| Patents for G03C 1 - Photosensitive materials (26,817) |
|---|
| 10/10/2007 | CN100341949C 1,1-dimethyl-3-propyl sulfonate indole-1'-(N,N-dimethyl amine athyl amine)-3-ethyl imidazole carbocxyanine dyestuff, preparing process and use thereof |
| 10/09/2007 | US7279539 Alkali-soluble polymer and polymerizable composition thereof |
| 10/09/2007 | US7279273 Photothermographic material |
| 10/09/2007 | US7279272 Silver halide emulsion and silver halide photosensitive material |
| 10/09/2007 | US7279271 Coloring capability, processing stability, dye image fastness and a white background |
| 10/09/2007 | US7279266 Photosensitive composition and lithographic printing plate precursor using the same |
| 10/09/2007 | US7279263 Dual-wavelength positive-working radiation-sensitive elements |
| 10/09/2007 | US7279200 Process for producing coatings using surface-active photoinitiators |
| 10/09/2007 | US7278709 Photo-curable resin composition, method of patterning the same, and ink jet head and method of fabricating the same |
| 10/04/2007 | WO2007110367A1 Layer support for recording materials |
| 10/04/2007 | WO2006098877A9 Method and apparatus for analyzing an imaging material |
| 10/04/2007 | US20070231754 Black and white photothermographic material |
| 10/04/2007 | US20070231753 For use in movie projection; at least three light-sensitive silver halide emulsion layers different from each other in color developability and sensitivity; non-light-sensitive hydrophilic colloid layer containing black colloidal silver between support and emulsion and having 6x10-5 mol/m2 or less Fe |
| 10/04/2007 | US20070231744 Holographic recording medium |
| 10/04/2007 | US20070231741 Resist composition and patterning process |
| 10/04/2007 | US20070231740 Planographic printing plate precursor and stack thereof |
| 10/04/2007 | US20070231739 Polymerizable negative planographic printing plate precursor, stack of planographic printing plate precursors, and method of producing polymerizable negative planographic printing plate precursor |
| 10/04/2007 | US20070231738 Resist composition and patterning process using the same |
| 10/04/2007 | US20070231737 polymer having a carbon-carbon unsaturated bond in then chain and a side chain; butadiene-styrene copolymer; thick layer efficiently engraved with low laser energy; sensitivity |
| 10/04/2007 | US20070231736 Bottom antireflective coating composition and method for use thereof |
| 10/04/2007 | US20070231735 Negative photoresist compositions |
| 10/04/2007 | US20070231734 Low activation energy dissolution modification agents for photoresist applications |
| 10/04/2007 | US20070231730 Radiation Curable Toner Composition |
| 10/04/2007 | US20070228340 Infrared absorbing phthalocyanine compound (1,4,8,11,15,18,22,25-octabutoxyphthalocyanine ) and a plasticizer (polyvinylbutyral or ethylene-co-vinyl acetate) |
| 10/04/2007 | CA2642924A1 Support material for recording layer |
| 10/03/2007 | EP1840818A2 Method for telemanipulation with telepresence |
| 10/03/2007 | EP1840646A1 Photothermographic material |
| 10/03/2007 | EP1839086A2 System, apparatus, and method for increasing media storage capacity |
| 10/03/2007 | EP1614002A4 Lithium salt of polyacetylene as radiation sensitive filaments and preparation and use thereof |
| 10/03/2007 | EP0894275B1 Photochromic naphthopyran compositions of improved fatigue resistance |
| 10/03/2007 | CN101048700A Silver halide color photographic photosensitive material and method of image forming |
| 10/03/2007 | CN101048699A Silver halide color light-sensitive material |
| 10/02/2007 | US7276623 Polymerizable ester compounds |
| 10/02/2007 | US7276327 Silicon-containing compositions for spin-on arc/hardmask materials |
| 10/02/2007 | US7276324 Nitrogen-containing organic compound, resist composition and patterning process |
| 10/02/2007 | US7276323 Photoresists, polymers and processes for microlithography |
| 10/02/2007 | US7276255 based on hypochlorous acid; acts as microbiocide and promotes cell proliferation |
