Patents for C23F 1 - Etching metallic material by chemical means (16,062)
09/2010
09/14/2010US7794546 Sealing device and method for a processing system
09/14/2010US7794545 Mask, film forming method, light-emitting device, and electronic apparatus
09/14/2010US7793612 Ring plasma jet method and apparatus for making an optical fiber preform
09/10/2010WO2010101136A1 Porous network structure, hydrophilic member utilizing same, and processes for producing the porous network structure and the hydrophilic member
09/09/2010US20100227478 Substrate processing apparatus and method of manufacturing semiconductor
09/09/2010US20100227477 Method for forming thin film, method for producing organic electroluminescent device, method for producing semiconductor device, and method for producing optical device
09/09/2010US20100227018 Method to fabricate a mould for lithography by nano-imprinting
09/09/2010US20100225858 Liquid crystal display, color filter substrate and manufacturing method thereof
09/09/2010US20100224706 Formation method of water repellent layer and injector having water repellent layer
09/09/2010US20100224592 Charged particle beam processing
09/09/2010US20100224591 Substrate processing method
09/09/2010US20100224587 Plasma etching method, plasma etching apparatus and computer-readable storage medium
09/09/2010US20100224325 Plasma processing apparatus and electrode for same
09/09/2010US20100224324 Plasma generating apparatus, plasma generating method and remote plasma processing apparatus
09/09/2010US20100224323 Plasma processing apparatus and electrode for same
09/09/2010US20100224322 Endpoint detection for a reactor chamber using a remote plasma chamber
09/09/2010US20100224321 Inductively coupled plasma reactor having rf phase control and methods of use thereof
09/09/2010DE102009012230A1 Apparatus for single-sided removal of a thin layer from a semiconductor substrate, comprises contact element made of etching-resistant material, container for receiving etching agent, gas flow device, and device for cleaning the substrate
09/08/2010EP2226410A1 Etchant and replenishment solution for producing copper wiring
09/08/2010CN101824620A Preparation method of superhydrophobic coating on magnesium alloy surface
09/08/2010CN101308789B Air flow guiding device for vacuum process
09/07/2010US7791573 forming multiple layer of copper and molybdenum on a substrate;forming a photoresist pattern on the multiple layer; andetching with a solution containing H2O2, anorganic acid; a phosphate; first and second nitrogen-containing additives; fluoriine compound; andde-ionized water; liquid crystal displays
09/07/2010US7790049 gas phase etching silicon oxide substrate: used as a material for a mold for nanoimprint, an optical waveguide, an optical switch, a biochip
09/07/2010US7790048 Treatment of the working layer of a multilayer structure
09/07/2010US7789992 Neutral beam etching device for separating and accelerating plasma
09/07/2010US7789991 Lag control
09/07/2010US7789979 Controlled prestraining of nickel titanium (nitinol) material; implantable medical devices
09/07/2010US7789963 Chuck pedestal shield
09/07/2010US7789961 Delivery device comprising gas diffuser for thin film deposition
09/02/2010WO2010099027A1 Mems device with integrated via and spacer
09/02/2010US20100221915 Method and apparatus for semiconductor processing
09/02/2010US20100220018 Ice and snow accretion-preventive antenna, electric wire, and insulator having water-repellent, oil-repellent, and antifouling surface and method for manufacturing the same
09/02/2010US20100219160 Method of treating a surface of at least one part by means of individual sources of an electron cyclotron resonance plasma
09/02/2010US20100219159 Plasma source with integral blade and method for removing materials from substrates
09/02/2010US20100219158 Method for dry etching interlayer insulating film
09/02/2010US20100219157 Film forming apparatus and film forming method
09/02/2010US20100219155 Equipment and methods for etching of mems
09/02/2010US20100218983 Method for manufacturing printed wiring board and printed wiring board
09/02/2010US20100218896 Atmospheric pressure plasma reactor
09/02/2010US20100218895 Plasma processing apparatus
09/02/2010US20100218894 Method of Removing Metallic, Inorganic and Organic Contaminants From Chip Passivation Layer Surfaces
09/01/2010CN201565291U System for classified discharge or recovery of various chemicals
09/01/2010CN1957111B Improved micro-fluid ejection assemblies
09/01/2010CN101819971A Thin film transistor for liquid crystal display
09/01/2010CN101818378A Velvet manufacturing solution of monocrystalline silicon additive
09/01/2010CN101818348A Method for preparing texture of monocrystalline-silicon solar cell by one-step process
08/2010
