Patents for G03C 1 - Photosensitive materials (26,817)
06/2006
06/06/2006US7056652 photographic films comprising supports, silver salt of aliphatic carboxylic acid, photosensitive silver halide grains, reducing agent and dye microcapsule dispersions, used to form high density images, having durability, quality and staining resistance
06/06/2006US7056651 Conductive underlayers for aqueous-based thermally developable materials
06/06/2006US7056650 Thermally developable materials containing cationic overcoat polymer
06/06/2006US7056649 Process for producing a tool insert for injection molding a part with two-stage microstructures
06/06/2006US7056641 photoresists comprising mixtures of polybenzoxazole precursor polymers, sensitizers and solvents, used to form relief images or patterns on substrates; electronics; lithography
06/06/2006CA2320331C Mouldable photographic material
06/01/2006WO2006057782A1 Silicon containing tarc/barrier layer
06/01/2006WO2006056385A1 Lateral guide used for curtain coating
06/01/2006WO2005017617A8 Planarization films for advanced microelectronic applications and devices and methods of production thereof
06/01/2006US20060115777 Silver halide; a non-photosensitive organic silver salt; a heat developer; a binder; and a alkyl fluoroalkyl sulfosuccinate
06/01/2006US20060115776 having a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent, a phthalocyanine dye,and a binder, on a support; high sharpness, preferable image tone, and excellent image storability
06/01/2006US20060115775 Scanning exposure using laser beams; color development
06/01/2006US20060115768 Lithographic printing plate precursor, plate-making method, and lithographic printing method
06/01/2006US20060115767 A cross-linking monomer having at least two ethylenic double bonds, a photopolymerization initiator, an organic solvent, and a mother-glass powder; improved adhesion to an inorganic material and an organic material; fineness
06/01/2006US20060115766 Positive type photo-sensitive siloxane composition, cured film formed from the composition and device incorporating the cured film
06/01/2006US20060115765 Photosensitive composition and color paste
05/2006
05/31/2006EP1659990A2 Light adjustable lenses capable of post-fabrication power modification via multi-photon processes
05/31/2006CN1257952C Photochromics, photochromic materials and methods for manufacturing the same
05/30/2006US7052828 Photothermographic material
05/30/2006US7052827 Silver halide photographic material
05/30/2006US7052826 diluting waste photoresist with solvent, measuring the solids content and thicknessses of the photoresists; monitoring and comparing them to target values to determine recyclabilty
05/30/2006US7052820 Silicon-containing resist for photolithography
05/30/2006US7052819 Photothermographic materials with improved natural age keeping
05/30/2006US7052766 Functionalized halogenated polymers for microencapsulation
05/26/2006WO2006053621A1 Highly shear-thinning polyvinyl acetals
05/25/2006US20060110692 Imagewise exposing and thermal developing a photothermographic material using an image recording apparatus, wherein a part of the sheet is exposed and, in parallel with the exposure, development is started on a part of the sheet having been already exposed; high-quality images
05/25/2006US20060110691 Photothermographic material
05/25/2006US20060110682 polyvinylsilsesquioxane enhance etch resistance of antihalation composition and as binder; reducing the reflection of exposure radiation of photoresist overcoatings; increase adhesion between two layers by crosslinking between Novolak resin PHOTORESIST layer OVER THE ANTIREFLECTIVE LAYER
05/25/2006US20060110681 Maximum sensitivity in 390 to 430 nm light region; laser responsive; computer direct drawing; image-exposing the photosensitive lithographic printing plate by means of a laser light; development of the image by an aqueous developer
05/25/2006US20060110680 Photosensitive resin composition
05/25/2006US20060110679 Low-temperature curable photosensitive compositions
05/25/2006US20060110678 Polyamic acid, amine (meth)acrylates, amine methacrylamides, non-amine-containing (meth)acrylate compound; photo initiator; sensitizer; developable in aqueous carbonate; electronic circuitry applications, for use in flexible circuits, low curl, low temperature curing, good adhesion
05/25/2006US20060110677 Photoresist composition for deep UV and process thereof
05/25/2006US20060110676 Resist material for liquid immersion lithography process and method for forming resist pattern using the resist material
05/25/2006US20060108063 Sheet with anti-counterfeit functions and manufacturing method for same, article, authentication card, bar code label and authentication system
05/24/2006DE102004054568A1 Hoch scherverdünnende Polyvinylacetale High shear-thinning polyvinyl
05/24/2006CN1777624A Vinyl addition polycyclic olefin polymers prepared with non-olefinic chain transfer agents and uses thereof
05/24/2006CN1776522A Imaging compositions and methods
05/23/2006US7049056 Method for wrapping heat-developable photosensitive material
05/23/2006US7049055 Silver halide photographic material
05/23/2006US7049054 Between the outermost protective layer and the underlying imaging layers; said ionic latex polymer is other than a carboxy-containing latex polymer, for example methyl methacrylate-butyl acrylate-[2-(methacryloyloxy)ethyl]trimethylammonium chloride terpolymer; thermographic, photothermographic materials
05/23/2006US7049044 Resist copolymer of a styrenic monomer such as tetrahydropyranyloxystyrene or p-hydroxystyrene and a photoacid generating sulfonium methacrylate monomer, and optionally with a polyhedral oligomeric silsesquioxane monomer; high resolution
05/23/2006US7048969 Coating device and coating method
05/23/2006US7048876 Photochromic compound exhibits absorption bands in two wavelength regions of 440 to 500 nm and 570 to 630 nm.