| 10/02/2007 | US7276188 Coupling dye to polyimide |
| 10/02/2007 | US7275704 Compound dispersing method and apparatus |
| 09/27/2007 | WO2007107752A1 Diffuse reflector for light enhancement of lcd screens |
| 09/27/2007 | WO2007073482A3 Method and apparatus for processing multiphoton curable photoreactive compositions |
| 09/27/2007 | US20070224555 supports having an image forming layer comprising photosensitive silver halides, a non-photosensitive organic silver salt, reducing agents and binders, used for recording images for medical use |
| 09/27/2007 | US20070224554 Photothermographic material |
| 09/27/2007 | US20070224550 Photosensitive composition and method for forming pattern using same |
| 09/27/2007 | US20070224549 Forming a photosensitive layer on a substrate, selectively irradiating the photosensitive layer with at least one of an ultraviolet ray and an ionizing radiation; heat treatment; developing the photosensitive layer to remove irradiated area |
| 09/27/2007 | US20070224541 Polymer matrix of a spiroorthoester of an epoxy compound, a radical-polymerizable compound and a photoinitiator |
| 09/27/2007 | US20070224540 containing an acid generating compound including a sulfonium cation, a low molecular weight polyhydric phenol compound which increases solubility in an alkali developing solution by an action of an acid; coating, exposing resist film and developing to form resist pattern |
| 09/27/2007 | US20070224539 Resist composition and pattern forming method using the same |
| 09/27/2007 | US20070224537 Resist composition, method for forming resist pattern, and semiconductor device and method for manufacturing the same |
| 09/27/2007 | US20070224536 Silver halide photographic light-sensitive material |
| 09/26/2007 | EP1836534A1 Thermally developable materials having improved backside conductive layers |
| 09/26/2007 | EP1836241A1 Antistatic surface finish |
| 09/26/2007 | EP1659990A4 Light adjustable lenses capable of post-fabrication power modification via multi-photon processes |
| 09/26/2007 | CN101044431A Silver halide color photosensitive material and method of processing the same |
| 09/26/2007 | CN100339407C Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the same |
| 09/26/2007 | CN100339213C Antireflective silicon-containing compositions as hardmask layer |
| 09/25/2007 | US7275224 Method for providing an area optimized binary orthogonality checker |
| 09/25/2007 | US7274463 Anodizing system with a coating thickness monitor and an anodized product |
| 09/25/2007 | US7273690 Improvement in the resist pattern falling and profile deterioration caused by a time delay between exposure and post-exposure bake; use of sulfonium acid generator that has either a cation with a fluoro(cyclo)alkyl residue or an anion with a nonfluoro-substituted (cyclo)alkyl residue |
| 09/20/2007 | WO2007106885A2 Photographic printing paper and method of making same |
| 09/20/2007 | WO2007105699A1 Dithienylcyclopentene compound, styrene polymer having dithienylcyclopentene, photochromic material, and photonic element |
| 09/20/2007 | WO2007105554A1 Heat developable photosensitive material |
| 09/20/2007 | US20070218407 Positive resist composition and pattern forming method using the same |
| 09/20/2007 | US20070218406 Positive resist composition and pattern forming method using the same |
| 09/20/2007 | US20070218405 resin which increases solubility in alkali developing solution by action of acid and comprises repeating unit containing lactone structure and cyano group; photoresists; lithography |
| 09/20/2007 | US20070218404 Infrared-sensitive lithographic printing plate |
| 09/20/2007 | US20070218403 (Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it |
| 09/20/2007 | US20070218402 Fluorine-containing silicon compounds, silicone resins, resist compositions, and patterning process |
| 09/20/2007 | US20070218401 liquid immersion lithography, solves problem of defect caused by residual fluid droplets on the resist film; blend of resin containing no fluorine and acid labile group, and an acrylic fluoro-copolymer with units of a fluoromonomer and units of acid labile, lactone, or hydroxy-functional group |
