Patents for G03C 1 - Photosensitive materials (26,817) |
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01/01/2008 | US7314703 Chemically amplified resist material and pattern formation method using the same |
01/01/2008 | US7314701 Radiation-sensitive resin composition |
01/01/2008 | US7314700 Imaging polymer (ketal-functionalized); radiosensitive dissolution-inhibiting acid generator; and unprotected acidic group-functionalized radiation sensitive acid generator (dimethylphenylsulfonium perfluorobutylsulfonate); used with electron projection, extreme UV , and soft x-ray radiation |
12/27/2007 | WO2007147782A2 Oxime sulfonates and the use therof as latent acids |
12/27/2007 | WO2007127229A3 Photochemical and photothermal rearrangements for optical data and image recording |
12/27/2007 | WO2007117975A3 Dual band color forming composition and method |
12/27/2007 | WO2007106885A3 Photographic printing paper and method of making same |
12/27/2007 | US20070298349 Antireflective Coating Compositions Comprising Siloxane Polymer |
12/27/2007 | US20070298348 Silver Halide Color Photographic Light-Sensitive Material and Image Forming Method |
12/26/2007 | EP1870169A1 Coater of electric insulating sheet and method for producing electric insulating sheet with coated film |
12/26/2007 | CN101095082A Dissolution rate modifiers for photoresist compositions |
12/26/2007 | CN100357332C 聚合固化性组合物 Polymerizable curable composition |
12/25/2007 | US7312178 Base support for image recording medium and method of manufacturing the same and image recording medium |
12/25/2007 | US7312016 Chemically amplified positive resist composition and patterning process |
12/25/2007 | US7312015 Containing structural units derived from a (meth)acrylic ester with a hydrophilic site; washed using an organic solvent that dissolves the resin; separation into two layers by combining with water; chemically amplified photoresist |
12/25/2007 | US7312013 Photoreactive composition |
12/21/2007 | WO2007146277A2 System and method for exposing electronic substrates to uv light |
12/21/2007 | WO2007145094A1 Thermally developable photosensitive material |
12/21/2007 | WO2007144452A1 Hybrid inorganic-organic polymer compositions for anti-reflective coatings |
12/20/2007 | US20070292804 Comprises an alkali-soluble resin, a photopolymerizable compound and a photopolymerization initiator, the polymerization initiator comprising a hexaarylbisimidazole based compound, and a multifunctional thiol compound; excellent in stability with maintaining sensitivity |
12/20/2007 | US20070292803 Optical recording medium and recording method thereof |
12/20/2007 | US20070292768 Comprises arylsulfonyloxime; for integrated circuits; suited for deep UV lithography; improved in pattern profile shape particularly when the thickness of resist film is reduced |
12/19/2007 | EP1867474A1 Support for image recording material, process for producing the same, and image recording material |
12/19/2007 | EP1867472A2 Composite material and method for manufacturing such composite material |
12/19/2007 | EP1866699A1 Photochromic materials with reactive substituents |
12/19/2007 | EP1866150A1 Use of polypeptides in the form of adhesive agents |
12/18/2007 | US7309750 Cyanoadamantyl compounds and polymers |
12/18/2007 | US7309565 Image forming layer surface is brought into contact with sticky rollers during or before exposing and developing to make the peel-off static electrification between the photothermographic dry imaging material and the sticky roller to be from -5 to +5 kV; high quality images for mammary diagnosis |
12/18/2007 | US7309564 Photothermographic material and image forming method |
12/18/2007 | US7309561 Polymer for forming anti-reflective coating layer |
12/18/2007 | US7309560 Composition for forming anti-reflective coating |
12/13/2007 | US20070287105 developing with photoresists, plasma etching, laminating |
12/13/2007 | US20070287099 Printing resist, method for preparing the same and patterning method using the same |
