| Patents for G03C 1 - Photosensitive materials (26,817) |
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| 07/27/2006 | US20060166150 Photothermographic material |
| 07/27/2006 | US20060166149 Silver halide color photosensitive material |
| 07/27/2006 | US20060166139 applying mixtures of curing agents, light absorbers, acid generators, solvents and polydimethylsiloxane on the surfaces of a layer to be etched, then baking to form films, applying photosensitive materials, exposing to a light source and developing to form patterns |
| 07/27/2006 | US20060166138 Resolution, sensitivity, focal depth; by-product inhibition; mixture containing acid generator |
| 07/27/2006 | US20060166137 Lithographic printing plate precursor, lithographic printing method and packaged body of lithographic printing plate precursors |
| 07/27/2006 | US20060166136 Positive resist composition for immersion exposure and pattern-forming method using the same |
| 07/27/2006 | US20060166135 Novel Acid generator having a carbamoyl structure that generates a sulfonic acid; sensitivity and resolution and improved in the exposure latitude, pattern profile and pitch dependency; use in semiconductor production |
| 07/27/2006 | US20060166134 Photoresist composition and method of forming a pattern using the same |
| 07/27/2006 | US20060166133 Negative resist composition and patterning process |
| 07/27/2006 | US20060166132 Ultraviolet light transparent nanoparticles for photoresists |
| 07/27/2006 | US20060166131 sensitizer and an alkali-soluble novolak containing hydroxyalkyl ether structural units that can be substituted with 1,2-naphthoquinonediazidesulfonyl groups; excellent resolution and good suppression of crack generation during plating |
| 07/27/2006 | US20060166130 Photoresist composition and method for forming resist pattern using the same |
| 07/27/2006 | US20060166128 Lithographic materials based on polymers containing polyhedral oligomeric silsesquioxanes |
| 07/27/2006 | US20060166104 injecting a precursor material through the through-hole and polymerizing the precursor material in contact with the first substrate to form the polymer matrix layer; void free resulting in substantially no optical distortion in the solid polymer matrix layer |
| 07/26/2006 | EP1684115A1 Photothermographic material |
| 07/26/2006 | EP1683164A2 Phosphor screen and imaging assembly |
| 07/26/2006 | EP1682940A1 Ultrahigh speed imaging assembly for radiography |
| 07/26/2006 | EP1682939A1 High-speed radiographic film |
| 07/26/2006 | EP1549713B1 Synergistic uv absorber combination |
| 07/26/2006 | CN1809935A Polymer transistor preparation |
| 07/26/2006 | CN1266541C Silver halides photographic emulsion and silver halides photographic sensitive materials |
| 07/26/2006 | CN1266540C Silver halide color photographic material and image forming method |
| 07/26/2006 | CN1266539C Silver halide emulsion and silver halide photosensitive material |
| 07/25/2006 | US7081333 Depositing a stimulable phosphor onto the support to grow columnar crystals of the stimulable phosphor to form the stimulable phosphor layer, wherein depositing is conducted with rotating the support using a vacuum deposition apparatus comprising a vacuum vessel having a support rotation mechanism |
| 07/25/2006 | US7081327 Chemically amplified positive photoresist composition for thick film, thick-film photoresist laminated product, manufacturing method for thick-film resist pattern, and manufacturing method for connection terminal |
| 07/25/2006 | US7081326 For patterning a substrate, fabrication of semiconductor devices |
| 07/25/2006 | US7081325 Photoresist polymer and photoresist composition including the same |
| 07/25/2006 | US7081324 Image transfer sheet which can be applied to a receptor element, such as cotton or cotton/polyester blend fabrics |
| 07/20/2006 | WO2006075003A1 Antistatic surface finish |
| 07/20/2006 | US20060160039 Photothermographic material |
| 07/20/2006 | US20060160038 Photosensitive silver halide, organic silver salt, and reducing agent, and nonphotosensitive layer on support comprising a crosslinking agent precursor of acylurea, sulfonylurea, semicarbazide, aminocarbonylsulfonate, or aminocarbonyloxycarbonyl derivative; waterproof, wear resistance |
