicolor image-forming apparatus |
| 06/15/2006 | CA2589067A1 Photoactive film, its preparation and use, and preparation of surface relief and optically anisotropic structures by irradiating said film |
| 06/13/2006 | US7060775 Polymer compound, resist material and pattern formation method |
| 06/13/2006 | US7060655 Black and white photography; mixture of heat sensitive elements, organosilver salt , binder and a 2-mercaptobenzothiazole |
| 06/13/2006 | US7060654 an imaging compound: a matrix having an antenna and an activator; with a dispersed alloy as an independent phase, said alloy having an antenna and further having a leuco-dye and an accelerator uniformly distributed; for use in fast-marking coatings, initiated and addressable by low-energy |
| 06/13/2006 | US7060426 a primary core of a photosensitive silver halide and a shell of non-photosensitive silver salts, with an organic silver coordinating ligand containing an imino group or a long chain aliphatic carboxylate, a reducing agent; lower temperatures, good image tone, quality and stability; medical radiography |
| 06/13/2006 | US7060425 preventing the migration of oxidised developer by incorporating a substituted benzofuranone scavenger into an interlayer between light sensitive silver halide emulsion layers; photo, heat, oxygen resistance |
| 06/13/2006 | US7060423 Mixture of photosensitive silver halide emulsion, organosiliver compound, developer and binder |
| 06/08/2006 | WO2005111717A3 Image recording method |
| 06/08/2006 | US20060121397 Silver halide emulsion silver halide photographic sensitive material and method of image formation |
| 06/08/2006 | US20060121390 Polymeric resist product of reacting an adamantyl compound, such as 2-(4-methoxybutyl)-2-adamantyl methacrylate, a cationic photoacid generator that is methacryloyloxyphenyldimethylsulfonium perfluoroalkyl sulfonate or dimethylphenylsulfonium p-vinylbenzenesulfonate and optionally hydroxystyrene |
| 06/08/2006 | US20060121389 Melts |
| 06/08/2006 | US20060121388 Alkali-soluble resin with polyaromatic group and photosensitive composition comprising the resin |
| 06/07/2006 | EP1664923A1 Negative resist composition with fluorosulfonamide-containing polymer |
| 06/07/2006 | CN1782866A UV-absorbing support layers and flexographic printing elements comprising same |
| 06/06/2006 | US7057054 Hexafluorocyclopentene di-substituted with an alkoxy- and aryl-substituted furan and/or thiophene; e.g., 1,2-bis(2-methoxy-5-phenyl-3-thienyl)hexafluorocyclopentene; nonfading |
| 06/06/2006 | US7056959 Comprises alkali soluble resin, phthalocyanine dye, and photosensitive compound; for photopolymerization; for use in liquid crystal displays; heat/light resistance |