12/13/2007 | US20070287097 Aluminum support containing multilayer alkali-soluble resin and a light to heat conversion material; sensitivity, chemical resistance |
12/13/2007 | US20070287096 Photoacid generators, chemically amplified resist compositions, and patterning process |
12/13/2007 | US20070287095 Planographic printing plate precursor and pile of planographic printing plate precursors |
12/13/2007 | US20070287094 Planographic Printing Plate, Planographic Printing Plate Material, Support for Planographic Printing Plate Material, and Planographic Printing Method |
12/13/2007 | US20070287093 Low refractive index composition comprising fluoropolyether urethane compound |
12/13/2007 | US20070287091 System and method for exposing electronic substrates to UV light |
12/12/2007 | EP1864162A2 Transfer material, and process for producing liquid crystal cell substrate and liquid crystal display device using the same |
12/12/2007 | EP1863869A1 Thermally developable materials with amorphous silica |
12/12/2007 | CN101087862A Photochromic compounds comprising polymeric substituents and methods for preparation and use thereof |
12/12/2007 | CN101087770A Tricyclic spacer systems for nonlinear optical devices |
12/12/2007 | CN100354751C Method for raising photosensitive rate of silver halide colour photosensitive material |
12/12/2007 | CN100354750C 激光标记方法 A laser marking method |
12/12/2007 | CN100354749C 卤化银乳剂 Silver halide emulsion |
12/12/2007 | CN100354257C Sulfonate and a resist composition |
12/12/2007 | CN100354136C Thermal imaging system |
12/12/2007 | CN100354126C Process for producing cellulose acylate film |
12/11/2007 | US7306900 Blue, green, red-sensitive layer and a non-light-sensitive layer on a support and a silver halide color photosensitive material of a fluorinated diester metal salt; capable of undergoing a one-electron oxidation to a one-electron oxidation product capable of releasing electrons and forming a bond |
12/11/2007 | US7306899 Method for manufacturing photoresist having nanoparticles |
12/11/2007 | US7306894 Unsaturaed monomer, photoinitiator (titanocene), benzotriazole sensitizer; exposure to laser light having a wavelength of 450 nm or shorter; scanning exposure adapted for computer-to-plate systems; storage stability; can reproduce halftone dot area with a high fidelity after accelerated aging |
12/11/2007 | US7306891 Recording layer containing a water-insoluble and alkali-soluble resin and an infrared absorbent, and an organic polymer layer with an arithmetic mean roughness Ra of 0.05 to 0.40 mu m on a face of the plate opposite to the recording layer; long-chain alkyl group-containing polymer matting agent |
12/11/2007 | US7306740 Withdrawing, centrifuging and dispensing fat tissue; autologous fat tissue transplantation |
12/06/2007 | WO2007140293A2 Aerogel compositions with enhanced performance |
12/06/2007 | WO2007140071A1 Photochromic materials comprising haloalkyl groups |
12/06/2007 | WO2007140058A1 Photochromic materials comprising metallocenyl groups |
12/06/2007 | WO2007117504A3 Substrate having dye layers that locationally change in color upon exposure to beam |
12/06/2007 | US20070281244 Color forming compositions with improved marking sensitivity and image contrast and associated methods |
12/06/2007 | US20070281243 Base Material for Pattern Forming Material, Positive Resist Composition and Method of Resist Formation |
12/06/2007 | US20070277580 Aluminum Pipe Production Method |
12/06/2007 | DE102006025707A1 Hochacetalisierte, grobkörnige Polyvinylacetacetale Highly acetalized, coarse-grained Polyvinylacetacetale |
12/05/2007 | EP1861749A2 Novel photosensitive resin compositions |
12/05/2007 | EP1805558A4 Silver halide color photosensitive material and method of processing the same |
12/05/2007 | CN200986651Y Transparent two-sided photo |
12/05/2007 | CN101084467A Silicon containing tarc / barrier layer |
12/05/2007 | CN100353207C Imaging methods |
12/05/2007 | CN100352870C Organic anti-reflective coating polymer, its preparation method and organic anti-reflective coating composition comprising the same |