| 07/20/2006 | US20060160024 projecting computer programmed 3-D image with laser on work piece at beam scan speed in projecting mode, applying acrylic copolymeric photosensitive to work piece reducing beam scan speed of 3-D image to beam scan speed in image recording projection mode to form pattern |
| 07/20/2006 | US20060160023 Photo acid generator, chemical amplification resist material and pattern formation method |
| 07/20/2006 | US20060160022 Photoresist compositions comprising resin blends |
| 07/20/2006 | US20060160021 photoresist film may have enough spaces among photosensitive polymers so that acid may be dispersed sufficiently in an exposure process; pattern may be easily formed in a defocus region |
| 07/20/2006 | US20060160020 Photosensitive polymer, photoresist composition having the photosensitive polymer and method of forming a photoresist pattern using the photoresist composition |
| 07/20/2006 | US20060160019 Photosensitive resin, photoresist composition having the photosensitive resin and method of forming a photoresist pattern by using the photoresist composition |
| 07/20/2006 | US20060160018 Electrode-forming composition for field emission type of display device, and method using such a composition |
| 07/20/2006 | US20060160017 better line edge roughness in excimer laser lithography; supramolecule ester useful in photoresists e.g. pentaerythritol, tetrakis(3-(methoxymethyloxycarbonyl)cyclohexanecarboxylate) aka PECHOM and other adamantanyl and norbornyl derivatives |
| 07/20/2006 | US20060160016 Inkjet-imageable lithographic printing members and methods of preparing and imaging them |
| 07/20/2006 | US20060160015 Water soluble resin composition, method of pattern formation and method of inspecting resist pattern |
| 07/20/2006 | US20060160014 Photosensitive composition for interlayer dielectric and method of forming patterned interlayer dielectric |
| 07/19/2006 | EP1681593A2 Image forming method using photothermographic material |
| 07/19/2006 | EP1680710A1 Thermally developable imaging materials with barrier layer |
| 07/19/2006 | CN1806205A Highly reflective substrates for the digital processing of photopolymer printing plates |
| 07/19/2006 | CN1805841A Ultraphobic surface for high pressure liquids |
| 07/18/2006 | US7079176 Digital interactive system for providing full interactivity with live programming events |
| 07/18/2006 | US7078562 Adamantane derivatives and resin compositions using the same as raw material |
| 07/18/2006 | US7078445 Fluorinated, non-urethane containing multifunctional acrylate from a multifunctional alcohol synthesized from a core of hydroxy-reacting functional groups and a fluorinated molecule with hydroxyl groups, and a photoinitiator |
| 07/18/2006 | US7078158 Copolymer of unsaturated ether and unsaturated ester crosslinked with phenolic compound |
| 07/18/2006 | US7078157 Photosensitive composition and use thereof |
| 07/18/2006 | US7078151 Multilayer support with photopolymer resin; photoinitiator |
| 07/18/2006 | US7078148 Photoresist with improved sensitivity and resolution to deep ultraviolet rays/excimer lasers; semiconductors; integrated circuits |
| 07/18/2006 | US7078146 Planographic printing plate material, printing plate and printing method |
| 07/13/2006 | WO2006063165A9 Composition for forming a laser-markable coating and process for forming a marking by laser exposure |
| 07/13/2006 | WO2005067567A3 Photoresist compositions and processess of use |
| 07/13/2006 | US20060154188 Immersion fluid for use in liquid immersion lithography and method of forming resist pattern using the immersion fluid |
| 07/13/2006 | US20060154177 reducing space width of holes and simultaneously removing unwanted holes to change pattern density; coating patterned resist layer with a water soluble negative resist layer, patternwise exposure, forming crosslinked plugs, removing uncrosslinked sections, pattern transfer to substrate; microelectronics |
| 07/13/2006 | US20060154176 Photoresist composition, method of forming a photoresist pattern and method of forming a protection layer in a semiconductor device using the photoresist composition |
| 07/13/2006 | US20060154175 Solid imaging compositions for preparing polypropylene-like articles |