08/31/2010US7786403 Method for high-resolution processing of thin layers using electron beams
08/31/2010US7785486 Method of etching structures into an etching body using a plasma
08/31/2010US7785484 Mask trimming with ARL etch
08/31/2010US7785481 Method for fabricating micromachined structures
08/31/2010US7784170 Method for forming a resist pattern of magnetic device by etching with a gas cluster ion beam
08/26/2010WO2010095742A1 Etching solution compositions for metal laminate films
08/26/2010US20100216260 Plasma etching method and apparatus, and method of manufacturing liquid ejection head
08/26/2010US20100215541 Device and method for producing high power microwave plasma
08/26/2010US20100214694 Method of manufacturing magnetic recording medium
08/26/2010US20100214645 Separable modulator
08/26/2010US20100213175 Diamond etching method and articles produced thereby
08/26/2010US20100213173 Bevel plasma treatment to enhance wet edge clean
08/26/2010US20100213172 Using Positive DC Offset of Bias RF to Neutralize Charge Build-Up of Etch Features
08/26/2010US20100213171 Focus ring heating method, plasma etching apparatus, and plasma etching method
08/26/2010US20100213166 Process and Device for The Precision-Processing Of Substrates by Means of a Laser Coupled Into a Liquid Stream, And Use of Same
08/26/2010US20100213165 Low ejection energy micro-fluid ejection heads
08/26/2010US20100213162 Plasma etching method, plasma etching apparatus and storage medium
08/26/2010US20100212832 Stage device and plasma treatment apparatus
08/26/2010US20100212831 Device with lifting and lowering drain tank for wet etching wafers
08/25/2010EP2222148A1 Rollers for transporting thin substrate and chemical treatment method using the same
08/25/2010EP2220269A1 A method of manufacturing a press plate, a press plate, a method of embossing a floor panel, and a floor planel
08/25/2010CN201560237U Solution exchanging system
08/25/2010CN101812724A Silicon film formation apparatus and method for using same
08/25/2010CN101812688A Etching solution and etching method
08/25/2010CN101812687A Slotted polysilicon wet velvet preparing device
08/25/2010CN101407914B Tin-lead stripper
08/25/2010CN101381872B Dry film pasting promotor and its use method
08/25/2010CN101327710B Method for decorating surface of metal
08/25/2010CN101191226B Schiff base heterocycle carbon steel pickling corrosion inhibitor and application thereof
08/25/2010CN101128622B Etching chamber with subchamber
08/25/2010CN101097971B Monocrystaline silicon solar battery texture etching tank
08/24/2010US7781340 Method and system for etching high-k dielectric materials
08/24/2010US7780868 Alkaline etching solution for semiconductor wafers and alkaline etching method
08/24/2010US7780866 Method of plasma confinement for enhancing magnetic control of plasma radial distribution
08/24/2010US7780864 Process using combined capacitively and inductively coupled plasma sources for controlling plasma ion radial distribution
08/24/2010US7780814 Wafer pre-clean reactor cable termination for selective suppression/reflection of source and bias frequency cross products
08/24/2010US7780813 Electric field mediated chemical reactors
08/24/2010US7780785 Gas delivery apparatus for atomic layer deposition
08/24/2010US7779784 Apparatus and method for plasma assisted deposition
08/24/2010US7779783 Plasma processing device
08/20/2010CA2692210A1 Electrodialysis method for purifying of silicate-containing potassium hydroxide etching solution
08/19/2010US20100210110 Etching apparatus, a method of controlling an etching solution, and a method of manufacturing a semiconductor device
08/19/2010US20100206847 Toroidal plasma chamber for high gas flow rate process
08/19/2010US20100206846 Substrate processing apparatus and substrate processing method
08/19/2010US20100206843 Restoring of strength and wear resistance of a metal matrix composite (mmc)
08/19/2010US20100206484 Tray, tray support member, and vacuum processing apparatus
08/19/2010US20100206483 RF Bus and RF Return Bus for Plasma Chamber Electrode
08/19/2010US20100206482 Plasma processing apparatus and temperature measuring method and apparatus used therein
08/19/2010US20100206481 Apparatus for wet treatment of plate-like articles
08/19/2010US20100206480 Processes and equipments for preparing f2-containing gases, as well as processes and equipments for modifying the surfaces of articles
08/18/2010CN1863940B Silicon blades for surgical and non-surgical use
08/18/2010CN1638604B Method and device for contactless treatment of flat objects in through type treatment equipment
08/18/2010CN1638603B Method and device for treating flat objects in through type treating apparatus
08/18/2010CN101805929A Polycrystalline silicon surface wool manufacturing method
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