05/23/2006US7047882 Planographic plate producing method including adjusting moisture content of coating film layer
05/18/2006WO2006051309A1 Photothermal recording medium
05/18/2006WO2006050853A1 Less shear-thinning polyvinyl acetals
05/18/2006US20060106160 Planarization films for advanced microelectronic applications and devices and methods of production thereof
05/18/2006US20060105269 Fluorinated photoresist materials with improved etch resistant properties
05/18/2006US20060105268 Method for thermally processing photosensitive printing sleeves
05/18/2006US20060105267 (Meth)acrylate terpolymers with pendant groups of 5-napthol, a lactone and an acid labile moiety inhibiting solubility in aqueous alkaline solutions; high resolution photolithography using 193 nm radiation; improved etch resistance and dissolution; antiswelling agents; microelectronics
05/18/2006US20060105266 Low activation energy positive resist
05/18/2006US20060105248 Method of reducing the average process bias during production of a reticle
05/18/2006US20060105150 Imaging support containing interference pigments
05/18/2006US20060102205 Method for reducing contact angle of water on TAC film
05/17/2006EP1657239A2 Chromene compound
05/17/2006EP1656590A2 Novel photosensitive bilayer composition
05/17/2006CN1774732A An instruction plate and signage using photo luminescent porcelain enamel
05/17/2006CN1773618A Write-only one time type high-density optical information recording media
05/17/2006CN1772759A N,n-dialkyl polyhydroxy alkylamines
05/16/2006US7045487 Rapid adsorbtion and aggregation on organic silver salt nanoparticles; neutral thermographic image tone; nitrogen heterocyclic compounds containing thiocarbamate, thiourea or amino-oxy-dithione functionality
05/16/2006US7045471 Method for forming resist pattern in reverse-tapered shape
05/16/2006US7045271 Polysiloxane copolymer; lithography printing plates
05/15/2006CA2527134A1 Printable substrate, processes and compositions for preparation thereof
05/11/2006WO2006049866A1 Thermally developable materials with improved conductive layer
05/11/2006WO2006049732A1 Color forming compositions and associated methods
05/11/2006US20060099539 Micro-particle dispersion having hydrophobic protective colloid and method of manufacture thereof, photosensitive emulsion and method of manufacturing thereof, and silver salt photohermographic dry imaging material utilizing the same
05/11/2006US20060099532 Method for manufacturing a substrate for use in a stamper manufacturing process, as well as a substrate obtained by using such a method
05/11/2006US20060099531 Derivatized polyhydroxystyrenes (DPHS) with a novolak type structure and blocked DPHS (BDPHS) and processes for preparing the same
05/10/2006EP1655294A2 Chromene compound
05/10/2006EP1655293A2 Chromene compound
05/10/2006EP1654126A1 Process for providing marking on security papers
05/10/2006CN1771299A Infrared absorbing compounds and their use in imageable elements
05/10/2006CN1255703C Method for producing double-sided diazophotosensitive paper
05/09/2006US7041846 useful as monomers for polymerization to form base resins for use in micropatterning resist compositions; improved transparency, especially at the exposure wavelength of an excimer laser, and improved dry etching resistance
05/09/2006US7041763 Photochromic polymers and methods of synthesizing same
05/09/2006US7041711 Polymerizable composition and compound therefor
05/09/2006US7041428 Exposure to light development a mixture of basic polymer and acid generator
05/09/2006US7041426 Lithography; acid splitting of polymer
05/09/2006US7041392 Laminated composite oxide film composed of an oxide of Ti, Mn, Co, Ni, Zn, and/or Sn, and and oxide of Mg, Al, and/or Si; and a transparent conductive film
05/09/2006US7040929 sulpho-benzimidazole compounds; their use enhances the adhesion of hydrophilic layers to hydrophobic supports, they have no photographically active impurities and are compatible with image-wise heating with a thermal head
05/04/2006WO2006045691A1 Amphoteric 4-4'-bis(triazinylamino) stilbene-2, 2'-disulfonic acid derivatives as optical brighteners for paper
05/04/2006WO2005110043A3 Method of making a photopolymer sleeve blank for flexographic printing
05/04/2006US20060093974 Thermally developable materials processable at lower temperatures
05/04/2006US20060093973 Thermally developable materials with improved conductive layer
05/04/2006US20060093960 4,4-difluoro-5-hydroxy-3-methyl-5-trifluoromethyloxolane-3-yl methacrylate; useful as raw materials for the synthesis of functional materials, pharmaceutical and agricultural chemicals, to produce polymers for the manufacture of radiation-sensitive resist having high transparency
05/04/2006US20060093959 Polymers having a silsesquioxane (ladder or network) structure; top anti-reflective coating material (TARC) and barrier layer, lithography
05/04/2006US20060093958 Color forming compositions and associated methods
05/04/2006US20060093762 Masterbatch
05/04/2006CA2584794A1 Tricyclic spacer systems for nonlinear optical devices
05/03/2006EP1653285A2 Evaluation method of resist composition using immersion solvent
05/03/2006EP1653284A2 Evaluation method of resist composition based on sensitivity
05/03/2006EP1651732A1 Photochromic primer composition having high impact resistance and transparent material coated with the same
05/03/2006CN1768302A Photoresist compositions
05/02/2006US7037641 Silver halide emulsion sheet for detecting track of charged elementary particles, and processing method thereof
05/02/2006US7037640 Image storage phosphor or scintillator panels coated onto flexible supports
05/02/2006US7037634 Imaging element on support of foam core layer; expanded using blowing agent
04/2006
04/27/2006WO2006044690A2 Low-k dielectric functional imprinting materials
04/27/2006WO2006043815A1 Multi-layer support
04/27/2006WO2005089355A3 Environmentally friendly photoacid generators (pags) with no perfluorooctyl sulfonates (pfos)
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