Patents for C30B 29 - Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape (27,107)
02/2006
02/16/2006WO2006016659A1 Nitrogen doped silicon wafer and manufacturing method thereof
02/16/2006WO2006015990A1 Method for producing a photonic crystal comprised of a material with a high refractive index
02/16/2006WO2005048297A3 Nanostructures including a metal
02/16/2006WO2005010949A3 Solution to thermal budget
02/16/2006US20060035446 Apparatus of catalytic molecule beam epitaxy and process for growing III-nitride materials using the apparatus
02/16/2006US20060035035 Film forming method and film forming apparatus
02/16/2006US20060033119 III-V group nitride system semiconductor self-standing substrate, method of making the same and III-V group nitride system semiconductor wafer
02/16/2006US20060032526 Thermoelectric conversion material, thermoelectric conversion device and manufacturing method thereof
02/16/2006US20060032434 Seed and seedholder combinations for high quality growth of large silicon carbide single crystals
02/16/2006US20060032428 Process for obtaining of bulk monocrystalline gallium-containing nitride
02/15/2006CN1734247A III-V group nitride system semiconductor self-standing substrate, method of making the same and III-V group nitride system semiconductor wafer
02/15/2006CN1733634A Nanometer thread and its preparation method
02/15/2006CN1242469C Radiator and its manufacturing method
02/15/2006CN1242101C Method for producing organic nano tube with porous template
02/14/2006US6997987 Optical lithography fluoride crystal annealing furnace
02/14/2006US6997986 Method for preparing single crystal
02/09/2006WO2006014472A1 Iii-nitride materials including low dislocation densities and methods associated with the same
02/09/2006WO2006013826A1 Bi LAYERED COMPOUND NANOPLATE, ARRAY THEREOF, PROCESS FOR PRODUCING THEM, AND APPARATUS UTILIZING THE SAME
02/09/2006WO2006013344A1 Manufacture of cadmium mercury telluride on patterned silicon
02/09/2006WO2006012925A1 Apparatus for growing single crystals from melt
02/09/2006WO2006012924A1 Method of growing single crystals from melt
02/09/2006US20060030133 Relaxed, low-defect SGOI for strained Si CMOS applications
02/09/2006US20060030087 Compliant substrate for a heteroepitaxial structure and method for making same
02/09/2006US20060029832 High surface quality GaN wafer and method of fabricating same
02/09/2006US20060029792 Process for manufacturing self-assembled nanoparticles
02/09/2006US20060027831 Method for fabricating Group III nitride compound semiconductors and Group III nitride compound semiconductor devices
02/09/2006US20060027161 Method for heat-treating silicon wafer and silicon wafer
02/09/2006DE102004034667A1 Producing synthetic diamond particles comprises exposing hydrogen and fluidized carbon seed particles to an energy source
02/09/2006CA2569832A1 Manufacture of cadmium mercury telluride on patterned silicon
02/08/2006EP1624095A2 Nitride semiconductor single-crystal substrate and method of its synthesis
02/08/2006EP1624094A1 Method for producing single crystal and single crystal
02/08/2006EP1623954A1 Method for preparation of metal nano-rod and use thereof
02/08/2006EP1622833A1 Perovskite titanium-containing composite oxide particle, production process and uses thereof
02/08/2006CN1240886C Protein crystallization equipment and protein crystallization method
02/08/2006CN1240885C Non-linear optical crystal potassium sodium alumino borate and its preparation process and application
02/08/2006CN1240884C Amorphous silicon crystallizing method
02/07/2006US6995078 Method of forming a relaxed semiconductor buffer layer on a substrate with a large lattice mismatch
02/02/2006WO2006011976A1 One hundred millimeter high purity semi-insulating single crystal silicon carbide wafer
02/02/2006WO2006011389A1 METHOD FOR PRODUCING RE-Ba-Cu-O OXIDE SUPERCONDUCTOR
02/02/2006WO2005007937A3 Annealing single crystal chemical vapor deposition diamonds
02/02/2006WO2005007935A3 Tough diamonds and method of making thereof
02/02/2006US20060022308 Group III-V compound semiconductor and method for producing the same
02/02/2006US20060021567 Apparatus for pulling single crystal
02/02/2006DE202004020812U1 Process for preparation especially of a non-111 oriented sliding plane large volume low stress crystal useful as an optical element for preparation of excimer-lasers, wafers, computer chips, and integrated circuits
02/02/2006DE202004020811U1 Process for preparation of a low stress large volume crystal of defined height and diameter having a small double refraction and homogeneous refractive index useful for production of optical elements, computer chips and integrated circuits
02/02/2006DE202004020810U1 Production of low stress calcium fluoride single crystal, for optical applications, including tempering of the crystal at specified temperature for specified time giving small residual stress
02/01/2006EP1620881A1 Method for texturing surfaces of silicon wafers
02/01/2006EP1620294A2 Chemical vapor deposition epitaxial growth
02/01/2006EP1587971A4 Method and apparatus for producing large, single-crystals of aluminum nitride