12/04/2007 | US7304190 Photoresist compositions comprising diamondoid derivatives |
12/04/2007 | US7304176 Process for producing easily polymerizable substance |
12/04/2007 | US7303865 Silver halide; a non-photosensitive organic silver salt; a heat developer; a binder; and a alkyl fluoroalkyl sulfosuccinate |
12/04/2007 | US7303864 Black and white photothermographic material and image forming method |
12/04/2007 | US7303863 Silver halide emulsion and silver halide photographic light-sensitive material |
12/04/2007 | US7303855 Etching resistance; novolak resin having a fluorene or tetrahydrospirobiindene structure, an organic solvent, an acid generator, and a crosslinker, optionally combined with an intermediate layer having an antireflective effect |
12/04/2007 | US7303851 Silver halide photographic light-sensitive material |
11/29/2007 | WO2007136513A1 Multilayered structures and their use as optical storage media |
11/29/2007 | WO2007136051A1 Optical recording material, optical recording medium using the optical recording material, and method for reproducing optical recording medium |
11/29/2007 | US20070275333 Method for Controlling the Treatment of a Crystal with a Liquid |
11/29/2007 | US20070275327 Photosensitive resin composition, resist pattern forming method, substrate processing method, and device manufacturing method |
11/29/2007 | US20070275326 Resist protective film composition and patterning process |
11/29/2007 | US20070275325 Etching resistance; novolak resin having a fluorene or tetrahydrospirobiindene structure, an organic solvent, an acid generator, and a crosslinker, optionally combined with an intermediate layer having an antireflective effect |
11/29/2007 | US20070275324 Terpolymer of 1-ethylcyclooctyl methacrylate, trifluoromethylsulfonamidoethyl methacrylate and lactone substituted methacrylate; radiation sensitive photoresists, imagewise exposing, heating and development; improved resist images in lithography |
11/29/2007 | US20070275323 Increasing photoresist processing throughput |
11/29/2007 | US20070275322 Negative-working radiation-sensitive compositions and imageable materials |
11/29/2007 | US20070275321 Film comprising photoacid generator and polymer having functional groups bonded to protecting moieties deposited on substrate, exposed to patterned radiation resulting in protonation of functional groups and formation of latent image, bonds between protonated groups and protecting moieties cleaved |
11/29/2007 | US20070272902 Aerogel compositions with enhanced performance |
11/28/2007 | EP1860498A1 Photothermographic Material |
11/28/2007 | EP1859933A1 Adhesion-promoting white multilayer film |
11/28/2007 | EP1501688B1 Multilayer image, particularly a multicolor image |
11/28/2007 | CN101080669A Low refractive index polymers as underlayers for silicon-containing photoresists |
11/27/2007 | US7300747 For producing optical materials such as adhesives for optical devices, coating compositions for optical devices, resist materials, prisms, fiber optics, information recording media, filters and plastic lenses |
11/27/2007 | US7300743 Radiation durable organic compounds with high transparency in the vacuum ultraviolet, and method for preparing |
11/27/2007 | US7300741 Advanced chemically amplified resist for sub 30 nm dense feature resolution |
11/27/2007 | US7300740 Lithographic printing plate precursor and lithographic printing method |
11/27/2007 | US7300738 Thermal recording material, storability before images are recorded thereon (unprocessed stock storability), color formation efficiency, reduced in coloration of a background portion due to exposure to light, image stability |
11/27/2007 | US7300727 Method for forming temporary image |
11/27/2007 | US7300619 Compositions and methods for use in three dimensional model printing |
11/27/2007 | US7300606 Pb free Ag paste composition for PDP address electrode |
11/22/2007 | WO2007103645A3 Latent image systems, developers, and blockers therefor |
11/22/2007 | WO2006091648A3 Immersion topcoat materials with improved performance |