| 07/13/2006 | US20060154174 (meth)acrylate ester copolymer change alkali solubility under action of acid, and acid generator; miniaturization the resist layer by using a water soluble acrylic acid-vinylpyrrolidone copolymer overcoatings; first heat the laminates, narrowing the spacing of the resist pattern; fine resolution |
| 07/13/2006 | US20060154173 Resist composition |
| 07/13/2006 | US20060154172 1-4-Dihydropyridine-containing ir-sensitive composition and use thereof for the production of imageable elements |
| 07/13/2006 | US20060154171 Photoresist composition and method of forming resist pattern |
| 07/13/2006 | US20060154170 Both an unexposed and an exposed coating film formed using the resist composition individually have the maximum increase in thickness equal to or less than 3.0 nm |
| 07/13/2006 | US20060154050 Holographic transfer thermoplastic sheet |
| 07/13/2006 | US20060152780 Deposition of photosensitive media for digital hologram recording |
| 07/13/2006 | US20060151757 Photochromic, photochromic material and method for manufacturing the same |
| 07/13/2006 | DE4493152B4 Harzbeschichtetes Papier The resin-coated paper |
| 07/12/2006 | EP1679162A2 Sheet material cutting method for cutting a thermal imaging material and sheet material cutting apparatus for cutting a band-shaped thermal imaging material |
| 07/12/2006 | EP1678556A2 Low-activation energy silicon-containing resist system |
| 07/12/2006 | EP1394156B1 Chromene compound |
| 07/12/2006 | EP1023636B1 Compensation method and system for density loss in an imaging apparatus |
| 07/12/2006 | CN1802607A Photoacid generators with perfluorinated multifunctional anions |
| 07/12/2006 | CN1802604A Photographic element |
| 07/12/2006 | CN1802603A Planarization films for advanced microelectronic applications and devices and methods of production thereof |
| 07/12/2006 | CN1800847A Evaluation method of resist composition using immersion solvent |
| 07/12/2006 | CN1800846A Evaluation method of resist composition using immersion solvent |
| 07/12/2006 | CN1799705A Coated device and method |
| 07/11/2006 | US7074840 Light adjustable lenses capable of post-fabrication power modification via multi-photon processes |
| 07/11/2006 | US7074551 Imaging material with improved mechanical properties |
| 07/11/2006 | US7074550 Silver halide color photosensitive material |
| 07/11/2006 | US7074549 Photothermographic materials containing phosphors and methods of using same |
| 07/11/2006 | US7074495 Recording material support, process for manufacturing the same, recording material and process for image formation |
| 07/11/2006 | US7074458 Method of drying a web coated with a solution |
| 07/11/2006 | CA2209939C Slot coating method and apparatus |
| 07/06/2006 | WO2006071586A1 Boron compounds as stabilizers in photothermographic materials |
| 07/06/2006 | WO2006071585A1 Blocked aliphatic thiol stabilizers for photothermographic materials |
| 07/06/2006 | WO2006071546A1 Aqueous-based photothermographic materials containing tetrafluoroborate salts |
| 07/06/2006 | WO2005119802A3 Adaptive shape substrate support system and method |
| 07/06/2006 | US20060147852 A photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent for a silver ion, a binder on one face of a support, and a compound having a group adsorptive to silver halide and a reducible group; high sensitivity with a low degree of fogging, improved image stability |
| 07/06/2006 | US20060147839 Photosensitive coating material for a substrate |
| 07/06/2006 | US20060147838 Negative-working photosensitive resin composition and photosensitive resin plate using the same |
| 07/06/2006 | US20060147837 Resist composition |
| 07/06/2006 | US20060147836 Excellent resist pattern after development in the liquid immersion lithography; high resolution, high sensitivity and high resolution to high energy beam; has reduced line edge roughness, and comprises a polymeric acid generator which has insolubility in water, thermal stability, preservation stability |
| 07/06/2006 | US20060147835 Chemically amplified photoresists and related methods |
| 07/06/2006 | US20060147833 Color forming compositions with improved marking sensitivity and image contrast and associated methods |
| 07/06/2006 | US20060147832 Polymer and positive type resist composition |
| 07/05/2006 | EP1677145A1 Device and method for laser marking |
| 07/05/2006 | EP1676869A1 Photoresist resin and photoresist resin composition |