02/01/2006EP1290251B8 Thick single crystal diamond layer method for making it and gemstones produced from the layer
02/01/2006CN1729383A Increasing of resistance of crystals to optical damage
02/01/2006CN1729317A Method for forming carbon nanotubes
02/01/2006CN1727528A Method for developing crystal of protein
02/01/2006CN1727527A Boron aluminate, non-linear optic crystal of boron aluminate, growth method and usage
02/01/2006CN1727526A Method for preparing microlite silicon
02/01/2006CN1727525A Method for preparing polysilicon
02/01/2006CN1727524A Method for preparing needle shaped Nano ZnO line under low temperature without catalyst
02/01/2006CN1727523A Liquid phase method for synthesizing one-dimensional super long Nano line of metal copper
02/01/2006CN1727522A Method for developing monocrystal of potassium dihydrogen phosphate in large aperture rapidly
02/01/2006CN1727303A Method for fabricating Mg, Ti adulterated Al2O3 crystalline material, and transparent laser ceramics
02/01/2006CN1727283A Method for preparing superfine zinc oxide and crystal whisker of zinc oxide
02/01/2006CN1239759C Method for preparation of directional growth columnar crystal and monocrystal titanium alloy
02/01/2006CN1239758C Massive prepn process of nano beta-Sic crystal whisker
02/01/2006CN1239757C Method for preparing phosphoric acid rare earth monocrystalline nano-thread
02/01/2006CN1239423C Quartz glass component and method for production thereof
01/2006
01/31/2006US6991959 Method of manufacturing silicon carbide film
01/26/2006WO2006009802A2 A melter assembly and method for charging a crystal forming apparatus with molten source material
01/26/2006WO2006008957A1 Silicon epitaxial wafer and process for producing the same
01/26/2006WO2004081987A3 Sige rectification process
01/26/2006US20060019472 Systems and methods for nanowire growth and harvesting
01/26/2006US20060019470 Directionally controlled growth of nanowhiskers
01/26/2006US20060019459 Method for forming a structure provided with at least one zone of one or several semiconductor nanocrystals localised with precision
01/26/2006US20060016388 Domain epitaxy for thin film growth
01/26/2006US20060016386 Silicon wafer and method for producing silicon single crystal
01/26/2006DE19740257B4 Impfkristallhalter Seed crystal
01/26/2006CA2580273A1 Thin film material and method for manufacturing the same
01/25/2006EP1619277A2 Process for making a structure having at least one precisely positioned zone of one or several semiconductor nanocrystals
01/25/2006EP1619276A2 Homoepitaxial growth of SiC on low off-axis SiC wafers
01/25/2006EP1375692B1 Intermetallic compound superconducting material comprising magnesium and beryllium and alloy superconducting material containing the intermetallic compound and method for preparing them
01/25/2006CN1725444A Epitaxial growing lanthanum aluminate film material on silicon substrate and preparation method
01/25/2006CN1724724A Growing method of yttrium aluminate crystal
01/25/2006CN1724723A Preparation method of large diameter zone melting silicon single crystal
01/25/2006CN1724722A Cold core shouldering micropulling proparation method of large size sapphire single crystal
01/25/2006CN1238578C Lithium niobate crystal waveguide preparation by ion implantation and anneal
01/25/2006CN1238577C Preparation process of lamellar nano zinc oxide mono-crystal
01/25/2006CN1238575C Method of building crystal to grow lead zirconate titanate film
01/25/2006CN1238574C Process for preparing CdTe nano-crystal with high photo-luminescent efficiency by hydrothermal technique
01/25/2006CN1238193C Substrate for electronic device, electronic device and equipment containing the electronic device
01/24/2006US6989287 Method for producing nitride semiconductor, semiconductor wafer and semiconductor device
01/24/2006US6989060 Calcium fluoride crystal and method and apparatus for using the same
01/24/2006US6989059 Process for producing single crystal of compound semiconductor and crystal growing apparatus
01/24/2006US6989058 Use of thin SOI to inhibit relaxation of SiGe layers
01/19/2006WO2006005637A1 Method for the deposition of layers containing silicon and germanium
01/19/2006WO2004086489A8 System and method of silicon crystallization
01/19/2006US20060014383 Method of producing semiconductor single crystal wafer and laser processing device used therefor
01/19/2006US20060014040 Zn and Cd metal layer act to passivate and limit the diffusion rate of oxygen molecules to the semiconductor nanocrystal core CdTe; reduce lattice mismatch, increase the quantum efficiency
01/19/2006US20060012011 Mehtod for processing nitride semiconductor crystal surface and nitride semiconductor crystal obtained by such method
01/19/2006US20060011126 Three-dimensional periodic structure and method for producing the same
01/19/2006DE10036672B4 GaAs-Flüssigphasenepitaxiewafer und Verfahren zum Herstellen desselben GaAs Flüssigphasenepitaxiewafer thereof and methods for preparing
01/18/2006EP1617466A1 Method for producing single crystal ingot from which semiconductor wafer is sliced