| 09/20/2007 | US20070218400 polyamide polymer of p-phenylenediamine and 3,3',4,4'-biphenyltetracarboxylic acid dianhydride containing of N,N-dimethylaminopropyl methacrylate photosensitive group; a dissolution accelerator for a developing solution e.g. N-phenylbenzenesulfonamide; and a solvent e.g. methyl ethyl ketone, toluene etc. |
| 09/19/2007 | EP1649322A4 Planarization films for advanced microelectronic applications and devices and methods of production thereof |
| 09/19/2007 | CN101039924A Amphoteric 4-4'-bis(triazinylamino) stilbene-2, 2'-disulfonic acid derivatives as optical brighteners for paper |
| 09/18/2007 | US7271940 Deposition of photosensitive media for digital hologram recording |
| 09/18/2007 | US7270945 Image forming method using photothermographic material |
| 09/18/2007 | US7270944 Compositions, systems, and methods for imaging |
| 09/18/2007 | US7270943 Compositions, systems, and methods for imaging |
| 09/18/2007 | US7270939 Photoresist composition for LCD light diffuse reflecting film |
| 09/18/2007 | US7270937 Over-coating composition for photoresist and process for forming photoresist pattern using the same |
| 09/18/2007 | US7270935 Cyanoadamantyl compounds and polymers and photoresists comprising same |
| 09/18/2007 | US7270934 Water-soluble negative photoresist polymer, composition containing the same, and method of forming a photoresist pattern |
| 09/18/2007 | US7270933 applying mixtures of curing agents, light absorbers, acid generators, solvents and polydimethylsiloxane on the surfaces of a layer to be etched, then baking to form films, applying photosensitive materials, exposing to a light source and developing to form patterns |
| 09/18/2007 | US7270932 Imaging composition and method |
| 09/18/2007 | US7270931 Silicon-containing compositions for spin-on ARC/hardmask materials |
| 09/18/2007 | US7270919 Coating the substrate with a substantially visible light-transparent solution, in an organic solvent, of an amine compound of molybdenum, tungsten or vanadium that changes colour on heating or irradiation, and heating or irradiating the coating |
| 09/18/2007 | US7270916 Recording medium |
| 09/13/2007 | WO2007103645A2 Latent image systems, developers, and blockers therefor |
| 09/13/2007 | WO2007102590A1 Optically active compound, optical recording material, optical film, and information recording medium |
| 09/13/2007 | US20070213447 Over-coating agent for forming fine patterns and a method of forming fine patterns using such agent |
| 09/13/2007 | US20070212656 Photothermographic material |
| 09/13/2007 | US20070212646 Compositions and processes for photolithography |
| 09/13/2007 | US20070212645 Photo sensitive composition, pattern-forming method using the photosensitive composition and compound for use in the photosensitive composition |
| 09/13/2007 | US20070212644 Photosensitive recording material, planographic printing plate precursor, and stacks of the same |
| 09/13/2007 | US20070212643 Compound having polymethine-chain structure, image forming material, planographic printing plate precursor, and image forming method using the same, method of making planographic printing plate, and planographic printing method |
| 09/13/2007 | US20070212642 photopolymerization initiator; photosensitive transfer sheet; titanocene has a carbonyl group |
| 09/13/2007 | US20070212641 Lithographic printing plate precursor and method for preparation of lithographic printing plate |
| 09/13/2007 | US20070212640 Positive Photosensitive Composition |
| 09/13/2007 | US20070212639 Color forming composition with enhanced image stability |
| 09/13/2007 | US20070212638 Base soluble polymers for photoresist compositions |
| 09/12/2007 | EP1831762A1 Blocked aliphatic thiol stabilizers for photothermographic materials |
| 09/12/2007 | CN100337160C Photosensitive composition and color filter |